Cooling arrangements

Industry

CPC
H01J2237/002

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/002Cooling arrangements

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Sample supports and sample cooling systems for cryo-electron micros...
- Patent number 12,366,509
- Issue date Jul 22, 2025
- MiTeGen, LLC
- David Closs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma type ion implanter
- Patent number 12,368,021
- Issue date Jul 22, 2025
- SK Hynix Inc.
- Jong Jin Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, substrate processing apparatus, and substrate...
- Patent number 12,354,852
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Hyun Tak Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,347,658
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus
- Patent number 12,340,990
- Issue date Jun 24, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck including a heater element with mutiple heating...
- Patent number 12,341,049
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen supply device, and ion beam irradiation apparatus equipped...
- Patent number 12,340,974
- Issue date Jun 24, 2025
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gas generation apparatus
- Patent number 12,327,711
- Issue date Jun 10, 2025
- TMEIC Corporation
- Ren Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 12,327,707
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table structure, substrate processing apparatus, and metho...
- Patent number 12,315,707
- Issue date May 27, 2025
- Tokyo Electron Limited
- Motoi Yamagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck for high bias radio frequency (RF) power applic...
- Patent number 12,300,473
- Issue date May 13, 2025
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shield cooling assembly, reaction chamber and semiconductor process...
- Patent number 12,278,096
- Issue date Apr 15, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Qing Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anodized titanium material and method for producing the same
- Patent number 12,276,037
- Issue date Apr 15, 2025
- Yamaguchi Prefectural Industrial Technology Institute
- Takehiko Muranaka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer placement table
- Patent number 12,266,557
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,266,515
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron sputter device
- Patent number 12,266,516
- Issue date Apr 1, 2025
- Daegu Gyeongbuk Institute of Science & Technology
- June Seo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plenum assemblies for cooling transformer coupled plasma windows
- Patent number 12,261,018
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hanry Issavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch type substrate processing apparatus
- Patent number 12,243,724
- Issue date Mar 4, 2025
- Eugene Technology Co., Ltd.
- Sung Ho Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,237,156
- Issue date Feb 25, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 12,237,201
- Issue date Feb 25, 2025
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled surface with a cryo-nanomanipulator for impr...
- Patent number 12,230,473
- Issue date Feb 18, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature manifold assembly for substrate processing systems
- Patent number 12,224,161
- Issue date Feb 11, 2025
- Lam Research Corporation
- Gabriel De Jesus Soto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,217,942
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sorption chamber walls for semiconductor equipment
- Patent number 12,217,945
- Issue date Feb 4, 2025
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,211,671
- Issue date Jan 28, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SA...
- Publication number 20250232948
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Hoonseop KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250232963
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Motoi YAMAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM
- Publication number 20250232953
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Ryan T. DOWNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218825
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jae Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING TEMPERATURE
- Publication number 20250218736
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Yun Sik JU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD AND SUBSTRATE TREATMENT APPARATUS INCLUDING SHOWERHEAD
- Publication number 20250218731
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Je Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE COOLING SYSTEM
- Publication number 20250218737
- Publication date Jul 3, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Songjae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLENUMS FOR COOLING DIELECTRIC WINDOWS
- Publication number 20250218724
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Hanry ISSAVI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT
- Publication number 20250210395
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Kuk Saeng KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cooling Apparatus and Cooling Preparation Method
- Publication number 20250207827
- Publication date Jun 26, 2025
- JEOL Ltd.
- Mitsuru Hamochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER FOR AN ORIFICE ELEMENT
- Publication number 20250210337
- Publication date Jun 26, 2025
- Thermo Fisher Scientific (Bremen) GmbH
- Jakub Magda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER SYSTEM INCLUDING TEMPERATURE CONDITIONING PLATE
- Publication number 20250191875
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Dongchi YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DEVICE AND COOLING PLATE
- Publication number 20250191956
- Publication date Jun 12, 2025
- HORIBA STEC, CO., LTD.
- Esteban GONZALEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABLE ELECTRON MICROSCOPY SPECIMEN HOLDER OPERATING AT LOW TEMPERA...
- Publication number 20250191876
- Publication date Jun 12, 2025
- President and Fellows of Harvard College
- Ismail EL BAGGARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250191891
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR...
- Publication number 20250191895
- Publication date Jun 12, 2025
- CKD CORPORATION
- Yuko SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPARK PLASMA SINTERED COMPONENT FOR CRYO-PLASMA PROCESSING
- Publication number 20250191893
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Lin XU
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
TEMPERATURE CONTROL SYSTEM AND PLASMA PROCESSING SYSTEM
- Publication number 20250191899
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Hayato SAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID COOLING PLATE FOR COOLING OF DIELECTRIC WINDOW OF A SUBSTRAT...
- Publication number 20250183011
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Hanry ISSAVI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250174441
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Naoya FUKUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...
- Publication number 20250157798
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149370
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT DEVICE AND METHOD OF CONTROLLING PREVENTION OF LE...
- Publication number 20250140533
- Publication date May 1, 2025
- SEMES CO., LTD.
- Soon Cheon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250140535
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Takashi KANAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE-DIELECTRIC NOZZLE FOR PLASMA PROCESSING
- Publication number 20250132132
- Publication date Apr 24, 2025
- LAM RESEARCH CORPORATION
- Paul Konkola
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING OF HIGH-QUALITY SUPERCONDUCTING THIN FILMS
- Publication number 20250129468
- Publication date Apr 24, 2025
- Northrop Grumman Systems Corporation
- THOMAS SCOTT GESKE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE AND METHOD FOR VIBRATION FREE LOW TEMPERATURE SAMPLE HOLDER...
- Publication number 20250132120
- Publication date Apr 24, 2025
- Ohio State Innovation Foundation
- Alexander REIFSNYDER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118527
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA SOURCE
- Publication number 20250118538
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Kartik RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118525
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS

Cooling arrangements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sample supports and sample cooling systems for cryo-electron micros...

Inductively coupled plasma type ion implanter

Plasma processing method and plasma processing apparatus

Electrostatic chuck, substrate processing apparatus, and substrate...

Stage and plasma processing apparatus

Member for semiconductor manufacturing apparatus

Electrostatic chuck including a heater element with mutiple heating...

Hydrogen supply device, and ion beam irradiation apparatus equipped...

Active gas generation apparatus

Charged particle blocking element, exposure apparatus comprising su...

Mounting table structure, substrate processing apparatus, and metho...

Electrostatic chuck for high bias radio frequency (RF) power applic...

Shield cooling assembly, reaction chamber and semiconductor process...

Anodized titanium material and method for producing the same

Wafer chuck structure with holes in upper surface to improve temper...

Wafer placement table

Wafer placement table

Magnetron sputter device

Plenum assemblies for cooling transformer coupled plasma windows

Plasma processing apparatus

Method for manufacturing semiconductor wafer with wafer chuck havin...

Plasma generating device and process executing apparatus including...

Batch type substrate processing apparatus

Wafer placement table

Electrostatic chucks with coolant gas zones and corresponding groov...

Temperature-controlled surface with a cryo-nanomanipulator for impr...

Low temperature manifold assembly for substrate processing systems

Plasma processing apparatus

Sorption chamber walls for semiconductor equipment

Wafer placement table

Patents Applicationslast 30 patents

ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SA...

Substrate Processing Apparatus

PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM

SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD FOR CONTROLLING TEMPERATURE

SHOWERHEAD AND SUBSTRATE TREATMENT APPARATUS INCLUDING SHOWERHEAD

PLASMA SOURCE COOLING SYSTEM

PLENUMS FOR COOLING DIELECTRIC WINDOWS

SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT

Cooling Apparatus and Cooling Preparation Method

SPACER FOR AN ORIFICE ELEMENT

VACUUM CHAMBER SYSTEM INCLUDING TEMPERATURE CONDITIONING PLATE

ELECTROSTATIC CHUCK DEVICE AND COOLING PLATE

STABLE ELECTRON MICROSCOPY SPECIMEN HOLDER OPERATING AT LOW TEMPERA...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR...

SPARK PLASMA SINTERED COMPONENT FOR CRYO-PLASMA PROCESSING

TEMPERATURE CONTROL SYSTEM AND PLASMA PROCESSING SYSTEM

LIQUID COOLING PLATE FOR COOLING OF DIELECTRIC WINDOW OF A SUBSTRAT...

Substrate Processing Apparatus

CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE SUPPORT DEVICE AND METHOD OF CONTROLLING PREVENTION OF LE...

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

ELECTRODE-DIELECTRIC NOZZLE FOR PLASMA PROCESSING

SPUTTERING OF HIGH-QUALITY SUPERCONDUCTING THIN FILMS

DEVICE AND METHOD FOR VIBRATION FREE LOW TEMPERATURE SAMPLE HOLDER...

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM

REMOTE PLASMA SOURCE

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM