Construction (includes replacing parts of the apparatus)

Industry

CPC
H01J37/32807

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32807Construction (includes replacing parts of the apparatus)

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods for spindle mechanism monitoring and maintenance in process...
- Patent number 12,362,157
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ focus ring coating
- Patent number 12,354,842
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Encapsulated RFID in consumable chamber parts
- Patent number 12,354,895
- Issue date Jul 8, 2025
- Lam Research Corporation
- Gordon Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for inductively coupled plasma and method of assembl...
- Patent number 12,327,713
- Issue date Jun 10, 2025
- LOT CES CO., LTD.
- Jin Ho Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,308,220
- Issue date May 20, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and method for installing edge ring
- Patent number 12,308,221
- Issue date May 20, 2025
- Tokyo Electron Limited
- Takashi Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for improving fusion bonding
- Patent number 12,243,848
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hong-Ta Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Moveable edge ring designs
- Patent number 12,230,482
- Issue date Feb 18, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detaching and installing device for gas distribution plate of etchi...
- Patent number 12,230,480
- Issue date Feb 18, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Ko Wei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Joining techniques for composite ceramic bodies
- Patent number 12,211,685
- Issue date Jan 28, 2025
- Lam Research Corporation
- Karl Frederick Leeser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,176,186
- Issue date Dec 24, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Window for plasma OES diagnosis, and plasma apparatus using same
- Patent number 12,154,769
- Issue date Nov 26, 2024
- KOREA INSTITUTE OF FUSION ENERGY
- Kang Il Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber for an optical emission spectroscopy instrument
- Patent number 12,148,599
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH ANALYTICAL SCIENCE GMBH
- André Peters
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated transfer of edge ring requiring rotational alignment
- Patent number 12,142,466
- Issue date Nov 12, 2024
- Lam Research Corporation
- Damon Tyrone Genetti
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Transfer system, transfer device, and transfer method
- Patent number 12,131,937
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring replacement method and plasma processing system
- Patent number 12,094,696
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Shigeru Ishizawa
- B08 - CLEANING
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for inductively coupled plasma and method of assembl...
- Patent number 12,062,528
- Issue date Aug 13, 2024
- LOT CES CO., LTD.
- Jin Ho Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 12,051,569
- Issue date Jul 30, 2024
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for cleaning off d...
- Patent number 12,051,572
- Issue date Jul 30, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Wulin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Connect structure for semiconductor processing equipment
- Patent number 12,040,163
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and wear amount measurement method
- Patent number 12,033,838
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Joji Takayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma shutter and substrate processing apparatus including the same
- Patent number 12,009,187
- Issue date Jun 11, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process cooling-water isolation
- Patent number 12,002,658
- Issue date Jun 4, 2024
- Lam Research Corporation
- Sreeram Sonti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring replacement method and plasma processing system
- Patent number 11,990,323
- Issue date May 21, 2024
- Tokyo Electron Limited
- Shigeru Ishizawa
- B08 - CLEANING
Information Patent Grant
Methods for processing a semiconductor substrate
- Patent number 11,972,935
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method of component and plasma processing apparatus
- Patent number 11,967,487
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detector for process kit ring wear
- Patent number 11,913,777
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,791,140
- Issue date Oct 17, 2023
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lattice coat surface enhancement for chamber components
- Patent number 11,739,411
- Issue date Aug 29, 2023
- Applied Materials, Inc.
- Lit Ping Lam
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250232965
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250210330
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK
- Publication number 20250210325
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Atsushi KAWABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESC DESIGN WITH ENHANCED TUNABILITY FOR WAFER FAR EDGE PLASMA PROFI...
- Publication number 20250201538
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Jian LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELDING PLASMA ETCHING DATA COLLECTION WINDOWS USING POSITIVELY C...
- Publication number 20250191890
- Publication date Jun 12, 2025
- International Business Machines Corporation
- Viswas Purohit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...
- Publication number 20250183009
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Amin Azimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING FUSION BONDING
- Publication number 20250174595
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hong-Ta Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...
- Publication number 20250157795
- Publication date May 15, 2025
- SEMES CO., LTD.
- Jun Seok PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES
- Publication number 20250115522
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Karl Frederick LEESER
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
- Publication number 20250095949
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Christopher A. Rowland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION APPARATUS
- Publication number 20250095966
- Publication date Mar 20, 2025
- LEYDENJAR TECHNOLOGEIS B.V.
- Pavel KUDLACEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING
- Publication number 20250079138
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REGENERATING METHOD FOR INNER MEMBER OF PLASMA PROCESSING APPARATUS
- Publication number 20250046582
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Wenhao WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20250046585
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250046583
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...
- Publication number 20250022691
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Shang-I CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250014875
- Publication date Jan 9, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Systems with Rotating Electrostatic Chuck and Methods Th...
- Publication number 20240376602
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES
- Publication number 20240379316
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- Karl Frederick LEESER
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...
- Publication number 20240371613
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...
- Publication number 20240363316
- Publication date Oct 31, 2024
- LOT CES CO., LTD.
- Jin Ho BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20240355591
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS COOLING-WATER ISOLATION
- Publication number 20240312768
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Sreeram SONTI
- G01 - MEASURING TESTING
Information Patent Application
ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...
- Publication number 20240290583
- Publication date Aug 29, 2024
- AMOSENSE CO.,LTD
- Ji Hyung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU FOCUS RING COATING
- Publication number 20240249921
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT
- Publication number 20240234110
- Publication date Jul 11, 2024
- Hitachi High-Tech Analytical Science GmbH
- André PETERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE
- Publication number 20240222097
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Hsiang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...
- Publication number 20240212990
- Publication date Jun 27, 2024
- CoorsTek KK
- Manami Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213031
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Atsuki HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS

Construction (includes replacing parts of the apparatus)

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods for spindle mechanism monitoring and maintenance in process...

In-situ focus ring coating

Encapsulated RFID in consumable chamber parts

Plasma reactor for inductively coupled plasma and method of assembl...

Wafer placement table

Substrate processing system and method for installing edge ring

Methods and systems for improving fusion bonding

Moveable edge ring designs

Detaching and installing device for gas distribution plate of etchi...

Joining techniques for composite ceramic bodies

Wafer placement table

Window for plasma OES diagnosis, and plasma apparatus using same

Plasma chamber for an optical emission spectroscopy instrument

Automated transfer of edge ring requiring rotational alignment

Transfer system, transfer device, and transfer method

Focus ring replacement method and plasma processing system

Bottom electrode assembly, plasma processing apparatus, and method...

Plasma reactor for inductively coupled plasma and method of assembl...

Deposition apparatus and deposition method using the same

Semiconductor manufacturing apparatus and method for cleaning off d...

Connect structure for semiconductor processing equipment

Plasma processing apparatus and wear amount measurement method

Plasma shutter and substrate processing apparatus including the same

Process cooling-water isolation

Focus ring replacement method and plasma processing system

Methods for processing a semiconductor substrate

Forming method of component and plasma processing apparatus

Detector for process kit ring wear

Confinement ring for use in a plasma processing system

Lattice coat surface enhancement for chamber components

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK

ESC DESIGN WITH ENHANCED TUNABILITY FOR WAFER FAR EDGE PLASMA PROFI...

SHIELDING PLASMA ETCHING DATA COLLECTION WINDOWS USING POSITIVELY C...

METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...

METHODS AND SYSTEMS FOR IMPROVING FUSION BONDING

ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...

JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES

ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES

PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION APPARATUS

SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING

REGENERATING METHOD FOR INNER MEMBER OF PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

SUBSTRATE PROCESSING SYSTEM

WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...

WAFER PLACEMENT TABLE

Deposition Systems with Rotating Electrostatic Chuck and Methods Th...

JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES

HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...

PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...

CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT

PROCESS COOLING-WATER ISOLATION

ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...

IN-SITU FOCUS RING COATING

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT

METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS