comprising inorganic layers

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H01L21/033

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/033comprising inorganic layers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods for fabricating semiconductor structures
- Patent number 12,170,205
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure and semiconductor stru...
- Patent number 12,170,201
- Issue date Dec 17, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crystal growth method and a substrate for a semiconductor device
- Patent number 12,170,200
- Issue date Dec 17, 2024
- Kyocera Corporation
- Takehiro Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for thin-film fabrication
- Patent number 12,165,922
- Issue date Dec 10, 2024
- Jani Oksanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,165,923
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chuan-Hui Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing conductive lines in a circuit
- Patent number 12,165,972
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Hui Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for fabricating semiconductor device with damascene structur...
- Patent number 12,159,790
- Issue date Dec 3, 2024
- NANYA TECHNOLOGY CORPORATION
- Wei-Chen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Network type pellicle membrane and method for forming the same
- Patent number 12,153,339
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask structure, semiconductor structure and methods for manufacturi...
- Patent number 12,148,618
- Issue date Nov 19, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Penghui Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method to pattern pitch lines
- Patent number 12,148,617
- Issue date Nov 19, 2024
- International Business Machines Corporation
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Subtractive metal etch with improved isolation for BEOL interconnec...
- Patent number 12,142,562
- Issue date Nov 12, 2024
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structures for advanced integrated circuit...
- Patent number 12,142,667
- Issue date Nov 12, 2024
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,135,501
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced chemical vapor deposition of carbon hard-mask
- Patent number 12,136,549
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Byung Seok Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,136,662
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Wei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure including overlay mark structure
- Patent number 12,125,800
- Issue date Oct 22, 2024
- NANYA TECHNOLOGY CORPORATION
- Chun-Yen Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of antireflective surfaces
- Patent number 12,122,668
- Issue date Oct 22, 2024
- Brookhaven Science Associates, LLC
- Charles T. Black
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for forming pattern
- Patent number 12,125,704
- Issue date Oct 22, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing mask structure, semiconductor structure an...
- Patent number 12,119,226
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yexiao Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming semiconductor structure
- Patent number 12,120,869
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mengna Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,112,979
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yan-Jhi Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,114,496
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,112,949
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self aligned pattern formation post spacer etchback in tight pitch...
- Patent number 12,106,963
- Issue date Oct 1, 2024
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiply spin-coated ultra-thick hybrid hard mask for sub 60nm MRAM...
- Patent number 12,108,679
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi Yang
- G11 - INFORMATION STORAGE
Information Patent Grant
Nonpolar or semipolar group III-nitride substrates
- Patent number 12,106,959
- Issue date Oct 1, 2024
- Saphlux, Inc.
- Jie Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double-patterning method to improve sidewall uniformity
- Patent number 12,106,964
- Issue date Oct 1, 2024
- Winbond Electronics Corp.
- Chu-Chun Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 12,106,958
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterning method and overlay measurement method
- Patent number 12,106,962
- Issue date Oct 1, 2024
- United Microelectronics Corp.
- Yi Jing Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20240411220
- Publication date Dec 12, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20240411228
- Publication date Dec 12, 2024
- JSR Corporation
- Ken MARUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND STRUCTURES FOR INCREASING STABILITY OF SOFT OR ORGANIC...
- Publication number 20240404829
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Katie LUTKER-LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING SEMICONDUCTOR DEVICES
- Publication number 20240402594
- Publication date Dec 5, 2024
- NEXPERIA B.V.
- Nivasan Yogeswaran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDISTRIBUTION LAYER METALLIC LAYOUT STRUCTURE AND METHOD WITH WARP...
- Publication number 20240404853
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Dian-Hau CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER MASKING LAYER AND METHOD OF FORMING SAME
- Publication number 20240395907
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240395909
- Publication date Nov 28, 2024
- UNITED MICROELECTRONICS CORP.
- Chin-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID, METHOD OF CLEANING SUBSTRATE, AND METHOD OF MANUFA...
- Publication number 20240392218
- Publication date Nov 28, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kohei SERIZAWA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHOD OF FORMING MASK PATTERN INCLUDING SURFACE ENHANCEMENT LAYER...
- Publication number 20240395552
- Publication date Nov 28, 2024
- SK HYNIX INC.
- Jin Woong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...
- Publication number 20240393674
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kevin TANADY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR DEVICES
- Publication number 20240387699
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Wei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH POROUS LAYER AND METHOD FOR FABRICATING T...
- Publication number 20240387166
- Publication date Nov 21, 2024
- NANYA TECHNOLOGY CORPORATION
- TSE-YAO HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...
- Publication number 20240387174
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Guangyan Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOWIRE TRANSISTOR FABRICATION WITH HARDMASK LAYERS
- Publication number 20240387634
- Publication date Nov 21, 2024
- SONY GROUP CORPORATION
- Seung Hoon Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240385514
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH POROUS LAYER AND METHOD FOR FABRICATING T...
- Publication number 20240387165
- Publication date Nov 21, 2024
- NANYA TECHNOLOGY CORPORATION
- TSE-YAO HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20240387189
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20240387175
- Publication date Nov 21, 2024
- WINBOND ELECTRONICS CORP.
- Chungchen Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...
- Publication number 20240387190
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Guangyan Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER
- Publication number 20240379375
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- Xiaofeng SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240381632
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANTATION MASK FORMATION
- Publication number 20240379357
- Publication date Nov 14, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY , LTD.
- Wei-Chao CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source/Drain Regions and Methods of Forming Same
- Publication number 20240379454
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hui-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING LOW-STRESS SILICON NITRIDE LAYER THROUGH HYDROGEN TREATMENT
- Publication number 20240379346
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Che Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR INTEGRATED CIRCUIT DESIGN AND FABRICATION
- Publication number 20240379358
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsong-Hua Ou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DOPING HIGH-K METAL GATES FOR TUNING THRESHOLD VOLTAGES
- Publication number 20240379365
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Feng Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Semiconductor Devices and Structures Resulting Therefrom
- Publication number 20240379359
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20240377722
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conductive Feature Formation
- Publication number 20240373613
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS

comprising inorganic layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods for fabricating semiconductor structures

Method for preparing semiconductor structure and semiconductor stru...

Crystal growth method and a substrate for a semiconductor device

Method and structure for thin-film fabrication

Method of manufacturing a semiconductor device

Method of manufacturing conductive lines in a circuit

Method for fabricating semiconductor device with damascene structur...

Network type pellicle membrane and method for forming the same

Mask structure, semiconductor structure and methods for manufacturi...

Structure and method to pattern pitch lines

Subtractive metal etch with improved isolation for BEOL interconnec...

Contact over active gate structures for advanced integrated circuit...

Method of manufacturing a semiconductor device

Plasma-enhanced chemical vapor deposition of carbon hard-mask

Methods of forming semiconductor devices

Semiconductor device structure including overlay mark structure

Formation of antireflective surfaces

Method for forming pattern

Method to improve wafer edge uniformity

Method for manufacturing mask structure, semiconductor structure an...

Semiconductor structure and method for forming semiconductor structure

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

Highly etch selective amorphous carbon film

Self aligned pattern formation post spacer etchback in tight pitch...

Multiply spin-coated ultra-thick hybrid hard mask for sub 60nm MRAM...

Nonpolar or semipolar group III-nitride substrates

Double-patterning method to improve sidewall uniformity

Method of using dual frequency RF power in a process chamber

Patterning method and overlay measurement method

Patents Applicationslast 30 patents

MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...

PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES

METHODS AND STRUCTURES FOR INCREASING STABILITY OF SOFT OR ORGANIC...

Compound For Forming Metal-Containing Film, Composition For Forming...

PATTERNING SEMICONDUCTOR DEVICES

REDISTRIBUTION LAYER METALLIC LAYOUT STRUCTURE AND METHOD WITH WARP...

MULTILAYER MASKING LAYER AND METHOD OF FORMING SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

CLEANING LIQUID, METHOD OF CLEANING SUBSTRATE, AND METHOD OF MANUFA...

METHOD OF FORMING MASK PATTERN INCLUDING SURFACE ENHANCEMENT LAYER...

METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...

METHODS OF FORMING SEMICONDUCTOR DEVICES

SEMICONDUCTOR DEVICE WITH POROUS LAYER AND METHOD FOR FABRICATING T...

FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...

NANOWIRE TRANSISTOR FABRICATION WITH HARDMASK LAYERS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE WITH POROUS LAYER AND METHOD FOR FABRICATING T...

METHOD FOR FORMING SEMICONDUCTOR DEVICE

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

FORMATION OF SILICON-AND-METAL-CONTAINING MATERIALS FOR HARDMASK AP...

METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

IMPLANTATION MASK FORMATION

Source/Drain Regions and Methods of Forming Same

FORMING LOW-STRESS SILICON NITRIDE LAYER THROUGH HYDROGEN TREATMENT

METHODS FOR INTEGRATED CIRCUIT DESIGN AND FABRICATION

METHODS FOR DOPING HIGH-K METAL GATES FOR TUNING THRESHOLD VOLTAGES

Patterning Semiconductor Devices and Structures Resulting Therefrom

MASK AND METHOD OF FORMING THE SAME

Conductive Feature Formation