Cleaning during device manufacture

Industry

CPC
H01L21/02057

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02057Cleaning during device manufacture

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating semiconductor device
- Patent number 12,230,509
- Issue date Feb 18, 2025
- United Microelectronics Corp.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning system and substrate cleaning method
- Patent number 12,220,732
- Issue date Feb 11, 2025
- Ebara Corporation
- Hiroki Takahashi
- B08 - CLEANING
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,218,222
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 12,211,687
- Issue date Jan 28, 2025
- SCREEN Holdings Co., Ltd.
- Shigeru Yamamoto
- B08 - CLEANING
Information Patent Grant
Wafer bonding apparatus and method
- Patent number 12,211,820
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-I Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for semiconductor wafer
- Patent number 12,194,510
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuang-Wei Cheng
- B08 - CLEANING
Information Patent Grant
Vertical tunneling field-effect transistor with enhanced current co...
- Patent number 12,199,171
- Issue date Jan 14, 2025
- National Technology & Engineering Solutions of Sandia, LLC
- Tzu-Ming Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cleaning substrates using high temperature...
- Patent number 12,186,684
- Issue date Jan 7, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Fuping Chen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Substrate processing apparatus, substrate processing system and sub...
- Patent number 12,191,153
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Munehisa Kodama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 12,183,613
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster processing device and gas cluster processing method
- Patent number 12,172,198
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 12,165,866
- Issue date Dec 10, 2024
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer wet cleaning system
- Patent number 12,162,045
- Issue date Dec 10, 2024
- Tawain Semiconductor Manufacturing Co., Ltd.
- Chih-Wei Chao
- B08 - CLEANING
Information Patent Grant
Method of restoring collapsed pattern, substrate processing method,...
- Patent number 12,159,783
- Issue date Dec 3, 2024
- SCREEN Holdings Co., Ltd.
- Masayuki Otsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GaN/two-dimensional AlN heterojunction rectifier on silicon substra...
- Patent number 12,154,990
- Issue date Nov 26, 2024
- South China University of Technology
- Wenliang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer and method of wafer thinning
- Patent number 12,154,783
- Issue date Nov 26, 2024
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. Seddon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for chemical mechanical polishing process
- Patent number 12,131,897
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-I Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus and substrate cleaning method
- Patent number 12,131,919
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Tsunenaga Nakashima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Integrated semiconductor die vessel processing workstations
- Patent number 12,125,725
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Sheng Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 12,119,217
- Issue date Oct 15, 2024
- Semes Co., Ltd.
- Si Nae Song
- B08 - CLEANING
Information Patent Grant
Cleaning process and semiconductor processing method
- Patent number 12,112,939
- Issue date Oct 8, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Zhaopei Cui
- B08 - CLEANING
Information Patent Grant
Method and single wafer processing system for processing of semicon...
- Patent number 12,103,052
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Shan Hu
- B08 - CLEANING
Information Patent Grant
Steam-assisted single substrate cleaning process and apparatus
- Patent number 12,106,976
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jianshe Tang
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method and apparatus
- Patent number 12,100,586
- Issue date Sep 24, 2024
- ACM Research (Shanghai) Inc.
- Wenjun Wang
- B08 - CLEANING
Information Patent Grant
Method and system for processing substrate in semiconductor fabrica...
- Patent number 12,090,527
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Syuan Jhuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated dry-in dry-out dual side polishing of silicon substrates...
- Patent number 12,094,740
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Manoj A. Gajendra
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and apparatus cleaning method
- Patent number 12,087,599
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Hidemasa Aratake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for improvement of photoresist patterning profile
- Patent number 12,087,634
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ke-Ming Chen
- G11 - INFORMATION STORAGE
Information Patent Grant
Composition comprising a primary and a secondary surfactant, for cl...
- Patent number 12,084,628
- Issue date Sep 10, 2024
- BASF SE
- I Chen Chou
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Showerhead assembly and method of servicing assembly for semiconduc...
- Patent number 12,080,545
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Wei Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FLUORINATED CLEANING FLUID MIXTURES
- Publication number 20250051695
- Publication date Feb 13, 2025
- 3M Innovative Properties Company
- Tamami Kimura
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20250044697
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SUBSTRATE TREATING METHOD, SUBSTRATE MANUFACTURING METHOD, AND SUBS...
- Publication number 20250046597
- Publication date Feb 6, 2025
- SEMES CO., LTD.
- Hee Hwan KIM
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER CLEANING
- Publication number 20250041906
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuang-Wei Cheng
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250029845
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Hunjae JANG
- B08 - CLEANING
Information Patent Application
COMPOSITION, MANUFACTURING METHOD FOR SEMICONDUCTOR ELEMENT, AND CL...
- Publication number 20250017209
- Publication date Jan 16, 2025
- FUJIFILM CORPORATION
- Tadashi INABA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS
- Publication number 20240418443
- Publication date Dec 19, 2024
- SCREEN Holdings Co., Ltd.
- Tomoya TANAKA
- B08 - CLEANING
Information Patent Application
METHOD FOR TREATING A SUBSTRATE
- Publication number 20240416394
- Publication date Dec 19, 2024
- SEMES CO., LTD.
- Tae-Keun KIM
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240412986
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Byung Woo SIM
- B08 - CLEANING
Information Patent Application
METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...
- Publication number 20240399422
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR SUBSTRATE BEVEL CLEANING
- Publication number 20240404821
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Saravanapriyan SRIRAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO JUNCTION FORMATION THROUGH GAS PHASE DOPING
- Publication number 20240395553
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER WET CLEANING SYSTEM
- Publication number 20240390952
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wei CHAO
- B08 - CLEANING
Information Patent Application
Wafer Bonding Apparatus and Method
- Publication number 20240387451
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-I Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DE...
- Publication number 20240387164
- Publication date Nov 21, 2024
- CANSEMI TECHNOLOGY INC.
- Ruijing HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DRYING WAFER
- Publication number 20240387163
- Publication date Nov 21, 2024
- NATIONAL SUN YAT-SEN UNIVERSITY
- TING-CHANG CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MITIGATION OF FIRST WAFER EFFECT
- Publication number 20240379343
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Yongqian Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SEMICONDUCTOR DIE VESSEL PROCESSING WORKSTATIONS
- Publication number 20240379393
- Publication date Nov 14, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Tsung-Sheng KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR IMPROVEMENT OF PHOTORESIST PATTERNING PROFILE
- Publication number 20240379441
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ke-Ming CHEN
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE AND SUBLIMATION DRYING METHOD
- Publication number 20240371627
- Publication date Nov 7, 2024
- Central Glass Company, Limited
- Yoshiharu TERUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE-FREE CLEANING AGENT, PREPARATION METHOD THEREFOR AND USE T...
- Publication number 20240368505
- Publication date Nov 7, 2024
- TAN KAH KEE INNOVATION LABORATORY
- Aiqiang Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240371661
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- B08 - CLEANING
Information Patent Application
SHOWERHEAD ASSEMBLY AND METHOD OF SERVICING ASSEMBLY FOR SEMICONDUC...
- Publication number 20240371626
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Wei WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FULLY STRAINED CHANNEL
- Publication number 20240371941
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCT...
- Publication number 20240363450
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE REMOVAL METHOD IN SEMICONDUCTOR FABRICATION PROCESS
- Publication number 20240363329
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-MING TSAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES
- Publication number 20240363355
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Ji ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR IN-SITU MARANGONI CLEANING
- Publication number 20240363373
- Publication date Oct 31, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Wei-Chun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SHUTTERED WAFER CLEANING
- Publication number 20240363377
- Publication date Oct 31, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Tsui-Wei WANG
- B08 - CLEANING
Information Patent Application
METHOD FOR FORMING SOURCE/DRAIN CONTACTS
- Publication number 20240332298
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS

Cleaning during device manufacture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for fabricating semiconductor device

Substrate cleaning system and substrate cleaning method

FinFET device and method of forming same

Substrate treatment apparatus and substrate treatment method

Wafer bonding apparatus and method

Method and apparatus for semiconductor wafer

Vertical tunneling field-effect transistor with enhanced current co...

Method and apparatus for cleaning substrates using high temperature...

Substrate processing apparatus, substrate processing system and sub...

Substrate processing system and substrate processing method

Gas cluster processing device and gas cluster processing method

Wafer cleaning apparatus and wafer cleaning method using the same

Wafer wet cleaning system

Method of restoring collapsed pattern, substrate processing method,...

GaN/two-dimensional AlN heterojunction rectifier on silicon substra...

Semiconductor wafer and method of wafer thinning

Method and system for chemical mechanical polishing process

Substrate cleaning apparatus and substrate cleaning method

Integrated semiconductor die vessel processing workstations

Substrate treatment method and substrate treatment apparatus

Cleaning process and semiconductor processing method

Method and single wafer processing system for processing of semicon...

Steam-assisted single substrate cleaning process and apparatus

Substrate cleaning method and apparatus

Method and system for processing substrate in semiconductor fabrica...

Automated dry-in dry-out dual side polishing of silicon substrates...

Substrate processing apparatus and apparatus cleaning method

Methods for improvement of photoresist patterning profile

Composition comprising a primary and a secondary surfactant, for cl...

Showerhead assembly and method of servicing assembly for semiconduc...

Patents Applicationslast 30 patents

FLUORINATED CLEANING FLUID MIXTURES

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

SUBSTRATE TREATING METHOD, SUBSTRATE MANUFACTURING METHOD, AND SUBS...

METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER CLEANING

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

COMPOSITION, MANUFACTURING METHOD FOR SEMICONDUCTOR ELEMENT, AND CL...

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS

METHOD FOR TREATING A SUBSTRATE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...

SEMICONDUCTOR SUBSTRATE BEVEL CLEANING

HIGH ASPECT RATIO JUNCTION FORMATION THROUGH GAS PHASE DOPING

WAFER WET CLEANING SYSTEM

Wafer Bonding Apparatus and Method

WAFER CLEANING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DE...

METHOD FOR DRYING WAFER

MITIGATION OF FIRST WAFER EFFECT

INTEGRATED SEMICONDUCTOR DIE VESSEL PROCESSING WORKSTATIONS

METHODS FOR IMPROVEMENT OF PHOTORESIST PATTERNING PROFILE

METHOD FOR PRODUCING SUBSTRATE AND SUBLIMATION DRYING METHOD

FLUORINE-FREE CLEANING AGENT, PREPARATION METHOD THEREFOR AND USE T...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SHOWERHEAD ASSEMBLY AND METHOD OF SERVICING ASSEMBLY FOR SEMICONDUC...

FULLY STRAINED CHANNEL

METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCT...

PARTICLE REMOVAL METHOD IN SEMICONDUCTOR FABRICATION PROCESS

EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES

SYSTEMS AND METHODS FOR IN-SITU MARANGONI CLEANING

SYSTEMS AND METHODS FOR SHUTTERED WAFER CLEANING

METHOD FOR FORMING SOURCE/DRAIN CONTACTS