Cleaning during device manufacture

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CPC
H01L21/02057

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02057Cleaning during device manufacture

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resin shaping device
- Patent number 12,341,036
- Issue date Jun 24, 2025
- BONDTECH CO., LTD.
- Akira Yamauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of optimizing film deposition process in semiconductor fabri...
- Patent number 12,334,335
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Rei-Lin Chu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Integrated circuit device with source/drain barrier
- Patent number 12,324,201
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Feng-Ching Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating Fin-type field-effect transistor device havin...
- Patent number 12,324,224
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sublimation in forming a semiconductor
- Patent number 12,322,585
- Issue date Jun 3, 2025
- Micron Technology, Inc.
- Matthew S. Thorum
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Stimulus responsive polymer films and formulations
- Patent number 12,322,588
- Issue date Jun 3, 2025
- Lam Research Corporation
- Gregory Blachut
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Displacement measurements in semiconductor wafer processing
- Patent number 12,322,662
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Justin Wong
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,311,415
- Issue date May 27, 2025
- Semes Co., Ltd.
- Do Hyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for drying substrate
- Patent number 12,308,255
- Issue date May 20, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of treating substrate
- Patent number 12,297,545
- Issue date May 13, 2025
- Semes Co., Ltd.
- Jun Kil Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having doped epitaxial region and its methods...
- Patent number 12,294,027
- Issue date May 6, 2025
- Intel Corporation
- Anand S. Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a FET structure by selective deposition of film o...
- Patent number 12,288,692
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer-type wafer cleaning device and method for controlling...
- Patent number 12,288,699
- Issue date Apr 29, 2025
- SK SILTRON CO., LTD.
- Gun Ho Lee
- B08 - CLEANING
Information Patent Grant
Apparatus for treating substrate and method for treating substrate
- Patent number 12,272,543
- Issue date Apr 8, 2025
- Semes Co., Ltd.
- Yong Hyun Choi
- B08 - CLEANING
Information Patent Grant
Selective and isotropic etch of silicon over silicon-germanium allo...
- Patent number 12,272,558
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Matthew Flaugh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for use with hydrogen radicals and method of using same
- Patent number 12,272,527
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating substrate and method for treating substrate
- Patent number 12,272,544
- Issue date Apr 8, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- B08 - CLEANING
Information Patent Grant
Treatment liquid
- Patent number 12,264,275
- Issue date Apr 1, 2025
- FUJIFILM Corporation
- Kohei Hayashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Apparatus and method for wafer cleaning
- Patent number 12,257,610
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bo Chen Chen
- B08 - CLEANING
Information Patent Grant
Substrate processing method
- Patent number 12,255,061
- Issue date Mar 18, 2025
- SCREEN Holdings Co., Ltd.
- Tetsuya Emoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and substrate processing apparatus
- Patent number 12,252,786
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Yoshihiro Takezawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etching method and semiconductor structure manufactured u...
- Patent number 12,255,074
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Da Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,255,081
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Shinichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,237,151
- Issue date Feb 25, 2025
- SEMES CO, LTD.
- Seong Gil Lee
- B08 - CLEANING
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 12,230,509
- Issue date Feb 18, 2025
- United Microelectronics Corp.
- Ming Thai Chai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning system and substrate cleaning method
- Patent number 12,220,732
- Issue date Feb 11, 2025
- Ebara Corporation
- Hiroki Takahashi
- B08 - CLEANING
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,218,222
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 12,211,687
- Issue date Jan 28, 2025
- SCREEN Holdings Co., Ltd.
- Shigeru Yamamoto
- B08 - CLEANING
Information Patent Grant
Wafer bonding apparatus and method
- Patent number 12,211,820
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-I Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for semiconductor wafer
- Patent number 12,194,510
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuang-Wei Cheng
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATING METHOD
- Publication number 20250210341
- Publication date Jun 26, 2025
- SCREEN Holdings Co., Ltd.
- Yuta SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR WAFERS IN A CLEANING LINE
- Publication number 20250201589
- Publication date Jun 19, 2025
- Siltronic AG
- Bertram MÖCKEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCHING METHOD AND SEMICONDUCTOR STRUCTURE MANUFACTURED U...
- Publication number 20250201571
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250170621
- Publication date May 29, 2025
- SEMES CO., LTD.
- Sune Gi WANG
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD OF TREATING SUBSTRATE
- Publication number 20250166987
- Publication date May 22, 2025
- SEMES CO., LTD.
- Yong Jun KIM
- B08 - CLEANING
Information Patent Application
Apparatus And Method For Wafer Cleaning
- Publication number 20250161998
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bo Chen CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250167012
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Jihoon JEONG
- B08 - CLEANING
Information Patent Application
SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...
- Publication number 20250167022
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Keita Hirase
- B08 - CLEANING
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250149344
- Publication date May 8, 2025
- UNITED MICROELECTRONICS CORP.
- MING THAI CHAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...
- Publication number 20250140576
- Publication date May 1, 2025
- SEMES CO., LTD.
- Jun Hee CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Compositions
- Publication number 20250136865
- Publication date May 1, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Keeyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20250135510
- Publication date May 1, 2025
- SEMES CO., LTD.
- Si Nae SONG
- B08 - CLEANING
Information Patent Application
MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PR...
- Publication number 20250132145
- Publication date Apr 24, 2025
- SEMES CO., LTD.
- Do Hyeon YOON
- B08 - CLEANING
Information Patent Application
METHODS FOR MAKING SEMICONDUCTOR TRANSISTOR DEVICES WITH RECESSED S...
- Publication number 20250125187
- Publication date Apr 17, 2025
- ATOMERA INCORPORATED
- DONGHUN KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND STRUCTURES FOR FORMING FIN-TYPE COMPLEMENTARY FIELD-EFF...
- Publication number 20250126876
- Publication date Apr 17, 2025
- IMEC vzw
- Farid SEBAAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET Device and Method of Forming Same
- Publication number 20250126821
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIALS TO REDUCE THIC...
- Publication number 20250112054
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION, POST-CHEMI...
- Publication number 20250101346
- Publication date Mar 27, 2025
- FUJIMI INCORPORATED
- Masafumi NISHIUMI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20250087515
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THINNER COMPOSITION AND METHOD FOR SUBSTRATE PROCESSING
- Publication number 20250084352
- Publication date Mar 13, 2025
- Advanced Echem Materials Company Limited
- Chen-Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICO...
- Publication number 20250079198
- Publication date Mar 6, 2025
- ELEMENTAL SCIENTIFIC, INC.
- Jacob Unnerstall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER AND METHOD OF WAFER THINNING
- Publication number 20250062114
- Publication date Feb 20, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. SEDDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINATED CLEANING FLUID MIXTURES
- Publication number 20250051695
- Publication date Feb 13, 2025
- 3M Innovative Properties Company
- Tamami Kimura
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20250044697
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SUBSTRATE TREATING METHOD, SUBSTRATE MANUFACTURING METHOD, AND SUBS...
- Publication number 20250046597
- Publication date Feb 6, 2025
- SEMES CO., LTD.
- Hee Hwan KIM
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER CLEANING
- Publication number 20250041906
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuang-Wei Cheng
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250029845
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Hunjae JANG
- B08 - CLEANING
Information Patent Application
COMPOSITION, MANUFACTURING METHOD FOR SEMICONDUCTOR ELEMENT, AND CL...
- Publication number 20250017209
- Publication date Jan 16, 2025
- FUJIFILM CORPORATION
- Tadashi INABA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS
- Publication number 20240418443
- Publication date Dec 19, 2024
- SCREEN Holdings Co., Ltd.
- Tomoya TANAKA
- B08 - CLEANING
Information Patent Application
METHOD FOR TREATING A SUBSTRATE
- Publication number 20240416394
- Publication date Dec 19, 2024
- SEMES CO., LTD.
- Tae-Keun KIM
- B08 - CLEANING

Cleaning during device manufacture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resin shaping device

Method of optimizing film deposition process in semiconductor fabri...

Integrated circuit device with source/drain barrier

Method of fabricating Fin-type field-effect transistor device havin...

Sublimation in forming a semiconductor

Stimulus responsive polymer films and formulations

Displacement measurements in semiconductor wafer processing

Substrate processing apparatus and substrate processing method

Apparatus and method for drying substrate

Apparatus and method of treating substrate

Semiconductor device having doped epitaxial region and its methods...

Method of forming a FET structure by selective deposition of film o...

Single wafer-type wafer cleaning device and method for controlling...

Apparatus for treating substrate and method for treating substrate

Selective and isotropic etch of silicon over silicon-germanium allo...

Apparatus for use with hydrogen radicals and method of using same

Apparatus for treating substrate and method for treating substrate

Treatment liquid

Apparatus and method for wafer cleaning

Substrate processing method

Cleaning method and substrate processing apparatus

Selective etching method and semiconductor structure manufactured u...

Substrate processing apparatus and substrate processing method

Apparatus and method for processing substrate using plasma

Method for fabricating semiconductor device

Substrate cleaning system and substrate cleaning method

FinFET device and method of forming same

Substrate treatment apparatus and substrate treatment method

Wafer bonding apparatus and method

Method and apparatus for semiconductor wafer

Patents Applicationslast 30 patents

SUBSTRATE TREATING METHOD

METHOD FOR CLEANING SEMICONDUCTOR WAFERS IN A CLEANING LINE

SELECTIVE ETCHING METHOD AND SEMICONDUCTOR STRUCTURE MANUFACTURED U...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

APPARATUS AND METHOD OF TREATING SUBSTRATE

Apparatus And Method For Wafer Cleaning

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...

Etching Compositions

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PR...

METHODS FOR MAKING SEMICONDUCTOR TRANSISTOR DEVICES WITH RECESSED S...

METHODS AND STRUCTURES FOR FORMING FIN-TYPE COMPLEMENTARY FIELD-EFF...

FINFET Device and Method of Forming Same

CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIALS TO REDUCE THIC...

POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION, POST-CHEMI...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

THINNER COMPOSITION AND METHOD FOR SUBSTRATE PROCESSING

SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICO...

SEMICONDUCTOR WAFER AND METHOD OF WAFER THINNING

FLUORINATED CLEANING FLUID MIXTURES

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

SUBSTRATE TREATING METHOD, SUBSTRATE MANUFACTURING METHOD, AND SUBS...

METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER CLEANING

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

COMPOSITION, MANUFACTURING METHOD FOR SEMICONDUCTOR ELEMENT, AND CL...

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS

METHOD FOR TREATING A SUBSTRATE