Cooling arrangements

Industry

CPC
H01J2237/002

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/002Cooling arrangements

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Ground electrode formed in an electrostatic chuck for a plasma proc...
- Patent number 12,205,843
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,191,123
- Issue date Jan 7, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for temperature control in a substrate processing chamber
- Patent number 12,183,559
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooling device, semiconductor manufacturing apparatus, and semicond...
- Patent number 12,146,696
- Issue date Nov 19, 2024
- Canon Kabushiki Kaisha
- Makoto Nomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device and method for manufacturing same
- Patent number 12,136,540
- Issue date Nov 5, 2024
- LG Display Co., Ltd.
- Young Gon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer placement table
- Patent number 12,131,891
- Issue date Oct 29, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gas generation apparatus
- Patent number 12,074,012
- Issue date Aug 27, 2024
- TMEIC Corporation
- Kensuke Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Programmable electrostatic chuck to enhance aluminum film morphology
- Patent number 12,046,460
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Yaoying Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone heating apparatus, bottom electrode assembly, plasma pro...
- Patent number 12,046,458
- Issue date Jul 23, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Sha Rin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and wafer holding table for s...
- Patent number 12,046,488
- Issue date Jul 23, 2024
- Sumitomo Electric Industries, Ltd.
- Koichi Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature detachable very high frequency (VHF) electrostatic...
- Patent number 12,014,906
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- William R. Johanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,990,321
- Issue date May 21, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Ceramic susceptor
- Patent number 11,990,322
- Issue date May 21, 2024
- MiCo Ceramics Ltd.
- Haneum Bae
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Automated temperature controlled substrate support
- Patent number 11,981,989
- Issue date May 14, 2024
- Applied Materials, Inc.
- Robert Hartwig
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Method and apparatus for parts cleaning
- Patent number 11,967,491
- Issue date Apr 23, 2024
- Semes Co., Ltd.
- Soon-Cheon Cho
- B08 - CLEANING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Cooling device, substrate treatment device, cooling method, and sub...
- Patent number 11,948,812
- Issue date Apr 2, 2024
- Shibaura Mechatronics Corporation
- Kensuke Demura
- B08 - CLEANING
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 11,942,351
- Issue date Mar 26, 2024
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,932,934
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature actuated valve and methods of use thereof
- Patent number 11,913,563
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Shivaram Chandrashekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,915,950
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally controlled magnetic fields optimization system for sputte...
- Patent number 11,908,669
- Issue date Feb 20, 2024
- Arizona Thin Film Research, LLC
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Toxic outgas control post process
- Patent number 11,901,198
- Issue date Feb 13, 2024
- Axcelis Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for pasteurizing and/or sterilizing particulate m...
- Patent number 11,896,041
- Issue date Feb 13, 2024
- Buhler AG
- Alasdair Currie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support
- Patent number 11,894,254
- Issue date Feb 6, 2024
- SPTS Technologies Limited
- Nicolas Launay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, support platform, and plasma processing apparatus
- Patent number 11,894,218
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Masato Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,894,213
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing substrate
- Patent number 11,894,219
- Issue date Feb 6, 2024
- Semes Co., Ltd.
- Je Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detachable biasable electrostatic chuck for high temperature applic...
- Patent number 11,887,878
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Shreesha Yogish Rao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...
- Publication number 20250022695
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Kazuki HOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20250007296
- Publication date Jan 2, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...
- Publication number 20250003536
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME
- Publication number 20250006538
- Publication date Jan 2, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20250006463
- Publication date Jan 2, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240429024
- Publication date Dec 26, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER COOLING FLANGE FOR REMO...
- Publication number 20240420924
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amit Sahu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBERS HAVING MULTIPLE COOLING PLATES
- Publication number 20240412954
- Publication date Dec 12, 2024
- Dinkesh HUDERI SOMANNA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...
- Publication number 20240412953
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Bradley Taylor Streng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE ADJUSTING SYSTEM, TEMPERATURE ADJUSTING METHOD, SUBSTRA...
- Publication number 20240412955
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Masahiko YOKOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT
- Publication number 20240404793
- Publication date Dec 5, 2024
- SEMES CO., LTD.
- Wook Sang JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20240395515
- Publication date Nov 28, 2024
- SPP TECHNOLOGIES CO., LTD.
- Kazuya OTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
- Publication number 20240395509
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING SYSTEM FOR PROCESSING CHAMBER
- Publication number 20240393018
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Kevin FLYNN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CHUCK STRUCTURE WITH HOLES IN UPPER SURFACE TO IMPROVE TEMPER...
- Publication number 20240379400
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...
- Publication number 20240379322
- Publication date Nov 14, 2024
- Carl Zeiss MultiSEM GmbH
- Alexander Wertz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER LID Temperature COOLING SYSTEM
- Publication number 20240363313
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Santosh S. NESARKAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck and Method of Operation for Plasma Processing
- Publication number 20240355593
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...
- Publication number 20240347366
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CCP GAS DELIVERY NOZZLE
- Publication number 20240339301
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240339305
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Actively Cooled Gas Line For Ion Source
- Publication number 20240331972
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240321559
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Satoshi TAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240321550
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20240312801
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Shohei ARAKAWA
- H01 - BASIC ELECTRIC ELEMENTS

Cooling arrangements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ground electrode formed in an electrostatic chuck for a plasma proc...

Wafer placement table

Apparatus for temperature control in a substrate processing chamber

Cooling device, semiconductor manufacturing apparatus, and semicond...

Substrate processing device and method for manufacturing same

Wafer placement table

Energy filter element for ion implantation systems for the use in t...

Active gas generation apparatus

Programmable electrostatic chuck to enhance aluminum film morphology

Multi-zone heating apparatus, bottom electrode assembly, plasma pro...

Semiconductor manufacturing apparatus and wafer holding table for s...

High temperature detachable very high frequency (VHF) electrostatic...

Fast response pedestal assembly for selective preclean

Ceramic susceptor

Automated temperature controlled substrate support

Method and apparatus for parts cleaning

Vacuum chamber arrangement for charged particle beam generator

Cooling device, substrate treatment device, cooling method, and sub...

Electrostatic chucks with coolant gas zones and corresponding groov...

Method for particle removal from wafers through plasma modification...

Temperature actuated valve and methods of use thereof

Multi-zone semiconductor substrate supports

Thermally controlled magnetic fields optimization system for sputte...

Toxic outgas control post process

Device and method for pasteurizing and/or sterilizing particulate m...

Support

Electrostatic chuck, support platform, and plasma processing apparatus

Ion milling device

Method for processing substrate

Detachable biasable electrostatic chuck for high temperature applic...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...

CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER COOLING FLANGE FOR REMO...

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

PROCESS CHAMBERS HAVING MULTIPLE COOLING PLATES

APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...

TEMPERATURE ADJUSTING SYSTEM, TEMPERATURE ADJUSTING METHOD, SUBSTRA...

SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

Substrate Processing Apparatus

APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING

COOLING SYSTEM FOR PROCESSING CHAMBER

WAFER CHUCK STRUCTURE WITH HOLES IN UPPER SURFACE TO IMPROVE TEMPER...

MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...

Concentrated Solar Irradiation of Targets in Plasmas

CHAMBER LID Temperature COOLING SYSTEM

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

Electrostatic Chuck and Method of Operation for Plasma Processing

ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...

CCP GAS DELIVERY NOZZLE

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

Actively Cooled Gas Line For Ion Source

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...