Coating on a rotating support

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CPC
G03F7/162

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/162Coating on a rotating support

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Solvent annealing of an organic planarization layer
- Patent number 12,362,168
- Issue date Jul 15, 2025
- International Business Machines Corporation
- Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for coating photo resist over a substrate
- Patent number 12,362,179
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Hung Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cup, liquid processing apparatus, and liquid processing method
- Patent number 12,358,016
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Ryunosuke Higashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,353,120
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Che Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid supplying device
- Patent number 12,343,754
- Issue date Jul 1, 2025
- Koganei Corporation
- Takeo Yajima
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Method of manufacturing a master for a replication process
- Patent number 12,346,024
- Issue date Jul 1, 2025
- AMS-OSRAM ASIA PACIFIC PTE. LTD.
- Ji Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,347,683
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bubble measurement unit, substrate treating apparatus including the...
- Patent number 12,320,735
- Issue date Jun 3, 2025
- Semes Co., Ltd.
- Jung Suk Goh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support member, substrate treatment apparatus, and substr...
- Patent number 12,321,098
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Hitoshi Hashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment condition setting method, storage medium, and substrate t...
- Patent number 12,314,023
- Issue date May 27, 2025
- Tokyo Electron Limited
- Takuya Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adhesion layer for multi-layer photoresist
- Patent number 12,292,684
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,292,685
- Issue date May 6, 2025
- SCREEN Holdings Co., Ltd.
- Jun Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and/or system for coating a substrate
- Patent number 12,283,499
- Issue date Apr 22, 2025
- Service Support Specialties, Inc
- Gary Hillman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Developing method and apparatus
- Patent number 12,276,914
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Helei Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 12,265,327
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Hai Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning jig, coating apparatus, and cleaning method
- Patent number 12,257,611
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Satoshi Shimmura
- B08 - CLEANING
Information Patent Grant
Apparatus for manufacturing semiconductor device
- Patent number 12,252,791
- Issue date Mar 18, 2025
- Denso Corporation
- Hiroaki Fujibayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for real-time quality control of a film in a sp...
- Patent number 12,255,110
- Issue date Mar 18, 2025
- Samsung Electronics Co., Ltd.
- Gaurav Kumar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing monitoring apparatus based on imaging video da...
- Patent number 12,244,972
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Yuichiro Kunugimoto
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor developer tool and methods of operation
- Patent number 12,235,582
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,235,581
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Min Jung Park
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 12,234,369
- Issue date Feb 25, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,228,861
- Issue date Feb 18, 2025
- Semes Co., Ltd.
- Ki Sang Eum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating method and coating apparatus
- Patent number 12,216,406
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Yusaku Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display device and manufacturing method thereof
- Patent number 12,218,153
- Issue date Feb 4, 2025
- Au Optronics Corporation
- Wen-Ching Sung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WAFER HOLDER APPARATUS, SYSTEM AND METHOD OF FORMING SAME
- Publication number 20250231490
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Heng-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...
- Publication number 20250231492
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDGE BEAD REMOVAL METHOD, SUBSTRATE TREATMENT APPARATUS PERFORMING...
- Publication number 20250216787
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sung Gyu LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUCT STRUCTURE, STOCKER, AND PHOTORESIST BOTTLE MANAGEMENT FACILITIES
- Publication number 20250216100
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sang Hoon KIM
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...
- Publication number 20250172869
- Publication date May 29, 2025
- NISSAN CHEMICAL CORPORATION
- Shunsuke MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20250172879
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250172883
- Publication date May 29, 2025
- A Rah CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...
- Publication number 20250164874
- Publication date May 22, 2025
- The Research Foundation for the State University of New York
- Robert Brainard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155800
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SPIN COATING APPARATUS
- Publication number 20250155814
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Chulmin Cho
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR DEVELOPER TOOL AND METHODS OF OPERATION
- Publication number 20250155815
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155801
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...
- Publication number 20250155799
- Publication date May 15, 2025
- Samsung SDI Co., Ltd.
- Soobin LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polymer, Positive And Negative Photosensitive Resin Compositions, P...
- Publication number 20250147420
- Publication date May 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250130493
- Publication date Apr 24, 2025
- Samsung SDI Co., Ltd.
- Eunsu LEE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250123568
- Publication date Apr 17, 2025
- Samsung SDI Co., Ltd.
- Seung HAN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LIQUID PROCESSING APPARATUS, AND MONITORING METHOD
- Publication number 20250112066
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Shinichi MIZUSHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...
- Publication number 20250110409
- Publication date Apr 3, 2025
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY DEVELOPMENT OF RESISTS
- Publication number 20250112045
- Publication date Apr 3, 2025
- LAM RESEARCH CORPORATION
- Boris Volosskiy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER SOLUBLE PROTECTIVE COATINGS FOR ENGINEERED OPTICAL DEVICES
- Publication number 20250093780
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Amit Kumar ROY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250095989
- Publication date Mar 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...
- Publication number 20250085627
- Publication date Mar 13, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...
- Publication number 20250087443
- Publication date Mar 13, 2025
- Saudi Arabian Oil Company
- Dong Kyu Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD
- Publication number 20250060671
- Publication date Feb 20, 2025
- ASM IP HOLDING B.V.
- Ivo Raaijmakers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
- Publication number 20250051501
- Publication date Feb 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Minoru Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IMPRINT LITHOGRAPHY DEFECT MITIGATION METHOD AND MASKED IMPRINT LIT...
- Publication number 20250053081
- Publication date Feb 13, 2025
- LEIA INC.
- Kevin Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250053086
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- MADHUR SACHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...
- Publication number 20250054759
- Publication date Feb 13, 2025
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- H01 - BASIC ELECTRIC ELEMENTS

Coating on a rotating support

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Solvent annealing of an organic planarization layer

Method and apparatus for coating photo resist over a substrate

Cup, liquid processing apparatus, and liquid processing method

EUV photo masks and manufacturing method thereof

Liquid supplying device

Method of manufacturing a master for a replication process

Method of manufacturing a semiconductor device

Bubble measurement unit, substrate treating apparatus including the...

Substrate support member, substrate treatment apparatus, and substr...

Treatment condition setting method, storage medium, and substrate t...

Adhesion layer for multi-layer photoresist

Substrate processing apparatus

Method and/or system for coating a substrate

Organotin oxide hydroxide patterning compositions, precursors, and...

Developing method and apparatus

Semiconductor manufacturing apparatus and method thereof

Cleaning jig, coating apparatus, and cleaning method

Apparatus for manufacturing semiconductor device

Methods and systems for real-time quality control of a film in a sp...

Substrate processing monitoring apparatus based on imaging video da...

Semiconductor developer tool and methods of operation

Method and apparatus for treating substrate

Photoresist topcoat compositions and methods of processing photores...

Pattern formation methods

Apparatus for treating substrate

Solution, solution storage body, actinic ray-sensitive or radiation...

Coating composition for forming resist underlayer film for EUV lith...

Coating method and coating apparatus

Semiconductor manufacturing system, method of manufacturing a semic...

Display device and manufacturing method thereof

Patents Applicationslast 30 patents

WAFER HOLDER APPARATUS, SYSTEM AND METHOD OF FORMING SAME

MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

EDGE BEAD REMOVAL METHOD, SUBSTRATE TREATMENT APPARATUS PERFORMING...

DUCT STRUCTURE, STOCKER, AND PHOTORESIST BOTTLE MANAGEMENT FACILITIES

WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

EXHAUST DEVICE AND SUBSTRATE PROCESSING APPARATUS

LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SPIN COATING APPARATUS

SEMICONDUCTOR DEVELOPER TOOL AND METHODS OF OPERATION

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...

Polymer, Positive And Negative Photosensitive Resin Compositions, P...

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

LIQUID PROCESSING APPARATUS, AND MONITORING METHOD

SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...

DRY DEVELOPMENT OF RESISTS

WATER SOLUBLE PROTECTIVE COATINGS FOR ENGINEERED OPTICAL DEVICES

Composition For Forming Organic Film, Method For Forming Organic Fi...

ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...

NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...

SUBSTRATE PROCESSING APPARATUS AND METHOD

RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

IMPRINT LITHOGRAPHY DEFECT MITIGATION METHOD AND MASKED IMPRINT LIT...

POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS

METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...