Membership
Tour
Register
Log in
characterised by the type of processing
Follow
Industry
CPC
H01J2237/33
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
H
ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/00
Discharge tubes exposing object to beam
Current Industry
H01J2237/33
characterised by the type of processing
Industries
Overview
Organizations
People
Information
Impact
Please log in for detailed analytics
Patents Grants
last 30 patents
Information
Patent Grant
Methods and apparatus for processing a substrate
Patent number
12,368,024
Issue date
Jul 22, 2025
Applied Materials, Inc.
Abdullah Zafar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and system for forming metal-insulator-metal capacitors
Patent number
12,369,336
Issue date
Jul 22, 2025
Taiwan Semiconductor Manufacturing Co., Ltd
Wei-Liang Chen
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Polycrystalline SiC compact and method for manufacturing the same
Patent number
12,368,026
Issue date
Jul 22, 2025
Tokai Carbon Co., Ltd.
Yohei Harada
B24 - GRINDING POLISHING
Information
Patent Grant
Apparatus for improved high pressure plasma processing
Patent number
12,368,028
Issue date
Jul 22, 2025
Applied Materials, Inc.
William R. Johanson
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Lamellar ceramic structure
Patent number
12,368,029
Issue date
Jul 22, 2025
Lam Research Corporation
Joel Philip Hollingsworth
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Sputtering apparatus and CVD mask coating method using the same
Patent number
12,365,975
Issue date
Jul 22, 2025
Samsung Display Co., Ltd.
Sungmin Hur
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing method
Patent number
12,368,031
Issue date
Jul 22, 2025
HITACHI HIGH-TECH CORPORATION
Kosa Hirota
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate processing method and substrate processing apparatus
Patent number
12,368,027
Issue date
Jul 22, 2025
Tokyo Electron Limited
Takatoshi Orui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing method and plasma processing apparatus
Patent number
12,368,050
Issue date
Jul 22, 2025
Tokyo Electron Limited
Masahiko Yokoi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
In-situ closed-loop management of radio frequency power generator
Patent number
12,368,023
Issue date
Jul 22, 2025
Taiwan Semiconductor Manufacturing Co., Ltd
Wei Ting Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Deposition method and deposition apparatus
Patent number
12,368,030
Issue date
Jul 22, 2025
Tokyo Electron Limited
Hitoshi Kato
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Gas analyzer apparatus
Patent number
12,368,032
Issue date
Jul 22, 2025
Atonarp Inc.
Naoki Takahashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
12,362,143
Issue date
Jul 15, 2025
Tokyo Electron Limited
Satoru Kawakami
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma etching apparatus and method
Patent number
12,362,152
Issue date
Jul 15, 2025
SPTS Technologies Limited
Maxime Varvara
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Ion beam etching chamber with etching by-product redistributor
Patent number
12,362,154
Issue date
Jul 15, 2025
Taiwan Semiconductor Manufacturing Company, Ltd
Te-Hsien Hsieh
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Systems and methods for controlling a plasma sheath characteristic
Patent number
12,362,159
Issue date
Jul 15, 2025
Lam Research Corporation
Alexei M. Marakhtanov
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus, temperature control method of subst...
Patent number
12,362,155
Issue date
Jul 15, 2025
Tokyo Electron Limited
Toshiharu Hirata
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Methods of forming thermally stable carbon film
Patent number
12,362,181
Issue date
Jul 15, 2025
Applied Materials, Inc.
Eswaranand Venkatasubramanian
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Glow plasma stabilization
Patent number
12,362,140
Issue date
Jul 15, 2025
Servomex Group Limited
Bahram Alizadeh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
Patent number
12,362,149
Issue date
Jul 15, 2025
Applied Materials, Inc.
Chien-Teh Kao
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
12,362,151
Issue date
Jul 15, 2025
Tokyo Electron Limited
Taro Ikeda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate processing method and substrate processing apparatus
Patent number
12,362,156
Issue date
Jul 15, 2025
Tokyo Electron Limited
Atsushi Kubo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Apparatus and method for measuring pedestal voltage uniformity in p...
Patent number
12,362,136
Issue date
Jul 15, 2025
Stephen Savas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing method and substrate processing apparatus
Patent number
12,362,142
Issue date
Jul 15, 2025
Tokyo Electron Limited
Takashi Chiba
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Methods for spindle mechanism monitoring and maintenance in process...
Patent number
12,362,157
Issue date
Jul 15, 2025
Taiwan Semiconductor Manufacturing Company, Ltd
Yu-Hsiang Cheng
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Tungsten suboxide ceramic target
Patent number
12,359,304
Issue date
Jul 15, 2025
SOLERAS ADVANCED COATINGS BV
Ignacio Caretti Giangaspro
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma based film modification for semiconductor devices
Patent number
12,351,900
Issue date
Jul 8, 2025
Applied Materials, Inc.
Timothy J. Miller
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Radio-frequency antenna and plasma processing device
Patent number
12,354,839
Issue date
Jul 8, 2025
EMD CORPORATION
Akinori Ebe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
In-situ focus ring coating
Patent number
12,354,842
Issue date
Jul 8, 2025
Tokyo Electron Limited
Minjoon Park
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
High aspect ratio etch with infinite selectivity
Patent number
12,354,880
Issue date
Jul 8, 2025
Lam Research Corporation
Leonid Belau
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLASMA SYSTEMS AND METHODS FOR USING SQUARE-SHAPED PULSE SIGNALS
Publication number
20250239434
Publication date
Jul 24, 2025
LAM RESEARCH CORPORATION
Alexei M. Marakhtanov
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR WAFER PROCESSING APPARATUS
Publication number
20250239436
Publication date
Jul 24, 2025
Samsung Electronics Co., Ltd.
Seongha JEONG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
Publication number
20250239439
Publication date
Jul 24, 2025
Samsung Electronics Co., Ltd.
Jaebin KIM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND DEVICE FOR PROTECTING OXYGEN-SENSITIVE TARGET MATERIALS...
Publication number
20250239442
Publication date
Jul 24, 2025
FHR Anlagenbau GmbH
Sven HAEBERLEIN
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS
Publication number
20250239476
Publication date
Jul 24, 2025
TOKYO ELECTRON LIMITED
Takamitsu TAKAYAMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD
Publication number
20250239437
Publication date
Jul 24, 2025
Hitachi High-Tech Corporation
Makoto SATAKE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE-TREATMENT METHOD AND SUBSTRATE-TREATMENT SYSTEM
Publication number
20250239446
Publication date
Jul 24, 2025
TOKYO ELECTRON LIMITED
Isao GUNJI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA MULTI-WAFER ASHING SYSTEM
Publication number
20250237959
Publication date
Jul 24, 2025
Rockwell Collins, Inc.
Mark J. Reimer
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SWITCHING CIRCUIT FOR MULTILEVEL PLASMA IMPEDANCE MATCHING
Publication number
20250239435
Publication date
Jul 24, 2025
Applied Materials, Inc.
Anm Wasekul AZAD
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WAFER PROCESSING APPARATUS
Publication number
20250232966
Publication date
Jul 17, 2025
Hitachi High-Tech Corporation
Yutaka KADOMOTO
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Application
Resonant Frequency Shift as Etch Stop of Gate Oxide of MOSFET Trans...
Publication number
20250232968
Publication date
Jul 17, 2025
King Faisal University
HESHAM MOHAMMED ENSHASY
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
Publication number
20250233008
Publication date
Jul 17, 2025
TOKYO ELECTRON LIMITED
Yohei UCHIDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF)...
Publication number
20250230541
Publication date
Jul 17, 2025
Applied Materials, Inc.
Rui Cheng
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...
Publication number
20250232960
Publication date
Jul 17, 2025
Samsung Electronics Co., Ltd.
Hyungsik KO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
Publication number
20250232964
Publication date
Jul 17, 2025
Applied Materials, Inc.
Tsutomu Tanaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GAP-FILLING METHOD FOR A SEMICONDUCTOR DEVICE AND METHOD OF MANUFAC...
Publication number
20250233017
Publication date
Jul 17, 2025
WONIK IPS CO., LTD.
Chang Gyu SONG
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND WAFER PR...
Publication number
20250233023
Publication date
Jul 17, 2025
Samsung Electronics Co., Ltd.
Jewon Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
Publication number
20250232954
Publication date
Jul 17, 2025
TOKYO ELECTRON LIMITED
Mitsuhiro IWANO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20250232961
Publication date
Jul 17, 2025
Hitachi High-Tech Corporation
Kazuya TAJIMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
Publication number
20250226178
Publication date
Jul 10, 2025
Applied Materials, Inc.
Michael Andrew STEARNS
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS
Publication number
20250226210
Publication date
Jul 10, 2025
TOKYO ELECTRON LIMITED
Hiroki MURAKAMI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA TREATMENT DEVICE AND ETCHING METHOD
Publication number
20250226183
Publication date
Jul 10, 2025
TOKYO ELECTRON LIMITED
Natsumi TORII
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
Publication number
20250226185
Publication date
Jul 10, 2025
TOKYO ELECTRON LIMITED
Kazuki MOYAMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...
Publication number
20250226188
Publication date
Jul 10, 2025
Taiwan Semiconductor Manufacturing Company, Ltd.
Ting-Jung Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA
Publication number
20250226187
Publication date
Jul 10, 2025
Samsung Electronics Co., Ltd.
Heewon MIN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE TREATMENT SYSTEM
Publication number
20250226189
Publication date
Jul 10, 2025
TOKYO ELECTRON LIMITED
Toshiki AKAMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
Publication number
20250226207
Publication date
Jul 10, 2025
Kokusai Electric Corporation
Yasunobu KOSHI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
Publication number
20250226223
Publication date
Jul 10, 2025
TOKYO ELECTRON LIMITED
Sho KUMAKURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SHOWERHEAD STRUCTURE AND APPARATUS FOR TREATING SUBSTRATE
Publication number
20250223699
Publication date
Jul 10, 2025
Samsung Electronics Co., Ltd.
Tae Seung YU
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma Treatment Device and Plasma Treatment Method
Publication number
20250226180
Publication date
Jul 10, 2025
TOKYO ELECTRON LIMITED
Hiroshi OTOMO
H01 - BASIC ELECTRIC ELEMENTS