Controlling tubes by information coming from the objects or from the beam

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CPC
H01J37/304

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/304Controlling tubes by information coming from the objects or from the beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam delayering system and method, topographically enhanced del...
- Patent number 12,165,840
- Issue date Dec 10, 2024
- Techinsights Inc.
- Christopher Pawlowicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection using semiconductor detector
- Patent number 12,009,177
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Chin King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating a gas feed device for a particle beam apparatus
- Patent number 12,002,656
- Issue date Jun 4, 2024
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cross-sectioning a sample with a preset thick...
- Patent number RE50001
- Issue date Jun 4, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
Information Patent Grant
Apparatus and techniques for substrate processing using independent...
- Patent number 11,996,266
- Issue date May 28, 2024
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus, defect repair method, lithographic exposur...
- Patent number 11,996,267
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Ruben Cornelis Maas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for examining a beam of charged particles
- Patent number 11,961,705
- Issue date Apr 16, 2024
- Carl Zeiss SMT GmbH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam irradiation apparatus and program therefor
- Patent number 11,955,311
- Issue date Apr 9, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Shinya Takemura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Devices, systems, and methods for using an imaging device to calibr...
- Patent number 11,925,983
- Issue date Mar 12, 2024
- Arcam AB
- Anders Snis
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Microscopy imaging method for 3D tomography with predictive drift t...
- Patent number 11,923,168
- Issue date Mar 5, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correction in electron beam lithography
- Patent number 11,899,373
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection and correction of system responses in real-time
- Patent number 11,894,214
- Issue date Feb 6, 2024
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and device
- Patent number 11,862,429
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen machining device and information provision method
- Patent number 11,837,437
- Issue date Dec 5, 2023
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable attenuation optical unit
- Patent number 11,835,769
- Issue date Dec 5, 2023
- Applied Materials Israel Ltd.
- Eitam Yitzchak Vinegrad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number RE49732
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Ion implanter and model generation method
- Patent number 11,823,863
- Issue date Nov 21, 2023
- SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO, LTD.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for directed irradiation synthesis with ion and thermal beams
- Patent number 11,814,720
- Issue date Nov 14, 2023
- Purdue Research Foundation
- Jean Paul Allain
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System using pixelated faraday sensor
- Patent number 11,810,754
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing method, charged particle beam writing...
- Patent number 11,804,361
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION
- Publication number 20250005714
- Publication date Jan 2, 2025
- FEI Company
- Matej Dolník
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240404780
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Masahiro KAMIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SYNCHRONOUS SYSTEM FOR GRIDDED ION SOURCES
- Publication number 20240387142
- Publication date Nov 21, 2024
- VEECO INSTRUMENTS INC.
- Mohammad SAGHAYEZHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
- Publication number 20240339290
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuit with FIB-Ready Structures
- Publication number 20240321548
- Publication date Sep 26, 2024
- Nuvoton Technology Corporation
- Yuval Kirschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT...
- Publication number 20240297016
- Publication date Sep 5, 2024
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION USING SEMICONDUCTOR DETECTOR
- Publication number 20240290575
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...
- Publication number 20240281952
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...
- Publication number 20240282550
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER POSITIONING METHOD AND APPARATUS
- Publication number 20240274478
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...
- Publication number 20240258068
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20240242932
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...
- Publication number 20240242931
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processor System, Correction Method, and Correction Program
- Publication number 20240222064
- Publication date Jul 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Mayuka OSAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A HEAD FOR IRRADIATING A TARGET WITH A BEA...
- Publication number 20240221970
- Publication date Jul 4, 2024
- UNIVERSITÉ D'AIX-MARSEILLE
- Wilfried Vervisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER
- Publication number 20240222070
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Stephen Krause
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...
- Publication number 20240203684
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- David Disterheft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRECISION OXIDATION CONTROL BY ION IMPLANTATION
- Publication number 20240203743
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Supakit Charnvanichborikarn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM
- Publication number 20240194444
- Publication date Jun 13, 2024
- INFINEON TECHNOLOGIES AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...
- Publication number 20240186109
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY IMAGING METHOD AND SYSTEM
- Publication number 20240177966
- Publication date May 30, 2024
- Fibics Incorporated
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE ANALYSIS SYSTEM
- Publication number 20240112881
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jonghyeok PARK
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20240096590
- Publication date Mar 21, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS

Controlling tubes by information coming from the objects or from the beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for optimizing full horizontal scanned beam dis...

System and methods for automated processing of multiple samples in...

Ion beam delayering system and method, topographically enhanced del...

Automated ion-beam alignment for dual-beam instrument

Multi-charged-particle-beam writing method, multi-charged-particle-...

Detection using semiconductor detector

Operating a gas feed device for a particle beam apparatus

Method and system for cross-sectioning a sample with a preset thick...

Apparatus and techniques for substrate processing using independent...

Particle beam apparatus, defect repair method, lithographic exposur...

Wafer positioning method and apparatus

Method and apparatus for examining a beam of charged particles

Ion beam irradiation apparatus and program therefor

Devices, systems, and methods for using an imaging device to calibr...

Microscopy imaging method for 3D tomography with predictive drift t...

Massive overlay metrology sampling with multiple measurement columns

Proximity effect correction in electron beam lithography

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Detection and correction of system responses in real-time

Multi-beam writing method and multi-beam writing apparatus

Ion implantation method and device

Specimen machining device and information provision method

Adjustable attenuation optical unit

Charged particle lithography system with alignment sensor and beam...

Ion implanter and model generation method

Methods for directed irradiation synthesis with ion and thermal beams

System using pixelated faraday sensor

Ion beam source for optical device fabrication using a segmented io...

Multi charged particle beam adjustment method, multi charged partic...

Charged particle beam writing method, charged particle beam writing...

Patents Applicationslast 30 patents

FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

SEMICONDUCTOR PROCESSING APPARATUS

COMPENSATION RASTER SCANNING

INTEGRATED SYNCHRONOUS SYSTEM FOR GRIDDED ION SOURCES

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM

Integrated Circuit with FIB-Ready Structures

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT...

DETECTION USING SEMICONDUCTOR DETECTOR

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...

BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...

System and Method for Reducing Particle Formation in a Process Cham...

WAFER POSITIONING METHOD AND APPARATUS

METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...

Processor System, Correction Method, and Correction Program

METHOD FOR MANUFACTURING A HEAD FOR IRRADIATING A TARGET WITH A BEA...

XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER

METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...

METHOD FOR PRECISION OXIDATION CONTROL BY ION IMPLANTATION

ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...

MICROSCOPY IMAGING METHOD AND SYSTEM

SUBSTRATE ANALYSIS SYSTEM

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...