Cleaning of reactor or parts inside the reactor by using reactive gases

Industry

CPC
C23C16/4405

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/4405Cleaning of reactor or parts inside the reactor by using reactive gases

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Process kits and related methods for processing chambers to facilit...
- Patent number 12,221,696
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning of a processing chamber
- Patent number 12,221,694
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for performing an in-situ etch of reaction ch...
- Patent number 12,203,166
- Issue date Jan 21, 2025
- ASM IP Holding B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning, method of manufacturing semiconductor device, s...
- Patent number 12,195,848
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Kazuhiro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning chamber of substrate processing apparatus
- Patent number 12,198,901
- Issue date Jan 14, 2025
- Jusung Engineering Co., Ltd.
- Yong Hyun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin-film-deposition equipment
- Patent number 12,198,904
- Issue date Jan 14, 2025
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Removing metal contamination from surfaces of a processing chamber
- Patent number 12,191,125
- Issue date Jan 7, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,163,219
- Issue date Dec 10, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Intersecting module
- Patent number 12,152,303
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Syuan Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus for component for semiconductor production appar...
- Patent number 12,139,788
- Issue date Nov 12, 2024
- Taiyo Nippon Sanso Corporation
- Akira Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for cleaning reaction vessel for processing su...
- Patent number 12,139,787
- Issue date Nov 12, 2024
- Kokusai Electric Corporation
- Shinya Ebata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning materials and processes for lithium processing equipment
- Patent number 12,134,822
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Tapash Chakraborty
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and plasma treatment device
- Patent number 12,129,544
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yoshiyuki Kondo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 12,106,958
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Valve module and substrate processing device comprising the same
- Patent number 12,092,235
- Issue date Sep 17, 2024
- PRESYS. CO., LTD.
- Sang Min Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,084,762
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ker-hsun Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and film deposition apparatus
- Patent number 12,077,855
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Hideomi Hane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition furnace with a cleaning gas system to pro...
- Patent number 12,077,854
- Issue date Sep 3, 2024
- ASM IP Holding B.V.
- Dieter Pierreux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective in-situ cleaning of high-k films from processing chamber...
- Patent number 12,076,763
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Yujia Zhai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber cleaning device and chamber cleaning method
- Patent number 12,065,734
- Issue date Aug 20, 2024
- Jusung Engineering Co., Ltd.
- Dong Hwan Lee
- B08 - CLEANING
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 12,065,732
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Masayuki Harashima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
- Patent number 12,065,736
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Naoya Miyashita
- B08 - CLEANING
Information Patent Grant
Apparatus for cleaning plasma chambers
- Patent number 12,057,300
- Issue date Aug 6, 2024
- Lam Research Corporation
- Adrien Lavoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning member in process container, method of manufactu...
- Patent number 12,053,805
- Issue date Aug 6, 2024
- Kokusai Electric Corporation
- Koei Kuribayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for reducing effluent build-up in a pumping exh...
- Patent number 12,049,698
- Issue date Jul 30, 2024
- Lam Research Corporation
- Antonio Xavier
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and related device for removing by-product on semiconductor...
- Patent number 12,027,350
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing-Cheng Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flim forming method of carbon-containing film by microwave plasma
- Patent number 12,018,375
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Ryota Ifuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing apparatus and a method for processing a su...
- Patent number 12,018,365
- Issue date Jun 25, 2024
- ASM IP Holding B.V.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and cleaning method
- Patent number 12,018,366
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Shingo Hishiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
EPITAXIAL WAFER MANUFACTURING METHOD AND EPITAXIAL WAFER MANUFACTUR...
- Publication number 20250051959
- Publication date Feb 13, 2025
- SUMCO CORPORATION
- Masayuki TSUJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND METHOD FOR CLEANING SUBSTRATE PROCE...
- Publication number 20250027200
- Publication date Jan 23, 2025
- Jusung Engineering Co., Ltd.
- Won Tae CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR DEPOSITING A LAYER CONTAINING A GROUP FIVE EL...
- Publication number 20250019823
- Publication date Jan 16, 2025
- AIXTRON SE
- Ilio MICCOLI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor cleaning step
- Publication number 20240401191
- Publication date Dec 5, 2024
- United Semiconductor (Xiamen) Co., Ltd.
- William Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION FURNACE WITH A CLEANING GAS SYSTEM TO PRO...
- Publication number 20240392435
- Publication date Nov 28, 2024
- ASM IP HOLDING B.V.
- Dieter Pierreux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING PROCESS CHAMBER AND APPLICATION THEREOF
- Publication number 20240392436
- Publication date Nov 28, 2024
- SUZHOU MAXWELL TECHNOLOGIES CO., LTD.
- QINGYUAN QU
- B08 - CLEANING
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20240395513
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR CLEANING A PRE-CLEAN PROCESS CHAMBER
- Publication number 20240384402
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ting Tsai
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD
- Publication number 20240384404
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Wei XU
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240384403
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ker-hsun LIAO
- B08 - CLEANING
Information Patent Application
CLEANING ASSEMBLIES FOR SUBSTRATE PROCESSING CHAMBERS
- Publication number 20240368756
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Yuxing ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILM DEPOSITION DEVICE, THIN FILM DEPOSITION METHOD AND THIN F...
- Publication number 20240368766
- Publication date Nov 7, 2024
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REMOVING MOLYBDENUM MONOFLUORIDE TO MOLYBDENUM PENTAFLUO...
- Publication number 20240368755
- Publication date Nov 7, 2024
- Central Glass Co., Ltd.
- Akiou KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR DRY-CLEANING AlN HEATER FOR SEMICONDUCTOR...
- Publication number 20240363328
- Publication date Oct 31, 2024
- WONIK QNC Corporation
- Eun Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING MEMBER IN PROCESS CONTAINER, METHOD OF MANUFACTU...
- Publication number 20240359218
- Publication date Oct 31, 2024
- Kokusai Electric Corporation
- Koei KURIBAYASHI
- B08 - CLEANING
Information Patent Application
REACTIVE BY-PRODUCTS COLLECTION SYSTEM
- Publication number 20240352926
- Publication date Oct 24, 2024
- MILAEBO CO., LTD.
- Che Hoo CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS CHAMBER
- Publication number 20240352579
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Zhepeng CONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20240337022
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...
- Publication number 20240331988
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing-Cheng Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...
- Publication number 20240321597
- Publication date Sep 26, 2024
- Kokusai Electric Corporation
- Kaoru YAMAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240321555
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Jongyun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20240295022
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORTS FOR SEMICONDUCTOR STRUCTURES
- Publication number 20240290615
- Publication date Aug 29, 2024
- SOITEC
- Young-Pil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER CLEANING APPARATUS AND METHOD
- Publication number 20240279802
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Jung-Min LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY SYSTEM
- Publication number 20240279808
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Minsoo PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE GROWTH METHOD
- Publication number 20240271273
- Publication date Aug 15, 2024
- NUFLARE TECHNOLOGY, INC.
- Ichiro MIZUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME
- Publication number 20240247371
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Nitin Pathak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING OPERATIONS BASED ON DEPOSITION THICKNESS
- Publication number 20240229234
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Victor Zamarian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO IMPROVE PRODUCTIVITY OF ADVANCED CVD W GAPFILL PROCESS
- Publication number 20240222128
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Mingrui ZHAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEM AND METHODS FOR FORMING VOID-FREE AND SEAM-FREE T...
- Publication number 20240209500
- Publication date Jun 27, 2024
- Applied Materials, Inc.
- Xi CEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Cleaning of reactor or parts inside the reactor by using reactive gases

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Process kits and related methods for processing chambers to facilit...

Conditioning of a processing chamber

Apparatus and methods for performing an in-situ etch of reaction ch...

Method of cleaning, method of manufacturing semiconductor device, s...

Method for cleaning chamber of substrate processing apparatus

Thin-film-deposition equipment

Removing metal contamination from surfaces of a processing chamber

Ex situ coating of chamber components for semiconductor processing

Intersecting module

Cleaning apparatus for component for semiconductor production appar...

Apparatus and method for cleaning reaction vessel for processing su...

Cleaning materials and processes for lithium processing equipment

Cleaning method and plasma treatment device

Method of using dual frequency RF power in a process chamber

Valve module and substrate processing device comprising the same

Semiconductor processing tool and methods of operation

Vacuum pump protection against deposition byproduct buildup

Cleaning method and film deposition apparatus

Chemical vapor deposition furnace with a cleaning gas system to pro...

Selective in-situ cleaning of high-k films from processing chamber...

Chamber cleaning device and chamber cleaning method

Film forming method and film forming apparatus

Cleaning method, method of manufacturing semiconductor device, and...

Apparatus for cleaning plasma chambers

Method of cleaning member in process container, method of manufactu...

Systems and methods for reducing effluent build-up in a pumping exh...

Process and related device for removing by-product on semiconductor...

Flim forming method of carbon-containing film by microwave plasma

Semiconductor processing apparatus and a method for processing a su...

Substrate processing apparatus and cleaning method

Patents Applicationslast 30 patents

EPITAXIAL WAFER MANUFACTURING METHOD AND EPITAXIAL WAFER MANUFACTUR...

SUBSTRATE PROCESSING DEVICE AND METHOD FOR CLEANING SUBSTRATE PROCE...

METHOD AND DEVICE FOR DEPOSITING A LAYER CONTAINING A GROUP FIVE EL...

Semiconductor cleaning step

CHEMICAL VAPOR DEPOSITION FURNACE WITH A CLEANING GAS SYSTEM TO PRO...

METHOD FOR CLEANING PROCESS CHAMBER AND APPLICATION THEREOF

APPARATUS FOR CLEANING PLASMA CHAMBERS

SYSTEM AND METHOD FOR CLEANING A PRE-CLEAN PROCESS CHAMBER

SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

CLEANING ASSEMBLIES FOR SUBSTRATE PROCESSING CHAMBERS

THIN FILM DEPOSITION DEVICE, THIN FILM DEPOSITION METHOD AND THIN F...

METHOD FOR REMOVING MOLYBDENUM MONOFLUORIDE TO MOLYBDENUM PENTAFLUO...

METHOD AND APPARATUS FOR DRY-CLEANING AlN HEATER FOR SEMICONDUCTOR...

METHOD OF CLEANING MEMBER IN PROCESS CONTAINER, METHOD OF MANUFACTU...

REACTIVE BY-PRODUCTS COLLECTION SYSTEM

PROCESS CHAMBER

FILM FORMING APPARATUS AND FILM FORMING METHOD

PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...

SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

PROCESSING METHOD AND PROCESSING APPARATUS

SUPPORTS FOR SEMICONDUCTOR STRUCTURES

PROCESS CHAMBER CLEANING APPARATUS AND METHOD

GAS SUPPLY SYSTEM

VAPOR PHASE GROWTH METHOD

SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME

CLEANING OPERATIONS BASED ON DEPOSITION THICKNESS

METHODS TO IMPROVE PRODUCTIVITY OF ADVANCED CVD W GAPFILL PROCESS

PROCESSING SYSTEM AND METHODS FOR FORMING VOID-FREE AND SEAM-FREE T...