comprising an air gap

Industry

CPC
H01L29/4991

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier

Current Industry

H01L29/4991comprising an air gap

Industries

Patents Grantslast 30 patents

Information Patent Grant
Air gap spacer formation for nano-scale semiconductor devices
- Patent number 12,224,203
- Issue date Feb 11, 2025
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact architecture for capacitance reduction and satisfactory con...
- Patent number 12,224,326
- Issue date Feb 11, 2025
- Intel Corporation
- Rishabh Mehandru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure cutting process and structures formed thereby
- Patent number 12,218,130
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate air spacer for fin-like field effect transistor
- Patent number 12,211,922
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Ning Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,206,007
- Issue date Jan 21, 2025
- United Microelectronics Corp.
- Wen-Wen Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device with capped air-gap spacer
- Patent number 12,191,373
- Issue date Jan 7, 2025
- Samsung Electronics Co., Ltd.
- Sangkoo Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,183,805
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zhi-Qiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies having vertically-spaced channel material seg...
- Patent number 12,185,544
- Issue date Dec 31, 2024
- John D. Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 12,176,412
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Yao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with an air gap and method of forming the same
- Patent number 12,176,440
- Issue date Dec 24, 2024
- Winbond Electronics Corp.
- Shang-Rong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit with doped low-k sidewall spacers for gate stacks
- Patent number 12,136,658
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual gate structures for semiconductor devices
- Patent number 12,132,108
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Chih Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SRAM speed and margin optimization via spacer tuning
- Patent number 12,101,921
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Hao Lin
- G11 - INFORMATION STORAGE
Information Patent Grant
Air spacer formation with a spin-on dielectric material
- Patent number 12,094,952
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including gas spacers and method of manufacture
- Patent number 12,068,389
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate spacer structure and method of forming same
- Patent number 12,062,709
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Ting Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having air gap between gate electrode and sour...
- Patent number 12,046,632
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Haejun Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-gate device and related methods
- Patent number 12,040,383
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Lin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating cap on contact structure
- Patent number 12,040,225
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Chiang Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with air gate spacer and air gate cap
- Patent number 12,027,606
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Chi Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacers around contact plugs and method forming same
- Patent number 12,015,071
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosheet field-effect transistor device and method of forming
- Patent number 12,009,407
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Kai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air gap seal for interconnect air gap and method of fabricating the...
- Patent number 11,996,353
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Xusheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air gap in inner spacers and methods of fabricating the same in fie...
- Patent number 11,990,529
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien Ning Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming air spacers in semiconductor devices
- Patent number 11,955,535
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon carbide oxide hard mask for reducing dishing effects
- Patent number 11,935,942
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Lun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid-state image-capturing element having floation diffusion and h...
- Patent number 11,929,380
- Issue date Mar 12, 2024
- SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Yusuke Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,929,419
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Yin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a FinFET by implanting a dielectric with a...
- Patent number 11,901,455
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual gate structures for semiconductor devices
- Patent number 11,894,459
- Issue date Feb 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Chih Su
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INVERTED GATE CUT REGION
- Publication number 20240420959
- Publication date Dec 19, 2024
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Gate Structures For Semiconductor Devices
- Publication number 20240387726
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Chih SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices with Air Gaps and the Method Thereof
- Publication number 20240379813
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ko-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SRAM SPEED AND MARGIN OPTIMIZATION VIA SPACER TUNING
- Publication number 20240373614
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Hao Lin
- G11 - INFORMATION STORAGE
Information Patent Application
AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL
- Publication number 20240363722
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Ting CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES WITH AIR GATE SPACER AND AIR GATE CAP
- Publication number 20240347625
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Chi Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-GATE DEVICE AND RELATED METHODS
- Publication number 20240347627
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Lin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING CAP ON CONTACT STRUCTURE
- Publication number 20240339356
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Chiang TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Gap Seal for Interconnect Air Gap and Method of Fabricating The...
- Publication number 20240312876
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Xusheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR GAP IN INNER SPACERS AND METHODS OF FABRICATING THE SAME IN FIE...
- Publication number 20240313082
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien Ning Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSHEET FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING
- Publication number 20240297237
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Kai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR SPACERS AROUND CONTACT PLUGS AND METHOD FORMING SAME
- Publication number 20240297235
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR SPACERS FOR SEMICONDUCTOR DEVICES
- Publication number 20240250151
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Chia-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20240234543
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- HYUN-KWAN YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR
- Publication number 20240234535
- Publication date Jul 11, 2024
- AUO Corporation
- Kuo-Jui Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC GAS SPACER FORMATION FOR REDUCING PARASITIC CAPACITANCE...
- Publication number 20240194760
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES WITH CAVITY SPACERS
- Publication number 20240186398
- Publication date Jun 6, 2024
- Intel Corporation
- Aaron D. LILAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240178300
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Yin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON CARBIDE OXIDE HARD MASK FOR REDUCING DISHING EFFECTS
- Publication number 20240170557
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Lun CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS
- Publication number 20240145234
- Publication date May 2, 2024
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A FINFET BY IMPLANTING A DIELECTRIC WITH A...
- Publication number 20240145596
- Publication date May 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR
- Publication number 20240136420
- Publication date Apr 25, 2024
- AUO Corporation
- Kuo-Jui Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR AIR GAP INNER SPACER IN GATE-ALL-AROUND DE...
- Publication number 20240128376
- Publication date Apr 18, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Chiang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Structure Cutting Process and Structures Formed Thereby
- Publication number 20240113113
- Publication date Apr 4, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE OF TWO-DIMENSIONAL MATERIAL-BASED DEVICE HAVING AIR-GAP A...
- Publication number 20240105821
- Publication date Mar 28, 2024
- Nanjing University
- Xinran Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20240096979
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wang-Chun HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL CHANNEL FIELD EFFECT TRANSISTOR (VCFET) WITH REDUCED CONTA...
- Publication number 20240096964
- Publication date Mar 21, 2024
- QUALCOMM Incorporated
- Junjing Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20240096986
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOSFET DEVICE STRUCTURE WITH AIR-GAPS IN SPACER AND METHODS FOR FOR...
- Publication number 20240079471
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Gulbagh Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR GAP SPACER FORMATION FOR NANO-SCALE SEMICONDUCTOR DEVICES
- Publication number 20240079266
- Publication date Mar 7, 2024
- TESSERA LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS

comprising an air gap

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Air gap spacer formation for nano-scale semiconductor devices

Contact architecture for capacitance reduction and satisfactory con...

Semiconductor structure cutting process and structures formed thereby

Gate air spacer for fin-like field effect transistor

Semiconductor device and method for fabricating the same

Method of forming a semiconductor device with capped air-gap spacer

Semiconductor device and manufacturing method thereof

Integrated assemblies having vertically-spaced channel material seg...

Semiconductor devices and methods of manufacturing thereof

Semiconductor structure with an air gap and method of forming the same

Integrated circuit with doped low-k sidewall spacers for gate stacks

Dual gate structures for semiconductor devices

SRAM speed and margin optimization via spacer tuning

Air spacer formation with a spin-on dielectric material

Semiconductor device including gas spacers and method of manufacture

Gate spacer structure and method of forming same

Semiconductor device having air gap between gate electrode and sour...

Multi-gate device and related methods

Insulating cap on contact structure

Semiconductor devices with air gate spacer and air gate cap

Air spacers around contact plugs and method forming same

Nanosheet field-effect transistor device and method of forming

Air gap seal for interconnect air gap and method of fabricating the...

Air gap in inner spacers and methods of fabricating the same in fie...

Methods for forming air spacers in semiconductor devices

Silicon carbide oxide hard mask for reducing dishing effects

Solid-state image-capturing element having floation diffusion and h...

Semiconductor device

Method of manufacturing a FinFET by implanting a dielectric with a...

Dual gate structures for semiconductor devices

Patents Applicationslast 30 patents

INVERTED GATE CUT REGION

Dual Gate Structures For Semiconductor Devices

Semiconductor Devices with Air Gaps and the Method Thereof

SRAM SPEED AND MARGIN OPTIMIZATION VIA SPACER TUNING

AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL

SEMICONDUCTOR DEVICES WITH AIR GATE SPACER AND AIR GATE CAP

MULTI-GATE DEVICE AND RELATED METHODS

INSULATING CAP ON CONTACT STRUCTURE

Air Gap Seal for Interconnect Air Gap and Method of Fabricating The...

AIR GAP IN INNER SPACERS AND METHODS OF FABRICATING THE SAME IN FIE...

NANOSHEET FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING

AIR SPACERS AROUND CONTACT PLUGS AND METHOD FORMING SAME

AIR SPACERS FOR SEMICONDUCTOR DEVICES

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

THIN FILM TRANSISTOR

DIELECTRIC GAS SPACER FORMATION FOR REDUCING PARASITIC CAPACITANCE...

INTEGRATED CIRCUIT STRUCTURES WITH CAVITY SPACERS

SEMICONDUCTOR DEVICE

SILICON CARBIDE OXIDE HARD MASK FOR REDUCING DISHING EFFECTS

CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS

METHOD OF MANUFACTURING A FINFET BY IMPLANTING A DIELECTRIC WITH A...

THIN FILM TRANSISTOR

METHOD AND STRUCTURE FOR AIR GAP INNER SPACER IN GATE-ALL-AROUND DE...

Semiconductor Structure Cutting Process and Structures Formed Thereby

STRUCTURE OF TWO-DIMENSIONAL MATERIAL-BASED DEVICE HAVING AIR-GAP A...

SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME

VERTICAL CHANNEL FIELD EFFECT TRANSISTOR (VCFET) WITH REDUCED CONTA...

METHOD FOR FORMING SEMICONDUCTOR DEVICE

MOSFET DEVICE STRUCTURE WITH AIR-GAPS IN SPACER AND METHODS FOR FOR...

AIR GAP SPACER FORMATION FOR NANO-SCALE SEMICONDUCTOR DEVICES