Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing

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Patents Grantslast 30 patents

Information Patent Grant
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Mask forming imageable material and use
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Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Aromatic underlayer

Metal circuit structure based on FPC and method of making the same

Coating compositions and methods of forming electronic devices

Laminate for patterned substrates

Method for exposing photopolymerization layer comprising photopolymer

Photosensitive resin composition

Display substrate, method for preparing the same, and display device

Laminate for patterned substrates

Composite panel with barrier layer and method for manufacturing a l...

Relief image-forming method and assembly

Mask element precursor and relief image-forming system

Automated UV-LED exposure of flexographic printing plates

Pattern formed body

Method for producing liquid crystal display apparatus with a unifor...

Method for producing a flexographic printing frame through multiple...

Photo mask and exposure system

Method of manufacturing mask and method of manufacturing display de...

Automated UV-LED exposure of flexographic printing plates

Pattern forming method

Wet strippable gap fill materials

Method of forming patterns

Patterning method using surface plasmon

Pattern formation method

Mask forming imageable material and use

Pattern forming method, alkali-developable thermosetting resin comp...

Techniques for marking product housings

Composition for forming tungsten oxide film and method for producin...

Mask forming imageable material and use

Method for patterning flexible substrate

Techniques for generating three dimensional structures

Patents Applicationslast 30 patents

POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...

Material For Forming Organic Film, Patterning Process, And Organic...

METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD

Composition For Forming Silicon-Containing Resist Underlayer Film A...

Material For Forming Adhesive Film, Patterning Process, And Method...

FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAP...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

CHEMICAL-RESISTANT PROTECTIVE FILM

METHOD FOR FORMING CONTINUOUS LINE-END TO LINE-END SPACES WITH SPAC...

COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND

IMPRINT METHOD FOR FABRICATION OF LOW DENSITY NANOPORE MEMBRANE

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

QUANTUM DOT LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

FLOW CELLS AND METHODS FOR MAKING THE SAME

Metal Circuit Structure Based on FPC and Method of Making the Same

HARDMASK COMPOSITION, HARDMASK LAYER, AND PATTERN FORMING METHOD

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

METHODS FOR MAKING FLOW CELLS

Laminate For Patterned Substrates

COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES

HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAK...

AROMATIC UNDERLAYER

Ultra-High Resolution Conductive Traces Flexible Biocomposites by R...

Display Substrate, Method for Preparing the Same, and Display Device

Laminate

PHOTOSENSITIVE RESIN COMPOSITION

MASK ELEMENT PRECURSOR AND RELIEF IMAGE-FORMING SYSTEM

Composite Panel with Barrier Layer and Method for Manufacturing a L...

AUTOMATED UV-LED EXPOSURE OF FLEXOGRAPHIC PRINTING PLATES