characterised by the type of processing

Industry

CPC
H01J2237/33

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/33characterised by the type of processing

Industries

Patents Grantslast 30 patents

Information Patent Grant
In-situ adsorbate formation for plasma etch process
- Patent number 12,308,212
- Issue date May 20, 2025
- Tokyo Electron Limited
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,308,208
- Issue date May 20, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,308,219
- Issue date May 20, 2025
- Semes Co., Ltd.
- Seong Gil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid tuning of critical dimension non-uniformity by modulating tem...
- Patent number 12,308,264
- Issue date May 20, 2025
- Lam Research Corporation
- Ravi Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control method for multi-zone active-matrix temperature control in...
- Patent number 12,309,891
- Issue date May 20, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate
- Patent number 12,308,214
- Issue date May 20, 2025
- Tes Co., Ltd.
- Bong-Soo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and method for installing edge ring
- Patent number 12,308,221
- Issue date May 20, 2025
- Tokyo Electron Limited
- Takashi Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical emission spectroscopy for advanced process characterization
- Patent number 12,306,044
- Issue date May 20, 2025
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for use of low frequency harmonics in bias radi...
- Patent number 12,308,211
- Issue date May 20, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-etch treatment for metal etch
- Patent number 12,308,250
- Issue date May 20, 2025
- Tokyo Electron Limited
- Scott Lefevre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
- Patent number 12,300,488
- Issue date May 13, 2025
- Lam Research Corporation
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of low temperature plasma enhanced chemical va...
- Patent number 12,300,497
- Issue date May 13, 2025
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor substrate support power transmission components
- Patent number 12,300,474
- Issue date May 13, 2025
- Applied Materials, Inc.
- Paul L. Brillhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 12,300,469
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 12,300,472
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Pei-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Autonomous operation of plasma processing tool
- Patent number 12,300,477
- Issue date May 13, 2025
- Tokyo Electron Limited
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical film, sputtering target, and method of producing optical film
- Patent number 12,297,528
- Issue date May 13, 2025
- Sumitomo Metal Mining Co., Ltd.
- Hideharu Okami
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,300,467
- Issue date May 13, 2025
- Tokyo Electron Limited
- Manabu Oie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus having edge impedance control circuit
- Patent number 12,300,470
- Issue date May 13, 2025
- Semes Co., Ltd.
- Daehyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced film formation method
- Patent number 12,300,466
- Issue date May 13, 2025
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck for high bias radio frequency (RF) power applic...
- Patent number 12,300,473
- Issue date May 13, 2025
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 12,293,937
- Issue date May 6, 2025
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for a substrate support
- Patent number 12,293,902
- Issue date May 6, 2025
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
LATERAL AND VERTICAL DIELECTROPHORESIS METHOD FOR MICRO/NANO-SCALE...
- Publication number 20250164442
- Publication date May 22, 2025
- Zhejiang Normal University
- CLARENCE AUGUSTINE TECK HUO TEE
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
MICROWAVE HEAT TREATMENT APPARATUS AND IMPEDANCE MATCHING METHOD
- Publication number 20250167751
- Publication date May 22, 2025
- SEMES CO., LTD.
- Hak Gyun HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20250166971
- Publication date May 22, 2025
- ASM IP HOLDING B.V.
- Songwhe Herr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL PLENUM SHOWERHEAD WITH CENTER TO EDGE TUNABILITY
- Publication number 20250163581
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Krishna Birru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...
- Publication number 20250166965
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER FOR WAFER ETCHING AND WAFER ETCHING METHOD USING PLA...
- Publication number 20250166968
- Publication date May 22, 2025
- Nam Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR PLASMA PROCESS
- Publication number 20250166972
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Evrim Solmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT
- Publication number 20250166977
- Publication date May 22, 2025
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250166978
- Publication date May 22, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PR...
- Publication number 20250166974
- Publication date May 22, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT
- Publication number 20250167030
- Publication date May 22, 2025
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS
- Publication number 20250163578
- Publication date May 22, 2025
- Applied Materials, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING VARIABILITY IN FEATURES OF A SUBST...
- Publication number 20250166967
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250166980
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yusuke SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250154645
- Publication date May 15, 2025
- Tokyo Electron Limited
- Tadashi MITSUNARI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...
- Publication number 20250157790
- Publication date May 15, 2025
- Applied Materials, Inc.
- Bencherki MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetrical Process Reactor
- Publication number 20250157792
- Publication date May 15, 2025
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOUSING, MOBILE TERMINAL, AND SPUTTER COATING APPARATUS
- Publication number 20250155622
- Publication date May 15, 2025
- Huawei Technologies Co., Ltd
- Peiling Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250154649
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION
- Publication number 20250157815
- Publication date May 15, 2025
- Applied Materials, Inc.
- Tassie ANDERSEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250157843
- Publication date May 15, 2025
- Shinko Electric Industries Co., Ltd.
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD
- Publication number 20250157787
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Masakazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inductively Coupled Plasma Source with Radial Coil Network
- Publication number 20250157791
- Publication date May 15, 2025
- Yuhui ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS
- Publication number 20250157802
- Publication date May 15, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250149331
- Publication date May 8, 2025
- Kokusai Electric Corporation
- Kenshiro USUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250149294
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Juhyun NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-PLASMA COATING
- Publication number 20250149302
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Kai Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR CONTROLLING A SLOPE AND LOCATION OF AN UPPER ELECTRODE
- Publication number 20250149304
- Publication date May 8, 2025
- VM Inc.
- Sang Woo LEE
- H01 - BASIC ELECTRIC ELEMENTS

characterised by the type of processing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

In-situ adsorbate formation for plasma etch process

Substrate processing method and substrate processing apparatus

Substrate treating method and substrate treating apparatus

Rapid tuning of critical dimension non-uniformity by modulating tem...

Control method for multi-zone active-matrix temperature control in...

Apparatus for preventing contamination of self-plasma chamber

Method of processing substrate

Substrate processing system and method for installing edge ring

Optical emission spectroscopy for advanced process characterization

Systems and methods for use of low frequency harmonics in bias radi...

Pre-etch treatment for metal etch

RF immune sensor probe for monitoring a temperature of an electrost...

Power adjustment method of upper electrode power supply and semicon...

Stage, plasma processing apparatus, and cleaning method

Doped or undoped silicon carbide deposition and remote hydrogen pla...

Method and apparatus of low temperature plasma enhanced chemical va...

Semiconductor substrate support power transmission components

Plasma processing apparatus, calculation method, and calculation pr...

Plasma processing apparatus and method

Autonomous operation of plasma processing tool

Optical film, sputtering target, and method of producing optical film

Plasma processing method and plasma processing apparatus

Substrate treating apparatus having edge impedance control circuit

Plasma enhanced film formation method

Method of uniformity control

Electrostatic chuck for high bias radio frequency (RF) power applic...

Substrate support and plasma processing apparatus

Plasma processing apparatus and mounting table thereof

Process kit for a substrate support

Throughput improvement with interval conditioning purging

Patents Applicationslast 30 patents

LATERAL AND VERTICAL DIELECTROPHORESIS METHOD FOR MICRO/NANO-SCALE...

MICROWAVE HEAT TREATMENT APPARATUS AND IMPEDANCE MATCHING METHOD

SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT

DUAL PLENUM SHOWERHEAD WITH CENTER TO EDGE TUNABILITY

SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...

PLASMA CHAMBER FOR WAFER ETCHING AND WAFER ETCHING METHOD USING PLA...

METHOD AND SYSTEM FOR PLASMA PROCESS

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PR...

LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT

PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS

SYSTEMS AND METHODS FOR REDUCING VARIABILITY IN FEATURES OF A SUBST...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...

Symmetrical Process Reactor

HOUSING, MOBILE TERMINAL, AND SPUTTER COATING APPARATUS

SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS

SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION

ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

Inductively Coupled Plasma Source with Radial Coil Network

ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

PLASMA PROCESSING METHOD

ANTI-PLASMA COATING

SYSTEM FOR CONTROLLING A SLOPE AND LOCATION OF AN UPPER ELECTRODE