comprising inorganic layers

Industry

CPC
H01L21/033

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/033comprising inorganic layers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,272,555
- Issue date Apr 8, 2025
- Samsung Electronics Co., Ltd.
- Jinyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen and iodine-containing hydrofluorocarbon compound for etching...
- Patent number 12,272,562
- Issue date Apr 8, 2025
- L'Aire Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés G...
- Fabrizio Marchegiani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide and tin carbide materials for semiconductor patterning ap...
- Patent number 12,272,564
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oblique deposition and etch processes
- Patent number 12,272,559
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure
- Patent number 12,272,565
- Issue date Apr 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chuan Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,272,554
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask pellicle including network of nanowires and method of for...
- Patent number 12,266,525
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming patterned mask layer
- Patent number 12,266,528
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask encapsulation to prevent degradation during fabrication of hig...
- Patent number 12,266,535
- Issue date Apr 1, 2025
- Lam Researh Corporation
- Kapu Sirish Reddy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning semiconductor devices and structures resulting therefrom
- Patent number 12,266,529
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing silicon carbide semiconductor device
- Patent number 12,266,531
- Issue date Apr 1, 2025
- Mitsubishi Electric Corporation
- Junya Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enlarging contact area and process window for a contact via
- Patent number 12,266,563
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Zhen Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing lithography defects and pattern transfer
- Patent number 12,265,326
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Angélique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective EMI shielding using preformed mask with fang design
- Patent number 12,266,615
- Issue date Apr 1, 2025
- STATS ChipPAC Pte. Ltd.
- ChangOh Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming low-stress silicon nitride layer through hydrogen treatment
- Patent number 12,261,036
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Che Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrical devices with electrodes on softening polymers and method...
- Patent number 12,262,481
- Issue date Mar 25, 2025
- Board of Regents, The University of Texas System
- Romil Modi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning method
- Patent number 12,261,045
- Issue date Mar 25, 2025
- Imec VZW
- Victor M. Blanco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer hardmask for defect reduction in EUV patterning
- Patent number 12,261,044
- Issue date Mar 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Textile patterning for subtractively-patterned self-aligned interco...
- Patent number 12,261,057
- Issue date Mar 25, 2025
- Tahoe Research, LTD.
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded high-z marker material and process for alignment of multil...
- Patent number 12,255,047
- Issue date Mar 18, 2025
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench contact structures for advanced integrated circuit structure...
- Patent number 12,255,247
- Issue date Mar 18, 2025
- Intel Corporation
- Subhash M. Joshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing layers directly adjacent uncovered vias or co...
- Patent number 12,255,067
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Larry Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits with capacitors
- Patent number 12,243,871
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Han Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a substrate
- Patent number 12,243,742
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- SeungHyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor device
- Patent number 12,243,743
- Issue date Mar 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Susheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial source/drain recess formation with metal-comprising maski...
- Patent number 12,243,783
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hui-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Different height cell subregions, semiconductor device having the s...
- Patent number 12,243,914
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Chan Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selective patterning of vias with hardmasks
- Patent number 12,243,771
- Issue date Mar 4, 2025
- Interational Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,243,744
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Chang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MANDREL STRUCTURES AND METHODS OF FABRICATING THE SAME IN SEMICONDU...
- Publication number 20250118559
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250118560
- Publication date Apr 10, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- LINSHAN YUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOW MITIGATION IN HIGH ASPECT RATIO OXIDE AND NITRIDE ETCHES
- Publication number 20250118570
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mir Abdulla Al Galib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE WAFER EDGE UNIFORMITY
- Publication number 20250118539
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING
- Publication number 20250118557
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK PATTERN AND METHOD OF FORMING A FINE PATTERN OF A SEMICONDUCTO...
- Publication number 20250118558
- Publication date Apr 10, 2025
- SK HYNIX INC.
- Hong Gu LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A PATTERN ON A SUBSTRATE
- Publication number 20250110411
- Publication date Apr 3, 2025
- ASM IP HOLDING B.V.
- Kishan Ashokbhai Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS
- Publication number 20250112046
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS
- Publication number 20250105015
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Shihsheng CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exposure method of semiconductor pattern
- Publication number 20250102922
- Publication date Mar 27, 2025
- UNITED MICROELECTRONICS CORP.
- Shin-Hung Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-C...
- Publication number 20250095990
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250095991
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20250096007
- Publication date Mar 20, 2025
- SEMES CO., LTD.
- Jae Seung YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCT...
- Publication number 20250098258
- Publication date Mar 20, 2025
- Intel Corporation
- Andrew W. YEOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250095989
- Publication date Mar 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250096033
- Publication date Mar 20, 2025
- NANYA TECHNOLOGY CORPORATION
- YING-CHENG CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF AN ARRAY OF NANOSTRUCTURES
- Publication number 20250087487
- Publication date Mar 13, 2025
- ALIXLABS AB
- Dmitry Suyatin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20250087498
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FABRICATING SEMICONDCUTOR STRUCTURES
- Publication number 20250087496
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND ME...
- Publication number 20250085637
- Publication date Mar 13, 2025
- SK HYNIX INC.
- Jong Hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250087488
- Publication date Mar 13, 2025
- SK HYNIX INC.
- Ji Hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL HARD MASKS FOR REDUCING LINE BENDING
- Publication number 20250079172
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE
- Publication number 20250079174
- Publication date Mar 6, 2025
- Tokyo Election Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20250079179
- Publication date Mar 6, 2025
- NANYA TECHNOLOGY CORPORATION
- Yu Li LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20250079173
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Daisuke YOSHIKOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250072097
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chuan-Hui LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE
- Publication number 20250069888
- Publication date Feb 27, 2025
- NANYA TECHNOLOGY CORPORATION
- JUNG-TZU PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...
- Publication number 20250072078
- Publication date Feb 27, 2025
- Intel Corporation
- Andrew W. YEOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask and Reticle Protection with Atomic Layer Deposition (ALD)
- Publication number 20250068054
- Publication date Feb 27, 2025
- Nano-Master, Inc.
- Birol Kuyel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE
- Publication number 20250069889
- Publication date Feb 27, 2025
- NANYA TECHNOLOGY CORPORATION
- JUNG-TZU PENG
- H01 - BASIC ELECTRIC ELEMENTS

comprising inorganic layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of forming semiconductor devices

Oxygen and iodine-containing hydrofluorocarbon compound for etching...

Tin oxide and tin carbide materials for semiconductor patterning ap...

Oblique deposition and etch processes

Method for preparing semiconductor structure

Method of manufacturing a semiconductor device

Photomask pellicle including network of nanowires and method of for...

Method for forming patterned mask layer

Mask encapsulation to prevent degradation during fabrication of hig...

Patterning semiconductor devices and structures resulting therefrom

Method of manufacturing silicon carbide semiconductor device

Enlarging contact area and process window for a contact via

Method for reducing lithography defects and pattern transfer

Selective EMI shielding using preformed mask with fang design

Forming low-stress silicon nitride layer through hydrogen treatment

Electrical devices with electrodes on softening polymers and method...

Patterning method

Multi-layer hardmask for defect reduction in EUV patterning

Textile patterning for subtractively-patterned self-aligned interco...

Embedded high-z marker material and process for alignment of multil...

Trench contact structures for advanced integrated circuit structure...

Method for depositing layers directly adjacent uncovered vias or co...

Selective deposition of carbon on photoresist layer for lithography...

Integrated circuits with capacitors

Method for processing a substrate

Method for preparing semiconductor device

Epitaxial source/drain recess formation with metal-comprising maski...

Different height cell subregions, semiconductor device having the s...

Selective patterning of vias with hardmasks

Method for forming semiconductor structure

Patents Applicationslast 30 patents

MANDREL STRUCTURES AND METHODS OF FABRICATING THE SAME IN SEMICONDU...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

BOW MITIGATION IN HIGH ASPECT RATIO OXIDE AND NITRIDE ETCHES

METHOD TO IMPROVE WAFER EDGE UNIFORMITY

SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING

MASK PATTERN AND METHOD OF FORMING A FINE PATTERN OF A SEMICONDUCTO...

METHOD FOR FORMING A PATTERN ON A SUBSTRATE

BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS

METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS

Exposure method of semiconductor pattern

METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-C...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCT...

Composition For Forming Organic Film, Method For Forming Organic Fi...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

FORMATION OF AN ARRAY OF NANOSTRUCTURES

TIN OXIDE MANDRELS IN PATTERNING

METHODS FOR FABRICATING SEMICONDCUTOR STRUCTURES

EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND ME...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METAL HARD MASKS FOR REDUCING LINE BENDING

METHOD FOR PROCESSING A SUBSTRATE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE

HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...

Mask and Reticle Protection with Atomic Layer Deposition (ALD)

METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE