Condensation products of carbonyl compounds and phenolic compounds

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CPC
G03F7/0236

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0236Condensation products of carbonyl compounds and phenolic compounds

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, resin sheet, cured film, organic...
- Patent number 11,852,973
- Issue date Dec 26, 2023
- Toray Industries, Inc.
- Yusuke Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, method for preparing the same, and pattern...
- Patent number 11,762,290
- Issue date Sep 19, 2023
- Beijing Asahi Electronic Materials Co., Ltd
- Teng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, method for producing heat-resistant resin film,...
- Patent number 11,640,110
- Issue date May 2, 2023
- Toray Industries, Inc.
- Keika Hashimoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,572,430
- Issue date Feb 7, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern, and met...
- Patent number 11,543,749
- Issue date Jan 3, 2023
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist material
- Patent number 11,487,204
- Issue date Nov 1, 2022
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Novolak resins and resist materials
- Patent number 11,254,778
- Issue date Feb 22, 2022
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,243,467
- Issue date Feb 8, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition
- Patent number 10,990,008
- Issue date Apr 27, 2021
- Toray Industries, Inc.
- Yuki Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative-type photosensitive resin composition, cured film, display...
- Patent number 10,983,436
- Issue date Apr 20, 2021
- Toray Industries, Inc.
- Yugo Tanigaki
- G02 - OPTICS
Information Patent Grant
Positive working photosensitive material
- Patent number 10,976,662
- Issue date Apr 13, 2021
- Merck Patent GmbH
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresists comprising novolak resin blends
- Patent number 10,976,659
- Issue date Apr 13, 2021
- Rohm and Haas Electronic Materials LLC
- Jeffrey M. Calvert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyimide resin and resin composition
- Patent number 10,920,017
- Issue date Feb 16, 2021
- Kaneka Corporation
- Kan Fujihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition
- Patent number 10,866,512
- Issue date Dec 15, 2020
- Showa Denko K.K.
- Kentaro Furue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 10,816,898
- Issue date Oct 27, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist film laminate and pattern forming process
- Patent number 10,719,015
- Issue date Jul 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterned bank structures on substrates and formation method
- Patent number 10,635,001
- Issue date Apr 28, 2020
- Merck Patent GmbH
- Li Wei Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phenolic-hydroxyl-group-containing novolac resin and resist film
- Patent number 10,577,449
- Issue date Mar 3, 2020
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin containing phenolic hydroxyl groups, and resist film
- Patent number 10,414,850
- Issue date Sep 17, 2019
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, method for manufacturing cured re...
- Patent number 10,365,559
- Issue date Jul 30, 2019
- Toray Industries, Inc.
- Yukari Arimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, method for manufacturing patterne...
- Patent number 10,175,577
- Issue date Jan 8, 2019
- Hitachi Chemical Company, Ltd.
- Shingo Tahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolac phenol resin, manufacturing method therefor, photosensitive...
- Patent number 10,047,186
- Issue date Aug 14, 2018
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition including novel polymer and organic film using th...
- Patent number 9,983,476
- Issue date May 29, 2018
- Samsung SDI Co., Ltd.
- Sang Soo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin material and resin film
- Patent number 9,874,813
- Issue date Jan 23, 2018
- Sumitomo Bakelite Co., Ltd.
- Yuma Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound containing phenolic hydroxy group, photosensitive composit...
- Patent number 9,828,457
- Issue date Nov 28, 2017
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photosensitive resin composition, method for producti...
- Patent number 9,786,576
- Issue date Oct 10, 2017
- Hitachi Chemical Company, Ltd.
- Hiroshi Matsutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modified novolak phenolic resin, making method, and resist composition
- Patent number 9,777,102
- Issue date Oct 3, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition to reduce photoresist pattern collapse
- Patent number 9,698,014
- Issue date Jul 4, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Pao Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing micro-structure
- Patent number 9,650,538
- Issue date May 16, 2017
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 9,606,435
- Issue date Mar 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
TRANSPARENT ELECTRODE, PROCESS FOR PRODUCING TRANSPARENT ELECTRODE,...
- Publication number 20220209151
- Publication date Jun 30, 2022
- Kabushiki Kaisha Toshiba
- Naomi SHIDA
- B82 - NANO-TECHNOLOGY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20220019141
- Publication date Jan 20, 2022
- Merck Patent GmbH
- Weihong LIU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20210382390
- Publication date Dec 9, 2021
- Merck Patent GmbH
- Medhat A. Toukhy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...
- Publication number 20210278765
- Publication date Sep 9, 2021
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACT...
- Publication number 20210191263
- Publication date Jun 24, 2021
- Merck Patent GmbH
- Hirokazu IKEDA
- G02 - OPTICS
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...
- Publication number 20200409261
- Publication date Dec 31, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM,...
- Publication number 20200192227
- Publication date Jun 18, 2020
- TORAY INDUSTRIES, INC.
- Keika HASHIMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYIMIDE RESIN AND RESIN COMPOSITION
- Publication number 20190263968
- Publication date Aug 29, 2019
- KANEKA CORPORATION
- Kan FUJIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION
- Publication number 20190086800
- Publication date Mar 21, 2019
- TORAY INDUSTRIES, INC.
- Yuki MASUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM
- Publication number 20190077901
- Publication date Mar 14, 2019
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...
- Publication number 20190079397
- Publication date Mar 14, 2019
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, DISPLAY...
- Publication number 20190072851
- Publication date Mar 7, 2019
- TORAY INDUSTRIES, INC.
- Yugo TANIGAKI
- G02 - OPTICS
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20190064662
- Publication date Feb 28, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC STRENGTH
- Publication number 20190056661
- Publication date Feb 21, 2019
- DOW GLOBAL TECHNOLOGIES LLC
- Caroline Woelfle-Gupta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC CONSTANTS
- Publication number 20190056665
- Publication date Feb 21, 2019
- DOW GLOBAL TECHNOLOGIES LLC
- Caroline Woelfle-Gupta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20180253003
- Publication date Sep 6, 2018
- SHOWA DENKO K.K.
- Kentaro FURUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20180039174
- Publication date Feb 8, 2018
- TORAY INDUSTRIES, INC.
- Yoshifumi IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20180031970
- Publication date Feb 1, 2018
- TORAY INDUSTRIES, INC.
- Yukari ARIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND...
- Publication number 20170329221
- Publication date Nov 16, 2017
- DIC CORPORATION
- Tomoyuki IMADA
- G01 - MEASURING TESTING
Information Patent Application
NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENS...
- Publication number 20170260315
- Publication date Sep 14, 2017
- DIC CORPORATION
- Tomoyuki IMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20140356790
- Publication date Dec 4, 2014
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED REL...
- Publication number 20140349222
- Publication date Nov 27, 2014
- ASAHI KASEI E-MATERIALS CORPORATION
- Satoshi Shibui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel Dual-Tone Resist Formulations And Methods
- Publication number 20140342291
- Publication date Nov 20, 2014
- Board of Regents, The University of Texas System
- C. Grant Willson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNE...
- Publication number 20140322635
- Publication date Oct 30, 2014
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE
- Publication number 20140296380
- Publication date Oct 2, 2014
- Hideto KATO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE...
- Publication number 20140242515
- Publication date Aug 28, 2014
- SAMSUNG DISPLAY CO., LTD.
- Gwui-Hyun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PA...
- Publication number 20140242504
- Publication date Aug 28, 2014
- CHI MEI CORPORATION
- Chi-Ming LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THERE...
- Publication number 20140234777
- Publication date Aug 21, 2014
- JSR Corporation
- Tomohiko SAKURAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PA...
- Publication number 20140065526
- Publication date Mar 6, 2014
- CHI MEI CORPORATION
- Kai-Min CHEN
- G02 - OPTICS
Information Patent Application
PHOTORESIST COMPOSITION, THIN FILM TRANSISTOR ARRAY PANEL, AND METH...
- Publication number 20140030881
- Publication date Jan 30, 2014
- SAMSUNG DISPLAY CO., LTD.
- Ki Beom LEE
- H01 - BASIC ELECTRIC ELEMENTS

Condensation products of carbonyl compounds and phenolic compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photosensitive resin composition, resin sheet, cured film, organic...

Photoresist composition, method for preparing the same, and pattern...

Resin composition, method for producing heat-resistant resin film,...

Compound, resin, resist composition or radiation-sensitive composit...

Resist composition and method for producing resist pattern, and met...

Resist material

Novolak resins and resist materials

Compound, resin, resist composition or radiation-sensitive composit...

Resin composition

Negative-type photosensitive resin composition, cured film, display...

Positive working photosensitive material

Photoresists comprising novolak resin blends

Polyimide resin and resin composition

Positive photosensitive resin composition

Compound, resin, resist composition or radiation-sensitive composit...

Positive resist film laminate and pattern forming process

Patterned bank structures on substrates and formation method

Phenolic-hydroxyl-group-containing novolac resin and resist film

Resin containing phenolic hydroxyl groups, and resist film

Photosensitive resin composition, method for manufacturing cured re...

Photosensitive resin composition, method for manufacturing patterne...

Novolac phenol resin, manufacturing method therefor, photosensitive...

Resin composition including novel polymer and organic film using th...

Photosensitive resin material and resin film

Compound containing phenolic hydroxy group, photosensitive composit...

Positive-type photosensitive resin composition, method for producti...

Modified novolak phenolic resin, making method, and resist composition

Photoresist composition to reduce photoresist pattern collapse

Method for manufacturing micro-structure

Method for manufacturing micro-structure and optically patternable...

Patents Applicationslast 30 patents

TRANSPARENT ELECTRODE, PROCESS FOR PRODUCING TRANSPARENT ELECTRODE,...

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...

METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACT...

COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...

RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM,...

POLYIMIDE RESIN AND RESIN COMPOSITION

RESIN COMPOSITION

NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, DISPLAY...

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC STRENGTH

PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC CONSTANTS

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

PHOTOSENSITIVE COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND...

NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENS...

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED REL...

Novel Dual-Tone Resist Formulations And Methods

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNE...

METHOD FOR MANUFACTURING MICRO-STRUCTURE

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PA...

PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THERE...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PA...

PHOTORESIST COMPOSITION, THIN FILM TRANSISTOR ARRAY PANEL, AND METH...