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H01J2237/0475

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0475decelerating

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus suitable for a particle beam apparatus
- Patent number 11,908,656
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Han Willem Hendrik Severt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell detector for charged particles
- Patent number 11,784,024
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Joe Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus and composite beam apparatus
- Patent number 11,682,536
- Issue date Jun 20, 2023
- Hitachi High-Tech Science Corporation
- Koji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,562,882
- Issue date Jan 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Method of manufacturing a charged particle detector
- Patent number 11,417,498
- Issue date Aug 16, 2022
- FEI Company
- Bart Jozef Janssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and method for adjusting position of d...
- Patent number 11,342,155
- Issue date May 24, 2022
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell detector for charged particles
- Patent number 11,222,766
- Issue date Jan 11, 2022
- ASML Netherlands B.V.
- Joe Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and method for inspecting and/or imagi...
- Patent number 11,183,361
- Issue date Nov 23, 2021
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope with composite detection system and sp...
- Patent number 11,145,487
- Issue date Oct 12, 2021
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,133,148
- Issue date Sep 28, 2021
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,037,758
- Issue date Jun 15, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Charged particle beam device, and observation method and elemental...
- Patent number 11,031,211
- Issue date Jun 8, 2021
- HITACHI HIGH-TECH CORPORATION
- Naoto Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-current ion implanter and method for controlling ion beam usin...
- Patent number 11,011,343
- Issue date May 18, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive beam optic containing internal heating element
- Patent number 10,879,038
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Scott E. Peitzsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electostatic filter and method for controlling ion beam properties...
- Patent number 10,804,068
- Issue date Oct 13, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for decelerated ion beam with no energy co...
- Patent number 10,692,697
- Issue date Jun 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correcting device for an electron microscope and an elec...
- Patent number 10,679,819
- Issue date Jun 9, 2020
- HITACHI HIGH-TECH CORPORATION
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,600,612
- Issue date Mar 24, 2020
- Hitachi High-Tech Science Corporation
- Toshiyuki Iwahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical systems and arrangements and particle-optical comp...
- Patent number 10,504,681
- Issue date Dec 10, 2019
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High performance inspection scanning electron microscope device and...
- Patent number 10,504,684
- Issue date Dec 10, 2019
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Pavel Adamec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for inspecting a specimen and charged particle multi-beam de...
- Patent number 10,453,645
- Issue date Oct 22, 2019
- Applied Materials Israel Ltd.
- Jürgen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope and electron trajectory adjustment met...
- Patent number 10,262,830
- Issue date Apr 16, 2019
- Hitachi, Ltd.
- Daisuke Bizen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam inclination correction method and charged par...
- Patent number 10,229,811
- Issue date Mar 12, 2019
- Hitachi High-Technologies Corporation
- Yuzuru Mizuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Probe assembly with high bandwidth beam
- Patent number 10,163,601
- Issue date Dec 25, 2018
- Intel Corporation
- Amir Raveh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for decelerated ion beam with no energy co...
- Patent number 10,147,584
- Issue date Dec 4, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and ion implantation apparatus performing t...
- Patent number 10,002,799
- Issue date Jun 19, 2018
- BOE Technology Group Co., Ltd.
- Hui Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam device
- Patent number 9,966,218
- Issue date May 8, 2018
- Hitachi High-Technologies Corporation
- Tsunenori Nomaguchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VOLTAGE CONTROL FOR ETCHING SYSTEMS
- Publication number 20240387139
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...
- Publication number 20240290571
- Publication date Aug 29, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...
- Publication number 20240234085
- Publication date Jul 11, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...
- Publication number 20240136150
- Publication date Apr 25, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20240087835
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOOD COLUMN AND CHARGED PARTICLE APPARATUS
- Publication number 20240006147
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Energy Filter, and Energy Analyzer and Charged Particle Beam Device...
- Publication number 20230298845
- Publication date Sep 21, 2023
- Hitachi High-Tech Corporation
- Kazuhiro HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230230795
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM INSPECTION APPARATUS
- Publication number 20230113062
- Publication date Apr 13, 2023
- NuFlare Technology, Inc.
- Atsushi ANDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTINUOUS CHAINED ENERGY ION IMPLANTATION
- Publication number 20230038565
- Publication date Feb 9, 2023
- Axcelis Technologies, Inc.
- Causon Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Voltage Control for Etching Systems
- Publication number 20230031722
- Publication date Feb 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CELL DETECTOR FOR CHARGED PARTICLES
- Publication number 20220246391
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Joe WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR IMPLANTING PARTICLES INTO A SUBSTRATE
- Publication number 20220199362
- Publication date Jun 23, 2022
- mi2-factory GmbH
- Constantin CSATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE APPARATUS SUITABLE FOR A PARTICLE BEAM APPARATUS
- Publication number 20220028648
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Han Willem Hendrik SEVERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20210384007
- Publication date Dec 9, 2021
- HITACHI HIGH-TECH CORPORATION
- Takuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND METHOD FOR INSPECTING AND/OR IMAGI...
- Publication number 20210366686
- Publication date Nov 25, 2021
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM APPARATUS AND COMPOSITE BEAM APPARATUS
- Publication number 20210296079
- Publication date Sep 23, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Method for Adjusting Position of D...
- Publication number 20210296081
- Publication date Sep 23, 2021
- Hitachi High-Tech Corporation
- Yuta IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE WITH COMPOSITE DETECTION SYSTEM AND SP...
- Publication number 20210066031
- Publication date Mar 4, 2021
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A CHARGED PARTICLE DETECTOR
- Publication number 20210020400
- Publication date Jan 21, 2021
- FEI Company
- Bart Jozef Janssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...
- Publication number 20210020399
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20210013001
- Publication date Jan 14, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
MULTI-CELL DETECTOR FOR CHARGED PARTICLES
- Publication number 20200286708
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Joe WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device, and Observation Method and Elemental...
- Publication number 20200185190
- Publication date Jun 11, 2020
- Hitachi High-Technologies Corporation
- Naoto ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM PROPERTIES...
- Publication number 20200161076
- Publication date May 21, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20190362929
- Publication date Nov 28, 2019
- Hitachi High-Technologies Corporation
- Takuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aberration Correcting Device for an Electron Microscope and an Elec...
- Publication number 20190228946
- Publication date Jul 25, 2019
- Hitachi High-Technologies Corporation
- Pieter KRUIT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...
- Publication number 20190051493
- Publication date Feb 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...
- Publication number 20180269033
- Publication date Sep 20, 2018
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS

decelerating

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Device and method for implanting particles into a substrate

Stage apparatus suitable for a particle beam apparatus

Multi-cell detector for charged particles

Particle beam apparatus and composite beam apparatus

Scanning electron microscope

In-situ plasma cleaning of process chamber components

Method of manufacturing a charged particle detector

Charged particle beam device and method for adjusting position of d...

Multi-cell detector for charged particles

Charged particle beam device and method for inspecting and/or imagi...

Scanning electron microscope with composite detection system and sp...

Scanning electron microscope

Method and device for implanting ions in wafers

In-situ plasma cleaning of process chamber components

Charged particle beam device, and observation method and elemental...

High-current ion implanter and method for controlling ion beam usin...

Conductive beam optic containing internal heating element

Electostatic filter and method for controlling ion beam properties...

Apparatus and techniques for decelerated ion beam with no energy co...

Aberration correcting device for an electron microscope and an elec...

Charged particle beam apparatus

Particle-optical systems and arrangements and particle-optical comp...

High performance inspection scanning electron microscope device and...

Method for inspecting a specimen and charged particle multi-beam de...

Scanning electron microscope and electron trajectory adjustment met...

Charged particle beam inclination correction method and charged par...

Probe assembly with high bandwidth beam

Apparatus and techniques for decelerated ion beam with no energy co...

Ion implantation method and ion implantation apparatus performing t...

Electron beam device

Patents Applicationslast 30 patents

VOLTAGE CONTROL FOR ETCHING SYSTEMS

CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...

CHARGED PARTICLE APPARATUS AND METHOD

METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...

METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...

CHARGED PARTICLE DEVICE AND METHOD

FLOOD COLUMN AND CHARGED PARTICLE APPARATUS

Energy Filter, and Energy Analyzer and Charged Particle Beam Device...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

ELECTRON BEAM INSPECTION APPARATUS

METHOD AND APPARATUS FOR CONTINUOUS CHAINED ENERGY ION IMPLANTATION

Voltage Control for Etching Systems

MULTI-CELL DETECTOR FOR CHARGED PARTICLES

DEVICE AND METHOD FOR IMPLANTING PARTICLES INTO A SUBSTRATE

STAGE APPARATUS SUITABLE FOR A PARTICLE BEAM APPARATUS

Scanning Electron Microscope

CHARGED PARTICLE BEAM DEVICE AND METHOD FOR INSPECTING AND/OR IMAGI...

PARTICLE BEAM APPARATUS AND COMPOSITE BEAM APPARATUS

Charged Particle Beam Device and Method for Adjusting Position of D...

SCANNING ELECTRON MICROSCOPE WITH COMPOSITE DETECTION SYSTEM AND SP...

METHOD OF MANUFACTURING A CHARGED PARTICLE DETECTOR

HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

MULTI-CELL DETECTOR FOR CHARGED PARTICLES

Charged Particle Beam Device, and Observation Method and Elemental...

ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM PROPERTIES...

Scanning Electron Microscope

Aberration Correcting Device for an Electron Microscope and an Elec...

APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...

APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...