Controlling tubes by information coming from the objects or from the beam

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CPC
H01J37/304

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/304Controlling tubes by information coming from the objects or from the beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample milling apparatus and method of adjustment therefor
- Patent number 12,266,502
- Issue date Apr 1, 2025
- Jeol Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fiducial guided cross-sectioning and lamella preparation with tomog...
- Patent number 12,255,044
- Issue date Mar 18, 2025
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 12,249,483
- Issue date Mar 11, 2025
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlled ion implantation
- Patent number 12,247,283
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Alexander K. Eidukonis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Effective temperature calculation method for multi-charged particle...
- Patent number 12,230,472
- Issue date Feb 18, 2025
- NuFlare Technology, Inc.
- Shingo Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress modulation by implant to back of wafer
- Patent number 12,217,974
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam delayering system and method, topographically enhanced del...
- Patent number 12,165,840
- Issue date Dec 10, 2024
- Techinsights Inc.
- Christopher Pawlowicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection using semiconductor detector
- Patent number 12,009,177
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Chin King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating a gas feed device for a particle beam apparatus
- Patent number 12,002,656
- Issue date Jun 4, 2024
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cross-sectioning a sample with a preset thick...
- Patent number RE50001
- Issue date Jun 4, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
Information Patent Grant
Apparatus and techniques for substrate processing using independent...
- Patent number 11,996,266
- Issue date May 28, 2024
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus, defect repair method, lithographic exposur...
- Patent number 11,996,267
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Ruben Cornelis Maas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for examining a beam of charged particles
- Patent number 11,961,705
- Issue date Apr 16, 2024
- Carl Zeiss SMT GmbH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam irradiation apparatus and program therefor
- Patent number 11,955,311
- Issue date Apr 9, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Shinya Takemura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Devices, systems, and methods for using an imaging device to calibr...
- Patent number 11,925,983
- Issue date Mar 12, 2024
- Arcam AB
- Anders Snis
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Microscopy imaging method for 3D tomography with predictive drift t...
- Patent number 11,923,168
- Issue date Mar 5, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correction in electron beam lithography
- Patent number 11,899,373
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection and correction of system responses in real-time
- Patent number 11,894,214
- Issue date Feb 6, 2024
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and device
- Patent number 11,862,429
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen machining device and information provision method
- Patent number 11,837,437
- Issue date Dec 5, 2023
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Ion Milling Device
- Publication number 20250149287
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140518
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Toshiyuki NAGAMINE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING
- Publication number 20250140520
- Publication date May 1, 2025
- Axcelis Technologies, Inc.
- Michael Cristoforo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...
- Publication number 20250140521
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...
- Publication number 20250140523
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGE...
- Publication number 20250140519
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Michihiko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20250118529
- Publication date Apr 10, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION
- Publication number 20250112026
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...
- Publication number 20250104964
- Publication date Mar 27, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION PRODUCTION SYSTEM WITH A MASS RESOLVING APERTURE HAVING A SCATT...
- Publication number 20250095957
- Publication date Mar 20, 2025
- SHINE Technologies, LLC
- Ross Radel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
- Publication number 20250095958
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20250087452
- Publication date Mar 13, 2025
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTIC...
- Publication number 20250079120
- Publication date Mar 6, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING...
- Publication number 20250054727
- Publication date Feb 13, 2025
- NuFlare Technology, Inc.
- Tsubasa NANAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20250046567
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...
- Publication number 20250037969
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Tatsuya MUROFUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTER
- Publication number 20250014860
- Publication date Jan 9, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi MATSUSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION
- Publication number 20250005714
- Publication date Jan 2, 2025
- FEI Company
- Matej Dolník
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240404780
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Masahiro KAMIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SYNCHRONOUS SYSTEM FOR GRIDDED ION SOURCES
- Publication number 20240387142
- Publication date Nov 21, 2024
- VEECO INSTRUMENTS INC.
- Mohammad SAGHAYEZHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
- Publication number 20240339290
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuit with FIB-Ready Structures
- Publication number 20240321548
- Publication date Sep 26, 2024
- Nuvoton Technology Corporation
- Yuval Kirschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT...
- Publication number 20240297016
- Publication date Sep 5, 2024
- Applied Materials, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS

Controlling tubes by information coming from the objects or from the beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Closed loop faraday correction of a horizontal beam current profile...

Sample milling apparatus and method of adjustment therefor

Fiducial guided cross-sectioning and lamella preparation with tomog...

Charged particle beam writing method and charged particle beam writ...

Method and apparatus for controlled ion implantation

Effective temperature calculation method for multi-charged particle...

Localized stress modulation by implant to back of wafer

Charged particle beam writing apparatus, charged particle beam writ...

Systems and methods for optimizing full horizontal scanned beam dis...

System and methods for automated processing of multiple samples in...

Ion beam delayering system and method, topographically enhanced del...

Automated ion-beam alignment for dual-beam instrument

Multi-charged-particle-beam writing method, multi-charged-particle-...

Detection using semiconductor detector

Operating a gas feed device for a particle beam apparatus

Method and system for cross-sectioning a sample with a preset thick...

Apparatus and techniques for substrate processing using independent...

Particle beam apparatus, defect repair method, lithographic exposur...

Wafer positioning method and apparatus

Method and apparatus for examining a beam of charged particles

Ion beam irradiation apparatus and program therefor

Devices, systems, and methods for using an imaging device to calibr...

Microscopy imaging method for 3D tomography with predictive drift t...

Massive overlay metrology sampling with multiple measurement columns

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Proximity effect correction in electron beam lithography

Detection and correction of system responses in real-time

Multi-beam writing method and multi-beam writing apparatus

Ion implantation method and device

Specimen machining device and information provision method

Patents Applicationslast 30 patents

Ion Milling Device

MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE

APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...

SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGE...

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION

METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...

ION PRODUCTION SYSTEM WITH A MASS RESOLVING APERTURE HAVING A SCATT...

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTIC...

BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING...

Ion Milling Device

CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...

ION IMPLANTATION METHOD AND ION IMPLANTER

FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

SEMICONDUCTOR PROCESSING APPARATUS

COMPENSATION RASTER SCANNING

INTEGRATED SYNCHRONOUS SYSTEM FOR GRIDDED ION SOURCES

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM

Integrated Circuit with FIB-Ready Structures

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT...