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H01L21/0332

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0332characterised by their composition

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Patterning material including silicon-containing layer and method f...
- Patent number 12,205,824
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Ping Tung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron concentration tunability in boron-silicon films
- Patent number 12,205,818
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate line plug structures for advanced integrated circuit structure...
- Patent number 12,199,167
- Issue date Jan 14, 2025
- Intel Corporation
- Byron Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor structure including spacer fi...
- Patent number 12,198,932
- Issue date Jan 14, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jungsu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plugs for interconnect lines for advanced integrated circuit struct...
- Patent number 12,199,168
- Issue date Jan 14, 2025
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,191,158
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuan-Wei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device and reworking process
- Patent number 12,191,194
- Issue date Jan 7, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask with alloy based absorbers
- Patent number 12,181,797
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal hard masks for reducing line bending
- Patent number 12,183,577
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming and patterning a layer and/or substrate
- Patent number 12,183,578
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,183,580
- Issue date Dec 31, 2024
- SK Hynix Inc.
- Ji Hoon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflection mode photomask
- Patent number 12,176,211
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating semiconductor structures
- Patent number 12,170,205
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Network type pellicle membrane and method for forming the same
- Patent number 12,153,339
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Structure and method to pattern pitch lines
- Patent number 12,148,617
- Issue date Nov 19, 2024
- International Business Machines Corporation
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structures for advanced integrated circuit...
- Patent number 12,142,667
- Issue date Nov 12, 2024
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,135,501
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced chemical vapor deposition of carbon hard-mask
- Patent number 12,136,549
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Byung Seok Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing mask structure, semiconductor structure an...
- Patent number 12,119,226
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yexiao Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming semiconductor structure
- Patent number 12,120,869
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mengna Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,112,979
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yan-Jhi Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,112,949
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiply spin-coated ultra-thick hybrid hard mask for sub 60nm MRAM...
- Patent number 12,108,679
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi Yang
- G11 - INFORMATION STORAGE
Information Patent Grant
Nonpolar or semipolar group III-nitride substrates
- Patent number 12,106,959
- Issue date Oct 1, 2024
- Saphlux, Inc.
- Jie Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double-patterning method to improve sidewall uniformity
- Patent number 12,106,964
- Issue date Oct 1, 2024
- Winbond Electronics Corp.
- Chu-Chun Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 12,106,958
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implantation mask formation
- Patent number 12,100,592
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Chao Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoactive metal-based hard mask integration
- Patent number 12,100,591
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT...
- Publication number 20250022939
- Publication date Jan 16, 2025
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK
- Publication number 20250022709
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250011623
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE ETCH USING FLUOROCARBON-BASED DEPOSITION OF A METALLOID O...
- Publication number 20250014909
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Eric HUDSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING CRITICAL DIMENSION OF PATTERNS GENERATED USING...
- Publication number 20240429053
- Publication date Dec 26, 2024
- Silicon Laboratories Inc.
- Jiye Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING ELEMENTAL METALS
- Publication number 20240429065
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Jane P. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
- Publication number 20240429050
- Publication date Dec 26, 2024
- Sumitomo Electric Industries, Ltd.
- Isao Makabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
- Publication number 20240429051
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Chun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20240411220
- Publication date Dec 12, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20240411228
- Publication date Dec 12, 2024
- JSR Corporation
- Ken MARUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYER MASKING LAYER AND METHOD OF FORMING SAME
- Publication number 20240395907
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID, METHOD OF CLEANING SUBSTRATE, AND METHOD OF MANUFA...
- Publication number 20240392218
- Publication date Nov 28, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kohei SERIZAWA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHOD OF FORMING MASK PATTERN INCLUDING SURFACE ENHANCEMENT LAYER...
- Publication number 20240395552
- Publication date Nov 28, 2024
- SK HYNIX INC.
- Jin Woong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...
- Publication number 20240393674
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kevin TANADY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...
- Publication number 20240387174
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Guangyan Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOWIRE TRANSISTOR FABRICATION WITH HARDMASK LAYERS
- Publication number 20240387634
- Publication date Nov 21, 2024
- SONY GROUP CORPORATION
- Seung Hoon Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240385514
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20240387189
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...
- Publication number 20240387190
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Guangyan Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER
- Publication number 20240379375
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- Xiaofeng SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source/Drain Regions and Methods of Forming Same
- Publication number 20240379454
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hui-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANTATION MASK FORMATION
- Publication number 20240379357
- Publication date Nov 14, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY , LTD.
- Wei-Chao CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DOPING HIGH-K METAL GATES FOR TUNING THRESHOLD VOLTAGES
- Publication number 20240379365
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Feng Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conductive Feature Formation
- Publication number 20240373613
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protection Layer Formation during Plasma Etching Conductive Materials
- Publication number 20240371655
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Yen-Tien Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240363349
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN DEPOSITION ON A COBALT SURFACE
- Publication number 20240360548
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSES FOR REDUCING LINE-END SPACING
- Publication number 20240355633
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Yen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MTJS WITH LITHOGRAPHY-VARIATION INDEPENDENT CRITICAL DIMENSION
- Publication number 20240357941
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- William J. Gallagher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240355637
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- John Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS

characterised by their composition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Patterning material including silicon-containing layer and method f...

Boron concentration tunability in boron-silicon films

Gate line plug structures for advanced integrated circuit structure...

Mask and reticle protection with atomic layer deposition (ALD)

Method of manufacturing semiconductor structure including spacer fi...

Plugs for interconnect lines for advanced integrated circuit struct...

Semiconductor device and method

Method for fabricating semiconductor device and reworking process

Extreme ultraviolet mask with alloy based absorbers

Metal hard masks for reducing line bending

Method for forming and patterning a layer and/or substrate

Method of manufacturing a semiconductor device

Reflection mode photomask

Methods for fabricating semiconductor structures

Network type pellicle membrane and method for forming the same

Structure and method to pattern pitch lines

Contact over active gate structures for advanced integrated circuit...

Method of manufacturing a semiconductor device

Plasma-enhanced chemical vapor deposition of carbon hard-mask

Method to improve wafer edge uniformity

Method for manufacturing mask structure, semiconductor structure an...

Semiconductor structure and method for forming semiconductor structure

Semiconductor device and manufacturing method thereof

Highly etch selective amorphous carbon film

Multiply spin-coated ultra-thick hybrid hard mask for sub 60nm MRAM...

Nonpolar or semipolar group III-nitride substrates

Double-patterning method to improve sidewall uniformity

Method of using dual frequency RF power in a process chamber

Implantation mask formation

Photoactive metal-based hard mask integration

Patents Applicationslast 30 patents

CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT...

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK

Composition For Forming Organic Film, Method For Forming Organic Fi...

SELECTIVE ETCH USING FLUOROCARBON-BASED DEPOSITION OF A METALLOID O...

METHOD FOR REDUCING CRITICAL DIMENSION OF PATTERNS GENERATED USING...

METHOD OF PATTERNING ELEMENTAL METALS

PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE

PHOTORESIST AND FORMATION METHOD THEREOF

MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...

PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES

MULTILAYER MASKING LAYER AND METHOD OF FORMING SAME

CLEANING LIQUID, METHOD OF CLEANING SUBSTRATE, AND METHOD OF MANUFA...

METHOD OF FORMING MASK PATTERN INCLUDING SURFACE ENHANCEMENT LAYER...

METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...

FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...

NANOWIRE TRANSISTOR FABRICATION WITH HARDMASK LAYERS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD FOR FORMING SEMICONDUCTOR DEVICE

FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...

METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER

Source/Drain Regions and Methods of Forming Same

IMPLANTATION MASK FORMATION

METHODS FOR DOPING HIGH-K METAL GATES FOR TUNING THRESHOLD VOLTAGES

Conductive Feature Formation

Protection Layer Formation during Plasma Etching Conductive Materials

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

TUNGSTEN DEPOSITION ON A COBALT SURFACE

PROCESSES FOR REDUCING LINE-END SPACING

MTJS WITH LITHOGRAPHY-VARIATION INDEPENDENT CRITICAL DIMENSION

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE