Clean surfaces

Industry

CPC
Y10S148/017

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

Current Industry

Y10S148/017Clean surfaces

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Methods for cleaning distilling columns
- Patent number 9,102,604
- Issue date Aug 11, 2015
- Baxter International Inc.
- Leonid A. Rozov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD apparatus
- Patent number 6,520,189
- Issue date Feb 18, 2003
- Semiconductor Energy Laboratory Co., Ltd.
- Takashi Inushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In situ method for cleaning silicon surface and forming layer there...
- Patent number 6,197,694
- Issue date Mar 6, 2001
- Applied Materials, Inc.
- Israel Beinglass
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD apparatus
- Patent number 6,013,338
- Issue date Jan 11, 2000
- Semiconductor Energy Laboratory Co., Ltd.
- Takashi Inushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of producing a bipolar transistor
- Patent number 5,925,574
- Issue date Jul 20, 1999
- Seiko Instruments Inc.
- Kenji Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating a thin film transistor
- Patent number 5,811,323
- Issue date Sep 22, 1998
- Seiko Epson Corporation
- Mitsutoshi Miyasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of silicided junctions in deep submicron MOSFETS by defec...
- Patent number 5,780,929
- Issue date Jul 14, 1998
- Siemens Aktiengesellschaft
- Heinrich Zeininger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a thin film semiconductor device
- Patent number 5,637,512
- Issue date Jun 10, 1997
- Seiko Epson Corporation
- Mitsutoshi Miyasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having first and second gate insulating films
- Patent number 5,591,989
- Issue date Jan 7, 1997
- Seiko Epson Corporation
- Mitsutoshi Miyasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of semiconductor device with refractory metal si...
- Patent number 5,563,100
- Issue date Oct 8, 1996
- NEC Corporation
- Yoshihisa Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a thin film semiconductor
- Patent number 5,504,019
- Issue date Apr 2, 1996
- Seiko Epson Corporation
- Mitsutoshi Miyasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication method
- Patent number 5,441,616
- Issue date Aug 15, 1995
- AT&T Corp.
- Arun K. Nanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a silicon-based device comprising surface plasma c...
- Patent number 5,413,954
- Issue date May 9, 1995
- AT&T Bell Laboratories
- Eray S. Aydil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling adhesion of fine particles to an object in li...
- Patent number 5,409,544
- Issue date Apr 25, 1995
- Hitachi, Ltd.
- Katsuhiro Ota
- B08 - CLEANING
Information Patent Grant
Impurity diffusion method
- Patent number 5,387,545
- Issue date Feb 7, 1995
- Hitachi, Ltd.
- Yukihiro Kiyota
- C30 - CRYSTAL GROWTH
Information Patent Grant
Manufacturing method of a semiconductor device utilizing thin metal...
- Patent number 5,382,544
- Issue date Jan 17, 1995
- Matsushita Electric Industrial Co., Ltd.
- Michikazu Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating a thin film semiconductor device
- Patent number 5,372,958
- Issue date Dec 13, 1994
- Seiko Epson Corporation
- Mitsutoshi Miyasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a bipolar transistor included in an integra...
- Patent number 5,372,953
- Issue date Dec 13, 1994
- NEC Corporation
- Akio Matsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ method for cleaning silicon surface and forming layer there...
- Patent number 5,352,636
- Issue date Oct 4, 1994
- Applied Materials, Inc.
- Israel Beinglass
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for encapsulating electronic devices
- Patent number 5,348,913
- Issue date Sep 20, 1994
- AT&T Bell Laboratories
- Richard McBride
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of silicided junctions in deep sub-micron MOSFETs by defe...
- Patent number 5,344,793
- Issue date Sep 6, 1994
- Siemens Aktiengesellschaft
- Heinrich Zeininger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device having a polycide st...
- Patent number 5,332,692
- Issue date Jul 26, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kenji Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fabrication equipment
- Patent number 5,330,577
- Issue date Jul 19, 1994
- Semiconductor Process Laboratory Co., Inc.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Peroxide clean before buried contact polysilicon deposition
- Patent number 5,328,867
- Issue date Jul 12, 1994
- United Microelectronics Corporation
- Sun-Chieh Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching an SiO.sub.2 film
- Patent number 5,328,558
- Issue date Jul 12, 1994
- Tokyo Electron Limited
- Kouhei Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication method
- Patent number 5,312,780
- Issue date May 17, 1994
- AT&T Bell Laboratories
- Arun K. Nanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming doped shallow electrical junctions
- Patent number 5,310,711
- Issue date May 10, 1994
- Hewlett-Packard Company
- Clifford I. Drowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an AlGaInP semiconductor light emitting devi...
- Patent number 5,310,697
- Issue date May 10, 1994
- Sharp Kabushiki Kaisha
- Yasuo Kan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for depositing a layer on a substrate
- Patent number 5,294,572
- Issue date Mar 15, 1994
- ASM International N.V.
- Ernst H. A. Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective etching native oxide
- Patent number 5,294,568
- Issue date Mar 15, 1994
- Genus, Inc.
- Michael A. McNeilly
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Patents Applicationslast 30 patents

Information Patent Application
CVD apparatus
- Publication number 20030140941
- Publication date Jul 31, 2003
- Semiconductor Energy Laboratory Co., Ltd.
- Takashi Inushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Clean surfaces

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods for cleaning distilling columns

CVD apparatus

In situ method for cleaning silicon surface and forming layer there...

CVD apparatus

Method of producing a bipolar transistor

Process for fabricating a thin film transistor

Formation of silicided junctions in deep submicron MOSFETS by defec...

Method for fabricating a thin film semiconductor device

Semiconductor device having first and second gate insulating films

Fabrication method of semiconductor device with refractory metal si...

Method for fabricating a thin film semiconductor

Integrated circuit fabrication method

Method of making a silicon-based device comprising surface plasma c...

Method of controlling adhesion of fine particles to an object in li...

Impurity diffusion method

Manufacturing method of a semiconductor device utilizing thin metal...

Process for fabricating a thin film semiconductor device

Method of manufacturing a bipolar transistor included in an integra...

In situ method for cleaning silicon surface and forming layer there...

Methods for encapsulating electronic devices

Formation of silicided junctions in deep sub-micron MOSFETs by defe...

Method of manufacturing a semiconductor device having a polycide st...

Semiconductor fabrication equipment

Peroxide clean before buried contact polysilicon deposition

Method for etching an SiO.sub.2 film

Integrated circuit fabrication method

Method of forming doped shallow electrical junctions

Method for fabricating an AlGaInP semiconductor light emitting devi...

Method and apparatus for depositing a layer on a substrate

Method of selective etching native oxide

Patents Applicationslast 30 patents

CVD apparatus