characterised by their composition

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H01L21/0332

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0332characterised by their composition

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,272,555
- Issue date Apr 8, 2025
- Samsung Electronics Co., Ltd.
- Jinyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure
- Patent number 12,272,565
- Issue date Apr 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chuan Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,272,554
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask pellicle including network of nanowires and method of for...
- Patent number 12,266,525
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming patterned mask layer
- Patent number 12,266,528
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enlarging contact area and process window for a contact via
- Patent number 12,266,563
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Zhen Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer hardmask for defect reduction in EUV patterning
- Patent number 12,261,044
- Issue date Mar 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded high-z marker material and process for alignment of multil...
- Patent number 12,255,047
- Issue date Mar 18, 2025
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench contact structures for advanced integrated circuit structure...
- Patent number 12,255,247
- Issue date Mar 18, 2025
- Intel Corporation
- Subhash M. Joshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a substrate
- Patent number 12,243,742
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- SeungHyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial source/drain recess formation with metal-comprising maski...
- Patent number 12,243,783
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hui-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective patterning of vias with hardmasks
- Patent number 12,243,771
- Issue date Mar 4, 2025
- Interational Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus
- Patent number 12,230,505
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Akihiro Tsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,222,653
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank for EUV lithography, mask blank for EUV litho...
- Patent number 12,216,397
- Issue date Feb 4, 2025
- AGC Inc.
- Daijiro Akagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device
- Patent number 12,217,971
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,217,959
- Issue date Feb 4, 2025
- Kokusai Electric Corporation
- Kimihiko Nakatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hard mask trimming in method for manufacturing semiconductor device
- Patent number 12,217,961
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chien Kuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method
- Patent number 12,211,692
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Noriaki Okabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal of an etching stop layer for improving overlay sh...
- Patent number 12,211,700
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber deposition confinement
- Patent number 12,211,673
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultra-high modulus and etch selectivity boron-carbon hardmask films
- Patent number 12,211,694
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterning material including silicon-containing layer and method f...
- Patent number 12,205,824
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Ping Tung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron concentration tunability in boron-silicon films
- Patent number 12,205,818
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate line plug structures for advanced integrated circuit structure...
- Patent number 12,199,167
- Issue date Jan 14, 2025
- Intel Corporation
- Byron Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor structure including spacer fi...
- Patent number 12,198,932
- Issue date Jan 14, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jungsu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plugs for interconnect lines for advanced integrated circuit struct...
- Patent number 12,199,168
- Issue date Jan 14, 2025
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,191,158
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuan-Wei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device and reworking process
- Patent number 12,191,194
- Issue date Jan 7, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chen Pan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250118560
- Publication date Apr 10, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- LINSHAN YUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOW MITIGATION IN HIGH ASPECT RATIO OXIDE AND NITRIDE ETCHES
- Publication number 20250118570
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mir Abdulla Al Galib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE WAFER EDGE UNIFORMITY
- Publication number 20250118539
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING
- Publication number 20250118557
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK PATTERN AND METHOD OF FORMING A FINE PATTERN OF A SEMICONDUCTO...
- Publication number 20250118558
- Publication date Apr 10, 2025
- SK HYNIX INC.
- Hong Gu LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS
- Publication number 20250112046
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS
- Publication number 20250105015
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Shihsheng CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-C...
- Publication number 20250095990
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCT...
- Publication number 20250098258
- Publication date Mar 20, 2025
- Intel Corporation
- Andrew W. YEOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250095989
- Publication date Mar 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250096033
- Publication date Mar 20, 2025
- NANYA TECHNOLOGY CORPORATION
- YING-CHENG CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FABRICATING SEMICONDCUTOR STRUCTURES
- Publication number 20250087496
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250087488
- Publication date Mar 13, 2025
- SK HYNIX INC.
- Ji Hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL HARD MASKS FOR REDUCING LINE BENDING
- Publication number 20250079172
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE
- Publication number 20250079174
- Publication date Mar 6, 2025
- Tokyo Election Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20250079179
- Publication date Mar 6, 2025
- NANYA TECHNOLOGY CORPORATION
- Yu Li LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...
- Publication number 20250072078
- Publication date Feb 27, 2025
- Intel Corporation
- Andrew W. YEOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask and Reticle Protection with Atomic Layer Deposition (ALD)
- Publication number 20250068054
- Publication date Feb 27, 2025
- Nano-Master, Inc.
- Birol Kuyel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS
- Publication number 20250062124
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Yen-Tien LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON MASK DEPOSITION
- Publication number 20250054760
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20250053080
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...
- Publication number 20250054759
- Publication date Feb 13, 2025
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPED DIAMOND-LIKE CARBON
- Publication number 20250046610
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NEUTRAL STRESS DIAMOND-LIKE CARBON
- Publication number 20250046611
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING PROCESS OF A SEMICONDUCTOR ELECTRONIC DEVICE INTEGRAT...
- Publication number 20250037998
- Publication date Jan 30, 2025
- STMicroelectronics International N.V.
- Riccardo DEPETRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT...
- Publication number 20250022939
- Publication date Jan 16, 2025
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK
- Publication number 20250022709
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250011623
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE ETCH USING FLUOROCARBON-BASED DEPOSITION OF A METALLOID O...
- Publication number 20250014909
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Eric HUDSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING CRITICAL DIMENSION OF PATTERNS GENERATED USING...
- Publication number 20240429053
- Publication date Dec 26, 2024
- Silicon Laboratories Inc.
- Jiye Li
- H01 - BASIC ELECTRIC ELEMENTS

characterised by their composition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of forming semiconductor devices

Method for preparing semiconductor structure

Method of manufacturing a semiconductor device

Photomask pellicle including network of nanowires and method of for...

Method for forming patterned mask layer

Enlarging contact area and process window for a contact via

Multi-layer hardmask for defect reduction in EUV patterning

Embedded high-z marker material and process for alignment of multil...

Trench contact structures for advanced integrated circuit structure...

Method for processing a substrate

Epitaxial source/drain recess formation with metal-comprising maski...

Selective patterning of vias with hardmasks

Etching apparatus

Method for forming semiconductor structure

Reflective mask blank for EUV lithography, mask blank for EUV litho...

Method for forming semiconductor device

Method of manufacturing semiconductor device, substrate processing...

Hard mask trimming in method for manufacturing semiconductor device

Wafer processing method

Selective removal of an etching stop layer for improving overlay sh...

Processing chamber deposition confinement

Ultra-high modulus and etch selectivity boron-carbon hardmask films

Patterning material including silicon-containing layer and method f...

Boron concentration tunability in boron-silicon films

Gate line plug structures for advanced integrated circuit structure...

Mask and reticle protection with atomic layer deposition (ALD)

Method of manufacturing semiconductor structure including spacer fi...

Plugs for interconnect lines for advanced integrated circuit struct...

Semiconductor device and method

Method for fabricating semiconductor device and reworking process

Patents Applicationslast 30 patents

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

BOW MITIGATION IN HIGH ASPECT RATIO OXIDE AND NITRIDE ETCHES

METHOD TO IMPROVE WAFER EDGE UNIFORMITY

SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING

MASK PATTERN AND METHOD OF FORMING A FINE PATTERN OF A SEMICONDUCTO...

BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS

METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS

METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-C...

PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCT...

Composition For Forming Organic Film, Method For Forming Organic Fi...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHODS FOR FABRICATING SEMICONDCUTOR STRUCTURES

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METAL HARD MASKS FOR REDUCING LINE BENDING

METHOD FOR PROCESSING A SUBSTRATE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...

Mask and Reticle Protection with Atomic Layer Deposition (ALD)

METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS

CARBON MASK DEPOSITION

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...

DOPED DIAMOND-LIKE CARBON

NEUTRAL STRESS DIAMOND-LIKE CARBON

MANUFACTURING PROCESS OF A SEMICONDUCTOR ELECTRONIC DEVICE INTEGRAT...

CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT...

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK

Composition For Forming Organic Film, Method For Forming Organic Fi...

SELECTIVE ETCH USING FLUOROCARBON-BASED DEPOSITION OF A METALLOID O...

METHOD FOR REDUCING CRITICAL DIMENSION OF PATTERNS GENERATED USING...