deposition by cyclic CVD

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H01L21/0228

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/0228deposition by cyclic CVD

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Patents Grantslast 30 patents

Information Patent Grant
Topology selective and sacrificial silicon nitride layer for genera...
- Patent number 12,255,240
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including a support pattern on a lower electr...
- Patent number 12,255,065
- Issue date Mar 18, 2025
- Samsung Electronics Co., Ltd.
- Hyun-Suk Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for real-time quality control of a film in a sp...
- Patent number 12,255,110
- Issue date Mar 18, 2025
- Samsung Electronics Co., Ltd.
- Gaurav Kumar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for depositing tungsten or molybdenum films
- Patent number 12,252,787
- Issue date Mar 18, 2025
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for selective film formation in semiconductor...
- Patent number 12,243,753
- Issue date Mar 4, 2025
- Kokusai Electric Corporation
- Kimihiko Nakatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Negative-capacitance and ferroelectric field-effect transistor (NCF...
- Patent number 12,243,932
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Yang Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a substrate
- Patent number 12,243,742
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- SeungHyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask removal without damaging top epitaxial layer
- Patent number 12,243,770
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device
- Patent number 12,237,214
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organoaminosilane precursors and methods for depositing films compr...
- Patent number 12,230,496
- Issue date Feb 18, 2025
- VERSUM MATERIALS US, LLC
- Mark Leonard O'Neill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device including air gap
- Patent number 12,230,498
- Issue date Feb 18, 2025
- Samsung Electronics Co., Ltd.
- Dain Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method for processing substrate, an...
- Patent number 12,227,848
- Issue date Feb 18, 2025
- Kioxia Corporation
- Takanori Fukusumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing silicon nitride films
- Patent number 12,230,495
- Issue date Feb 18, 2025
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Area selective organic material removal
- Patent number 12,230,506
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Mikko Ritala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Type III-V semiconductor device with structured passivation
- Patent number 12,230,700
- Issue date Feb 18, 2025
- Infineon Technologies Austria AG
- Simone Lavanga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing vias with pulsing plasma
- Patent number 12,224,178
- Issue date Feb 11, 2025
- NANYA TECHNOLOGY CORPORATION
- Zhi-Xuan Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,222,653
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for FinFet fabrication and structure thereof
- Patent number 12,224,210
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of metal grid, thin film sensor and manufactur...
- Patent number 12,224,234
- Issue date Feb 11, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Hu Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,224,325
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Li-Zhen Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Long-term implantable electronic devices
- Patent number 12,220,239
- Issue date Feb 11, 2025
- Northwestern University
- John A. Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with etch stop layer for reducing RC...
- Patent number 12,218,241
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching features using a targeted deposition for selecti...
- Patent number 12,217,955
- Issue date Feb 4, 2025
- Lam Research Corporation
- Wenchi Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbon film deposition method and deposition apparatus
- Patent number 12,217,956
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Yosuke Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor structure and same
- Patent number 12,211,697
- Issue date Jan 28, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- You Lv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing gap filling fluid
- Patent number 12,211,742
- Issue date Jan 28, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition precursor compounds and process of use
- Patent number 12,209,105
- Issue date Jan 28, 2025
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor and related methods
- Patent number 12,209,308
- Issue date Jan 28, 2025
- ASM IP Holding B.V.
- Antonius Aarnink
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method for silicon nitride thin film, thin film trans...
- Patent number 12,211,688
- Issue date Jan 28, 2025
- BEIHAI HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.
- En-Tsung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Zone-controlled rare-earth oxide ALD and CVD coatings
- Patent number 12,209,307
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Method and Apparatus for Increasing Skin Depth and Reducing Eddy Cu...
- Publication number 20250087483
- Publication date Mar 13, 2025
- Atlas Magnetics
- John Othniel McDonald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20250087480
- Publication date Mar 13, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Haifeng QIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250084530
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INCREASING DEPOSITION RATES OF OXIDE FILMS
- Publication number 20250087481
- Publication date Mar 13, 2025
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250087482
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yi CHOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FILLING GAP
- Publication number 20250087529
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Hsien CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAPFILL METHOD, SYSTEM AND APPARATUS
- Publication number 20250079160
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Jereld Lee Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HAFNIUM-CONTAINING STRUCTURES AND RELATED METHODS AND SYSTEMS
- Publication number 20250079155
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Fatemeh Davodi
- H01 - BASIC ELECTRIC ELEMENTS
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RF SWITCH DEVICE WITH A SIDEWALL SPACER HAVING A LOW DIELECTRIC CON...
- Publication number 20250081570
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20250081492
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Lin CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE
- Publication number 20250079154
- Publication date Mar 6, 2025
- TES CO., LTD.
- Joonyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF ORGANIC MATERIAL
- Publication number 20250079161
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Adam Vianna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...
- Publication number 20250081588
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF IMPROVING PMOS TRANSISTOR PERFORMANCE
- Publication number 20250081593
- Publication date Mar 6, 2025
- APPLIED MATERIALS ,INC.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITROGEN-BASED OXYGEN-FREE DIPOLES, RELATED DEVICES, RELATED SYSTEM...
- Publication number 20250079156
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Giuseppe Alessio Verni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...
- Publication number 20250079157
- Publication date Mar 6, 2025
- Entegris, Inc.
- Rong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVED SILICON DEPOSITION
- Publication number 20250079159
- Publication date Mar 6, 2025
- ASM IP HOLDING, B.V.
- Dieter Pierreux
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL
- Publication number 20250066913
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Supriya Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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SELECTIVE DEPOSITION OF OXIDE MATERIAL AND A DEPOSITION ASSEMBLY
- Publication number 20250069883
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Vincent Vandalon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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CHUCK ASSEMBLY, PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANU...
- Publication number 20250069938
- Publication date Feb 27, 2025
- Canon Kabushiki Kaisha
- SETH J. BAMESBERGER
- H01 - BASIC ELECTRIC ELEMENTS
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MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...
- Publication number 20250066921
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Ranjit Rohidas Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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SILICON NITRIDE DEPOSITION
- Publication number 20250069882
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20250069885
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
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PLANARIZATION METHOD AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20250069892
- Publication date Feb 27, 2025
- Canon Kabushiki Kaisha
- KENJI YAEGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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HIGH PRESSURE PLASMA INHIBITION
- Publication number 20250062118
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- H01 - BASIC ELECTRIC ELEMENTS
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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR...
- Publication number 20250062233
- Publication date Feb 20, 2025
- SK HYNIX INC.
- So Young YIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TE...
- Publication number 20250054751
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
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EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES
- Publication number 20250056927
- Publication date Feb 13, 2025
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
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METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTUR...
- Publication number 20250054752
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

deposition by cyclic CVD

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Topology selective and sacrificial silicon nitride layer for genera...

Semiconductor devices including a support pattern on a lower electr...

Methods and systems for real-time quality control of a film in a sp...

Methods for depositing tungsten or molybdenum films

Method and apparatus for selective film formation in semiconductor...

Negative-capacitance and ferroelectric field-effect transistor (NCF...

Method for processing a substrate

Hard mask removal without damaging top epitaxial layer

Method of forming a semiconductor device

Organoaminosilane precursors and methods for depositing films compr...

Method for manufacturing semiconductor device including air gap

Substrate processing apparatus, method for processing substrate, an...

Method of depositing silicon nitride films

Area selective organic material removal

Type III-V semiconductor device with structured passivation

Method of manufacturing vias with pulsing plasma

Method for forming semiconductor structure

Method for FinFet fabrication and structure thereof

Manufacturing method of metal grid, thin film sensor and manufactur...

Semiconductor device and manufacturing method thereof

Long-term implantable electronic devices

Semiconductor device structure with etch stop layer for reducing RC...

Method for etching features using a targeted deposition for selecti...

Carbon film deposition method and deposition apparatus

Method for manufacturing semiconductor structure and same

Methods for depositing gap filling fluid

Vapor deposition precursor compounds and process of use

Reactor and related methods

Manufacturing method for silicon nitride thin film, thin film trans...

Zone-controlled rare-earth oxide ALD and CVD coatings

Patents Applicationslast 30 patents

Method and Apparatus for Increasing Skin Depth and Reducing Eddy Cu...

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

INCREASING DEPOSITION RATES OF OXIDE FILMS

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD FOR FILLING GAP

GAPFILL METHOD, SYSTEM AND APPARATUS

HAFNIUM-CONTAINING STRUCTURES AND RELATED METHODS AND SYSTEMS

RF SWITCH DEVICE WITH A SIDEWALL SPACER HAVING A LOW DIELECTRIC CON...

SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE

DEPOSITION OF ORGANIC MATERIAL

METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...

METHODS OF IMPROVING PMOS TRANSISTOR PERFORMANCE

NITROGEN-BASED OXYGEN-FREE DIPOLES, RELATED DEVICES, RELATED SYSTEM...

METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...

METHOD FOR IMPROVED SILICON DEPOSITION

SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL

SELECTIVE DEPOSITION OF OXIDE MATERIAL AND A DEPOSITION ASSEMBLY

CHUCK ASSEMBLY, PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANU...

MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...

SILICON NITRIDE DEPOSITION

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

PLANARIZATION METHOD AND METHOD OF MANUFACTURING ARTICLE

HIGH PRESSURE PLASMA INHIBITION

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR...

ALD PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TE...

EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES

METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTUR...