Cleaning of reactor or parts inside the reactor by using reactive gases

Industry

CPC
C23C16/4405

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/4405Cleaning of reactor or parts inside the reactor by using reactive gases

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for conductance liners in semiconductor proce...
- Patent number 12,354,847
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Timothy Joseph Franklin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
- Patent number 12,354,887
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Gen Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Uniform in situ cleaning and deposition
- Patent number 12,347,653
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shutter disk for physical vapor deposition (PVD) chamber
- Patent number 12,338,527
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deflector for chamber cleaning
- Patent number 12,325,913
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuang-Wei Cheng
- B08 - CLEANING
Information Patent Grant
Method of performing maintenance on substrate processing apparatus
- Patent number 12,315,709
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactive by-products collection system
- Patent number 12,305,626
- Issue date May 20, 2025
- MILAEBO CO., LTD.
- Che Hoo Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for purge clean of low pressure furnace
- Patent number 12,305,276
- Issue date May 20, 2025
- Shanghai Huali Microelectronics Corporation
- Yuhong Lang
- B08 - CLEANING
Information Patent Grant
Semiconductor deposition monitoring device
- Patent number 12,283,497
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Young Uk Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas dispenser and deposition apparatus using the same
- Patent number 12,281,385
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing epitaxial silicon wafer
- Patent number 12,278,105
- Issue date Apr 15, 2025
- Sumco Corporation
- Motoki Goto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor cleaning step
- Patent number 12,276,020
- Issue date Apr 15, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- William Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning quartz epitaxial chambers
- Patent number 12,252,785
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Gregory Deye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and substrate processing apparatus
- Patent number 12,252,786
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Yoshihiro Takezawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cleaning process for substrate etching
- Patent number 12,255,055
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for cleaning a pre-clean process chamber
- Patent number 12,241,157
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ting Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vaporizer, processing apparatus and method of manufacturing semicon...
- Patent number 12,234,550
- Issue date Feb 25, 2025
- Kokusai Electric Corporation
- Gen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,227,837
- Issue date Feb 18, 2025
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method usin...
- Patent number 12,227,838
- Issue date Feb 18, 2025
- Semes Co., Ltd.
- Ban Seok You
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kits and related methods for processing chambers to facilit...
- Patent number 12,221,696
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning of a processing chamber
- Patent number 12,221,694
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for performing an in-situ etch of reaction ch...
- Patent number 12,203,166
- Issue date Jan 21, 2025
- ASM IP Holding B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning, method of manufacturing semiconductor device, s...
- Patent number 12,195,848
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Kazuhiro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning chamber of substrate processing apparatus
- Patent number 12,198,901
- Issue date Jan 14, 2025
- Jusung Engineering Co., Ltd.
- Yong Hyun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin-film-deposition equipment
- Patent number 12,198,904
- Issue date Jan 14, 2025
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Removing metal contamination from surfaces of a processing chamber
- Patent number 12,191,125
- Issue date Jan 7, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,163,219
- Issue date Dec 10, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Intersecting module
- Patent number 12,152,303
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Syuan Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus for component for semiconductor production appar...
- Patent number 12,139,788
- Issue date Nov 12, 2024
- Taiyo Nippon Sanso Corporation
- Akira Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for cleaning reaction vessel for processing su...
- Patent number 12,139,787
- Issue date Nov 12, 2024
- Kokusai Electric Corporation
- Shinya Ebata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250230542
- Publication date Jul 17, 2025
- Kokusai Electric Corporation
- Hideharu ITATANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF METAL-CONTAINING FILMS AND CHAMBER CLEAN
- Publication number 20250226227
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250223703
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Toshiyuki KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250223691
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...
- Publication number 20250207249
- Publication date Jun 26, 2025
- ASM IP HOLDING B.V.
- Toshiharu Watarai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLAY APPARATUS MANUFACTURING APPARATUS AND DISPLAY APPARATUS MAN...
- Publication number 20250197992
- Publication date Jun 19, 2025
- SAMSUNG DISPLAY CO., LTD.
- Sungmin Huch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER
- Publication number 20250191896
- Publication date Jun 12, 2025
- ASM IP HOLDING B.V.
- Ryo MIYAMA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20250191898
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Akira TANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20250183016
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Yi Zhou
- B08 - CLEANING
Information Patent Application
CONDITIONING OF A PROCESSING CHAMBER
- Publication number 20250179629
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Pramit MANNA
- B08 - CLEANING
Information Patent Application
Substrate Processing Apparatus, Cleaning Method, Method of Manufact...
- Publication number 20250171895
- Publication date May 29, 2025
- Kokusai Electric Corporation
- Yoshitomo HASHIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250128298
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- B08 - CLEANING
Information Patent Application
METHOD OF CLEANING A PLASMA PROCESSING DEVICE
- Publication number 20250122615
- Publication date Apr 17, 2025
- SPTS TECHNOLOGIES LIMITED
- Matthew EDMONDS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250122616
- Publication date Apr 17, 2025
- LPE S.p.A.
- Silvio Roberto Mario Preti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, METHOD OF MANUFACT...
- Publication number 20250115993
- Publication date Apr 10, 2025
- Kokusai Electric Corporation
- Takeo HANASHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS FOR PREVENTIVE MAINTENANCE OF SEMICONDUCTOR PRO...
- Publication number 20250109494
- Publication date Apr 3, 2025
- ASM IP HOLDING B.V.
- Kenneth Honniball
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...
- Publication number 20250101580
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...
- Publication number 20250101581
- Publication date Mar 27, 2025
- ASM IP HOLDING B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20250087480
- Publication date Mar 13, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Haifeng QIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR REMOVING COLLATERAL DEPOSITIONS FROM WITHIN...
- Publication number 20250075317
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Gregory Deye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for cleaning a reaction chamber
- Publication number 20250075318
- Publication date Mar 6, 2025
- Picosun Oy
- Tom BLOMBERG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250066920
- Publication date Feb 27, 2025
- EUGENE TECHNOLOGY CO., LTD.
- In Soo SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER
- Publication number 20250062106
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Danae Nicole Kay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL WAFER MANUFACTURING METHOD AND EPITAXIAL WAFER MANUFACTUR...
- Publication number 20250051959
- Publication date Feb 13, 2025
- SUMCO CORPORATION
- Masayuki TSUJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND METHOD FOR CLEANING SUBSTRATE PROCE...
- Publication number 20250027200
- Publication date Jan 23, 2025
- Jusung Engineering Co., Ltd.
- Won Tae CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR DEPOSITING A LAYER CONTAINING A GROUP FIVE EL...
- Publication number 20250019823
- Publication date Jan 16, 2025
- AIXTRON SE
- Ilio MICCOLI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor cleaning step
- Publication number 20240401191
- Publication date Dec 5, 2024
- United Semiconductor (Xiamen) Co., Ltd.
- William Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION FURNACE WITH A CLEANING GAS SYSTEM TO PRO...
- Publication number 20240392435
- Publication date Nov 28, 2024
- ASM IP HOLDING B.V.
- Dieter Pierreux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING PROCESS CHAMBER AND APPLICATION THEREOF
- Publication number 20240392436
- Publication date Nov 28, 2024
- SUZHOU MAXWELL TECHNOLOGIES CO., LTD.
- QINGYUAN QU
- B08 - CLEANING

Cleaning of reactor or parts inside the reactor by using reactive gases

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and apparatus for conductance liners in semiconductor proce...

Cleaning method, method of manufacturing semiconductor device, and...

Uniform in situ cleaning and deposition

Shutter disk for physical vapor deposition (PVD) chamber

Deflector for chamber cleaning

Method of performing maintenance on substrate processing apparatus

Reactive by-products collection system

Method for purge clean of low pressure furnace

Semiconductor deposition monitoring device

Gas dispenser and deposition apparatus using the same

Method for producing epitaxial silicon wafer

Semiconductor cleaning step

Method for cleaning quartz epitaxial chambers

Cleaning method and substrate processing apparatus

Integrated cleaning process for substrate etching

System and method for cleaning a pre-clean process chamber

Vaporizer, processing apparatus and method of manufacturing semicon...

Ex situ coating of chamber components for semiconductor processing

Substrate processing apparatus and substrate processing method usin...

Process kits and related methods for processing chambers to facilit...

Conditioning of a processing chamber

Apparatus and methods for performing an in-situ etch of reaction ch...

Method of cleaning, method of manufacturing semiconductor device, s...

Method for cleaning chamber of substrate processing apparatus

Thin-film-deposition equipment

Removing metal contamination from surfaces of a processing chamber

Ex situ coating of chamber components for semiconductor processing

Intersecting module

Cleaning apparatus for component for semiconductor production appar...

Apparatus and method for cleaning reaction vessel for processing su...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

DEPOSITION OF METAL-CONTAINING FILMS AND CHAMBER CLEAN

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...

DISPLAY APPARATUS MANUFACTURING APPARATUS AND DISPLAY APPARATUS MAN...

SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

CONDITIONING OF A PROCESSING CHAMBER

Substrate Processing Apparatus, Cleaning Method, Method of Manufact...

CLEANING METHOD AND FILM-FORMING APPARATUS

METHOD OF CLEANING A PLASMA PROCESSING DEVICE

APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES

SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, METHOD OF MANUFACT...

METHODS AND SYSTEMS FOR PREVENTIVE MAINTENANCE OF SEMICONDUCTOR PRO...

UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...

APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SYSTEMS AND METHODS FOR REMOVING COLLATERAL DEPOSITIONS FROM WITHIN...

Method and apparatus for cleaning a reaction chamber

SUBSTRATE PROCESSING APPARATUS

REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER

EPITAXIAL WAFER MANUFACTURING METHOD AND EPITAXIAL WAFER MANUFACTUR...

SUBSTRATE PROCESSING DEVICE AND METHOD FOR CLEANING SUBSTRATE PROCE...

METHOD AND DEVICE FOR DEPOSITING A LAYER CONTAINING A GROUP FIVE EL...

Semiconductor cleaning step

CHEMICAL VAPOR DEPOSITION FURNACE WITH A CLEANING GAS SYSTEM TO PRO...

METHOD FOR CLEANING PROCESS CHAMBER AND APPLICATION THEREOF