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H01J37/1472

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/1472Deflecting along given lines

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Charged particle beam device
- Patent number 12,205,790
- Issue date Jan 21, 2025
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam bending snout for mobile electron accelerators
- Patent number 12,172,367
- Issue date Dec 24, 2024
- Fermi Research Alliance, LLC
- Aaron Sauers
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Stroboscopic illumination synchronized electron detection and imaging
- Patent number 12,165,835
- Issue date Dec 10, 2024
- FEI Company
- Bart Jozef Janssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam gun control systems and methods
- Patent number 12,145,006
- Issue date Nov 19, 2024
- Varian Medical Systems, Inc.
- Mark Everett Trail
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for generating particle wave carrying electric...
- Patent number 12,125,666
- Issue date Oct 22, 2024
- Yanbing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sampling assembly and testing instrument
- Patent number 11,933,668
- Issue date Mar 19, 2024
- Rohde & Schwarz GmbH & Co. KG
- Bernhard Sterzbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,923,167
- Issue date Mar 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Infrastructure-scale additive manufacturing using mobile electron a...
- Patent number 11,878,462
- Issue date Jan 23, 2024
- Fermi Research Alliance, LLC
- Aaron Sauers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens system for fast scanning large FOV
- Patent number 11,837,431
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,837,430
- Issue date Dec 5, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Primary charged particle beam current measurement
- Patent number 11,817,292
- Issue date Nov 14, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for acquiring three-dimensional electron diffra...
- Patent number 11,815,476
- Issue date Nov 14, 2023
- FEI Company
- Bart Buijsse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,791,124
- Issue date Oct 17, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,784,023
- Issue date Oct 10, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Multi-beam inspection apparatus with improved detection performance...
- Patent number 11,721,521
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Particle beam apparatus and composite beam apparatus
- Patent number 11,682,536
- Issue date Jun 20, 2023
- Hitachi High-Tech Science Corporation
- Koji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,670,477
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of optical device fabrication using an ion beam source
- Patent number 11,640,898
- Issue date May 2, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device
- Patent number 11,626,266
- Issue date Apr 11, 2023
- HITACHI HIGH-TECH CORPORATION
- Keiichiro Hitomi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM POSITION DETECTION AND REPOSITIONING
- Publication number 20240429017
- Publication date Dec 26, 2024
- KLA Corporation
- Henning Stoschus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF
- Publication number 20240382166
- Publication date Nov 21, 2024
- Rodney HERRING
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTIPLE ELECTRON BEAM OPTICS
- Publication number 20240387140
- Publication date Nov 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Alon Litman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM APPARATUS
- Publication number 20240355575
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- German AKSENOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339287
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240321545
- Publication date Sep 26, 2024
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...
- Publication number 20240258065
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE OPTICAL SYSTEM AND CHARGED PARTICLE APPARATUS
- Publication number 20240212969
- Publication date Jun 27, 2024
- Nikon Corporation
- Takakuni GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM, CORRECTOR FOR ABERRATION CORRECTION O...
- Publication number 20240170249
- Publication date May 23, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Pieter Kruit
- G01 - MEASURING TESTING
Information Patent Application
DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY
- Publication number 20240161998
- Publication date May 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hsien Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE INSPECTION APPARATUS AND A METHOD OF INSPECTING A SUBSTRA...
- Publication number 20240151664
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Kwang-Eun KIM
- G01 - MEASURING TESTING
Information Patent Application
OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV
- Publication number 20240145209
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM BENDING SNOUT FOR MOBILE ELECTRON ACCELERATORS
- Publication number 20240140025
- Publication date May 2, 2024
- FERMI RESEARCH ALLIANCE, LLC
- Aaron Sauers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE ANALYSIS SYSTEM
- Publication number 20240112881
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jonghyeok PARK
- G01 - MEASURING TESTING
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20240055217
- Publication date Feb 15, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON OPTICAL COLUMN AND METHOD FOR DIRECTING A BEAM OF PRIMARY...
- Publication number 20240055219
- Publication date Feb 15, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle optics components and their fabrication
- Publication number 20240047171
- Publication date Feb 8, 2024
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
APPARATUS USING CHARGED PARTICLE BEAMS
- Publication number 20230411110
- Publication date Dec 21, 2023
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Multiple Electron Beams with a Photocathode Film
- Publication number 20230395349
- Publication date Dec 7, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SCANNING OPERATION MODE OF SECONDARY-ELECTRON PROJECTION IMAGI...
- Publication number 20230377831
- Publication date Nov 23, 2023
- ASML NETHERLANDS B.V.
- Oleg KRUPIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
- Publication number 20230324318
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20230317406
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuto KAWASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20230290608
- Publication date Sep 14, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM
- Publication number 20230170177
- Publication date Jun 1, 2023
- Friedrich-Alexander-Universitat Erlangen-Nurnberg
- Robert ZIMMERMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION, METH...
- Publication number 20230170181
- Publication date Jun 1, 2023
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS

Deflecting along given lines

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and system for the removal and/or avoidance of contamination...

Charged particle beam device

Charged particle beam writing apparatus, charged particle beam writ...

Beam bending snout for mobile electron accelerators

Stroboscopic illumination synchronized electron detection and imaging

Beam pattern device having beam absorber structure

Particle beam gun control systems and methods

Apparatus and method for generating particle wave carrying electric...

Apparatus of plural charged-particle beams

Energy filter element for ion implantation systems for the use in t...

Multi-charged-particle-beam writing method, multi-charged-particle-...

Charged particle beam writing apparatus, charged particle beam writ...

Apparatus using charged particle beams

Sampling assembly and testing instrument

Ion implanter and ion implantation method

Infrastructure-scale additive manufacturing using mobile electron a...

Objective lens system for fast scanning large FOV

Blanking aperture array unit

Energy filter element for ion implantation systems for the use in t...

Primary charged particle beam current measurement

Methods and systems for acquiring three-dimensional electron diffra...

Ion beam source for optical device fabrication using a segmented io...

Charged particle beam apparatus

Charged particle beam apparatus

Method and system for the removal and/or avoidance of contamination...

Multi-beam inspection apparatus with improved detection performance...

Particle beam apparatus and composite beam apparatus

Apparatus using charged particle beams

Methods of optical device fabrication using an ion beam source

Charged particle beam device

Patents Applicationslast 30 patents

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

ELECTRON BEAM POSITION DETECTION AND REPOSITIONING

CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF

MULTIPLE ELECTRON BEAM OPTICS

BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM APPARATUS

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

SEMICONDUCTOR DEVICE

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...

CHARGED PARTICLE OPTICAL SYSTEM AND CHARGED PARTICLE APPARATUS

CHARGED PARTICLE BEAM SYSTEM, CORRECTOR FOR ABERRATION CORRECTION O...

DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY

SUBSTRATE INSPECTION APPARATUS AND A METHOD OF INSPECTING A SUBSTRA...

OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV

BEAM BENDING SNOUT FOR MOBILE ELECTRON ACCELERATORS

SUBSTRATE ANALYSIS SYSTEM

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

ELECTRON OPTICAL COLUMN AND METHOD FOR DIRECTING A BEAM OF PRIMARY...

Charged particle optics components and their fabrication

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

APPARATUS USING CHARGED PARTICLE BEAMS

Creating Multiple Electron Beams with a Photocathode Film

ANTI-SCANNING OPERATION MODE OF SECONDARY-ELECTRON PROJECTION IMAGI...

Multi-Beam Pattern Definition Device

CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD

Charged Particle Beam System

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM

MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION, METH...