characterized by a material, a roughness, a coating or the like

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H01L21/67323

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67323characterized by a material, a roughness, a coating or the like

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Processing chamber with annealing mini-environment
- Patent number 11,791,176
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Michael Honan
- C30 - CRYSTAL GROWTH
Information Patent Grant
Stopper for substrate cassette and substrate cassette assembly
- Patent number 10,096,503
- Issue date Oct 9, 2018
- BOE Technology Group Co., Ltd.
- Yulong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer loaders having buffer zones
- Patent number 9,502,274
- Issue date Nov 22, 2016
- Samsung Electronics Co., Ltd.
- Yi Koan Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon film coated member
- Patent number 7,988,786
- Issue date Aug 2, 2011
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Container for precision substrate
- Patent number 7,781,035
- Issue date Aug 24, 2010
- Zeon Corporation
- Toshihiko Jimbo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving isothermal batch processing of su...
- Patent number 7,771,563
- Issue date Aug 10, 2010
- Sumitomo Precision Products Co., LTD
- Robert W. Grant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment jig for silicon semiconductor substrate
- Patent number 7,210,925
- Issue date May 1, 2007
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus and method for measuring static charge on wafers, disks,...
- Patent number 6,719,142
- Issue date Apr 13, 2004
- Ion Systems, Inc.
- John E. Menear
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR SUBSTRATE BOAT AND METHODS OF USING THE SAME
- Publication number 20240379394
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Huang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED METHOD FOR CREATING ELECTROSTATIC CHUCK (ESC) MESA PATTERNS
- Publication number 20240339349
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Joseph Sommers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH ANNEALING MINI-ENVIRONMENT
- Publication number 20230420275
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Michael Honan
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE STORAGE RACKS FOR SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20230143667
- Publication date May 11, 2023
- ASM IP HOLDING B.V.
- Gurupkar Nerwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE BOAT AND METHODS OF USING THE SAME
- Publication number 20220102175
- Publication date Mar 31, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Huang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE RETAINER AND METHOD OF MA...
- Publication number 20220093435
- Publication date Mar 24, 2022
- Kokusai Electric Corporation
- Kenji SHINOZAKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Processing Chamber With Annealing Mini-Environment
- Publication number 20200135508
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- Michael Honan
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
APPARATUS FOR THERMAL TREATMENT OF A SUBSTRATE, CARRIER AND SUBSTRA...
- Publication number 20180247842
- Publication date Aug 30, 2018
- HERAEUS NOBLELIGHT GMBH
- Thomas PIELA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR ELECTROPLATING SYSTEM
- Publication number 20160315048
- Publication date Oct 27, 2016
- XINTEC INC.
- Yen-Shih HO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR PACKAGE MAGAZINE
- Publication number 20110259840
- Publication date Oct 27, 2011
- Advanced Semiconductor Engineering, Inc.
- Jeeyong Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CARRIER HAVING AN INTERIOR LINING
- Publication number 20070141280
- Publication date Jun 21, 2007
- APPLIED MATERIALS, INC.
- MICHAEL RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and methods for achieving isothermal batch processing of su...
- Publication number 20060102287
- Publication date May 18, 2006
- Robert W. Grant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Carbon film coated member
- Publication number 20060040105
- Publication date Feb 23, 2006
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat treatment jig for silicon semiconductor substrate
- Publication number 20050282101
- Publication date Dec 22, 2005
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor component handling device having a performance film
- Publication number 20050236110
- Publication date Oct 27, 2005
- Sanjiv M. Bhatt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor component handling device having an electrostatic dis...
- Publication number 20050056601
- Publication date Mar 17, 2005
- Sanjiv M. Bhatt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Container for precision substrate
- Publication number 20040224110
- Publication date Nov 11, 2004
- Toshihiko Jimbo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Carbon film coated member
- Publication number 20030087096
- Publication date May 8, 2003
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

characterized by a material, a roughness, a coating or the like

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Processing chamber with annealing mini-environment

Stopper for substrate cassette and substrate cassette assembly

Wafer loaders having buffer zones

Carbon film coated member

Container for precision substrate

Systems and methods for achieving isothermal batch processing of su...

Heat treatment jig for silicon semiconductor substrate

Apparatus and method for measuring static charge on wafers, disks,...

Patents Applicationslast 30 patents

SEMICONDUCTOR SUBSTRATE BOAT AND METHODS OF USING THE SAME

ADVANCED METHOD FOR CREATING ELECTROSTATIC CHUCK (ESC) MESA PATTERNS

PROCESSING CHAMBER WITH ANNEALING MINI-ENVIRONMENT

SUBSTRATE STORAGE RACKS FOR SEMICONDUCTOR PROCESSING SYSTEMS

SEMICONDUCTOR SUBSTRATE BOAT AND METHODS OF USING THE SAME

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE RETAINER AND METHOD OF MA...

Processing Chamber With Annealing Mini-Environment

APPARATUS FOR THERMAL TREATMENT OF A SUBSTRATE, CARRIER AND SUBSTRA...

SEMICONDUCTOR ELECTROPLATING SYSTEM

SEMICONDUCTOR PACKAGE MAGAZINE

SUBSTRATE CARRIER HAVING AN INTERIOR LINING

Systems and methods for achieving isothermal batch processing of su...

Carbon film coated member

Heat treatment jig for silicon semiconductor substrate

Semiconductor component handling device having a performance film

Semiconductor component handling device having an electrostatic dis...

Container for precision substrate

Carbon film coated member