Cooling arrangements

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CPC
H01J2237/002

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/002Cooling arrangements

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer placement table
- Patent number 12,266,557
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,266,515
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron sputter device
- Patent number 12,266,516
- Issue date Apr 1, 2025
- Daegu Gyeongbuk Institute of Science & Technology
- June Seo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plenum assemblies for cooling transformer coupled plasma windows
- Patent number 12,261,018
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hanry Issavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch type substrate processing apparatus
- Patent number 12,243,724
- Issue date Mar 4, 2025
- Eugene Technology Co., Ltd.
- Sung Ho Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,237,156
- Issue date Feb 25, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 12,237,201
- Issue date Feb 25, 2025
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled surface with a cryo-nanomanipulator for impr...
- Patent number 12,230,473
- Issue date Feb 18, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature manifold assembly for substrate processing systems
- Patent number 12,224,161
- Issue date Feb 11, 2025
- Lam Research Corporation
- Gabriel De Jesus Soto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,217,942
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sorption chamber walls for semiconductor equipment
- Patent number 12,217,945
- Issue date Feb 4, 2025
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,211,671
- Issue date Jan 28, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for metal and ceramic nanolayering for acciden...
- Patent number 12,211,679
- Issue date Jan 28, 2025
- Starfire Industries LLC
- Brian E. Jurczyk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck assembly
- Patent number 12,211,725
- Issue date Jan 28, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ground electrode formed in an electrostatic chuck for a plasma proc...
- Patent number 12,205,843
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,191,123
- Issue date Jan 7, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for temperature control in a substrate processing chamber
- Patent number 12,183,559
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooling device, semiconductor manufacturing apparatus, and semicond...
- Patent number 12,146,696
- Issue date Nov 19, 2024
- Canon Kabushiki Kaisha
- Makoto Nomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device and method for manufacturing same
- Patent number 12,136,540
- Issue date Nov 5, 2024
- LG Display Co., Ltd.
- Young Gon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer placement table
- Patent number 12,131,891
- Issue date Oct 29, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gas generation apparatus
- Patent number 12,074,012
- Issue date Aug 27, 2024
- TMEIC Corporation
- Kensuke Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Programmable electrostatic chuck to enhance aluminum film morphology
- Patent number 12,046,460
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Yaoying Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone heating apparatus, bottom electrode assembly, plasma pro...
- Patent number 12,046,458
- Issue date Jul 23, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Sha Rin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and wafer holding table for s...
- Patent number 12,046,488
- Issue date Jul 23, 2024
- Sumitomo Electric Industries, Ltd.
- Koichi Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature detachable very high frequency (VHF) electrostatic...
- Patent number 12,014,906
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- William R. Johanson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118527
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA SOURCE
- Publication number 20250118538
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Kartik RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118525
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System
- Publication number 20250109481
- Publication date Apr 3, 2025
- JEOL Ltd.
- Noriaki Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...
- Publication number 20250112076
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL BONDED ESC WITH OUTER CERAMIC VACUUM ISOLATION RING FOR CRYOG...
- Publication number 20250112075
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250105043
- Publication date Mar 27, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250105052
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Yong Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL DEVICE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT
- Publication number 20250095962
- Publication date Mar 20, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jinji XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL TERMINAL CONNECTOR, SUBSTRATE SUPPORT, SUBSTRATE TREATIN...
- Publication number 20250096496
- Publication date Mar 20, 2025
- Jae Oh BANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME
- Publication number 20250095972
- Publication date Mar 20, 2025
- PSK INC.
- Yong Soo YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBER LID COOLING
- Publication number 20250095970
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE
- Publication number 20250087451
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY WITH IMPROVED THERMAL UNIFORMITY
- Publication number 20250087468
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUSCEPTOR HEAT TRANSFER
- Publication number 20250069864
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Arvinder ManmohanSingh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...
- Publication number 20250069895
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Anatoli Chlenov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLED SPUTTERING TARGET FOR ION SOURCE
- Publication number 20250054722
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Ori NOKED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CONDITIONING ENCLOSURE FOR A CHARGED PARTICLE INSTRUMENT
- Publication number 20250054723
- Publication date Feb 13, 2025
- FEI Company
- Rens van Alebeek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...
- Publication number 20250054778
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Anthony DE LA LLERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEM NAVIGATION BY FOCUSED ION BEAM SYSTEM WITH CRYO COOLING SAMPLE...
- Publication number 20250046568
- Publication date Feb 6, 2025
- FEI Company
- Libor Strakoš
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REGIOSELECTIVE FUNCTIONALIZING A SURFACE OF AN ELECTRON...
- Publication number 20250037963
- Publication date Jan 30, 2025
- Universiteit Gent
- Wouter VAN PUTTE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVELY COOLED ANODE FOR SPUTTERING PROCESSES
- Publication number 20250029820
- Publication date Jan 23, 2025
- INTEVAC, INC.
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...
- Publication number 20250022695
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Kazuki HOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20250007296
- Publication date Jan 2, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...
- Publication number 20250003536
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME
- Publication number 20250006538
- Publication date Jan 2, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20250006463
- Publication date Jan 2, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240429024
- Publication date Dec 26, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER COOLING FLANGE FOR REMO...
- Publication number 20240420924
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amit Sahu
- H01 - BASIC ELECTRIC ELEMENTS

Cooling arrangements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer chuck structure with holes in upper surface to improve temper...

Wafer placement table

Wafer placement table

Magnetron sputter device

Plenum assemblies for cooling transformer coupled plasma windows

Plasma processing apparatus

Method for manufacturing semiconductor wafer with wafer chuck havin...

Plasma generating device and process executing apparatus including...

Batch type substrate processing apparatus

Wafer placement table

Electrostatic chucks with coolant gas zones and corresponding groov...

Temperature-controlled surface with a cryo-nanomanipulator for impr...

Low temperature manifold assembly for substrate processing systems

Plasma processing apparatus

Sorption chamber walls for semiconductor equipment

Wafer placement table

Method and apparatus for metal and ceramic nanolayering for acciden...

Electrostatic chuck assembly

Ground electrode formed in an electrostatic chuck for a plasma proc...

Wafer placement table

Apparatus for temperature control in a substrate processing chamber

Cooling device, semiconductor manufacturing apparatus, and semicond...

Substrate processing device and method for manufacturing same

Wafer placement table

Energy filter element for ion implantation systems for the use in t...

Active gas generation apparatus

Programmable electrostatic chuck to enhance aluminum film morphology

Multi-zone heating apparatus, bottom electrode assembly, plasma pro...

Semiconductor manufacturing apparatus and wafer holding table for s...

High temperature detachable very high frequency (VHF) electrostatic...

Patents Applicationslast 30 patents

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM

REMOTE PLASMA SOURCE

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM

Focused Ion Beam System

GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...

METAL BONDED ESC WITH OUTER CERAMIC VACUUM ISOLATION RING FOR CRYOG...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING T...

COIL DEVICE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT

ELECTRICAL TERMINAL CONNECTOR, SUBSTRATE SUPPORT, SUBSTRATE TREATIN...

SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME

PLASMA PROCESSING CHAMBER LID COOLING

DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE

SUBSTRATE SUPPORT ASSEMBLY WITH IMPROVED THERMAL UNIFORMITY

SUSCEPTOR HEAT TRANSFER

METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...

COOLED SPUTTERING TARGET FOR ION SOURCE

THERMAL CONDITIONING ENCLOSURE FOR A CHARGED PARTICLE INSTRUMENT

IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...

SEM NAVIGATION BY FOCUSED ION BEAM SYSTEM WITH CRYO COOLING SAMPLE...

METHODS FOR REGIOSELECTIVE FUNCTIONALIZING A SURFACE OF AN ELECTRON...

ACTIVELY COOLED ANODE FOR SPUTTERING PROCESSES

PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...

CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER COOLING FLANGE FOR REMO...