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GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10
USPC classification
Y10S
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S204/00
Chemistry: electrical and wave energy
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Patents Grants
last 30 patents
Information
Patent Grant
Device and method to conduct an electrochemical reaction on a surfa...
Patent number
8,795,503
Issue date
Aug 5, 2014
Alchimer
Said Zahraoui
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Apparatus for an enhanced magnetic plating method
Patent number
8,168,045
Issue date
May 1, 2012
International Business Corporation
Matteo Flotta
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Semiconductive counter electrode for electrolytic current distribut...
Patent number
8,147,660
Issue date
Apr 3, 2012
Novellus Systems, Inc.
Steven T. Mayer
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method of electroplating using a high resistance ionic current source
Patent number
7,967,969
Issue date
Jun 28, 2011
Novellus Systems, Inc.
Steven T. Mayer
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Enhanced magnetic plating method
Patent number
7,964,081
Issue date
Jun 21, 2011
International Business Machines Corporation
Matteo Flotta
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Electroplating apparatus and method based on an array of anodes
Patent number
7,935,240
Issue date
May 3, 2011
Applied Materials, Inc.
Saravjeet Singh
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Metal plating process
Patent number
7,704,365
Issue date
Apr 27, 2010
International Business Machines Corporation
Johji Nakamoto
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Electrolytic apparatus for use in oxide electrowinning method
Patent number
7,635,421
Issue date
Dec 22, 2009
Japan Nuclear Cycle Development Institute
Kenji Koizumi
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
High resistance ionic current source
Patent number
7,622,024
Issue date
Nov 24, 2009
Novellus Systems, Inc.
Steven T. Mayer
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Anodic oxidation apparatus
Patent number
7,569,124
Issue date
Aug 4, 2009
Tokyo Electron Limited and Matsushita Electric Works, Ltd.
Yasushi Yagi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
System for electrochemically processing a workpiece
Patent number
7,566,386
Issue date
Jul 28, 2009
Semitool, Inc.
Gregory J. Wilson
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for airfoil electroplating
Patent number
7,560,014
Issue date
Jul 14, 2009
General Electric Company
Michael Rucker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for controlling thickness uniformity of electroplated layers
Patent number
7,435,323
Issue date
Oct 14, 2008
Novellus Systems, Inc.
Bulent M. Basol
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Selective shield/material flow mechanism
Patent number
7,425,256
Issue date
Sep 16, 2008
International Business Machines Corporation
Ralph A. Barrese
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Apparatus and method for electrochemically depositing metal on a se...
Patent number
7,332,066
Issue date
Feb 19, 2008
Semitool, Inc.
Linlin Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for depositing a layer of material on a substrate
Patent number
7,323,094
Issue date
Jan 29, 2008
FREESCALE SEMICONDUCTOR, INC.
Cindy Reidsema Simpson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Selective shield/material flow mechanism
Patent number
7,288,177
Issue date
Oct 30, 2007
International Business Machines Corporation
Ralph A. Barrese
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Workpiece processor having processing chamber with improved process...
Patent number
7,267,749
Issue date
Sep 11, 2007
Semitool, Inc.
Gregory J. Wilson
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Dual contact ring and method for metal ECP process
Patent number
7,252,750
Issue date
Aug 7, 2007
Taiwan Semiconductor Manufacturing Co., Ltd.
Chi-Wen Liu
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Anodization device and anodization method
Patent number
7,169,283
Issue date
Jan 30, 2007
Tokyo Electron Limited
Yasushi Yagi
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Turning electrodes used in a reactor for electrochemically processi...
Patent number
7,160,421
Issue date
Jan 9, 2007
Semitool, Inc.
Gregory J. Wilson
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Apparatus and method for electrochemically depositing metal on a se...
Patent number
7,115,196
Issue date
Oct 3, 2006
Semitool, Inc.
Linlin Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process and system for eliminating gas bubbles during electrochemic...
Patent number
7,045,040
Issue date
May 16, 2006
ASM NuTool, Inc.
Bulent M. Basol
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Cup type plating apparatus
Patent number
6,991,711
Issue date
Jan 31, 2006
Electroplating Engineers of Japan Limited
Yasuhiko Sakaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and system for controlling ion distribution during plating o...
Patent number
6,974,530
Issue date
Dec 13, 2005
Advanced Micro Devices, Inc.
Matthias Bonkass
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Electroplating panel with plating thickness-compensation structures
Patent number
6,966,976
Issue date
Nov 22, 2005
Hutchinson Technology Incorporated
Colin M. Mcgraw
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Liquid treatment method using alternating electrical contacts
Patent number
6,953,522
Issue date
Oct 11, 2005
Tokyo Electron Limited
Kyungho Park
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Diffuser with spiral opening pattern for electroplating reactor vessel
Patent number
6,881,309
Issue date
Apr 19, 2005
Semitool, Inc.
Kyle M. Hanson
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Metal plating apparatus and process
Patent number
6,827,827
Issue date
Dec 7, 2004
International Business Machines Corporation
Johji Nakamoto
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Methods and apparatus for improved current density and feature fill...
Patent number
6,811,669
Issue date
Nov 2, 2004
Texas Instruments Incorporated
David Gonzalez
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
DEVICE AND METHOD TO CONDUCT AN ELECTROCHEMICAL REACTION ON A SURFA...
Publication number
20120000785
Publication date
Jan 5, 2012
ALCHIMER
Said Zahraoui
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
ENHANCED MAGNETIC PLATING METHOD
Publication number
20110220020
Publication date
Sep 15, 2011
International Business Machines Corporation
MATTEO FLOTA
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
ELECTROPLATING APPARATUS BASED ON AN ARRAY OF ANODES
Publication number
20110198229
Publication date
Aug 18, 2011
APPLIED MATERIALS, INC.
SARAVJEET SINGH
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Apparatus and method for electrochemically depositing metal on a se...
Publication number
20100116671
Publication date
May 13, 2010
Semitool, Inc.
Linlin Chen
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
High Resistance Ionic Current Source
Publication number
20100032304
Publication date
Feb 11, 2010
Novellus Systems, Inc.
Steven T. Mayer
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Enhanced Magnetic Plating Method and Apparatus
Publication number
20090050486
Publication date
Feb 26, 2009
International Business Machines Corporation
Matteo Flotta
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
METHOD AND APPARATUS FOR AIRFOIL ELECTROPLATING, AND AIRFOIL
Publication number
20080302667
Publication date
Dec 11, 2008
GENERAL ELECTRIC COMPANY
Michael Rucker
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
METAL PLATING APPARATUS AND PROCESS
Publication number
20080041726
Publication date
Feb 21, 2008
Johji Nakamoto
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
SELECTIVE SHIELD/MATERIAL FLOW MECHANISM
Publication number
20080000777
Publication date
Jan 3, 2008
International Business Machines Corporation
Ralph A. Barrese
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Electroplating apparatus based on an array of anodes
Publication number
20070068819
Publication date
Mar 29, 2007
Saravjeet Singh
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Method and apparatus for airfoil electroplating, and airfoil
Publication number
20060275624
Publication date
Dec 7, 2006
GENERAL ELECTRIC COMPANY
Michael Rucker
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Electrolytic apparatus for use in oxide electrowinning method
Publication number
20060151326
Publication date
Jul 13, 2006
Kenji Koizumi
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Tuning electrodes used in a reactor for electrochemically processin...
Publication number
20060000716
Publication date
Jan 5, 2006
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Apparatus and method for electrochemically depositing metal on a se...
Publication number
20050245083
Publication date
Nov 3, 2005
Semitool, Inc.
Linlin Chen
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
System for electrochemically processing a workpiece
Publication number
20050224340
Publication date
Oct 13, 2005
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Selective shield/material flow mechanism
Publication number
20050218002
Publication date
Oct 6, 2005
International Business Machines Corporation
Ralph A. Barrese
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
System for electrochemically processing a workpiece
Publication number
20050167265
Publication date
Aug 4, 2005
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
System for electrochemically processing a workpiece
Publication number
20050109625
Publication date
May 26, 2005
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
System for electrochemically processing a workpiece
Publication number
20050109629
Publication date
May 26, 2005
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
System for electrochemically processing a workpiece
Publication number
20050109633
Publication date
May 26, 2005
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
System for electrochemically processing a workpiece
Publication number
20050109628
Publication date
May 26, 2005
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Anodic oxidation apparatus, anodic oxidation method, and panel for...
Publication number
20050077183
Publication date
Apr 14, 2005
Yasushi Yagi
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Dual contact ring and method for metal ECP process
Publication number
20050056544
Publication date
Mar 17, 2005
Taiwan Semiconductor Manufacturing Co., Ltd.
Chi-Wen Liu
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Method and apparatus for controlling thickness uniformity of electr...
Publication number
20040231994
Publication date
Nov 25, 2004
NuTool Inc.
Bulent M. Basol
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Process and system for eliminating gas bubbles during electrochemic...
Publication number
20040182712
Publication date
Sep 23, 2004
Bulent M. Basol
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
System for electrochemically processing a workpiece
Publication number
20040099533
Publication date
May 27, 2004
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Anodization device and anodization method
Publication number
20040089552
Publication date
May 13, 2004
Yasushi Yagi
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Metal plating apparatus and process
Publication number
20040079644
Publication date
Apr 29, 2004
International Business Machines Corporation
Johji Nakamoto
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Workpiece processor having processing chamber with improved process...
Publication number
20040055877
Publication date
Mar 25, 2004
Gregory J. Wilson
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Apparatus and method for electrochemically depositing metal on a se...
Publication number
20040031693
Publication date
Feb 19, 2004
Linlin Chen
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR