Construction (includes replacing parts of the apparatus)

Industry

CPC
H01J37/32807

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32807Construction (includes replacing parts of the apparatus)

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Wafer placement table
- Patent number 12,176,186
- Issue date Dec 24, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Window for plasma OES diagnosis, and plasma apparatus using same
- Patent number 12,154,769
- Issue date Nov 26, 2024
- KOREA INSTITUTE OF FUSION ENERGY
- Kang Il Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber for an optical emission spectroscopy instrument
- Patent number 12,148,599
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH ANALYTICAL SCIENCE GMBH
- André Peters
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated transfer of edge ring requiring rotational alignment
- Patent number 12,142,466
- Issue date Nov 12, 2024
- Lam Research Corporation
- Damon Tyrone Genetti
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Transfer system, transfer device, and transfer method
- Patent number 12,131,937
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring replacement method and plasma processing system
- Patent number 12,094,696
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Shigeru Ishizawa
- B08 - CLEANING
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for inductively coupled plasma and method of assembl...
- Patent number 12,062,528
- Issue date Aug 13, 2024
- LOT CES CO., LTD.
- Jin Ho Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 12,051,569
- Issue date Jul 30, 2024
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for cleaning off d...
- Patent number 12,051,572
- Issue date Jul 30, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Wulin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Connect structure for semiconductor processing equipment
- Patent number 12,040,163
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and wear amount measurement method
- Patent number 12,033,838
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Joji Takayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma shutter and substrate processing apparatus including the same
- Patent number 12,009,187
- Issue date Jun 11, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process cooling-water isolation
- Patent number 12,002,658
- Issue date Jun 4, 2024
- Lam Research Corporation
- Sreeram Sonti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring replacement method and plasma processing system
- Patent number 11,990,323
- Issue date May 21, 2024
- Tokyo Electron Limited
- Shigeru Ishizawa
- B08 - CLEANING
Information Patent Grant
Methods for processing a semiconductor substrate
- Patent number 11,972,935
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method of component and plasma processing apparatus
- Patent number 11,967,487
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detector for process kit ring wear
- Patent number 11,913,777
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,791,140
- Issue date Oct 17, 2023
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lattice coat surface enhancement for chamber components
- Patent number 11,739,411
- Issue date Aug 29, 2023
- Applied Materials, Inc.
- Lit Ping Lam
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Plasma device having exchangeable handpiece
- Patent number 11,664,204
- Issue date May 30, 2023
- FEMTO SCIENCE INC
- Moo Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 11,637,001
- Issue date Apr 25, 2023
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 11,569,069
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method of manufacturing ring-shaped member and ring-shaped member
- Patent number 11,551,915
- Issue date Jan 10, 2023
- THINKON NEW TECHNOLOGY JAPAN CORPORATION
- Atsushi Ikari
- C30 - CRYSTAL GROWTH
Information Patent Grant
Capacitive sensing data integration for plasma chamber condition mo...
- Patent number 11,545,346
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End effectors for moving workpieces and replaceable parts within a...
- Patent number 11,515,127
- Issue date Nov 29, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring adjustment assembly of a system for processing workpiece...
- Patent number 11,508,560
- Issue date Nov 22, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Semiconductor manufacturing apparatus having an insulating plate
- Patent number 11,508,557
- Issue date Nov 22, 2022
- Samsung Electronics Co., Ltd.
- Sung-Joo An
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus including edge ring
- Patent number 11,501,994
- Issue date Nov 15, 2022
- Samsung Electronics Co., Ltd.
- Ja Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,495,444
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Masato Kon
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...
- Publication number 20250022691
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Shang-I CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250014875
- Publication date Jan 9, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Systems with Rotating Electrostatic Chuck and Methods Th...
- Publication number 20240376602
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES
- Publication number 20240379316
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- Karl Frederick LEESER
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...
- Publication number 20240371613
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...
- Publication number 20240363316
- Publication date Oct 31, 2024
- LOT CES CO., LTD.
- Jin Ho BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20240355591
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS COOLING-WATER ISOLATION
- Publication number 20240312768
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Sreeram SONTI
- G01 - MEASURING TESTING
Information Patent Application
ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...
- Publication number 20240290583
- Publication date Aug 29, 2024
- AMOSENSE CO.,LTD
- Ji Hyung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU FOCUS RING COATING
- Publication number 20240249921
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT
- Publication number 20240234110
- Publication date Jul 11, 2024
- Hitachi High-Tech Analytical Science GmbH
- André PETERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE
- Publication number 20240222097
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Hsiang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...
- Publication number 20240212990
- Publication date Jun 27, 2024
- CoorsTek KK
- Manami Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213031
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Atsuki HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTOR FOR PROCESS KIT RING WEAR
- Publication number 20240183656
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT
- Publication number 20240136163
- Publication date Apr 25, 2024
- Hitachi High-Tech Analytical Science GmbH
- André PETERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONSUMABLE MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...
- Publication number 20240128057
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC ANISOTROPIC SUBSTRATE SUPPORTS
- Publication number 20240128062
- Publication date Apr 18, 2024
- LAM RESEARCH CORPORATION
- Joel HOLLINGSWORTH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPONENT REPLACEMENT METHOD, COMPONENT REPLACEMENT DEVICE, AND COM...
- Publication number 20240128064
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
- Publication number 20240120180
- Publication date Apr 11, 2024
- LAM RESEARCH CORPORATION
- Yuanping SONG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20240105428
- Publication date Mar 28, 2024
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHUTTER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20240096606
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240038503
- Publication date Feb 1, 2024
- HANA MATERIALS INC.
- Je Guen YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20240021416
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR RETROFITTING AN ETCHING APPARATUS
- Publication number 20230411127
- Publication date Dec 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tai-Jung CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230377852
- Publication date Nov 23, 2023
- SEMES CO., LTD.
- Junseok Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANODIZATION FOR METAL MATRIX COMPOSITE SEMICONDUCTOR PROCESSING CHA...
- Publication number 20230343627
- Publication date Oct 26, 2023
- LAM RESEARCH CORPORATION
- Debanjan DAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20230343564
- Publication date Oct 26, 2023
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...
- Publication number 20230343568
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Yaoling Pan
- G01 - MEASURING TESTING

Construction (includes replacing parts of the apparatus)

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer placement table

Window for plasma OES diagnosis, and plasma apparatus using same

Plasma chamber for an optical emission spectroscopy instrument

Automated transfer of edge ring requiring rotational alignment

Transfer system, transfer device, and transfer method

Focus ring replacement method and plasma processing system

Bottom electrode assembly, plasma processing apparatus, and method...

Plasma reactor for inductively coupled plasma and method of assembl...

Deposition apparatus and deposition method using the same

Semiconductor manufacturing apparatus and method for cleaning off d...

Connect structure for semiconductor processing equipment

Plasma processing apparatus and wear amount measurement method

Plasma shutter and substrate processing apparatus including the same

Process cooling-water isolation

Focus ring replacement method and plasma processing system

Methods for processing a semiconductor substrate

Forming method of component and plasma processing apparatus

Detector for process kit ring wear

Confinement ring for use in a plasma processing system

Lattice coat surface enhancement for chamber components

Plasma device having exchangeable handpiece

Deposition apparatus and deposition method using the same

3D printed chamber components configured for lower film stress and...

Method of manufacturing ring-shaped member and ring-shaped member

Capacitive sensing data integration for plasma chamber condition mo...

End effectors for moving workpieces and replaceable parts within a...

Focus ring adjustment assembly of a system for processing workpiece...

Semiconductor manufacturing apparatus having an insulating plate

Substrate processing apparatus including edge ring

Substrate processing apparatus and substrate processing method

Patents Applicationslast 30 patents

WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...

WAFER PLACEMENT TABLE

Deposition Systems with Rotating Electrostatic Chuck and Methods Th...

JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES

HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...

PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...

CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT

PROCESS COOLING-WATER ISOLATION

ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...

IN-SITU FOCUS RING COATING

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT

METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

DETECTOR FOR PROCESS KIT RING WEAR

PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT

CONSUMABLE MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...

MONOLITHIC ANISOTROPIC SUBSTRATE SUPPORTS

COMPONENT REPLACEMENT METHOD, COMPONENT REPLACEMENT DEVICE, AND COM...

POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS

WAFER PLACEMENT TABLE

PLASMA SHUTTER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

FOCUS RING AND METHOD FOR MANUFACTURING THE SAME

CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT

METHODS FOR RETROFITTING AN ETCHING APPARATUS

SUBSTRATE PROCESSING APPARATUS

ANODIZATION FOR METAL MATRIX COMPOSITE SEMICONDUCTOR PROCESSING CHA...

WAFER PLACEMENT TABLE

CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...