comprising at least one ion or electron beam chamber

Industry

CPC
H01L21/67213

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67213comprising at least one ion or electron beam chamber

Industries

Patents Grantslast 30 patents

Information Patent Grant
Yttrium oxide based coating composition
- Patent number 11,920,234
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Vahid Firouzdor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum deposition system and method thereof
- Patent number 11,916,036
- Issue date Feb 27, 2024
- INTLVAC INC.
- Michael Nagy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicide film nucleation
- Patent number 11,901,182
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and device
- Patent number 11,862,429
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correcting component failures in ion implant semiconductor manufact...
- Patent number 11,862,493
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Tianqing Liao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selective passivation and selective deposition
- Patent number 11,830,732
- Issue date Nov 28, 2023
- ASM IP Holding B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for the treatment of workpieces
- Patent number 11,791,181
- Issue date Oct 17, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing dram
- Patent number 11,751,382
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Lequn Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Yttrium oxide based coating composition
- Patent number 11,661,650
- Issue date May 30, 2023
- Applied Materials, Inc.
- Vahid Firouzdor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques and apparatus for unidirectional hole elongation using a...
- Patent number 11,640,909
- Issue date May 2, 2023
- Applied Materials, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cryogenic electrostatic chuck
- Patent number 11,437,261
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for manufacturing semiconductor device and manufacturing...
- Patent number 11,437,264
- Issue date Sep 6, 2022
- Samsung Electronics Co., Ltd.
- Jung Mo Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correcting component failures in ion implant semiconductor manufact...
- Patent number 11,348,813
- Issue date May 31, 2022
- Applied Materials, Inc.
- Tianqing Liao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of processing DRAM
- Patent number 11,329,052
- Issue date May 10, 2022
- Applied Materials, Inc.
- Lequn Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of semiconductors using vaporized solvents
- Patent number 11,289,323
- Issue date Mar 29, 2022
- Beijing E-Town Semiconductor Co, , Ltd.
- Shuang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,282,701
- Issue date Mar 22, 2022
- Tokyo Electron Limited
- Takashi Dokan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum-integrated hardmask processes and apparatus
- Patent number 11,209,729
- Issue date Dec 28, 2021
- Lam Research Corporation
- Jeffrey Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Side opening unified pod
- Patent number 11,201,070
- Issue date Dec 14, 2021
- Brooks Automation, Inc.
- Daniel Babbs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method
- Patent number 11,164,722
- Issue date Nov 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective passivation and selective deposition
- Patent number 11,145,506
- Issue date Oct 12, 2021
- ASM IP Holding B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming film stacks with reduced defects
- Patent number 11,145,504
- Issue date Oct 12, 2021
- Applied Materials, Inc.
- Zhijun Jiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for dynamically compensating position errors of a sample
- Patent number 11,127,618
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Fangfu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-ion plasma atomic layer etch process
- Patent number 11,101,113
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vaccum deposition system and method thereof
- Patent number 11,088,107
- Issue date Aug 10, 2021
- INTLVAC INC.
- Michael Nagy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicide film nucleation
- Patent number 11,081,358
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition (PVD) electrostatic chuck with improved t...
- Patent number 11,031,273
- Issue date Jun 8, 2021
- Applied Materials, Inc.
- Bonnie T Chia
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Apparatus for manufacturing semiconductor device and manufacturing...
- Patent number 10,964,578
- Issue date Mar 30, 2021
- Samsung Electronics Co., Ltd.
- Jung Mo Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for three-dimensional (3D) structure fill
- Patent number 10,943,779
- Issue date Mar 9, 2021
- Applied Materials, Inc.
- Ellie Yieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heating device and semiconductor manufacturing apparatus
- Patent number 10,916,457
- Issue date Feb 9, 2021
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-processing method, method for forming metal silicide and semico...
- Patent number 10,916,417
- Issue date Feb 9, 2021
- NEXCHIP SEMICONDUCTOR CORPORATION
- Chih-Hsien Huang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20240047197
- Publication date Feb 8, 2024
- ASM IP HOLDING B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Warm Wafer After Ion Cryo-Implantation
- Publication number 20230377913
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20230273516
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20230266662
- Publication date Aug 24, 2023
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
YTTRIUM OXIDE BASED COATING COMPOSITION
- Publication number 20230160055
- Publication date May 25, 2023
- Applied Materials, Inc.
- Vahid Firouzdor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHOD OF USING AN EMBEDDED CHAMBER
- Publication number 20220406629
- Publication date Dec 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORRECTING COMPONENT FAILURES IN ION IMPLANT SEMICONDUCTOR MANUFACT...
- Publication number 20220301903
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Tianqing Liao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method Of Processing DRAM
- Publication number 20220238533
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Lequn Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing of Semiconductors Using Vaporized Solvents
- Publication number 20220223405
- Publication date Jul 14, 2022
- Beijing E-Town Semiconductor Technology, Co., LTD
- Shuang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20220208542
- Publication date Jun 30, 2022
- ASM IP HOLDING B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20220075260
- Publication date Mar 10, 2022
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND DEVICE
- Publication number 20220059320
- Publication date Feb 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Hsiung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...
- Publication number 20220044908
- Publication date Feb 10, 2022
- Entegris, Inc.
- Barry Lewis CHAMBERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WARM WAFER AFTER ION CRYO-IMPLANTATION
- Publication number 20220028707
- Publication date Jan 27, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE WORKPIECE HEATING OR COOLING FOR AN ION IMPLANTATION SYSTEM
- Publication number 20210366746
- Publication date Nov 25, 2021
- Axcelis Technologies, Inc.
- Joseph Ferrara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM DEPOSITION SYSTEM AND METHOD THEREOF
- Publication number 20210335746
- Publication date Oct 28, 2021
- INTLVAC INC.
- Michael Nagy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
YTTRIUM OXIDE BASED COATING COMPOSITION
- Publication number 20210317564
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Vahid Firouzdor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MANUFACTURING...
- Publication number 20210175110
- Publication date Jun 10, 2021
- Samsung Electronics Co., Ltd.
- Jung Mo SUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Anisotropic Pattern Etching and Treatment
- Publication number 20210151290
- Publication date May 20, 2021
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THE TREATMENT OF WORKPIECES
- Publication number 20210082724
- Publication date Mar 18, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING DRAM
- Publication number 20210035982
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Lequn Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-PROCESSING METHOD, METHOD FOR FORMING METAL SILICIDE AND SEMICO...
- Publication number 20210013028
- Publication date Jan 14, 2021
- Nexchip Semiconductor Corporation
- CHIH-HSIEN HUANG
- B08 - CLEANING
Information Patent Application
BEAMLINE ARCHITECTURE WITH INTEGRATED PLASMA PROCESSING
- Publication number 20200411342
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORRECTING COMPONENT FAILURES IN ION IMPLANT SEMICONDUCTOR MANUFACT...
- Publication number 20200251360
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- Tianqing Liao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FORMING FILM STACKS WITH REDUCED DEFECTS
- Publication number 20200227258
- Publication date Jul 16, 2020
- Applied Materials, Inc.
- Zhijun JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...
- Publication number 20200194271
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) ELECTROSTATIC CHUCK WITH IMPROVED...
- Publication number 20200185247
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- BONNIE T CHIA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ELECTROSTATIC CHUCK
- Publication number 20200185248
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- Yogananda SARODE VISHWANATH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MANUFACTURING...
- Publication number 20200135527
- Publication date Apr 30, 2020
- Samsung Electronics Co., Ltd.
- Jung Mo SUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200118814
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Takashi DOKAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

comprising at least one ion or electron beam chamber

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Yttrium oxide based coating composition

Vacuum deposition system and method thereof

Silicide film nucleation

Ion implantation method and device

Correcting component failures in ion implant semiconductor manufact...

Selective passivation and selective deposition

Methods for the treatment of workpieces

Method of processing dram

Yttrium oxide based coating composition

Techniques and apparatus for unidirectional hole elongation using a...

Cryogenic electrostatic chuck

Apparatus for manufacturing semiconductor device and manufacturing...

Correcting component failures in ion implant semiconductor manufact...

Method of processing DRAM

Processing of semiconductors using vaporized solvents

Plasma processing method and plasma processing apparatus

Vacuum-integrated hardmask processes and apparatus

Side opening unified pod

Ion implantation method

Selective passivation and selective deposition

Method of forming film stacks with reduced defects

System for dynamically compensating position errors of a sample

Ion-ion plasma atomic layer etch process

Vaccum deposition system and method thereof

Silicide film nucleation

Physical vapor deposition (PVD) electrostatic chuck with improved t...

Apparatus for manufacturing semiconductor device and manufacturing...

Method and system for three-dimensional (3D) structure fill

Heating device and semiconductor manufacturing apparatus

Pre-processing method, method for forming metal silicide and semico...

Patents Applicationslast 30 patents

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

Warm Wafer After Ion Cryo-Implantation

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

YTTRIUM OXIDE BASED COATING COMPOSITION

SEMICONDUCTOR PROCESSING TOOL AND METHOD OF USING AN EMBEDDED CHAMBER

CORRECTING COMPONENT FAILURES IN ION IMPLANT SEMICONDUCTOR MANUFACT...

Method Of Processing DRAM

Processing of Semiconductors Using Vaporized Solvents

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

ION IMPLANTATION METHOD AND DEVICE

FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...

WARM WAFER AFTER ION CRYO-IMPLANTATION

ACTIVE WORKPIECE HEATING OR COOLING FOR AN ION IMPLANTATION SYSTEM

VACUUM DEPOSITION SYSTEM AND METHOD THEREOF

YTTRIUM OXIDE BASED COATING COMPOSITION

APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MANUFACTURING...

Method and Apparatus for Anisotropic Pattern Etching and Treatment

METHODS FOR THE TREATMENT OF WORKPIECES

METHOD OF PROCESSING DRAM

PRE-PROCESSING METHOD, METHOD FOR FORMING METAL SILICIDE AND SEMICO...

BEAMLINE ARCHITECTURE WITH INTEGRATED PLASMA PROCESSING

CORRECTING COMPONENT FAILURES IN ION IMPLANT SEMICONDUCTOR MANUFACT...

METHOD OF FORMING FILM STACKS WITH REDUCED DEFECTS

TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...

PHYSICAL VAPOR DEPOSITION (PVD) ELECTROSTATIC CHUCK WITH IMPROVED...

CRYOGENIC ELECTROSTATIC CHUCK

APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MANUFACTURING...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS