Data handling, in all parts of the microlithographic apparatus

Industry

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G03F7/70508

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70508Data handling, in all parts of the microlithographic apparatus

Industries

Patents Grantslast 30 patents

Information Patent Grant
Use of adaptive replacement maps in digital lithography for local c...
- Patent number 12,141,517
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Aravind Inumpudi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining best focus and best dose in exposure process
- Patent number 12,135,504
- Issue date Nov 5, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image stabilization for digital lithography
- Patent number 12,117,732
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for pattern generation
- Patent number 12,055,858
- Issue date Aug 6, 2024
- Mycronic AB
- Martin Glimtoft
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Burst statistics data aggregation filter
- Patent number 12,007,696
- Issue date Jun 11, 2024
- Cymer, LLC
- Matthew Minakais
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining a correction to a process
- Patent number 11,994,845
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 11,977,034
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Data inspection for digital lithography for HVM using offline and i...
- Patent number 11,914,305
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Chung-Shin Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preserving hierarchical structure information within a design file
- Patent number 11,906,905
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Chung-Shin Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 11,899,379
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling measurements of sample's parameters
- Patent number 11,874,606
- Issue date Jan 16, 2024
- Nova Ltd.
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Training method for machine learning assisted optical proximity err...
- Patent number 11,815,820
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Jaiin Moon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Machine and deep learning methods for spectra-based metrology and p...
- Patent number 11,815,819
- Issue date Nov 14, 2023
- Nova Ltd.
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,782,349
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for processing print data and for printing accord...
- Patent number 11,762,300
- Issue date Sep 19, 2023
- Mycronic AB
- Fredric Ihren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining corrections for lithographic apparatus
- Patent number 11,754,931
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining the combination of patterns to be applied to a substrat...
- Patent number 11,747,738
- Issue date Sep 5, 2023
- ASML Netherlands B.V.
- Coen Adrianus Verschuren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-supervised representation learning for interpretation of OCD data
- Patent number 11,747,740
- Issue date Sep 5, 2023
- Nova Ltd.
- Ran Yacoby
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to characterize post-processing data in terms of individual...
- Patent number 11,709,432
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern centric process control
- Patent number 11,694,009
- Issue date Jul 4, 2023
- Anchor Semiconductor, Inc.
- Chenmin Hu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for decision making in a semiconductor manufacturing process
- Patent number 11,687,007
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Arnaud Hubaux
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for pattern fidelity control
- Patent number 11,669,020
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Tanbir Hasan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,650,047
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D structure inspection or metrology using deep learning
- Patent number 11,644,756
- Issue date May 9, 2023
- KLA Corp.
- Scott A. Young
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device manufacturing system
- Patent number 11,635,697
- Issue date Apr 25, 2023
- Samsung Electronics Co., Ltd.
- Soon Hwan Cha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist and etch modeling
- Patent number 11,624,981
- Issue date Apr 11, 2023
- Lam Research Corporation
- Saravanapriyan Sriraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,604,419
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 11,599,032
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,592,753
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Devices, systems, and methods for the hybrid generation of drop pat...
- Patent number 11,567,414
- Issue date Jan 31, 2023
- Canon Kabushiki Kaisha
- Ahmed M. Hussein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20240385530
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...
- Publication number 20240385534
- Publication date Nov 21, 2024
- Canon Kabushiki Kaisha
- SHINGO HANYUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION COLLECTION SYSTEM, INSPECTION SUBSTRATE, AND INFORMATIO...
- Publication number 20240385538
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Junnosuke Maki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...
- Publication number 20240377763
- Publication date Nov 14, 2024
- Nikon Corporation
- Arata OCHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20240345569
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE
- Publication number 20240319614
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...
- Publication number 20240319581
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...
- Publication number 20240310737
- Publication date Sep 19, 2024
- NOVA LTD
- Barak BRINGOLTZ
- G05 - CONTROLLING REGULATING
Information Patent Application
OVERLAY IMPROVEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240310719
- Publication date Sep 19, 2024
- Samsung Electronics Co., Ltd.
- Jonghyun HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE
- Publication number 20240302750
- Publication date Sep 12, 2024
- SAMSUNG DISPLAY CO., LTD.
- CHOULWON MIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES...
- Publication number 20240295832
- Publication date Sep 5, 2024
- ASML NETHERLANDS B.V.
- Jean-Philippe Xavier VAN DAMME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING LOCALIZED IMAGE PREDICTION ERRORS TO IMPROVE A MACHINE...
- Publication number 20240288764
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Ayman HAMOUDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOID...
- Publication number 20240280892
- Publication date Aug 22, 2024
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD FOR DIAGNOSING A SYSTEM COMPRISING A PL...
- Publication number 20240273278
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Pieter VAN HERTUM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20240264537
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Gijs TEN HAAF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASUREMENT APPARATUS, METHOD FOR OPERATING A MASK-METROLOGY MEASUR...
- Publication number 20240255857
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Jan Reisloehner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
LITHOGRAPHING APPARATUS AND LITHOGRAPHING SYSTEM
- Publication number 20240241449
- Publication date Jul 18, 2024
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
- Publication number 20240231242
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Bram Paul Theodoor VAN GOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240210844
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERN SELECTION FOR A SEMICONDUCTOR MANUFACTURING RELAT...
- Publication number 20240184213
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Ayman HAMOUDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, A...
- Publication number 20240184214
- Publication date Jun 6, 2024
- Nikon Corporation
- Yoji WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR DISTRIBUTING LIGHT DELIVERY
- Publication number 20240160110
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL DIRECT RECORDING DEVICE COMPRISING REAL TIME ANALYSIS AND C...
- Publication number 20240160111
- Publication date May 16, 2024
- Visitech Lithography AS
- Endre Kirkhorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DATA INSPECTION FOR DIGITAL LITHOGRAPHY FOR HVM USING OFFLINE AND I...
- Publication number 20240152061
- Publication date May 9, 2024
- Applied Materials, Inc.
- Chung-Shin KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR...
- Publication number 20240142959
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Jill Elizabeth FREEMAN
- G05 - CONTROLLING REGULATING
Information Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
- Publication number 20240134289
- Publication date Apr 25, 2024
- ASML NETHERLANDS B.V.
- Bram Paul Theodoor VAN GOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCALING FOR DIE-LAST ADVANCED IC PACKAGING
- Publication number 20240126180
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Jang Fung CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Data handling, in all parts of the microlithographic apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Use of adaptive replacement maps in digital lithography for local c...

Method for determining best focus and best dose in exposure process

Image stabilization for digital lithography

Method and device for pattern generation

Burst statistics data aggregation filter

Determining a correction to a process

Methods and apparatus for measuring a property of a substrate

Data inspection for digital lithography for HVM using offline and i...

Preserving hierarchical structure information within a design file

Dynamic generation of layout adaptive packaging

System and method for controlling measurements of sample's parameters

Training method for machine learning assisted optical proximity err...

Machine and deep learning methods for spectra-based metrology and p...

Methods of determining corrections for a patterning process, device...

Method and device for processing print data and for printing accord...

Method for determining corrections for lithographic apparatus

Determining the combination of patterns to be applied to a substrat...

Self-supervised representation learning for interpretation of OCD data

Method to characterize post-processing data in terms of individual...

Pattern centric process control

Method for decision making in a semiconductor manufacturing process

Method and apparatus for pattern fidelity control

Metrology apparatus and method for determining a characteristic of...

3D structure inspection or metrology using deep learning

Semiconductor device manufacturing system

Resist and etch modeling

Method of determining information about a patterning process, metho...

Dynamic generation of layout adaptive packaging

Methods of determining corrections for a patterning process, device...

Devices, systems, and methods for the hybrid generation of drop pat...

Patents Applicationslast 30 patents

ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...

INFORMATION COLLECTION SYSTEM, INSPECTION SUBSTRATE, AND INFORMATIO...

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...

DETERMINING A CORRECTION TO A PROCESS

METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE

MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...

MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...

OVERLAY IMPROVEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCT...

CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE

SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES...

DETERMINING LOCALIZED IMAGE PREDICTION ERRORS TO IMPROVE A MACHINE...

METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOID...

COMPUTER IMPLEMENTED METHOD FOR DIAGNOSING A SYSTEM COMPRISING A PL...

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

MEASUREMENT APPARATUS, METHOD FOR OPERATING A MASK-METROLOGY MEASUR...

METHOD FOR DETERMINING A POSITION OF A MIRROR

Lithographic Method for Imprinting Three-Dimensional Microstructure...

LITHOGRAPHING APPARATUS AND LITHOGRAPHING SYSTEM

OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

METHOD OF PATTERN SELECTION FOR A SEMICONDUCTOR MANUFACTURING RELAT...

EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, A...

SYSTEMS AND METHODS FOR DISTRIBUTING LIGHT DELIVERY

DIGITAL DIRECT RECORDING DEVICE COMPRISING REAL TIME ANALYSIS AND C...

DATA INSPECTION FOR DIGITAL LITHOGRAPHY FOR HVM USING OFFLINE AND I...

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR...

OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...

SCALING FOR DIE-LAST ADVANCED IC PACKAGING