Controlling tubes by information coming from the objects or from the beam

Industry

CPC
H01J37/304

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/304Controlling tubes by information coming from the objects or from the beam

Industries

Patents Grantslast 30 patents

Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for examining a beam of charged particles
- Patent number 11,961,705
- Issue date Apr 16, 2024
- Carl Zeiss SMT GmbH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam irradiation apparatus and program therefor
- Patent number 11,955,311
- Issue date Apr 9, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Shinya Takemura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Devices, systems, and methods for using an imaging device to calibr...
- Patent number 11,925,983
- Issue date Mar 12, 2024
- Arcam AB
- Anders Snis
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Microscopy imaging method for 3D tomography with predictive drift t...
- Patent number 11,923,168
- Issue date Mar 5, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correction in electron beam lithography
- Patent number 11,899,373
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection and correction of system responses in real-time
- Patent number 11,894,214
- Issue date Feb 6, 2024
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and device
- Patent number 11,862,429
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen machining device and information provision method
- Patent number 11,837,437
- Issue date Dec 5, 2023
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable attenuation optical unit
- Patent number 11,835,769
- Issue date Dec 5, 2023
- Applied Materials Israel Ltd.
- Eitam Yitzchak Vinegrad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number RE49732
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Ion implanter and model generation method
- Patent number 11,823,863
- Issue date Nov 21, 2023
- SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO, LTD.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for directed irradiation synthesis with ion and thermal beams
- Patent number 11,814,720
- Issue date Nov 14, 2023
- Purdue Research Foundation
- Jean Paul Allain
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System using pixelated faraday sensor
- Patent number 11,810,754
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing method, charged particle beam writing...
- Patent number 11,804,361
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating a gas supply device for a particle beam device
- Patent number 11,764,036
- Issue date Sep 19, 2023
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 11,756,766
- Issue date Sep 12, 2023
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 11,749,501
- Issue date Sep 5, 2023
- NISSIN ION EQUIPMENT CO., LTD.
- Jian Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data generation method and charged particle beam irradiation device
- Patent number 11,749,499
- Issue date Sep 5, 2023
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,747,736
- Issue date Sep 5, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Real time photoresist outgassing control system and method
- Patent number 11,749,500
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Nevin Clay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device and milling processing method using same
- Patent number 11,742,178
- Issue date Aug 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Hitoshi Kamoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and control method thereof
- Patent number 11,742,177
- Issue date Aug 29, 2023
- Hitachi High-Tech Science Corporation
- Ayana Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,728,132
- Issue date Aug 15, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mikio Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE ANALYSIS SYSTEM
- Publication number 20240112881
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jonghyeok PARK
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20240096590
- Publication date Mar 21, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...
- Publication number 20240079207
- Publication date Mar 7, 2024
- Carl Zeiss MultiSEM GmbH
- Michael Behnke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLOSED LOOP FARADAY CORRECTION OF A HORIZONTAL BEAM CURRENT PROFILE...
- Publication number 20240071719
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240055220
- Publication date Feb 15, 2024
- Hitachi High-Tech Corporation
- Yuka II
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...
- Publication number 20240047175
- Publication date Feb 8, 2024
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20240027919
- Publication date Jan 25, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...
- Publication number 20240013999
- Publication date Jan 11, 2024
- NuFlare Technology, Inc.
- Toshiki KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPERATING A GAS SUPPLY DEVICE FOR A PARTICLE BEAM DEVICE
- Publication number 20230420224
- Publication date Dec 28, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, DRAWING METHOD, AND METHOD OF MANUFACTURING PLATE
- Publication number 20230411115
- Publication date Dec 21, 2023
- KIOXIA Corporation
- Yoshinori KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Image Acquisition Method
- Publication number 20230402252
- Publication date Dec 14, 2023
- JEOL Ltd.
- Nobuyuki Ikeo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...
- Publication number 20230386785
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
- Publication number 20230375941
- Publication date Nov 23, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHODS FOR AUTOMATED PROCESSING OF MULTIPLE SAMPLES IN...
- Publication number 20230377833
- Publication date Nov 23, 2023
- FEI Company
- Michal HROUZEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device and Ion Milling Method
- Publication number 20230369010
- Publication date Nov 16, 2023
- HITACHI HIGH-TECH CORPORATION
- Toru Iwaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL...
- Publication number 20230369014
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Pradeep Subrahmanyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20230359129
- Publication date Nov 9, 2023
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A SAMPLE ON AN OBJECT, COMPUTER PROGRAM PRODUC...
- Publication number 20230260744
- Publication date Aug 17, 2023
- CARL ZEISS MICROSCOPY GMBH
- Heiko Stegmann
- G01 - MEASURING TESTING
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20230260747
- Publication date Aug 17, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tetsuya Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL TIME PHOTORESIST OUTGASSING CONTROL SYSTEM AND METHOD
- Publication number 20230238214
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Nevin Clay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System and Method of Correcting Deviation of Field...
- Publication number 20230230801
- Publication date Jul 20, 2023
- JEOL Ltd.
- Yuichiro Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Automatic Detection of Required Peak for Sample Machining...
- Publication number 20230215689
- Publication date Jul 6, 2023
- TESCAN Brno, s.r.o.
- Sharang Sharang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT DETERMINATION METHOD AND COMPUTER PROGRAM
- Publication number 20230207259
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230187172
- Publication date Jun 15, 2023
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM USING PIXELATED FARADAY SENSOR
- Publication number 20230187171
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
- Publication number 20230168589
- Publication date Jun 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20230143407
- Publication date May 11, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Application
IN-SITU ETCH RATE OR DEPOSITION RATE MEASUREMENT SYSTEM
- Publication number 20230139375
- Publication date May 4, 2023
- BÜHLER ALZENAU GMBH
- Steffen GUERTLER
- G01 - MEASURING TESTING
Information Patent Application
ION IMPLANTATION METHOD, ION IMPLANTER, AND METHOD FOR MANUFACTURIN...
- Publication number 20230140499
- Publication date May 4, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230107036
- Publication date Apr 6, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS

Controlling tubes by information coming from the objects or from the beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer positioning method and apparatus

Method and apparatus for examining a beam of charged particles

Ion beam irradiation apparatus and program therefor

Devices, systems, and methods for using an imaging device to calibr...

Microscopy imaging method for 3D tomography with predictive drift t...

Massive overlay metrology sampling with multiple measurement columns

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Proximity effect correction in electron beam lithography

Detection and correction of system responses in real-time

Multi-beam writing method and multi-beam writing apparatus

Ion implantation method and device

Specimen machining device and information provision method

Adjustable attenuation optical unit

Charged particle lithography system with alignment sensor and beam...

Ion implanter and model generation method

Methods for directed irradiation synthesis with ion and thermal beams

System using pixelated faraday sensor

Ion beam source for optical device fabrication using a segmented io...

Multi charged particle beam adjustment method, multi charged partic...

Charged particle beam writing method, charged particle beam writing...

Aperture array with integrated current measurement

Operating a gas supply device for a particle beam device

Charged particle beam writing apparatus and charged particle beam w...

Ion implantation apparatus

Data generation method and charged particle beam irradiation device

Exposure apparatus and exposure method, and device manufacturing me...

Real time photoresist outgassing control system and method

Ion milling device and milling processing method using same

Charged particle beam apparatus and control method thereof

Ion implanter and ion implantation method

Patents Applicationslast 30 patents

SUBSTRATE ANALYSIS SYSTEM

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...

CLOSED LOOP FARADAY CORRECTION OF A HORIZONTAL BEAM CURRENT PROFILE...

Charged Particle Beam Device

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...

OPERATING A GAS SUPPLY DEVICE FOR A PARTICLE BEAM DEVICE

DRAWING APPARATUS, DRAWING METHOD, AND METHOD OF MANUFACTURING PLATE

Charged Particle Beam Device and Image Acquisition Method

SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...

PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY

SYSTEM AND METHODS FOR AUTOMATED PROCESSING OF MULTIPLE SAMPLES IN...

Ion Milling Device and Ion Milling Method

DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL...

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

METHOD FOR PRODUCING A SAMPLE ON AN OBJECT, COMPUTER PROGRAM PRODUC...

ION IMPLANTER AND ION IMPLANTATION METHOD

REAL TIME PHOTORESIST OUTGASSING CONTROL SYSTEM AND METHOD

Focused Ion Beam System and Method of Correcting Deviation of Field...

Method of Automatic Detection of Required Peak for Sample Machining...

ALIGNMENT DETERMINATION METHOD AND COMPUTER PROGRAM

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

SYSTEM USING PIXELATED FARADAY SENSOR

PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

IN-SITU ETCH RATE OR DEPOSITION RATE MEASUREMENT SYSTEM

ION IMPLANTATION METHOD, ION IMPLANTER, AND METHOD FOR MANUFACTURIN...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...