comprising inorganic layers

Industry

CPC
H01L21/033

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/033comprising inorganic layers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,313,972
- Issue date May 27, 2025
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eliminating yield impact of stochastics in lithography
- Patent number 12,315,727
- Issue date May 27, 2025
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,315,726
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for non-resist nanolithography
- Patent number 12,308,368
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal mask having a plurality of strip-shaped structures
- Patent number 12,308,234
- Issue date May 20, 2025
- DARWIN PRECISIONS CORPORATION
- Yun-Pei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual critical dimension patterning
- Patent number 12,308,233
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Chang Kau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film processing method and semiconductor device manufacturing method
- Patent number 12,300,504
- Issue date May 13, 2025
- Kioxia Corporation
- Junichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,300,506
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Chen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-dimensional (2D) metal structure and method of forming the same
- Patent number 12,300,609
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 12,300,491
- Issue date May 13, 2025
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure, and semiconductor...
- Patent number 12,300,492
- Issue date May 13, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mengmeng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of organic films
- Patent number 12,300,505
- Issue date May 13, 2025
- ASM IP Holding B.V.
- Eva E. Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alternating etch and passivation process
- Patent number 12,293,919
- Issue date May 6, 2025
- Lam Research Corporation
- Seongjun Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure and method for preparing the same
- Patent number 12,293,914
- Issue date May 6, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Hsiang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure
- Patent number 12,288,689
- Issue date Apr 29, 2025
- Winbond Electronics Corp.
- Pei-Hsiu Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic light emitting diode display and method for manufacturing t...
- Patent number 12,289,952
- Issue date Apr 29, 2025
- Samsung Display Co., Ltd.
- Jin-Kwang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of photomask, and photomask blank
- Patent number 12,288,688
- Issue date Apr 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,283,477
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shih-Wei Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silver patterning and interconnect processes
- Patent number 12,282,255
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- You-Hua Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming semiconductor structure
- Patent number 12,278,107
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Kai Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparation method of semiconductor device
- Patent number 12,278,106
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jun Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with helmet structure between two semiconducto...
- Patent number 12,278,236
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Cheng Ching
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,272,555
- Issue date Apr 8, 2025
- Samsung Electronics Co., Ltd.
- Jinyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen and iodine-containing hydrofluorocarbon compound for etching...
- Patent number 12,272,562
- Issue date Apr 8, 2025
- L'Aire Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés G...
- Fabrizio Marchegiani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide and tin carbide materials for semiconductor patterning ap...
- Patent number 12,272,564
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oblique deposition and etch processes
- Patent number 12,272,559
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure
- Patent number 12,272,565
- Issue date Apr 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chuan Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,272,554
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ASSEMBLY STRUCTURE INCLUDING A PLURALITY OF SPACERS AND METHOD OF M...
- Publication number 20250174459
- Publication date May 29, 2025
- NANYA TECHNOLOGY CORPORATION
- PIN-YUAN SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK, SUBSTRATE PROCESSING METHOD, AND REMOVAL METHOD FOR HARD...
- Publication number 20250174465
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Xiaolong LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal of an Etching Stop Layer for Improving Overlay Sh...
- Publication number 20250167002
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING NANOSTRUCTURES UTILIZING SELF-ASSEMBLED NUCLEIC...
- Publication number 20250166993
- Publication date May 22, 2025
- Micron Technology, Inc.
- Gurtej S. Sandhu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
DEPOSITION PROCESS FOR PATTERNING EDGE PLACEMENT ERROR IMPROVEMENT
- Publication number 20250166994
- Publication date May 22, 2025
- Applied Materials, Inc.
- Zhiyu HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUITS WITH CAPACITORS
- Publication number 20250169163
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiao-Han Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING MATERIAL INCLUDING SILICON-CONTAINING LAYER AND METHOD F...
- Publication number 20250167000
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Ping TUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING VERTICALLY LAYERED IONIC LIQUID CRYSTAL (ILC) S...
- Publication number 20250157820
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Dipak Aryal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE
- Publication number 20250157819
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- SeungHyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...
- Publication number 20250149335
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ELECTRON MOBILITY TRANSISTOR DEVICE
- Publication number 20250151360
- Publication date May 8, 2025
- XIAMEN SAN'AN INTEGRATED CIRCUIT CO., LTD.
- Wenjie SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY CRYOGENIC TUNGSTEN-BORON-CARBIDE ETCH
- Publication number 20250149337
- Publication date May 8, 2025
- Applied Materials, Inc.
- Jing ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Assemblies and Methods of Forming Integrated Assemblies
- Publication number 20250142820
- Publication date May 1, 2025
- Micron Technology, Inc.
- Justin B. Dorhout
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250142943
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Cheng CHIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Making Bottom Electrode for Tunnel Junctions
- Publication number 20250143187
- Publication date May 1, 2025
- University of the District of Columbia
- Pawan Tyagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVITY OF BORON HARD MASKS USING ION IMPLANT
- Publication number 20250140566
- Publication date May 1, 2025
- Applied Materials, Inc.
- Aykut Aydin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A REDUCED SIZE FEATURE
- Publication number 20250140557
- Publication date May 1, 2025
- NXP USA, Inc.
- Douglas Michael Reber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL METAL SILICIDE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRU...
- Publication number 20250142939
- Publication date May 1, 2025
- Intel Corporation
- Jeffrey S. LEIB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY DOPED HARDMASK FILMS
- Publication number 20250132157
- Publication date Apr 24, 2025
- LAM RESEARCH CORPORATION
- Sonal Bhadauriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENGINEERING EPI STACKS FOR EXTREME WAFER THINNING
- Publication number 20250132163
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Raghuveer Satya MAKALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250129203
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERATION OF MULTILINE ETCH SUBSTRATES
- Publication number 20250132166
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK INTEGRATION FOR HIGH ASPECT RATIO APPLICATIONS
- Publication number 20250132159
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Joshua Baillargeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF TIN THIN FILM FOR BONDING AND AS MASKING FILM
- Publication number 20250132158
- Publication date Apr 24, 2025
- University of South-Eastern Norway
- Avisek ROY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER DEPOSITION CONFINEMENT
- Publication number 20250125129
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL SOURCE OR DRAIN STRUCTURES FOR ADVANCED INTEGRATED CIRCUI...
- Publication number 20250126869
- Publication date Apr 17, 2025
- Intel Corporation
- Subhash JOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING LINE PATTERN IN SEMICONDUCTOR DEVICE
- Publication number 20250125147
- Publication date Apr 17, 2025
- NANYA TECHNOLOGY CORPORATION
- Chao Yuan CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TWO-DIMENSIONAL MENTAL LINE PATTERNING
- Publication number 20250125148
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chen LEE
- H01 - BASIC ELECTRIC ELEMENTS

comprising inorganic layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist underlayer film-forming composition

Eliminating yield impact of stochastics in lithography

Semiconductor device and method

Method for non-resist nanolithography

Metal mask having a plurality of strip-shaped structures

Dual critical dimension patterning

Film processing method and semiconductor device manufacturing method

Method of manufacturing semiconductor devices

Two-dimensional (2D) metal structure and method of forming the same

Deposition of semiconductor integration films

Method for manufacturing semiconductor structure, and semiconductor...

Deposition of organic films

Alternating etch and passivation process

Semiconductor device structure and method for preparing the same

Semiconductor structure

Organic light emitting diode display and method for manufacturing t...

Film deposition apparatus for fine pattern forming

Manufacturing method of photomask, and photomask blank

Selective deposition of carbon on photoresist layer for lithography...

Method of manufacturing a semiconductor device

Silver patterning and interconnect processes

Semiconductor structure and method for forming semiconductor structure

Preparation method of semiconductor device

Semiconductor device with helmet structure between two semiconducto...

Methods of forming semiconductor devices

Oxygen and iodine-containing hydrofluorocarbon compound for etching...

Tin oxide and tin carbide materials for semiconductor patterning ap...

Oblique deposition and etch processes

Method for preparing semiconductor structure

Method of manufacturing a semiconductor device

Patents Applicationslast 30 patents

ASSEMBLY STRUCTURE INCLUDING A PLURALITY OF SPACERS AND METHOD OF M...

HARD MASK, SUBSTRATE PROCESSING METHOD, AND REMOVAL METHOD FOR HARD...

Selective Removal of an Etching Stop Layer for Improving Overlay Sh...

METHODS OF FORMING NANOSTRUCTURES UTILIZING SELF-ASSEMBLED NUCLEIC...

DEPOSITION PROCESS FOR PATTERNING EDGE PLACEMENT ERROR IMPROVEMENT

INTEGRATED CIRCUITS WITH CAPACITORS

PATTERNING MATERIAL INCLUDING SILICON-CONTAINING LAYER AND METHOD F...

METHODS FOR FORMING VERTICALLY LAYERED IONIC LIQUID CRYSTAL (ILC) S...

METHOD FOR PROCESSING A SUBSTRATE

METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...

HIGH ELECTRON MOBILITY TRANSISTOR DEVICE

HIGH SELECTIVITY CRYOGENIC TUNGSTEN-BORON-CARBIDE ETCH

Integrated Assemblies and Methods of Forming Integrated Assemblies

SEMICONDUCTOR DEVICE

Method for Making Bottom Electrode for Tunnel Junctions

SELECTIVITY OF BORON HARD MASKS USING ION IMPLANT

METHOD FOR FORMING A REDUCED SIZE FEATURE

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

DUAL METAL SILICIDE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRU...

HIGH SELECTIVITY DOPED HARDMASK FILMS

ENGINEERING EPI STACKS FOR EXTREME WAFER THINNING

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

GENERATION OF MULTILINE ETCH SUBSTRATES

HARDMASK INTEGRATION FOR HIGH ASPECT RATIO APPLICATIONS

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

USE OF TIN THIN FILM FOR BONDING AND AS MASKING FILM

PROCESSING CHAMBER DEPOSITION CONFINEMENT

EPITAXIAL SOURCE OR DRAIN STRUCTURES FOR ADVANCED INTEGRATED CIRCUI...

METHOD OF FORMING LINE PATTERN IN SEMICONDUCTOR DEVICE

METHOD FOR TWO-DIMENSIONAL MENTAL LINE PATTERNING