Components associated with high voltage supply

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CPC
H01J37/248

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/248Components associated with high voltage supply

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,125,672
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,996,271
- Issue date May 28, 2024
- Tokyo Electron Limited
- Satoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Common substrate and shadow ring lift apparatus
- Patent number 11,881,375
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Abhishek Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,742,180
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,728,124
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic ESC bias compensation when using pulsed DC bias
- Patent number 11,476,145
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,348,758
- Issue date May 31, 2022
- HITACHI HIGH-TECH CORPORATION
- Anoru Suga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and electron beam application device
- Patent number 11,227,740
- Issue date Jan 18, 2022
- HITACHI HIGH-TECH CORPORATION
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosecond pulser bias compensation
- Patent number 11,222,767
- Issue date Jan 11, 2022
- Eagle Harbor Technologies, Inc.
- Timothy Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 11,145,493
- Issue date Oct 12, 2021
- Tokyo Electron Limited
- Satoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam generator and charged particle beam apparatus
- Patent number 11,139,139
- Issue date Oct 5, 2021
- Hitaclii High-Tech Corporation
- Hiroshi Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Noise reduction of a high voltage supply voltage
- Patent number 11,101,105
- Issue date Aug 24, 2021
- Applied Materials Israel Ltd.
- Denys Mets
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,069,504
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite charged particle beam apparatus and control method thereof
- Patent number 11,017,982
- Issue date May 25, 2021
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with multiple configurations
- Patent number 10,896,799
- Issue date Jan 19, 2021
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method to monitor glitch energy
- Patent number 10,770,261
- Issue date Sep 8, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Larry G. Nelson
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Plasma delivery system for modulated plasma systems
- Patent number 10,720,305
- Issue date Jul 21, 2020
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filament power supply for electron accelerator and electron acceler...
- Patent number 10,694,616
- Issue date Jun 23, 2020
- Jinsheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 10,685,807
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an imaging system
- Patent number 10,614,993
- Issue date Apr 7, 2020
- Frederick A. Flitsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of arc detection using dynamic threshold
- Patent number 10,515,780
- Issue date Dec 24, 2019
- Axcelis Technologies, Inc.
- Yusef Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage feedthrough assembly, time-resolved transmission elect...
- Patent number 10,366,861
- Issue date Jul 30, 2019
- Max-Planck Gesellschaft zur Foerderung der Wissenschaften e.V.
- Julian Hirscht
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 10,312,048
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,304,654
- Issue date May 28, 2019
- Hitachi High-Technologies Corporation
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device provided with ion pump
- Patent number 10,121,631
- Issue date Nov 6, 2018
- Hitachi High-Technologies Corporation
- Masazumi Tone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage generation circuit
- Patent number 10,097,104
- Issue date Oct 9, 2018
- SMC Corporation
- Naoto Sasada
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Charged particle beam device and installation method
- Patent number 10,008,361
- Issue date Jun 26, 2018
- Hitachi High-Technologies Corporation
- Shuhei Yabu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage electron beam system and method
- Patent number 9,911,571
- Issue date Mar 6, 2018
- Applied Materials Israel Ltd.
- Yosef Basson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact, configurable power supply for energizing ozone-producing c...
- Patent number 9,865,426
- Issue date Jan 9, 2018
- MKS Instruments, Inc.
- Ken Tran
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Analytical apparatus, sample holder and analytical method
- Patent number 9,734,985
- Issue date Aug 15, 2017
- Kabushiki Kaisha Toshiba
- Haruko Akutsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for Magnetron Sputtering
- Publication number 20240404806
- Publication date Dec 5, 2024
- Melec GmbH
- Günter Mark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Voltage Insulating Structure, Charged Particle Gun, and Charge...
- Publication number 20240242917
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- Yasuchika SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
- Publication number 20240038486
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ching Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230360882
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC High-Voltage Source Device and Charged Particle Beam Device
- Publication number 20230353056
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Tomoyo SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Ion Energy Distribution Functions (IEDF)
- Publication number 20230352264
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230268158
- Publication date Aug 24, 2023
- Hitachi High-Tech Corporation
- Hideki TSUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE FEEDTHROUGH AND CONNECTOR FOR A CHARGED PARTICLE APPAR...
- Publication number 20230238736
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Boudewijn Weijert Herman Jan VAN DER KROON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Voltage Amplifier Circuit and Analyzer Apparatus
- Publication number 20230148109
- Publication date May 11, 2023
- JEOL Ltd.
- Masahiro Arimitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMMON SUBSTRATE AND SHADOW RING LIFT APPARATUS
- Publication number 20220336182
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Abhishek CHOWDHURY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Supply Module and Charged Particle Beam Device
- Publication number 20220319795
- Publication date Oct 6, 2022
- Hitachi High-Tech Corporation
- Ryo Kadoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT DEVICE FOR PULSED ELECTRIC FIELDS IN A TREATMENT CELL
- Publication number 20220028646
- Publication date Jan 27, 2022
- Deutsches Institut fur Lebensmitteltechnik e.V.
- Tobias Kleemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210407767
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Satoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20210391143
- Publication date Dec 16, 2021
- Hitachi High-Tech Corporation
- Anoru SUGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20210343496
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Generator and Charged Particle Beam Apparatus
- Publication number 20210257178
- Publication date Aug 19, 2021
- Hitachi High-Tech Corporation
- Hiroshi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210020407
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20200312622
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Satoshi Tanaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTRON GUN AND ELECTRON BEAM APPLICATION DEVICE
- Publication number 20200266020
- Publication date Aug 20, 2020
- Hitachi High-Technologies Corporation
- Soichiro MATSUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20200266029
- Publication date Aug 20, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20200266022
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER BIAS COMPENSATION
- Publication number 20200227230
- Publication date Jul 16, 2020
- Eagle Harbor Technologies, Inc.
- Timothy Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DELIVERY SYSTEM FOR MODULATED PLASMA SYSTEMS
- Publication number 20200203119
- Publication date Jun 25, 2020
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATIC ESC BIAS COMPENSATION WHEN USING PULSED DC BIAS
- Publication number 20200161155
- Publication date May 21, 2020
- Applied Materials, Inc.
- James ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Treatment Device for Contactlessly Supplying HF Voltage to a...
- Publication number 20200111647
- Publication date Apr 9, 2020
- MEYER BURGER (GERMANY) GMBH
- Hermann Schlemm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20190259562
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System And Method To Monitor Glitch Energy
- Publication number 20190189390
- Publication date Jun 20, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Larry G. Nelson
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20180166249
- Publication date Jun 14, 2018
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE PROVIDED WITH ION PUMP
- Publication number 20180158648
- Publication date Jun 7, 2018
- Hitachi High-Technologies Corporation
- Masazumi TONE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE ELECTRON BEAM SYSTEM AND METHOD
- Publication number 20170309442
- Publication date Oct 26, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Yosef Basson
- H01 - BASIC ELECTRIC ELEMENTS

Components associated with high voltage supply

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Common substrate and shadow ring lift apparatus

Plasma processing method and plasma processing apparatus

Creating ion energy distribution functions (IEDF)

Automatic ESC bias compensation when using pulsed DC bias

Charged particle beam device

Electron gun and electron beam application device

Nanosecond pulser bias compensation

Plasma etching apparatus and plasma etching method

Charged particle beam generator and charged particle beam apparatus

Noise reduction of a high voltage supply voltage

Creating ion energy distribution functions (IEDF)

Composite charged particle beam apparatus and control method thereof

Ion source with multiple configurations

System and method to monitor glitch energy

Plasma delivery system for modulated plasma systems

Filament power supply for electron accelerator and electron acceler...

Creating ion energy distribution functions (IEDF)

Method and apparatus for an imaging system

System and method of arc detection using dynamic threshold

High voltage feedthrough assembly, time-resolved transmission elect...

Creating ion energy distribution functions (IEDF)

Charged particle beam device

Charged particle beam device provided with ion pump

High voltage generation circuit

Charged particle beam device and installation method

High voltage electron beam system and method

Compact, configurable power supply for energizing ozone-producing c...

Analytical apparatus, sample holder and analytical method

Patents Applicationslast 30 patents

Method for Magnetron Sputtering

High-Voltage Insulating Structure, Charged Particle Gun, and Charge...

METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

DC High-Voltage Source Device and Charged Particle Beam Device

Creating Ion Energy Distribution Functions (IEDF)

Charged Particle Beam Apparatus

HIGH VOLTAGE FEEDTHROUGH AND CONNECTOR FOR A CHARGED PARTICLE APPAR...

High Voltage Amplifier Circuit and Analyzer Apparatus

COMMON SUBSTRATE AND SHADOW RING LIFT APPARATUS

Power Supply Module and Charged Particle Beam Device

COMPACT DEVICE FOR PULSED ELECTRIC FIELDS IN A TREATMENT CELL

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Charged Particle Beam Device

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

Charged Particle Beam Generator and Charged Particle Beam Apparatus

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

ELECTRON GUN AND ELECTRON BEAM APPLICATION DEVICE

COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

NANOSECOND PULSER BIAS COMPENSATION

PLASMA DELIVERY SYSTEM FOR MODULATED PLASMA SYSTEMS

AUTOMATIC ESC BIAS COMPENSATION WHEN USING PULSED DC BIAS

Plasma-Treatment Device for Contactlessly Supplying HF Voltage to a...

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

System And Method To Monitor Glitch Energy

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

CHARGED PARTICLE BEAM DEVICE PROVIDED WITH ION PUMP

HIGH VOLTAGE ELECTRON BEAM SYSTEM AND METHOD