Connection or combination with other apparatus

Industry

CPC
H01J37/32889

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32889Connection or combination with other apparatus

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 12,131,952
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF pulsing assisted low-k film deposition with high mechanical stre...
- Patent number 12,125,675
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Ruitong Xiong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma cleaning of chambers for electronics manufacturing sy...
- Patent number 11,854,773
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for coating plastic bottles
- Patent number 11,634,809
- Issue date Apr 25, 2023
- KHS GmbH
- Sebastian Kytzia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 11,621,194
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Vacuum processing apparatus and operating method of vacuum processi...
- Patent number 11,600,472
- Issue date Mar 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Ryoichi Isomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling multiple plasma processes
- Patent number 11,538,670
- Issue date Dec 27, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling multiple plasma processes
- Patent number 11,430,642
- Issue date Aug 30, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and maintenance apparatus
- Patent number 11,309,168
- Issue date Apr 19, 2022
- Tokyo Electron Limited
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for galvanizing by plasma evaporation
- Patent number 11,268,185
- Issue date Mar 8, 2022
- NEOVAC GMBH
- Pierre Vandenbrande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generator configured for use with an auxiliary device
- Patent number 11,197,708
- Issue date Dec 14, 2021
- GYRUS ACMI, INC.
- Ming J. Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display panel, plasma etching method and system
- Patent number 11,189,797
- Issue date Nov 30, 2021
- WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Pengbin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wastage determination method and plasma processing apparatus
- Patent number 11,183,374
- Issue date Nov 23, 2021
- Tokyo Electron Limited
- Shu Kusano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for using O-rings to apply holding forces
- Patent number 11,145,496
- Issue date Oct 12, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Daniel McGillicudy
- E05 - LOCKS KEYS WINDOW OR DOOR FITTINGS SAFES
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 10,991,551
- Issue date Apr 27, 2021
- Tokyo Electron Limited
- Mohd Fairuz Bin Budiman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing system and met...
- Patent number 10,930,533
- Issue date Feb 23, 2021
- Kokusai Electric Corporation
- Yasuhiro Mizuguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 10,910,271
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for treating objects with plasma, use of this apparatus a...
- Patent number 10,903,058
- Issue date Jan 26, 2021
- COATING PLASMA INDUSTRIE
- Jocelyn Viard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system for small substrates
- Patent number 10,883,168
- Issue date Jan 5, 2021
- Massachusetts Institute of Technology
- Mitchell David Hsing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for collection and subsequent reaction of liquid and soli...
- Patent number 10,861,681
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- James L'Heureux
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Drop-on-demand identification document printing with surface pre-tr...
- Patent number 10,800,194
- Issue date Oct 13, 2020
- ENTRUST DATACARD CORPORATION
- Cory Wooldridge
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Grant
Precleaning apparatus and substrate processing system
- Patent number 10,790,133
- Issue date Sep 29, 2020
- Samsung Electronics Co., Ltd.
- Keum Seok Park
- B08 - CLEANING
Information Patent Grant
Wastage determination method and plasma processing apparatus
- Patent number 10,763,089
- Issue date Sep 1, 2020
- Tokyo Electron Limited
- Shu Kusano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System architecture for combined static and pass-by processing
- Patent number 10,752,987
- Issue date Aug 25, 2020
- Intevac, Inc.
- Patrick Leahey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 10,714,390
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Processing chamber, combination of processing chamber and loadlock,...
- Patent number 10,685,814
- Issue date Jun 16, 2020
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Heng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor vessel having improved plasma uniformity comprised o...
- Patent number 10,658,159
- Issue date May 19, 2020
- INDEOTEC SA
- Omid Reza Shojaei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Drop-on-demand identification document printing with surface pre-tr...
- Patent number 10,576,769
- Issue date Mar 3, 2020
- ENTRUST DATACARD CORPORATION
- Cory Wooldridge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 10,566,238
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Effusion cells, deposition systems including effusion cells, and re...
- Patent number 10,329,688
- Issue date Jun 25, 2019
- Innovative Advanced Materials, Inc.
- William Alan Doolittle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SY...
- Publication number 20240062999
- Publication date Feb 22, 2024
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230411184
- Publication date Dec 21, 2023
- SEMES CO., LTD.
- Kwang Ryul KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20230207393
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...
- Publication number 20230094012
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Ruitong Xiong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND MAINTENANCE APPARATUS
- Publication number 20220216035
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Takehiro UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SY...
- Publication number 20210305028
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20210134676
- Publication date May 6, 2021
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
DISPLAY PANEL, PLASMA ETCHING METHOD AND SYSTEM
- Publication number 20210119128
- Publication date Apr 22, 2021
- Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Pengbin ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing System For Small Substrates
- Publication number 20210087671
- Publication date Mar 25, 2021
- Massachusetts Institute of Technology
- Mitchell David Hsing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200350148
- Publication date Nov 5, 2020
- TOKYO ELECTRON LIMITED
- Shu KUSANO
- B08 - CLEANING
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200328064
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20200286787
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
DROP-ON-DEMAND IDENTIFICATION DOCUMENT PRINTING WITH SURFACE PRE-TR...
- Publication number 20200164672
- Publication date May 28, 2020
- ENTRUST DATACARD CORPORATION
- Cory Wooldridge
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20200118880
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CONTROLLING MULTIPLE PLASMA PROCESSES
- Publication number 20200066497
- Publication date Feb 27, 2020
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
CONTROLLING MULTIPLE PLASMA PROCESSES
- Publication number 20200058475
- Publication date Feb 20, 2020
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190378698
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Shu KUSANO
- B08 - CLEANING
Information Patent Application
System For Using O-Rings To Apply Holding Forces
- Publication number 20190371580
- Publication date Dec 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel McGillicudy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR CONFIGURED FOR USE WITH AN AUXILIARY DEVICE
- Publication number 20190262058
- Publication date Aug 29, 2019
- Gyrus ACMI, Inc. d/b/a Olympus Surgical Technologies America
- Ming J. Cheng
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20190088549
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
INTEGRATED EPITAXY SYSTEM HIGH TEMPERATURE CONTAMINANT REMOVAL
- Publication number 20190062904
- Publication date Feb 28, 2019
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER FOR IMPROVED PRECURSOR FLOW
- Publication number 20180337024
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Tien Fak Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLI...
- Publication number 20180337027
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- James L'HEUREUX
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
DROP-ON-DEMAND IDENTIFICATION DOCUMENT PRINTING WITH SURFACE PRE-TR...
- Publication number 20180257416
- Publication date Sep 13, 2018
- ENTRUST DATACARD CORPORATION
- Cory Wooldridge
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
SENSING SYSTEM, SENSING WAFER, AND PLASMA PROCESSING APPARATUS
- Publication number 20180261481
- Publication date Sep 13, 2018
- Toshiba Memory Corporation
- Hideo ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SPRAY COATING FOR SEALING A DEFECT AREA IN A WORKPIECE
- Publication number 20180223410
- Publication date Aug 9, 2018
- GE-HITACHI NUCLEAR ENERGY AMERICAS LLC
- Henry Peter OFFER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED SUBSTRATE DEFECT DETECTION USING PRECISION COATING
- Publication number 20180166307
- Publication date Jun 14, 2018
- LAM RESEARCH CORPORATION
- Matthew Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STATION PLASMA REACTOR WITH RF BALANCING
- Publication number 20180163302
- Publication date Jun 14, 2018
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR TREATING OBJECTS WITH PLASMA, USE OF THIS APPARATUS A...
- Publication number 20180053639
- Publication date Feb 22, 2018
- COATING PLASMA INDUSTRIE
- Jocelyn VIARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Passivation of Laser Facets and Systems for Performing the Same
- Publication number 20170310077
- Publication date Oct 26, 2017
- TRUMPF PHOTONICS, INC.
- Qiang Zhang
- C30 - CRYSTAL GROWTH

Connection or combination with other apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer dicing using femtosecond-based laser and plasma etch

RF pulsing assisted low-k film deposition with high mechanical stre...

Remote plasma cleaning of chambers for electronics manufacturing sy...

Method and apparatus for coating plastic bottles

Wafer dicing using femtosecond-based laser and plasma etch

Vacuum processing apparatus and operating method of vacuum processi...

Controlling multiple plasma processes

Controlling multiple plasma processes

Vacuum processing apparatus and maintenance apparatus

Method and system for galvanizing by plasma evaporation

Plasma generator configured for use with an auxiliary device

Display panel, plasma etching method and system

Wastage determination method and plasma processing apparatus

System for using O-rings to apply holding forces

Cleaning method and plasma processing apparatus

Substrate processing apparatus, substrate processing system and met...

Wafer dicing using femtosecond-based laser and plasma etch

Apparatus for treating objects with plasma, use of this apparatus a...

Processing system for small substrates

Apparatus for collection and subsequent reaction of liquid and soli...

Drop-on-demand identification document printing with surface pre-tr...

Precleaning apparatus and substrate processing system

Wastage determination method and plasma processing apparatus

System architecture for combined static and pass-by processing

Wafer dicing using femtosecond-based laser and plasma etch

Processing chamber, combination of processing chamber and loadlock,...

Plasma reactor vessel having improved plasma uniformity comprised o...

Drop-on-demand identification document printing with surface pre-tr...

Wafer dicing using femtosecond-based laser and plasma etch

Effusion cells, deposition systems including effusion cells, and re...

Patents Applicationslast 30 patents

REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SY...

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...

VACUUM PROCESSING APPARATUS AND MAINTENANCE APPARATUS

REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SY...

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

DISPLAY PANEL, PLASMA ETCHING METHOD AND SYSTEM

Processing System For Small Substrates

WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

DROP-ON-DEMAND IDENTIFICATION DOCUMENT PRINTING WITH SURFACE PRE-TR...

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

CONTROLLING MULTIPLE PLASMA PROCESSES

CONTROLLING MULTIPLE PLASMA PROCESSES

WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS

System For Using O-Rings To Apply Holding Forces

PLASMA GENERATOR CONFIGURED FOR USE WITH AN AUXILIARY DEVICE

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

INTEGRATED EPITAXY SYSTEM HIGH TEMPERATURE CONTAMINANT REMOVAL

SEMICONDUCTOR PROCESSING CHAMBER FOR IMPROVED PRECURSOR FLOW

APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLI...

DROP-ON-DEMAND IDENTIFICATION DOCUMENT PRINTING WITH SURFACE PRE-TR...

SENSING SYSTEM, SENSING WAFER, AND PLASMA PROCESSING APPARATUS

PLASMA SPRAY COATING FOR SEALING A DEFECT AREA IN A WORKPIECE

INTEGRATED SUBSTRATE DEFECT DETECTION USING PRECISION COATING

MULTI-STATION PLASMA REACTOR WITH RF BALANCING

APPARATUS FOR TREATING OBJECTS WITH PLASMA, USE OF THIS APPARATUS A...

Passivation of Laser Facets and Systems for Performing the Same