Cleaning

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CPC
H01L21/02041

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02041Cleaning

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Humidity control in semiconductor systems
- Patent number 12,148,642
- Issue date Nov 19, 2024
- Brooks Automation (Germany) GmbH
- Lutz Rebstock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus for component for semiconductor production appar...
- Patent number 12,139,788
- Issue date Nov 12, 2024
- Taiyo Nippon Sanso Corporation
- Akira Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,138,667
- Issue date Nov 12, 2024
- Semes Co., Ltd.
- Shi Hyun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning composition, method for cleaning substrate using...
- Patent number 12,046,464
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Ga Young Song
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor manufacturing apparatus and method of manufacturing s...
- Patent number 12,027,380
- Issue date Jul 2, 2024
- TOSHIBA MEMORY CORPORATION
- Tomohiko Sugita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to clean SnO2 film from chamber
- Patent number 11,915,923
- Issue date Feb 27, 2024
- Lam Research Corporation
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, processing container cleaning method, an...
- Patent number 11,865,590
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Kyoko Ikeda
- B08 - CLEANING
Information Patent Grant
Method of cleaning an apparatus that processes a substrate
- Patent number 11,823,915
- Issue date Nov 21, 2023
- Semes Co., Ltd.
- Jintack Yu
- B08 - CLEANING
Information Patent Grant
Solution, method of forming resist pattern, and semiconductor devic...
- Patent number 11,822,250
- Issue date Nov 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Iida
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor manufacturing apparatus and semiconductor manufacturi...
- Patent number 11,791,174
- Issue date Oct 17, 2023
- Mitsubishi Electric Corporation
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tonneau system for use with a pickup truck
- Patent number 11,780,305
- Issue date Oct 10, 2023
- WorkSport Ltd.
- Steven Rossi
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Substrate cleaning apparatus
- Patent number 11,761,075
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Yukimasa Saito
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and apparatus cleaning method
- Patent number 11,745,213
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Hidemasa Aratake
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate cleaning devices and methods thereof
- Patent number 11,745,227
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Steven M. Zuniga
- B08 - CLEANING
Information Patent Grant
System and method for fluid preparation
- Patent number 11,724,236
- Issue date Aug 15, 2023
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Chang-Hyeon Nam
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Post-CMP cleaning composition for germanium-containing substrate
- Patent number 11,718,812
- Issue date Aug 8, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ji Cui
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Pressure control strategies to provide uniform treatment streams in...
- Patent number 11,707,770
- Issue date Jul 25, 2023
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Kevin Siefering
- B08 - CLEANING
Information Patent Grant
Acoustic measurement of fabrication equipment clearance
- Patent number 11,709,153
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jun-Hao Deng
- B08 - CLEANING
Information Patent Grant
Method of manufacturing a resin-sealed semiconductor device
- Patent number 11,705,344
- Issue date Jul 18, 2023
- Renesas Electronics Corporation
- Masakatsu Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dilute chemical solution production device
- Patent number 11,667,515
- Issue date Jun 6, 2023
- Kurita Water Industries Ltd.
- Yuuya Sasaki
- B67 - OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS LIQUID...
Information Patent Grant
Cleaning method of glass substrate, manufacturing method of semicon...
- Patent number 11,637,009
- Issue date Apr 25, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus with moving device for connecting an...
- Patent number 11,637,035
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Satoshi Morita
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus including periphery cover body
- Patent number 11,551,945
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Katsuhiro Morikawa
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method
- Patent number 11,551,941
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Koji Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a semiconductor device including etching of a meta...
- Patent number 11,515,169
- Issue date Nov 29, 2022
- HITACHI HIGH-TECH CORPORATION
- Yoshihide Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate cleaning method, processing container cleaning method, an...
- Patent number 11,504,751
- Issue date Nov 22, 2022
- Tokyo Electron Limited
- Kyoko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for cleaning semiconductor substrates
- Patent number 11,498,100
- Issue date Nov 15, 2022
- ACM Research (Shanghai) Inc.
- Hui Wang
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,482,428
- Issue date Oct 25, 2022
- Tokyo Electron Limited
- Nobuhiko Mouri
- B08 - CLEANING
Information Patent Grant
Cleaning solution and method of cleaning wafer
- Patent number 11,456,170
- Issue date Sep 27, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning method of semiconductor manufacturing device
- Patent number 11,434,565
- Issue date Sep 6, 2022
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Acoustic Measurement of Fabrication Equipment Clearance
- Publication number 20240377364
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jun-Hao Deng
- B08 - CLEANING
Information Patent Application
ULTRAPURE WATER PRODUCTION SYSTEM, SEMICONDUCTOR PROCESSING SYSTEM...
- Publication number 20240317622
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Juhui PARK
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
CLEANING SOLUTION AND METHOD OF CLEANING WAFER
- Publication number 20240297036
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
VAPOR PHASE GROWTH METHOD
- Publication number 20240271273
- Publication date Aug 15, 2024
- NUFLARE TECHNOLOGY, INC.
- Ichiro MIZUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
- Publication number 20240178012
- Publication date May 30, 2024
- SCREEN Holdings Co., Ltd.
- Katsuya AKIYAMA
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20240071818
- Publication date Feb 29, 2024
- UNITED MICROELECTRONICS CORP.
- I-Wei Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TONNEAU SYSTEM FOR USE WITH A PICKUP TRUCK
- Publication number 20230391174
- Publication date Dec 7, 2023
- WORKSPORT LTD.
- Steven ROSSI
- B60 - VEHICLES IN GENERAL
Information Patent Application
IN-SITU INTEGRATED WAFER PARAMETER DETECTION SYSTEM
- Publication number 20230378006
- Publication date Nov 23, 2023
- Shuran SHENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Acoustic Measurement of Fabrication Equipment Clearance
- Publication number 20230366857
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jun-Hao Deng
- B08 - CLEANING
Information Patent Application
CLEANING METHOD OF GLASS SUBSTRATE, MANUFACTURING METHOD OF SEMICON...
- Publication number 20230260778
- Publication date Aug 17, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method for Purifying Hydrogen Peroxide
- Publication number 20230242400
- Publication date Aug 3, 2023
- OCI COMPANY LTD.
- Deokyun Kim
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF WASHING SEM...
- Publication number 20230243780
- Publication date Aug 3, 2023
- FUJIFILM CORPORATION
- Akihiko OHTSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...
- Publication number 20230063907
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- B08 - CLEANING
Information Patent Application
TEMPERATURE CONTROLLABLE BONDER EQUIPMENT FOR SUBSTRATE BONDING
- Publication number 20230067088
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Han-De CHEN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CLEANING SOLUTION AND METHOD OF CLEANING WAFER
- Publication number 20220351963
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE CLEANING COMPOSITION, METHOD FOR CLEANING SUBSTRATE USING...
- Publication number 20220336206
- Publication date Oct 20, 2022
- DONGJIN SEMICHEM CO., LTD.
- Ga Young SONG
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20220297167
- Publication date Sep 22, 2022
- SEMES CO., LTD.
- SHI HYUN PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD INCL...
- Publication number 20220181169
- Publication date Jun 9, 2022
- SEMES CO., LTD.
- Seung Tae YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SOLUTION SUPPLY DEVICE
- Publication number 20220105478
- Publication date Apr 7, 2022
- EBARA CORPORATION
- Suguru OZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220068668
- Publication date Mar 3, 2022
- RENESAS ELECTRONICS CORPORATION
- Masakatsu SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220056590
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Satoshi Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE GROWTH METHOD
- Publication number 20220056577
- Publication date Feb 24, 2022
- NUFLARE TECHNOLOGY, INC.
- Ichiro MIZUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning Fluid, Method of Cleaning Semiconductor Wafer, and Method...
- Publication number 20220028681
- Publication date Jan 27, 2022
- MITSUBISHI CHEMICAL CORPORATION
- Toshiaki Shibata
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING APPARATUS FOR COMPONENT FOR SEMICONDUCTOR PRODUCTION APPAR...
- Publication number 20220002864
- Publication date Jan 6, 2022
- Taiyo Nippon Sanso Corporation
- Akira YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...
- Publication number 20220001426
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20210398825
- Publication date Dec 23, 2021
- Toshiba Memory Corporation
- Tomohiko SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-CMP CLEANING COMPOSITION FOR GERMANIUM- CONTAINING SUBSTRATE
- Publication number 20210371774
- Publication date Dec 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ji CUI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20210335622
- Publication date Oct 28, 2021
- HITACHI HIGH-TECH CORPORATION
- Yoshihide Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATES
- Publication number 20210138513
- Publication date May 13, 2021
- ACM Research (Shanghai) Inc.
- Hui Wang
- B08 - CLEANING
Information Patent Application
CLEANING AGENT COMPOSITION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE
- Publication number 20210130739
- Publication date May 6, 2021
- KAO CORPORATION
- Daisuke KAYAKUBO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Humidity control in semiconductor systems

Cleaning apparatus for component for semiconductor production appar...

Apparatus for treating substrate

Substrate cleaning composition, method for cleaning substrate using...

Semiconductor manufacturing apparatus and method of manufacturing s...

Method to clean SnO2 film from chamber

Substrate cleaning method, processing container cleaning method, an...

Method of cleaning an apparatus that processes a substrate

Solution, method of forming resist pattern, and semiconductor devic...

Semiconductor manufacturing apparatus and semiconductor manufacturi...

Tonneau system for use with a pickup truck

Substrate cleaning apparatus

Substrate processing apparatus and apparatus cleaning method

Substrate cleaning devices and methods thereof

System and method for fluid preparation

Post-CMP cleaning composition for germanium-containing substrate

Pressure control strategies to provide uniform treatment streams in...

Acoustic measurement of fabrication equipment clearance

Method of manufacturing a resin-sealed semiconductor device

Dilute chemical solution production device

Cleaning method of glass substrate, manufacturing method of semicon...

Substrate processing apparatus with moving device for connecting an...

Substrate processing apparatus including periphery cover body

Substrate cleaning method

Method of making a semiconductor device including etching of a meta...

Substrate cleaning method, processing container cleaning method, an...

Apparatus for cleaning semiconductor substrates

Substrate processing apparatus and substrate processing method

Cleaning solution and method of cleaning wafer

Cleaning method of semiconductor manufacturing device

Patents Applicationslast 30 patents

Acoustic Measurement of Fabrication Equipment Clearance

ULTRAPURE WATER PRODUCTION SYSTEM, SEMICONDUCTOR PROCESSING SYSTEM...

CLEANING SOLUTION AND METHOD OF CLEANING WAFER

VAPOR PHASE GROWTH METHOD

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

TONNEAU SYSTEM FOR USE WITH A PICKUP TRUCK

IN-SITU INTEGRATED WAFER PARAMETER DETECTION SYSTEM

Acoustic Measurement of Fabrication Equipment Clearance

CLEANING METHOD OF GLASS SUBSTRATE, MANUFACTURING METHOD OF SEMICON...

Method for Purifying Hydrogen Peroxide

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF WASHING SEM...

SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...

TEMPERATURE CONTROLLABLE BONDER EQUIPMENT FOR SUBSTRATE BONDING

CLEANING SOLUTION AND METHOD OF CLEANING WAFER

SUBSTRATE CLEANING COMPOSITION, METHOD FOR CLEANING SUBSTRATE USING...

APPARATUS FOR TREATING SUBSTRATE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD INCL...

GAS SOLUTION SUPPLY DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

VAPOR PHASE GROWTH METHOD

Cleaning Fluid, Method of Cleaning Semiconductor Wafer, and Method...

CLEANING APPARATUS FOR COMPONENT FOR SEMICONDUCTOR PRODUCTION APPAR...

SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

POST-CMP CLEANING COMPOSITION FOR GERMANIUM- CONTAINING SUBSTRATE

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATES

CLEANING AGENT COMPOSITION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE