TREA

Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing

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Industry

  • CPC
  • G03F7/2016
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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
Industries