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H01L21/3081

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3081characterised by their composition

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Tin oxide and tin carbide materials for semiconductor patterning ap...
- Patent number 12,272,564
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,272,554
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective and isotropic etch of silicon over silicon-germanium allo...
- Patent number 12,272,558
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Matthew Flaugh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stacked dies and methods for forming bonded structures
- Patent number 12,266,650
- Issue date Apr 1, 2025
- ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
- Cyprian Emeka Uzoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a semiconductor device using a protective layer
- Patent number 12,266,534
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Shihsheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of a substrate
- Patent number 12,261,049
- Issue date Mar 25, 2025
- Applied Materials , Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming low-stress silicon nitride layer through hydrogen treatment
- Patent number 12,261,036
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Che Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with fin isolation
- Patent number 12,261,051
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Yin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High electron mobility transistor and fabricating method of the same
- Patent number 12,261,052
- Issue date Mar 25, 2025
- United Microelectronics Corp.
- Ming-Hua Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a three-dimensional memory device using composite...
- Patent number 12,243,776
- Issue date Mar 4, 2025
- SanDisk Technologies, Inc.
- Roshan Jayakhar Tirukkonda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with fin end spacer dummy gate and method of m...
- Patent number 12,243,930
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Tai Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing memory device having active area in elongat...
- Patent number 12,237,209
- Issue date Feb 25, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Ling Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming composition
- Patent number 12,227,621
- Issue date Feb 18, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High voltage device
- Patent number 12,224,213
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon dry etching method
- Patent number 12,217,969
- Issue date Feb 4, 2025
- ULVAC, Inc.
- Kenta Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask trimming in method for manufacturing semiconductor device
- Patent number 12,217,961
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chien Kuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method
- Patent number 12,211,692
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Noriaki Okabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method composition and methods thereof
- Patent number 12,211,698
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning material including silicon-containing layer and method f...
- Patent number 12,205,824
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Ping Tung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a semiconductor structure
- Patent number 12,206,010
- Issue date Jan 21, 2025
- Winbond Electronics Corp.
- Shu-Ming Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,198,978
- Issue date Jan 14, 2025
- Sumitomo Electric Device Innovations, Inc.
- Shouhei Kitajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor structure including spacer fi...
- Patent number 12,198,932
- Issue date Jan 14, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jungsu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,165,923
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chuan-Hui Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,166,069
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zheng-Long Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GaN vertical-channel junction field-effect transistors with regrown...
- Patent number 12,159,943
- Issue date Dec 3, 2024
- Arizona Board of Regents on behalf of Arizona State University
- Yuji Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures and manufacturing methods thereof
- Patent number 12,148,613
- Issue date Nov 19, 2024
- ENKRIS SEMICONDUCTOR, INC.
- Kai Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, systems, and apparatus for processing substrates using one...
- Patent number 12,131,913
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Krishna Nittala
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FIELD EFFECT TRANSISTOR WITH ALIGNMENT MARK AND RELATED METHODS
- Publication number 20250118679
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hsiung PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLOCK COPOLYMERS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DE...
- Publication number 20250101145
- Publication date Mar 27, 2025
- Korea Advanced Institute of Science and Technology
- Changhyeon An
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS
- Publication number 20250105015
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Shihsheng CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY STRUCTURE AND METHOD OF FORMING THEREOF
- Publication number 20250089243
- Publication date Mar 13, 2025
- NANYA TECHNOLOGY CORPORATION
- Tseng-Fu LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250085636
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20250079179
- Publication date Mar 6, 2025
- NANYA TECHNOLOGY CORPORATION
- Yu Li LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250072097
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chuan-Hui LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250068075
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY
- Publication number 20250062123
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- SHASHANK SHARMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250062130
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Yusuke TAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING CARBON-CONTAINING FEATURES AT LOW TEMPERATURES
- Publication number 20250054768
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Jiajing Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Deposition of Passivation Layer
- Publication number 20250046603
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPED DIAMOND-LIKE CARBON
- Publication number 20250046610
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250036029
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20250036027
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Kosuke IGATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250020998
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Kyungoh Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...
- Publication number 20250013154
- Publication date Jan 9, 2025
- YCCHEM CO., LTD.
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250011623
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-SITU ETCHING OF GALLIUM OXIDE WITH METAL ORGANIC GALLIUM PRECURSORS
- Publication number 20240429058
- Publication date Dec 26, 2024
- Nidhin Kurian Kalarickal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
- Publication number 20240429051
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Chun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING...
- Publication number 20240417648
- Publication date Dec 19, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kenta Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20240411227
- Publication date Dec 12, 2024
- Korea Advanced Institute of Science and Technology
- Sung Gap Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING VERTICAL POWER TRANSISTORS AND VERTICAL POWER...
- Publication number 20240404836
- Publication date Dec 5, 2024
- ROBERT BOSCH GmbH
- Jens Baringhaus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK
- Publication number 20240395542
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FINFET DEVICE AND METHOD OF FORMING SAME
- Publication number 20240387237
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bo-Cyuan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE DEVICE
- Publication number 20240387284
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20240379852
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lin-Yu HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20240376342
- Publication date Nov 14, 2024
- Samsung SDI Co., Ltd.
- Seil CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20240377746
- Publication date Nov 14, 2024
- Samsung SDI Co., Ltd.
- Seil CHOI
- H01 - BASIC ELECTRIC ELEMENTS

characterised by their composition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Tin oxide and tin carbide materials for semiconductor patterning ap...

Method of manufacturing a semiconductor device

Selective and isotropic etch of silicon over silicon-germanium allo...

Stacked dies and methods for forming bonded structures

Forming a semiconductor device using a protective layer

Selective etch of a substrate

Forming low-stress silicon nitride layer through hydrogen treatment

Semiconductor device with fin isolation

High electron mobility transistor and fabricating method of the same

Method of making a three-dimensional memory device using composite...

Resist underlayer film-forming composition comprising epoxy adduct...

Semiconductor device with fin end spacer dummy gate and method of m...

Method of manufacturing memory device having active area in elongat...

Film-forming composition

High voltage device

Silicon dry etching method

Hard mask trimming in method for manufacturing semiconductor device

Wafer processing method

Method composition and methods thereof

Patterning material including silicon-containing layer and method f...

Method for forming a semiconductor structure

Method of manufacturing semiconductor device

Method of manufacturing semiconductor structure including spacer fi...

Method of manufacturing a semiconductor device

Composition for forming silicon-containing resist underlayer film a...

Method of manufacturing a semiconductor device

Semiconductor device and manufacturing method thereof

GaN vertical-channel junction field-effect transistors with regrown...

Semiconductor structures and manufacturing methods thereof

Methods, systems, and apparatus for processing substrates using one...

Patents Applicationslast 30 patents

FIELD EFFECT TRANSISTOR WITH ALIGNMENT MARK AND RELATED METHODS

BLOCK COPOLYMERS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DE...

METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS

MEMORY STRUCTURE AND METHOD OF FORMING THEREOF

Compound For Forming Metal-Containing Film, Composition For Forming...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHODS OF ETCHING CARBON-CONTAINING FEATURES AT LOW TEMPERATURES

Atomic Layer Deposition of Passivation Layer

DOPED DIAMOND-LIKE CARBON

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

Method For Forming Resist Underlayer Film And Patterning Process

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...

Composition For Forming Organic Film, Method For Forming Organic Fi...

IN-SITU ETCHING OF GALLIUM OXIDE WITH METAL ORGANIC GALLIUM PRECURSORS

PHOTORESIST AND FORMATION METHOD THEREOF

PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING...

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

METHOD FOR PRODUCING VERTICAL POWER TRANSISTORS AND VERTICAL POWER...

HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK

FINFET DEVICE AND METHOD OF FORMING SAME

HIGH VOLTAGE DEVICE

SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS