CVD [Chemical Vapor Deposition]

Industry

CPC
H01J2237/3321

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3321CVD [Chemical Vapor Deposition]

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Process and device for diamond synthesis by CVD
- Patent number 12,227,834
- Issue date Feb 18, 2025
- DIAROTECH
- Horacio Tellez Oliva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pedestal thermal profile tuning using multiple heated zones and the...
- Patent number 12,215,420
- Issue date Feb 4, 2025
- Lam Research Corporation
- Gary B. Lind
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage, film-forming apparatus, and film-processing apparatus
- Patent number 12,211,710
- Issue date Jan 28, 2025
- NHK Spring Co., Ltd.
- Toshihiko Hanamachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable chemical vapor deposition of metal oxides
- Patent number 12,211,736
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Hurshvardhan Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber deposition confinement
- Patent number 12,211,673
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ground electrode formed in an electrostatic chuck for a plasma proc...
- Patent number 12,205,843
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conditioning treatment for ALD productivity
- Patent number 12,195,845
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Christina L. Engler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual RF for controllable film deposition
- Patent number 12,191,115
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and film forming appar...
- Patent number 12,191,193
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuya Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated process gas dis...
- Patent number 12,191,118
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- James Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with spatially tunable RF coupling to a wafer
- Patent number 12,191,122
- Issue date Jan 7, 2025
- Lam Research Corporation
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas nozzle, manufacturing method of gas nozzle, and plasma treatmen...
- Patent number 12,183,551
- Issue date Dec 31, 2024
- Kyocera Corporation
- Yukio Noguchi
- B24 - GRINDING POLISHING
Information Patent Grant
Gas transport system
- Patent number 12,173,736
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jheng-Syun Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma abatement system utilizing water vapor and oxygen reagent
- Patent number 12,170,192
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Colin John Dickinson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Coating apparatus and coating method
- Patent number 12,170,189
- Issue date Dec 17, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor mask reshaping using a sacrificial layer
- Patent number 12,165,878
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic heater
- Patent number 12,165,855
- Issue date Dec 10, 2024
- NGK Insulators, Ltd.
- Hideaki Takasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antimicrobial and/or antiviral polymer surfaces and methods for the...
- Patent number 12,146,221
- Issue date Nov 19, 2024
- MOLECULAR PLASMA GROUP SA
- Raphael Dabbous
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for substrate transport in vacuum processing systems
- Patent number 12,142,463
- Issue date Nov 12, 2024
- VON ARDENNE Asset GmbH & Co. KG
- Falk Milde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber system diffuser with increased power efficiency
- Patent number 12,136,538
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Changling Li
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Closed-loop multiple-output radio frequency (RF) matching
- Patent number 12,136,938
- Issue date Nov 5, 2024
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with multiple radio frequency meshes to control...
- Patent number 12,136,536
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for efficiently eliminating graphene wrinkles formed by chem...
- Patent number 12,116,281
- Issue date Oct 15, 2024
- Nanjing University
- Libo Gao
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Faceplate having a curved surface
- Patent number 12,110,590
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Shailendra Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD apparatus
- Patent number 12,112,928
- Issue date Oct 8, 2024
- GUANGZHOU AIFO LIGHT COMMUNICATION TECHNOLOGY COMPANY LTD.
- Guoqiang Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotating substrate support
- Patent number 12,106,944
- Issue date Oct 1, 2024
- ASM IP Holding B.V.
- Yukihiro Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER
- Publication number 20250062106
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Danae Nicole Kay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON MASK DEPOSITION
- Publication number 20250054760
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...
- Publication number 20250054749
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Kent Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS
- Publication number 20250054736
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Patrick G. BREILING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION CHAMBER SYSTEM DIFFUSER WITH INCREASED POWER EFFICIENCY
- Publication number 20250046578
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Changling Li
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING
- Publication number 20250046635
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Sangchul Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TRANSFER PADDLES WITH MINIMUM CONTACT AREA STRUCTURES FOR RED...
- Publication number 20250046644
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Andrew Borth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS STACK FOR CVD PLASMA TREATMENT
- Publication number 20250037976
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Anirudh K. Alewoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-PORT CROSS FLOW SYSTEM
- Publication number 20250037980
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Rupankar Choudhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATED METAL LID FOR SELECTIVE PECVD
- Publication number 20250029816
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Douglas Long
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20250029818
- Publication date Jan 23, 2025
- Hitachi High-Tech Corporation
- Andre AMEND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...
- Publication number 20250022691
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Shang-I CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLOSED-LOOP MULTIPLE-OUTPUT RADIO FREQUENCY (RF) MATCHING
- Publication number 20250015819
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAMOND FORMATION DEVICE AND DIAMOND-COATED SUBSTRATE
- Publication number 20250011922
- Publication date Jan 9, 2025
- NATIONAL UNIVERSITY CORPORATION EHIME UNIVERSITY
- Hiromichi TOYOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Publication number 20250006474
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Naomi YOSHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTU...
- Publication number 20250006488
- Publication date Jan 2, 2025
- NANYA TECHNOLOGY CORPORATION
- Chao-Hsiu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240429044
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATING SUBSTRATE SUPPORT
- Publication number 20240420931
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Yukihiro Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...
- Publication number 20240412953
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Bradley Taylor Streng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...
- Publication number 20240404861
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- SUSHIM KOSHTI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SOURCE SYSTEM, AND PLASMA PROCES...
- Publication number 20240387143
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Pengkai HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING
- Publication number 20240387226
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Aaron Blake MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH...
- Publication number 20240384410
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Hao LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SIMULTANEOUS SILICIDATION ON SOURCE AND DRAIN OF NMOS AND...
- Publication number 20240387290
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Xuebin LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING THE GAP BETWEEN A WAFER AND A TOP P...
- Publication number 20240387299
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Chan LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING CAPACITOR STRUCTURE
- Publication number 20240387606
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Qinghui ZHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition Systems with Rotating Electrostatic Chuck and Methods Th...
- Publication number 20240376602
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371612
- Publication date Nov 7, 2024
- JUSUNG ENGINEERING CO., LTD.
- Young Rok KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240371636
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Min Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLOCKABLE SUBSTRATE PROCESSING PEDESTAL FOR USE IN SEMICONDUCTOR FA...
- Publication number 20240371679
- Publication date Nov 7, 2024
- LAM RESEARCH CORPORATION
- Sky MULLENAUX
- H01 - BASIC ELECTRIC ELEMENTS

CVD [Chemical Vapor Deposition]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Process and device for diamond synthesis by CVD

Pedestal thermal profile tuning using multiple heated zones and the...

Stage, film-forming apparatus, and film-processing apparatus

Flowable chemical vapor deposition of metal oxides

Processing chamber deposition confinement

Ground electrode formed in an electrostatic chuck for a plasma proc...

Conditioning treatment for ALD productivity

Dual RF for controllable film deposition

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Method of manufacturing semiconductor device and film forming appar...

Monolithic modular microwave source with integrated process gas dis...

Electrostatic chuck with spatially tunable RF coupling to a wafer

Gas nozzle, manufacturing method of gas nozzle, and plasma treatmen...

Gas transport system

Plasma abatement system utilizing water vapor and oxygen reagent

Coating apparatus and coating method

Semiconductor mask reshaping using a sacrificial layer

Plasma processing method for manufacturing semiconductor structure

Ceramic heater

Antimicrobial and/or antiviral polymer surfaces and methods for the...

Device and method for substrate transport in vacuum processing systems

Deposition chamber system diffuser with increased power efficiency

Closed-loop multiple-output radio frequency (RF) matching

Electrostatic chuck with multiple radio frequency meshes to control...

Method to improve wafer edge uniformity

Method for efficiently eliminating graphene wrinkles formed by chem...

Faceplate having a curved surface

Substrate processing apparatus and method

PECVD apparatus

Rotating substrate support

Patents Applicationslast 30 patents

REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER

CARBON MASK DEPOSITION

RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...

A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS

DEPOSITION CHAMBER SYSTEM DIFFUSER WITH INCREASED POWER EFFICIENCY

SUBSTRATE PROCESSING

WAFER TRANSFER PADDLES WITH MINIMUM CONTACT AREA STRUCTURES FOR RED...

PROCESS STACK FOR CVD PLASMA TREATMENT

MULTI-PORT CROSS FLOW SYSTEM

HEATED METAL LID FOR SELECTIVE PECVD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...

CLOSED-LOOP MULTIPLE-OUTPUT RADIO FREQUENCY (RF) MATCHING

DIAMOND FORMATION DEVICE AND DIAMOND-COATED SUBSTRATE

INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS

DEPOSITION DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTU...

SUBSTRATE PROCESSING METHOD

ROTATING SUBSTRATE SUPPORT

APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...

APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...

PLASMA PROCESSING APPARATUS, POWER SOURCE SYSTEM, AND PLASMA PROCES...

REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING

SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH...

METHOD OF SIMULTANEOUS SILICIDATION ON SOURCE AND DRAIN OF NMOS AND...

METHOD AND SYSTEM FOR ADJUSTING THE GAP BETWEEN A WAFER AND A TOP P...

METHOD FOR MANUFACTURING CAPACITOR STRUCTURE

Deposition Systems with Rotating Electrostatic Chuck and Methods Th...

SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

CLOCKABLE SUBSTRATE PROCESSING PEDESTAL FOR USE IN SEMICONDUCTOR FA...