Constructional issues related to vacuum environment

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G03F7/70841

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/70841Constructional issues related to vacuum environment

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protection device for lines in a projection printing installation f...
- Patent number 12,038,695
- Issue date Jul 16, 2024
- Carl Zeiss SMT GmbH
- Tobias Hegele
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Vessel for a radiation source
- Patent number 12,007,699
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Sander Kerssemakers
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle beam inspection apparatus
- Patent number 11,942,340
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Jeroen Gerard Gosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-volume baking chamber for mask clean
- Patent number 11,921,422
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 11,803,129
- Issue date Oct 31, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-volume baking chamber for mask clean
- Patent number 11,644,748
- Issue date May 9, 2023
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) mask inspection system, a load-lock chamb...
- Patent number 11,531,277
- Issue date Dec 20, 2022
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-rotation coupling
- Patent number 11,500,297
- Issue date Nov 15, 2022
- ASML Netherlands B.V.
- David Bessems
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Particle beam inspection apparatus
- Patent number 11,430,678
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Jeroen Gerard Gosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method involving a...
- Patent number 11,378,893
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Theodorus Petrus Maria Cadee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration isolation system and lithographic apparatus
- Patent number 11,249,403
- Issue date Feb 15, 2022
- ASML Netherlands B.V.
- Franciscus Maria Joannes Linssen
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
In-situ light detection methods and apparatus for ultraviolet semic...
- Patent number 11,215,934
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Ralph Peter Antonio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring apparatus for vacuum chamber and measuring system includi...
- Patent number 11,169,449
- Issue date Nov 9, 2021
- Samsung Electronics Co., Ltd.
- Daesung Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum actuator containment for molecular contaminant and particle...
- Patent number 11,156,926
- Issue date Oct 26, 2021
- KLA Corporation
- Zefram D. Marks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for lithography in semiconductor fabrication
- Patent number 11,121,018
- Issue date Sep 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chueh-Chi Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid tamped targets for extreme ultraviolet lithography
- Patent number 11,086,226
- Issue date Aug 10, 2021
- Lawrence Livermore National Security, LLC
- Yechiel R. Frank
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective lens protection device, objective lens system and lithogr...
- Patent number 10,983,448
- Issue date Apr 20, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Xianming Li
- G02 - OPTICS
Information Patent Grant
Component for a projection exposure apparatus
- Patent number 10,866,528
- Issue date Dec 15, 2020
- Carl Zeiss SMT GmbH
- Thomas Wolfsteiner
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method involving a...
- Patent number 10,838,310
- Issue date Nov 17, 2020
- ASML Netherlands B.V.
- Theodorus Petrus Maria Cadee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration isolator, lithographic apparatus and device manufacturing...
- Patent number 10,816,910
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Hans Butler
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Method and apparatus for lithography in semiconductor fabrication
- Patent number 10,714,371
- Issue date Jul 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chueh-Chi Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle stage and method for using the same
- Patent number 10,663,871
- Issue date May 26, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Yu Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical apparatus and vibration removing method
- Patent number 10,645,289
- Issue date May 5, 2020
- Lasertec Corporation
- Haruhiko Kusunose
- G02 - OPTICS
Information Patent Grant
Method for creating vacuum in load lock chamber
- Patent number 10,627,728
- Issue date Apr 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Jung Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum system, in particular EUV lithography system, and optical el...
- Patent number 10,599,052
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Matthias Roos
- B08 - CLEANING
Information Patent Grant
Device for transmitting electrical signals, and lithography apparatus
- Patent number 10,459,351
- Issue date Oct 29, 2019
- Carl Zeiss SMT GmbH
- Jan Horn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus, discharge method, and program
- Patent number 10,438,820
- Issue date Oct 8, 2019
- Ebara Corporation
- Naoki Toyomura
- B08 - CLEANING
Information Patent Grant
Methods and apparatuses for protecting a seal in a pressure vessel...
- Patent number 10,437,162
- Issue date Oct 8, 2019
- ASML Netherlands B.V.
- David Bessems
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic apparatus and method of changing an optical wavef...
- Patent number 10,423,082
- Issue date Sep 24, 2019
- Carl Zeiss SMT GmbH
- Leonid Gorkhover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240404780
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Masahiro KAMIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20240288777
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G02 - OPTICS
Information Patent Application
SUBSTRATE HOLDER AND METHOD
- Publication number 20240264540
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van de Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM INSPECTION APPARATUS
- Publication number 20240258138
- Publication date Aug 1, 2024
- ASML NETHERLANDS B.V.
- Jeroen Gerard GOSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM
- Publication number 20240003827
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chien-Lin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20230375947
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID TAMPED TARGETS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20230280656
- Publication date Sep 7, 2023
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Yechiel R. FRANK
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET SUPPLY SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATU...
- Publication number 20230266677
- Publication date Aug 24, 2023
- Gigaphoton Inc.
- Fumio IWAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLAMMABLE GAS DILUTER AND METHOD THEREFORE
- Publication number 20230234004
- Publication date Jul 27, 2023
- Edwards Limited
- Joanne Rachel Greenwood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLAMMABLE GAS DILUTION
- Publication number 20230149865
- Publication date May 18, 2023
- Edwards Limited
- Joanne Rachel Greenwood
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20230046032
- Publication date Feb 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VESSEL FOR A RADIATION SOURCE
- Publication number 20230023631
- Publication date Jan 26, 2023
- ASML NETHERLANDS B.V.
- Sander KERSSEMAKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE BEAM INSPECTION APPARATUS
- Publication number 20220415678
- Publication date Dec 29, 2022
- ASML NETHERLANDS B.V.
- Jeroen Gerard GOSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20220390859
- Publication date Dec 8, 2022
- SEMES CO., LTD.
- Ho Jin JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-VOLUME BAKING CHAMBER FOR MASK CLEAN
- Publication number 20220326606
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SINGLE-VOLUME BAKING CHAMBER FOR MASK CLEAN
- Publication number 20220326605
- Publication date Oct 13, 2022
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) MASK INSPECTION SYSTEM, A LOAD-LOCK CHAMB...
- Publication number 20220283519
- Publication date Sep 8, 2022
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTION DEVICE FOR LINES IN A PROJECTION PRINTING INSTALLATION F...
- Publication number 20210336429
- Publication date Oct 28, 2021
- Carl Zeiss SMT GMBH
- Tobias Hegele
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
IN-SITU LIGHT DETECTION METHODS AND APPARATUS FOR ULTRAVIOLET SEMIC...
- Publication number 20210223707
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- RALPH PETER ANTONIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VIBRATION ISOLATION SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20210181639
- Publication date Jun 17, 2021
- ASML NETHERLANDS B.V.
- Franciscus Maria Joannes LINSSEN
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
SUBSTRATE TREATING APPARATUS WITH PARALLEL SUBSTRATE TREATMENT LINE...
- Publication number 20210134626
- Publication date May 6, 2021
- SCREEN Semiconductor Solutions Co., Ltd.
- Hiroyuki Ogura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...
- Publication number 20210063898
- Publication date Mar 4, 2021
- ASML NETHERLANDS B.V.
- Theodorus Petrus Maria CADEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM ACTUATOR CONTAINMENT FOR MOLECULAR CONTAMINANT AND PARTICLE...
- Publication number 20210048756
- Publication date Feb 18, 2021
- KLA Corporation
- Zefram D. Marks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LITHOGRAPHY IN SEMICONDUCTOR FABRICATION
- Publication number 20200350194
- Publication date Nov 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chueh-Chi KUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE BEAM INSPECTION APPARATUS
- Publication number 20200027763
- Publication date Jan 23, 2020
- ASML Netherlands B.V.
- Jeroen Gerard GOSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...
- Publication number 20190235397
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Theodorus Petrus Maria CADEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM SYSTEM, IN PARTICULAR EUV LITHOGRAPHY SYSTEM, AND OPTICAL EL...
- Publication number 20190196344
- Publication date Jun 27, 2019
- Carl Zeiss SMT GMBH
- Matthias Roos
- B08 - CLEANING
Information Patent Application
DEVICE FOR TRANSMITTING ELECTRICAL SIGNALS, AND LITHOGRAPHY APPARATUS
- Publication number 20190196343
- Publication date Jun 27, 2019
- Carl Zeiss SMT GMBH
- Jan Horn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUSES FOR PROTECTING A SEAL IN A PRESSURE VESSEL...
- Publication number 20190155177
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- David Bessems
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY
- Publication number 20190094715
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Andrew John HARPHAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Constructional issues related to vacuum environment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor processing tool and methods of operation

Protection device for lines in a projection printing installation f...

Vessel for a radiation source

Particle beam inspection apparatus

Single-volume baking chamber for mask clean

Semiconductor processing tool and methods of operation

Multi-volume baking chamber for mask clean

Extreme ultraviolet (EUV) mask inspection system, a load-lock chamb...

Anti-rotation coupling

Particle beam inspection apparatus

Lithographic apparatus and device manufacturing method involving a...

Vibration isolation system and lithographic apparatus

In-situ light detection methods and apparatus for ultraviolet semic...

Measuring apparatus for vacuum chamber and measuring system includi...

Vacuum actuator containment for molecular contaminant and particle...

Method and apparatus for lithography in semiconductor fabrication

Liquid tamped targets for extreme ultraviolet lithography

Objective lens protection device, objective lens system and lithogr...

Component for a projection exposure apparatus

Lithographic apparatus and device manufacturing method involving a...

Vibration isolator, lithographic apparatus and device manufacturing...

Method and apparatus for lithography in semiconductor fabrication

Reticle stage and method for using the same

Optical apparatus and vibration removing method

Method for creating vacuum in load lock chamber

Vacuum system, in particular EUV lithography system, and optical el...

Device for transmitting electrical signals, and lithography apparatus

Substrate processing apparatus, discharge method, and program

Methods and apparatuses for protecting a seal in a pressure vessel...

Microlithographic apparatus and method of changing an optical wavef...

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING APPARATUS

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

SUBSTRATE HOLDER AND METHOD

PARTICLE BEAM INSPECTION APPARATUS

SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

LIQUID TAMPED TARGETS FOR EXTREME ULTRAVIOLET LITHOGRAPHY

TARGET SUPPLY SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATU...

FLAMMABLE GAS DILUTER AND METHOD THEREFORE

FLAMMABLE GAS DILUTION

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

VESSEL FOR A RADIATION SOURCE

PARTICLE BEAM INSPECTION APPARATUS

SUBSTRATE TREATING APPARATUS

MULTI-VOLUME BAKING CHAMBER FOR MASK CLEAN

SINGLE-VOLUME BAKING CHAMBER FOR MASK CLEAN

EXTREME ULTRAVIOLET (EUV) MASK INSPECTION SYSTEM, A LOAD-LOCK CHAMB...

PROTECTION DEVICE FOR LINES IN A PROJECTION PRINTING INSTALLATION F...

IN-SITU LIGHT DETECTION METHODS AND APPARATUS FOR ULTRAVIOLET SEMIC...

VIBRATION ISOLATION SYSTEM AND LITHOGRAPHIC APPARATUS

SUBSTRATE TREATING APPARATUS WITH PARALLEL SUBSTRATE TREATMENT LINE...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...

VACUUM ACTUATOR CONTAINMENT FOR MOLECULAR CONTAMINANT AND PARTICLE...

METHOD AND APPARATUS FOR LITHOGRAPHY IN SEMICONDUCTOR FABRICATION

PARTICLE BEAM INSPECTION APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...

VACUUM SYSTEM, IN PARTICULAR EUV LITHOGRAPHY SYSTEM, AND OPTICAL EL...

DEVICE FOR TRANSMITTING ELECTRICAL SIGNALS, AND LITHOGRAPHY APPARATUS

METHODS AND APPARATUSES FOR PROTECTING A SEAL IN A PRESSURE VESSEL...

VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY