Chucks

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CPC
G03F7/707

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/707Chucks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,366,808
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Lithography system and method thereof
- Patent number 12,360,464
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder and methods of use
- Patent number 12,362,218
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chi Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder and method of manufacturing a substrate holder
- Patent number 12,353,139
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Alignment system and tool for visual inspection
- Patent number 12,346,010
- Issue date Jul 1, 2025
- International Business Machines Corporation
- Ryan Elsasser
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Substrate level sensing in a lithographic apparatus
- Patent number 12,339,594
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Martin Jules Marie-Emile De Nivelle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target supply system, extreme ultraviolet light generation apparatu...
- Patent number 12,332,575
- Issue date Jun 17, 2025
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Exposing apparatus and method for manufacturing article
- Patent number 12,326,666
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Takashi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder for use in a lithographic apparatus
- Patent number 12,321,104
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Thomas Poiesz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support member, substrate treatment apparatus, and substr...
- Patent number 12,321,098
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Hitoshi Hashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Holding mechanism and exposure apparatus
- Patent number 12,311,504
- Issue date May 27, 2025
- Ushio Denki Kabushiki Kaisha
- Kenji Ishida
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Jig for automatically measuring flow rate of reticle carrier
- Patent number 12,306,028
- Issue date May 20, 2025
- GUDENG EQUIPMENT CO., LTD.
- Chin-Hung Wen
- G01 - MEASURING TESTING
Information Patent Grant
Photo mask stage unit and photo mask stocker including the same
- Patent number 12,306,549
- Issue date May 20, 2025
- Semes Co., Ltd.
- Yun Ho Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inner pod holding device conducive to reducing dust contamination a...
- Patent number 12,306,550
- Issue date May 20, 2025
- GUDENG EQUIPMENT CO., LTD.
- Yin-Feng Chan
- G01 - MEASURING TESTING
Information Patent Grant
Advanced load port for photolithography mask inspection tool
- Patent number 12,298,664
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Jung Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus
- Patent number 12,298,676
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Injae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage system, lithographic apparatus, method for positioning and de...
- Patent number 12,287,586
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Stef Marten Johan Janssens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduce mask defect impact by contamination decompose
- Patent number 12,287,590
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Backside deposition tuning of stress to control wafer bow in semico...
- Patent number 12,276,922
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern decomposition lithography techniques
- Patent number 12,278,204
- Issue date Apr 15, 2025
- Intel Corporation
- Charles H. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle demounting method, and pellicle demounting device
- Patent number 12,271,109
- Issue date Apr 8, 2025
- Mitsui Chemicals, Inc.
- Akira Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support for an optical element
- Patent number 12,271,117
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for calibration of an optical measurement system and optical...
- Patent number 12,270,647
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G01 - MEASURING TESTING
Information Patent Grant
Reticle pod having latch including ramped surface
- Patent number 12,271,110
- Issue date Apr 8, 2025
- Entegris, Inc.
- Russ V. Raschke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compact dual pass interferometer for a plane mirror interferometer
- Patent number 12,270,644
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G02 - OPTICS
Information Patent Grant
Nanopositioning systems and associated methods
- Patent number 12,266,501
- Issue date Apr 1, 2025
- The Texas A&M University System
- ChaBum Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Work stage and exposure apparatus
- Patent number 12,261,077
- Issue date Mar 25, 2025
- Ushio Denki Kabushiki Kaisha
- Shunta Sugisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle design for mask application
- Patent number 12,253,797
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder for use in a lithographic apparatus
- Patent number 12,249,535
- Issue date Mar 11, 2025
- ASML Netherlands B.V.
- Niek Jacobus Johannes Roset
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SCREW TRANSMISSION DRIVE, AND RETICLE STAGE AND MEASURING DEVICE FO...
- Publication number 20250237968
- Publication date Jul 24, 2025
- Carl Zeiss SMT GMBH
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
TRANSFER APPARATUS AND WAFER STORAGE CONTAINER CLEANING APPARATUS
- Publication number 20250236470
- Publication date Jul 24, 2025
- SHIBAURA MECHATRONICS CORPORATION
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE
- Publication number 20250237962
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...
- Publication number 20250237965
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250237963
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...
- Publication number 20250237964
- Publication date Jul 24, 2025
- G02 - OPTICS
Information Patent Application
PLACEMENT MEMBER
- Publication number 20250233009
- Publication date Jul 17, 2025
- KYOCERA CORPORATION
- Koji AKASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART EQUIPMENT FRONT END MODULE METROLOGY
- Publication number 20250231500
- Publication date Jul 17, 2025
- Nanoverse Technologies Ltd
- Jeff Albelo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE STAGE
- Publication number 20250216799
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Seonghyeon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCE MASK DEFECT IMPACT BY CONTAMINATION DECOMPOSE
- Publication number 20250216804
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250216802
- Publication date Jul 3, 2025
- Samsung Electronics Co., LTD
- Injae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE EQUIPMENT
- Publication number 20250208519
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Jisu KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250201586
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WARPAGE DETERMINATION SYSTEM
- Publication number 20250199421
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Efthymios STRATIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CLAMPING MODULE
- Publication number 20250199420
- Publication date Jun 19, 2025
- GUDENG EQUIPMENT CO., LTD.
- YU-LIN CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF USING WAFER STAGE
- Publication number 20250199415
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD
- Publication number 20250199416
- Publication date Jun 19, 2025
- Gigaphoton Inc.
- Akira SUWA
- G02 - OPTICS
Information Patent Application
MASK REPAIR APPARATUS AND METHODS
- Publication number 20250180979
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Meng-Han HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
- Publication number 20250181001
- Publication date Jun 5, 2025
- ASML Holding N.V.
- Daniel Paul RODAK
- B08 - CLEANING
Information Patent Application
HIGH-CLEANLINESS RETICLE CLAMPING MODULE
- Publication number 20250181000
- Publication date Jun 5, 2025
- GUDENG EQUIPMENT CO., LTD.
- AN-PANG WANG
- G01 - MEASURING TESTING
Information Patent Application
RETICLE PRESSING DEVICE AND RETICLE BOX USING THE SAME
- Publication number 20250172884
- Publication date May 29, 2025
- GUDENG PRECISION INDUSTRIAL CO., LTD.
- Ming-Chien CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250172883
- Publication date May 29, 2025
- A Rah CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STAGE AND ERROR COMPENSATION SYSTEM USING THE SAME
- Publication number 20250164897
- Publication date May 22, 2025
- SAMSUNG DISPLAY CO., LTD.
- Jungwoong Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DYNAMICALLY CONTROLLING TEMPERATURE OF THERMO...
- Publication number 20250164900
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Jung Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLATNESS ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES
- Publication number 20250164240
- Publication date May 22, 2025
- Corning Incorporated
- Thomas James Dunn
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20250155817
- Publication date May 15, 2025
- SEMES CO., LTD.
- Ki Sang EUM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY RETICLE STAGE ACTUATORS
- Publication number 20250155825
- Publication date May 15, 2025
- Massachusetts Institute of Technology
- Charles Byron Seaberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY RETICLE STAGE DRIVE SYSTEM
- Publication number 20250155826
- Publication date May 15, 2025
- Massachusetts Institute of Technology
- Charles Byron Seaberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INSPECTION DEVICE
- Publication number 20250155380
- Publication date May 15, 2025
- Carl Zeiss SMT GMBH
- Maximilian Henning
- G01 - MEASURING TESTING
Information Patent Application
ACTUATED PHOTOLITHOGRAPHY RETICLE STAGE
- Publication number 20250155827
- Publication date May 15, 2025
- Massachusetts Institute of Technology
- Charles Byron Seaberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate holder, lithographic apparatus, device manufacturing meth...

Lithography system and method thereof

Substrate holder and methods of use

Substrate holder and method of manufacturing a substrate holder

Alignment system and tool for visual inspection

Substrate level sensing in a lithographic apparatus

Target supply system, extreme ultraviolet light generation apparatu...

Exposing apparatus and method for manufacturing article

Substrate holder for use in a lithographic apparatus

Substrate support member, substrate treatment apparatus, and substr...

Holding mechanism and exposure apparatus

Jig for automatically measuring flow rate of reticle carrier

Photo mask stage unit and photo mask stocker including the same

Inner pod holding device conducive to reducing dust contamination a...

Advanced load port for photolithography mask inspection tool

Substrate processing apparatus

Method for controlling a lithographic apparatus and associated appa...

Stage system, lithographic apparatus, method for positioning and de...

Reduce mask defect impact by contamination decompose

Backside deposition tuning of stress to control wafer bow in semico...

Pattern decomposition lithography techniques

Pellicle demounting method, and pellicle demounting device

Support for an optical element

Method for calibration of an optical measurement system and optical...

Reticle pod having latch including ramped surface

Compact dual pass interferometer for a plane mirror interferometer

Nanopositioning systems and associated methods

Work stage and exposure apparatus

Pellicle design for mask application

Substrate holder for use in a lithographic apparatus

Patents Applicationslast 30 patents

SCREW TRANSMISSION DRIVE, AND RETICLE STAGE AND MEASURING DEVICE FO...

TRANSFER APPARATUS AND WAFER STORAGE CONTAINER CLEANING APPARATUS

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...

SEMICONDUCTOR PROCESS APPARATUS

METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...

PLACEMENT MEMBER

SMART EQUIPMENT FRONT END MODULE METROLOGY

RETICLE STAGE

REDUCE MASK DEFECT IMPACT BY CONTAMINATION DECOMPOSE

SUBSTRATE PROCESSING APPARATUS

EXPOSURE EQUIPMENT

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

SUBSTRATE WARPAGE DETERMINATION SYSTEM

RETICLE CLAMPING MODULE

METHOD OF USING WAFER STAGE

LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD

MASK REPAIR APPARATUS AND METHODS

SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

RETICLE PRESSING DEVICE AND RETICLE BOX USING THE SAME

EXHAUST DEVICE AND SUBSTRATE PROCESSING APPARATUS

STAGE AND ERROR COMPENSATION SYSTEM USING THE SAME

SYSTEM AND METHOD FOR DYNAMICALLY CONTROLLING TEMPERATURE OF THERMO...

FLATNESS ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES

SUBSTRATE TREATING APPARATUS

PHOTOLITHOGRAPHY RETICLE STAGE ACTUATORS

PHOTOLITHOGRAPHY RETICLE STAGE DRIVE SYSTEM

OPTICAL INSPECTION DEVICE

ACTUATED PHOTOLITHOGRAPHY RETICLE STAGE