containing mineral alkaline compounds; containing organic basic compounds

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CPC
G03F7/425

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/425containing mineral alkaline compounds; containing organic basic compounds

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Patents Grantslast 30 patents

Information Patent Grant
Quaternary ammonium hydroxides of polyamines
- Patent number 12,077,730
- Issue date Sep 3, 2024
- Huntsman Petrochemical LLC
- Donald H. Champion
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions for removing photoresists and methods of manufacturing...
- Patent number 12,044,974
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Hyojin Yun
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid, method for washing substrate, and method for remo...
- Patent number 11,899,369
- Issue date Feb 13, 2024
- FUJIFILM Corporation
- Tomonori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of display panel and display panel
- Patent number 11,852,913
- Issue date Dec 26, 2023
- HKC CORPORATION LIMITED
- Chung-Kuang Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, method of forming resist pattern, and semiconductor devic...
- Patent number 11,822,250
- Issue date Nov 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Iida
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Stabilization of compositions comprising quaternary trialkylalkanol...
- Patent number 11,643,384
- Issue date May 9, 2023
- Kurita Water Industries Ltd.
- Michael Urschey
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Process liquid composition for extreme ultraviolet lithography and...
- Patent number 11,624,984
- Issue date Apr 11, 2023
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Surface treatment of titanium containing hardmasks
- Patent number 11,556,057
- Issue date Jan 17, 2023
- International Business Machines Corporation
- Ekmini A. De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
UV-assisted stripping of hardened photoresist to create chemical te...
- Patent number 11,538,684
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method using silicon-containing underlayers
- Patent number 11,506,979
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Li Cui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Treatment liquid, method of manufacturing treatment liquid, pattern...
- Patent number 11,480,880
- Issue date Oct 25, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned organometallic photoresists and methods of patterning
- Patent number 11,480,874
- Issue date Oct 25, 2022
- Inpria Corporation
- Michael Kocsis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripper
- Patent number 11,460,778
- Issue date Oct 4, 2022
- VERSUM MATERIALS US, LLC
- Richard Dalton Peters
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist-removing liquid and photoresist-removing method
- Patent number 11,448,966
- Issue date Sep 20, 2022
- HUAYING RESEARCH CO., LTD
- Sophia Z. Wen
- B08 - CLEANING
Information Patent Grant
Cleaning composition, cleaning method, and method for manufacturing...
- Patent number 11,441,101
- Issue date Sep 13, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Isao Hirano
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Treatment liquid, method for washing substrate, and method for remo...
- Patent number 11,397,383
- Issue date Jul 26, 2022
- FUJIFILM Corporation
- Tomonori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process liquid and method of processing substrate
- Patent number 11,385,548
- Issue date Jul 12, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Eto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical composition for tri-layer removal
- Patent number 11,378,882
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Min Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrates with an aqueous liquid medium expose...
- Patent number 11,358,172
- Issue date Jun 14, 2022
- SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
- Davide Dattilo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Photoresist stripper
- Patent number 11,353,794
- Issue date Jun 7, 2022
- VERSUM MATERIALS US, LLC
- Richard Dalton Peters
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist stripper composition
- Patent number 11,347,149
- Issue date May 31, 2022
- Henkel AG & Co. KGaA
- Tengfang Wang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Manufacturing method of display panel and display panel
- Patent number 11,340,489
- Issue date May 24, 2022
- HKC CORPORATION LIMITED
- Chung-Kuang Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid, method for washing substrate, and method for remo...
- Patent number 11,225,633
- Issue date Jan 18, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stripper solutions and methods of using stripper solutions
- Patent number 11,175,587
- Issue date Nov 16, 2021
- VERSUM MATERIALS US, LLC
- Jhih Kuei Ge
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist remover compositions
- Patent number 11,168,288
- Issue date Nov 9, 2021
- Merck Patent GmbH
- Hengpeng Wu
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning liquid, and method of cleaning substrate provided with met...
- Patent number 11,131,932
- Issue date Sep 28, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning liquid, and method of cleaning substrate provided with met...
- Patent number 11,131,933
- Issue date Sep 28, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Peeling solution composition for dry film resist
- Patent number 11,092,895
- Issue date Aug 17, 2021
- LTC Co., Ltd.
- Hosung Choi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Stripping compositions for removing photoresists from semiconductor...
- Patent number 10,947,484
- Issue date Mar 16, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- Atsushi Mizutani
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
ECO-FRIENDLY PHOTORESIST STRIPPER COMPOSITION
- Publication number 20250053093
- Publication date Feb 13, 2025
- SAMYOUNG PURE CHEMICALS CO., LTD.
- Sang Moon YUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRIPPER COMPOSITION AND METHOD FOR STRIPPING PHOTORESIST
- Publication number 20250043217
- Publication date Feb 6, 2025
- Advanced Echem Materials Company Limited
- Chi-Liang He
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Post-Dry Etching Photoresist And Metal Containing Residue Removal F...
- Publication number 20240392194
- Publication date Nov 28, 2024
- VERSUM MATERIALS US, LLC
- Chung-Yi Chang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MANAGING COMPENSATION FOR CELL-TO-CELL COUPLING AND LATERAL MIGRATI...
- Publication number 20240384168
- Publication date Nov 21, 2024
- Micron Technology, Inc.
- Mustafa N. Kaynak
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS FOR REMOVING PHOTORESISTS AND METHODS OF MANUFACTURING...
- Publication number 20240337948
- Publication date Oct 10, 2024
- KPX CHEMICAL CO., LTD.
- HYOJIN YUN
- B08 - CLEANING
Information Patent Application
STRIPPER COMPOSITION
- Publication number 20240309298
- Publication date Sep 19, 2024
- Samsung Electronics Co., Ltd.
- Minhyung CHO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
RESIST STRIPPER COMPOSITION AND PATTERN FORMATION METHOD USING SAME
- Publication number 20240241447
- Publication date Jul 18, 2024
- DONGWOO FINE-CHEM CO., LTD.
- SUNG SIK KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...
- Publication number 20240231237
- Publication date Jul 11, 2024
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...
- Publication number 20240134284
- Publication date Apr 25, 2024
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTORESIST STRIPPER AND METHOD OF TREATING SUBSTRATE USING SAME
- Publication number 20230314955
- Publication date Oct 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- YaChien Chuang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
NON-DMSO STRIPPER FOR ADVANCE PACKAGE METAL PLATING PROCESS
- Publication number 20230317647
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Yang LIN
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Amine Oxides for Etching, Stripping and Cleaning Applications
- Publication number 20230266671
- Publication date Aug 24, 2023
- Huntsman Petrochemical LLC
- Hui Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...
- Publication number 20230236505
- Publication date Jul 27, 2023
- SAN-APRO LTD.
- Takuto NAKAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REPLACEMENT LIQUID OF LIQUID FILLING BETWEEN RESIST PATTERNS, AND M...
- Publication number 20230045307
- Publication date Feb 9, 2023
- Merch Patent GmbH
- Kazuma YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PHOTORESIST STRIPPER
- Publication number 20230017238
- Publication date Jan 19, 2023
- ENF TECHNOLOGY CO., LTD.
- Hye Ji KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERNED ORGANOMETALLIC PHOTORESISTS AND METHODS OF PATTERNING
- Publication number 20230012169
- Publication date Jan 12, 2023
- INPRIA CORPORATION
- Michael Kocsis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST STRIPPER COMPOSITION FOR MANUFACTURING DISPLAY
- Publication number 20220404710
- Publication date Dec 22, 2022
- LTC CO., LTD.
- Ho Sung CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Removing Etch Residues, Methods Of Using And Use Th...
- Publication number 20220380705
- Publication date Dec 1, 2022
- VERSUM MATERIALS US, LLC
- LAISHENG SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST STRIPPING COMPOSITION
- Publication number 20220365440
- Publication date Nov 17, 2022
- DOW GLOBAL TECHNOLOGIES LLC
- Xin Jiang
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITIONS FOR REMOVING PHOTORESISTS AND METHODS OF MANUFACTURING...
- Publication number 20220350253
- Publication date Nov 3, 2022
- KPX CHEMICAL CO., LTD.
- HYOJIN YUN
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHOD OF MANUFACTURING CONDUCTIVE SUBSTRATE, CONDUCTIVE SUBSTRATE,...
- Publication number 20220342303
- Publication date Oct 27, 2022
- FUJIFILM CORPORATION
- Shinichi KANNA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photoresist Remover
- Publication number 20220333044
- Publication date Oct 20, 2022
- VERSUM MATERIALS US, LLC
- YUANMEI CAO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHOD FOR MANUFACTURING CONDUCTIVE SUBSTRATE, CONDUCTIVE SUBSTRATE...
- Publication number 20220334492
- Publication date Oct 20, 2022
- FUJIFILM CORPORATION
- Shinichi KANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Composition for Tri-Layer Removal
- Publication number 20220334473
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Min Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST STRIPPING COMPOSITION
- Publication number 20220326620
- Publication date Oct 13, 2022
- DOW GLOBAL TECHNOLOGIES LLC
- Qi Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS SOLUTION COMPOSITION FOR POLYMER TREATMENT
- Publication number 20220298366
- Publication date Sep 22, 2022
- DONGWOO FINE-CHEM CO., LTD.
- Soon-Hong Pang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR REMOVING PHOTORESIST
- Publication number 20220285172
- Publication date Sep 8, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Yukihide NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...
- Publication number 20220260919
- Publication date Aug 18, 2022
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITIONS FOR REMOVING ETCH RESIDUES, METHODS OF USING AND USE T...
- Publication number 20220251480
- Publication date Aug 11, 2022
- VERSUM MATERIALS US, LLC
- Laisheng Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning Composition For Semiconductor Substrates
- Publication number 20220243150
- Publication date Aug 4, 2022
- VERSUM MATERIALS US, LLC
- LILI WANG
- H01 - BASIC ELECTRIC ELEMENTS

containing mineral alkaline compounds; containing organic basic compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Quaternary ammonium hydroxides of polyamines

Compositions for removing photoresists and methods of manufacturing...

Semiconductor device production method employing silicon-containing...

Treatment liquid, method for washing substrate, and method for remo...

Manufacturing method of display panel and display panel

Solution, method of forming resist pattern, and semiconductor devic...

Stabilization of compositions comprising quaternary trialkylalkanol...

Process liquid composition for extreme ultraviolet lithography and...

Surface treatment of titanium containing hardmasks

UV-assisted stripping of hardened photoresist to create chemical te...

Method using silicon-containing underlayers

Treatment liquid, method of manufacturing treatment liquid, pattern...

Patterned organometallic photoresists and methods of patterning

Photoresist stripper

Photoresist-removing liquid and photoresist-removing method

Cleaning composition, cleaning method, and method for manufacturing...

Treatment liquid, method for washing substrate, and method for remo...

Process liquid and method of processing substrate

Chemical composition for tri-layer removal

Method for treating substrates with an aqueous liquid medium expose...

Photoresist stripper

Photoresist stripper composition

Manufacturing method of display panel and display panel

Treatment liquid, method for washing substrate, and method for remo...

Stripper solutions and methods of using stripper solutions

Photoresist remover compositions

Cleaning liquid, and method of cleaning substrate provided with met...

Cleaning liquid, and method of cleaning substrate provided with met...

Peeling solution composition for dry film resist

Stripping compositions for removing photoresists from semiconductor...

Patents Applicationslast 30 patents

ECO-FRIENDLY PHOTORESIST STRIPPER COMPOSITION

STRIPPER COMPOSITION AND METHOD FOR STRIPPING PHOTORESIST

Post-Dry Etching Photoresist And Metal Containing Residue Removal F...

MANAGING COMPENSATION FOR CELL-TO-CELL COUPLING AND LATERAL MIGRATI...

COMPOSITIONS FOR REMOVING PHOTORESISTS AND METHODS OF MANUFACTURING...

STRIPPER COMPOSITION

RESIST STRIPPER COMPOSITION AND PATTERN FORMATION METHOD USING SAME

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...

PHOTORESIST STRIPPER AND METHOD OF TREATING SUBSTRATE USING SAME

NON-DMSO STRIPPER FOR ADVANCE PACKAGE METAL PLATING PROCESS

Amine Oxides for Etching, Stripping and Cleaning Applications

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...

REPLACEMENT LIQUID OF LIQUID FILLING BETWEEN RESIST PATTERNS, AND M...

COMPOSITION FOR PHOTORESIST STRIPPER

PATTERNED ORGANOMETALLIC PHOTORESISTS AND METHODS OF PATTERNING

PHOTORESIST STRIPPER COMPOSITION FOR MANUFACTURING DISPLAY

Composition For Removing Etch Residues, Methods Of Using And Use Th...

PHOTORESIST STRIPPING COMPOSITION

COMPOSITIONS FOR REMOVING PHOTORESISTS AND METHODS OF MANUFACTURING...

METHOD OF MANUFACTURING CONDUCTIVE SUBSTRATE, CONDUCTIVE SUBSTRATE,...

Photoresist Remover

METHOD FOR MANUFACTURING CONDUCTIVE SUBSTRATE, CONDUCTIVE SUBSTRATE...

Chemical Composition for Tri-Layer Removal

PHOTORESIST STRIPPING COMPOSITION

PROCESS SOLUTION COMPOSITION FOR POLYMER TREATMENT

COMPOSITION FOR REMOVING PHOTORESIST

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...

COMPOSITIONS FOR REMOVING ETCH RESIDUES, METHODS OF USING AND USE T...

Cleaning Composition For Semiconductor Substrates