Cleaning of reactor or parts inside the reactor by using reactive gases

Industry

CPC
C23C16/4405

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Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/4405Cleaning of reactor or parts inside the reactor by using reactive gases

Industries

Patents Grantslast 30 patents

Information Patent Grant
Shielding device and thin-film-deposition equipment with the same
- Patent number 11,972,936
- Issue date Apr 30, 2024
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,972,934
- Issue date Apr 30, 2024
- Kokusai Electric Corporation
- Tomoki Imamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cluster tools, systems, and methods having one or more pressure sta...
- Patent number 11,965,241
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Saurabh Chopra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
- Patent number 11,965,240
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Keigo Nishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treatment of deposition reactor
- Patent number 11,967,488
- Issue date Apr 23, 2024
- ASM IP Holding B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shielding device and thin-film-deposition equipment with the same
- Patent number 11,961,724
- Issue date Apr 16, 2024
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for adjusting position of chamber and plasma process chamber...
- Patent number 11,955,322
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Che Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chambers and methods for cleaning the same
- Patent number 11,952,660
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Nitin Pathak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, cleaning method, and...
- Patent number 11,942,333
- Issue date Mar 26, 2024
- Kokusai Electric Corporation
- Tomihiro Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lids and lid assembly kits for atomic layer deposition chambers
- Patent number 11,932,939
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shielding mechanism and thin-film-deposition equipment using the same
- Patent number 11,929,242
- Issue date Mar 12, 2024
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and processing apparatus
- Patent number 11,926,891
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Masami Oikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for conditioning a processing reactor
- Patent number 11,926,892
- Issue date Mar 12, 2024
- GlobalWafers Co., Ltd.
- Gang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature control method and plasma processing apparatus
- Patent number 11,920,242
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and method of cleaning vacuum processin...
- Patent number 11,901,162
- Issue date Feb 13, 2024
- ULVAC, Inc.
- Takehisa Miyaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High throughput and metal contamination control oven for chamber co...
- Patent number 11,898,245
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Chien-Min Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control device, processing apparatus, and control method
- Patent number 11,894,249
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Masami Oikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vaporizer, substrate processing apparatus and method of manufacturi...
- Patent number 11,873,555
- Issue date Jan 16, 2024
- Kokusai Electric Corporation
- Gen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support cover for high-temperature corrosive environment
- Patent number 11,866,821
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Shuran Sheng
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Vaporizer, substrate processing apparatus, and method of manufactur...
- Patent number 11,866,822
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Hirohisa Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus and manufacturing method of s...
- Patent number 11,859,286
- Issue date Jan 2, 2024
- Kioxia Corporation
- Yuya Matsubara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Valve apparatuses and related methods for reactive process gas isol...
- Patent number 11,854,839
- Issue date Dec 26, 2023
- MKS Instruments, Inc.
- Andrew B. Cowe
- B08 - CLEANING
Information Patent Grant
One-body shadow frame support with flow controller
- Patent number 11,846,019
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Jong Yun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Removing metal contamination from surfaces of a processing chamber
- Patent number 11,842,888
- Issue date Dec 12, 2023
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-temperature chamber and chamber component cleaning and mainten...
- Patent number 11,837,448
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Shuran Sheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, subs...
- Patent number 11,827,979
- Issue date Nov 28, 2023
- Kokusai Electric Corporation
- Keigo Nishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduced defect deposition processes
- Patent number 11,821,082
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Xiaoquan Min
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching method or dry cleaning method
- Patent number 11,814,726
- Issue date Nov 14, 2023
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning, method of manufacturing semiconductor device, s...
- Patent number 11,814,725
- Issue date Nov 14, 2023
- Kokusai Electric Corporation
- Koei Kuribayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactive particles supply system
- Patent number 11,810,765
- Issue date Nov 7, 2023
- Applied Materials Israel Ltd.
- Asaf Gutman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESS SYSTEM AND METHOD OF CLEANING THE SAME
- Publication number 20240141481
- Publication date May 2, 2024
- Samsung Electronics Co., Ltd.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOZZLE FOR REMOTE PLASMA CLEANING OF PROCESS CHAMBERS
- Publication number 20240141482
- Publication date May 2, 2024
- LAM RESEARCH CORPORATION
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR MANUFACTURING SEMICONDUCTOR WAFERS CONTAINING A GAS-PHA...
- Publication number 20240117523
- Publication date Apr 11, 2024
- Siltronic AG
- Thomas Stettner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
- Publication number 20240112896
- Publication date Apr 4, 2024
- LAM RESEARCH CORPORATION
- Jengyi YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUP III-V SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION OF SAME...
- Publication number 20240105450
- Publication date Mar 28, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Yoganand Saripalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240093361
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Gen LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240093372
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Tadashi TAKASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS FOR ENDPOINT DETECTION IN FORELINE OF CHAMBER C...
- Publication number 20240063001
- Publication date Feb 22, 2024
- MKS Instruments, Inc.
- Hongke Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240055230
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Jong Yun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE
- Publication number 20240047185
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Abhijit A. Kangude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240043993
- Publication date Feb 8, 2024
- Kokusai Electric Corporation
- Naonori AKAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...
- Publication number 20240035155
- Publication date Feb 1, 2024
- Kokusai Electric Corporation
- Keigo NISHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORINE BASED CLEANING FOR PLASMA DOPING APPLICATIONS
- Publication number 20240035154
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20240014012
- Publication date Jan 11, 2024
- ASM IP HOLDING B.V.
- Suvi Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...
- Publication number 20240003005
- Publication date Jan 4, 2024
- Kokusai Electric Corporation
- Yasunobu KOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILIT...
- Publication number 20230407478
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Zhepeng CONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
- Publication number 20230402281
- Publication date Dec 14, 2023
- Kokusai Electric Corporation
- Yasunobu Koshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNIFORM IN SITU CLEANING AND DEPOSITION
- Publication number 20230402261
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR ADJUSTING POSITION OF CHAMBER AND PLASMA PROCESS CHAMBER...
- Publication number 20230386805
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Che CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386791
- Publication date Nov 30, 2023
- Tokyo Electron Limited
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF DISPLAY DEVICE AND CVD DEVICE
- Publication number 20230389355
- Publication date Nov 30, 2023
- Japan Display Inc.
- Noriyuki HIRATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD APPARATUS, METHOD AND VALVE
- Publication number 20230383404
- Publication date Nov 30, 2023
- Picosun Oy
- Marko PUDAS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOWER DEPOSITION CHAMBER CCP ELECTRODE CLEANING SOLUTION
- Publication number 20230377855
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Mukesh Shivakumaraiah CHITRADURGA
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20230366081
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ker-hsun LIAO
- B08 - CLEANING
Information Patent Application
METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER
- Publication number 20230343586
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Anup Kumar SINGH
- B08 - CLEANING
Information Patent Application
VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP
- Publication number 20230317437
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND...
- Publication number 20230313371
- Publication date Oct 5, 2023
- Kokusai Electric Corporation
- Naoya MIYASHITA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230304149
- Publication date Sep 28, 2023
- Kokusai Electric Corporation
- Kenichi SUZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING ACCRETION IN SEMICONDUCTOR PROC...
- Publication number 20230307255
- Publication date Sep 28, 2023
- ASM IP HOLDING, B.V.
- Gregory Deye
- B08 - CLEANING
Information Patent Application
PROCESSING CHAMBER CONDITION AND PROCESS STATE MONITORING USING OPT...
- Publication number 20230304150
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Patrick Tae
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Cleaning of reactor or parts inside the reactor by using reactive gases

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Shielding device and thin-film-deposition equipment with the same

Method of manufacturing semiconductor device, substrate processing...

Cluster tools, systems, and methods having one or more pressure sta...

Cleaning method, method of manufacturing semiconductor device, and...

Method for treatment of deposition reactor

Shielding device and thin-film-deposition equipment with the same

Device for adjusting position of chamber and plasma process chamber...

Semiconductor processing chambers and methods for cleaning the same

Method of manufacturing semiconductor device, cleaning method, and...

Lids and lid assembly kits for atomic layer deposition chambers

Shielding mechanism and thin-film-deposition equipment using the same

Cleaning method and processing apparatus

Methods for conditioning a processing reactor

Temperature control method and plasma processing apparatus

Vacuum processing apparatus and method of cleaning vacuum processin...

High throughput and metal contamination control oven for chamber co...

Control device, processing apparatus, and control method

Vaporizer, substrate processing apparatus and method of manufacturi...

Substrate support cover for high-temperature corrosive environment

Vaporizer, substrate processing apparatus, and method of manufactur...

Semiconductor manufacturing apparatus and manufacturing method of s...

Valve apparatuses and related methods for reactive process gas isol...

One-body shadow frame support with flow controller

Removing metal contamination from surfaces of a processing chamber

High-temperature chamber and chamber component cleaning and mainten...

Cleaning method, method of manufacturing semiconductor device, subs...

Reduced defect deposition processes

Dry etching method or dry cleaning method

Method of cleaning, method of manufacturing semiconductor device, s...

Reactive particles supply system

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESS SYSTEM AND METHOD OF CLEANING THE SAME

NOZZLE FOR REMOTE PLASMA CLEANING OF PROCESS CHAMBERS

PROCESS FOR MANUFACTURING SEMICONDUCTOR WAFERS CONTAINING A GAS-PHA...

REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

GROUP III-V SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION OF SAME...

VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICON...

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

METHODS AND SYSTEMS FOR ENDPOINT DETECTION IN FORELINE OF CHAMBER C...

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...

FLUORINE BASED CLEANING FOR PLASMA DOPING APPLICATIONS

METHOD FOR TREATMENT OF DEPOSITION REACTOR

CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...

PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILIT...

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...

UNIFORM IN SITU CLEANING AND DEPOSITION

DEVICE FOR ADJUSTING POSITION OF CHAMBER AND PLASMA PROCESS CHAMBER...

PLASMA PROCESSING APPARATUS

MANUFACTURING METHOD OF DISPLAY DEVICE AND CVD DEVICE

ALD APPARATUS, METHOD AND VALVE

LOWER DEPOSITION CHAMBER CCP ELECTRODE CLEANING SOLUTION

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER

VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP

CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND...

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SYSTEMS AND METHODS FOR CONTROLLING ACCRETION IN SEMICONDUCTOR PROC...

PROCESSING CHAMBER CONDITION AND PROCESS STATE MONITORING USING OPT...