CVD [Chemical Vapor Deposition]

Industry

CPC
H01J2237/3321

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3321CVD [Chemical Vapor Deposition]

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,308,208
- Issue date May 20, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of low temperature plasma enhanced chemical va...
- Patent number 12,300,497
- Issue date May 13, 2025
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 12,300,469
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 12,300,472
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Pei-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced film formation method
- Patent number 12,300,466
- Issue date May 13, 2025
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for carbon compound film deposition
- Patent number 12,288,672
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment device
- Patent number 12,278,092
- Issue date Apr 15, 2025
- Nissin Electric Co., Ltd.
- Toshihiko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for monitoring semiconductor processes
- Patent number 12,266,552
- Issue date Apr 1, 2025
- Inficon, Inc.
- Matan Lapidot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting the gap between a wafer and a top p...
- Patent number 12,266,579
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,266,522
- Issue date Apr 1, 2025
- Kokusai Electric Corporation
- Kazuyuki Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ PECVD cap layer
- Patent number 12,252,782
- Issue date Mar 18, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon based depositions used for critical dimension control during...
- Patent number 12,249,514
- Issue date Mar 11, 2025
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and device for diamond synthesis by CVD
- Patent number 12,227,834
- Issue date Feb 18, 2025
- DIAROTECH
- Horacio Tellez Oliva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pedestal thermal profile tuning using multiple heated zones and the...
- Patent number 12,215,420
- Issue date Feb 4, 2025
- Lam Research Corporation
- Gary B. Lind
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage, film-forming apparatus, and film-processing apparatus
- Patent number 12,211,710
- Issue date Jan 28, 2025
- NHK Spring Co., Ltd.
- Toshihiko Hanamachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable chemical vapor deposition of metal oxides
- Patent number 12,211,736
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Hurshvardhan Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber deposition confinement
- Patent number 12,211,673
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ground electrode formed in an electrostatic chuck for a plasma proc...
- Patent number 12,205,843
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conditioning treatment for ALD productivity
- Patent number 12,195,845
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Christina L. Engler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual RF for controllable film deposition
- Patent number 12,191,115
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and film forming appar...
- Patent number 12,191,193
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuya Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated process gas dis...
- Patent number 12,191,118
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- James Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with spatially tunable RF coupling to a wafer
- Patent number 12,191,122
- Issue date Jan 7, 2025
- Lam Research Corporation
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20250166971
- Publication date May 22, 2025
- ASM IP HOLDING B.V.
- Songwhe Herr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250166978
- Publication date May 22, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS
- Publication number 20250163578
- Publication date May 22, 2025
- Applied Materials, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250154645
- Publication date May 15, 2025
- Tokyo Electron Limited
- Tadashi MITSUNARI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHANNEL STRUCTURE AND SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20250146884
- Publication date May 8, 2025
- KYOCERA CORPORATION
- Miki HAMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SCRUBBER, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBST...
- Publication number 20250149314
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Mukyeong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT
- Publication number 20250140531
- Publication date May 1, 2025
- SEMES CO., LTD.
- Sang Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20250140595
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeontae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY DOPED HARDMASK FILMS
- Publication number 20250132157
- Publication date Apr 24, 2025
- LAM RESEARCH CORPORATION
- Sonal Bhadauriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250129474
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Ryota IFUKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING EUV RESIST UNDERLAYER
- Publication number 20250130500
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Sudha RATHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR TREATMENT OF HIGH-K MATERIALS TO REDUCE LEAKAGE CURRENT...
- Publication number 20250132147
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Jae Young PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PROCESSING SUBSTRATE
- Publication number 20250122611
- Publication date Apr 17, 2025
- TES CO., LTD.
- Sungwoo LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC SUSCEPTOR
- Publication number 20250125128
- Publication date Apr 17, 2025
- NGK Insulators, Ltd.
- Shingo AMANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING CHAMBER DEPOSITION CONFINEMENT
- Publication number 20250125129
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND APPARATUS FOR ATOMIC LAYER DEPOSITION
- Publication number 20250122618
- Publication date Apr 17, 2025
- SparkNano B.V.
- Paul POODT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE WAFER EDGE UNIFORMITY
- Publication number 20250118539
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUC...
- Publication number 20250116001
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Allison Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARD MASK LAYER AND FORMATION METHOD THEREOF
- Publication number 20250118569
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD
- Publication number 20250115991
- Publication date Apr 10, 2025
- DIAROTECH
- Horacio TELLEZ OLIVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...
- Publication number 20250112076
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING CARBON-CONTAINING FILM
- Publication number 20250112036
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Capillary Nanodiamond Reactor
- Publication number 20250101577
- Publication date Mar 27, 2025
- Board of Trustees of Michigan State University
- Tanvi NIKHAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...
- Publication number 20250101580
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Device
- Publication number 20250104974
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS TRANSPORT SYSTEM
- Publication number 20250092892
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jheng-Syun LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME
- Publication number 20250079230
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Ikuhisa MORIOKA
- H01 - BASIC ELECTRIC ELEMENTS

CVD [Chemical Vapor Deposition]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing method and substrate processing apparatus

Method and apparatus of low temperature plasma enhanced chemical va...

Plasma processing apparatus, calculation method, and calculation pr...

Plasma processing apparatus and method

Plasma enhanced film formation method

Throughput improvement with interval conditioning purging

Methods and apparatus for carbon compound film deposition

Plasma treatment device

Station-to-station control of backside bow compensation deposition

System and method for monitoring semiconductor processes

Method and system for adjusting the gap between a wafer and a top p...

Plasma processing apparatus and method for venting a processing cha...

Substrate processing apparatus, method of manufacturing semiconduct...

In-situ PECVD cap layer

Method for manufacturing semiconductor wafer with wafer chuck havin...

Carbon based depositions used for critical dimension control during...

Plasma generating device and process executing apparatus including...

Plasma processing assembly using pulsed-voltage and radio-frequency...

Process and device for diamond synthesis by CVD

Pedestal thermal profile tuning using multiple heated zones and the...

Stage, film-forming apparatus, and film-processing apparatus

Flowable chemical vapor deposition of metal oxides

Processing chamber deposition confinement

Ground electrode formed in an electrostatic chuck for a plasma proc...

Conditioning treatment for ALD productivity

Dual RF for controllable film deposition

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Method of manufacturing semiconductor device and film forming appar...

Monolithic modular microwave source with integrated process gas dis...

Electrostatic chuck with spatially tunable RF coupling to a wafer

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS

FILM FORMING METHOD AND FILM FORMING APPARATUS

CHANNEL STRUCTURE AND SEMICONDUCTOR MANUFACTURING DEVICE

SCRUBBER, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBST...

SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT

APPARATUS FOR PROCESSING SUBSTRATE

HIGH SELECTIVITY DOPED HARDMASK FILMS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHODS FOR FORMING EUV RESIST UNDERLAYER

METHODS FOR TREATMENT OF HIGH-K MATERIALS TO REDUCE LEAKAGE CURRENT...

METHOD FOR PROCESSING SUBSTRATE

CERAMIC SUSCEPTOR

PROCESSING CHAMBER DEPOSITION CONFINEMENT

PLASMA SOURCE AND APPARATUS FOR ATOMIC LAYER DEPOSITION

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...

METHOD TO IMPROVE WAFER EDGE UNIFORMITY

ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUC...

HARD MASK LAYER AND FORMATION METHOD THEREOF

PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD

GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...

METHOD OF FORMING CARBON-CONTAINING FILM

Microwave Capillary Nanodiamond Reactor

UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...

Plasma Processing Device

GAS TRANSPORT SYSTEM

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME