Cooling of the reaction chamber walls

Industry

CPC
C23C16/4411

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Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/4411Cooling of the reaction chamber walls

Industries

Patents Grantslast 30 patents

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Chamber architecture for epitaxial deposition and advanced epitaxia...
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Actively cooled foreline trap to reduce throttle valve drift
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Reactor system and method to reduce residue buildup during a film d...
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Film formation apparatus and moisture removal method thereof
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Linear lamp array for improved thermal uniformity and profile control
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Coating device for conducting high efficient low temperature coating
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Substrate processing apparatus
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Method for determining a surface temperature
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Film-forming apparatus
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Upper cone for epitaxy chamber
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High temperature vapor delivery system and method
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Reaction chamber for vapor deposition apparatus
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Patents Applicationslast 30 patents

Information Patent Application
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CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...
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DUAL DEPOSITION CHAMBER APPARATUS FOR PRODUCING SILICON MATERIAL
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SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD...
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Method and Device for Producing a SiC Solid Material
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METHODS AND APPARATUS FOR CHAMBER LID COOLING
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Cooling of the reaction chamber walls

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for trapping multiple reaction by-products for semiconduc...

Chamber architecture for epitaxial deposition and advanced epitaxia...

Actively cooled foreline trap to reduce throttle valve drift

Reactor system and method to reduce residue buildup during a film d...

Film formation apparatus and moisture removal method thereof

Substrate processing apparatus

Substrate processing device

Substrate retaining apparatus, system including the apparatus, and...

Chemical vapor deposition apparatus and method of manufacturing dis...

Apparatus for fluidized-bed chemical vapour deposition

Device and method for controlling the ceiling temperature of a CVD...

Linear lamp array for improved thermal uniformity and profile control

Substrate processing device

Coating device for conducting high efficient low temperature coating

Substrate processing apparatus

Method for determining a surface temperature

Film-forming apparatus

Reactor system and method to reduce residue buildup during a film d...

Epitaxial deposition reactor with reflector external to the reactio...

Dome stress isolating layer

Chemical vapor deposition apparatus and method of manufacturing dis...

Liner for processing chamber

Upper cone for epitaxy chamber

Film forming apparatus, film forming method, and storage medium

High temperature vapor delivery system and method

Reaction chamber for vapor deposition apparatus

Integration of ALD copper with high temperature PVD copper depositi...

Film forming apparatus

Process feed management for semiconductor substrate processing

Temperature controller and a plasma-processing apparatus including...

Patents Applicationslast 30 patents

CHAMBER LID Temperature COOLING SYSTEM

SUBSTRATE PROCESSING APPARATUS

MATERIAL DEPOSITION SYSTEM EQUIPMENT MAINTENANCE

SEMICONDUCTOR PROCESSING SYSTEM

CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...

DUAL DEPOSITION CHAMBER APPARATUS FOR PRODUCING SILICON MATERIAL

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD...

SUBSTRATE RETAINING APPARATUS, SYSTEM INCLUDING THE APPARATUS, AND...

Method and Device for Producing a SiC Solid Material

Method and Device for Producing a SiC Solid Material

METHODS AND APPARATUS FOR CHAMBER LID COOLING

SUBSTRATE PROCESSING DEVICE

APPARATUS FOR FLUIDIZED-BED CHEMICAL VAPOUR DEPOSITION

SUBSTRATE SUPPORT WITH VARYING DEPTHS OF AREAS BETWEEN MESAS AND CO...

MULTI-ZONE LAMP HEATING AND TEMPERATURE MONITORING IN EPITAXY PROCE...

APPARATUS FOR TRAPPING MULTIPLE REACTION BY-PRODUCTS FOR SEMICONDUC...

REACTOR SYSTEM AND METHOD TO REDUCE RESIDUE BUILDUP DURING A FILM D...

AN ATOMIC LAYER DEPOSITION APPARATUS

CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DIS...

ACTIVELY COOLED FORELINE TRAP TO REDUCE THROTTLE VALVE DRIFT

REACTION CHAMBER FOR A DEPOSITION REACTOR WITH INTERSPACE AND LOWER...

DEVICE AND METHOD FOR CONTROLLING THE CEILING TEMPERATURE OF A CVD...

FILM FORMATION APPARATUS AND MOISTURE REMOVAL METHOD THEREOF

LINEAR LAMP ARRAY FOR IMPROVED THERMAL UNIFORMITY AND PROFILE CONTROL

SUBSTRATE PROCESSING DEVICE

APPARATUS AND METHOD OF PROCESSING A SUBSTRATE

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SEMICO...

COATING DEVICE FOR CONDUCTING HIGH EFFICIENT LOW TEMPERATURE COATING

DOME STRESS ISOLATING LAYER

SUBSTRATE RETAINING APPARATUS, SYSTEM INCLUDING THE APPARATUS, AND...