deposition from the gas or vapour phase

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H01L21/02263

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02263deposition from the gas or vapour phase

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing electronic device
- Patent number 12,142,522
- Issue date Nov 12, 2024
- Mitsui Chemicals Tohcello, Inc.
- Toru Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack simplification for high aspect ratio patterning and vert...
- Patent number 12,080,592
- Issue date Sep 3, 2024
- Lam Research Corporation
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming components without adding tabs during etching
- Patent number 12,044,965
- Issue date Jul 23, 2024
- Hutchinson Technology Incorporated
- Clark T. Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming carbon rich silicon-containing films
- Patent number 12,037,681
- Issue date Jul 16, 2024
- Entegris, Inc.
- Sungsil Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryogenic atomic layer etch with noble gases
- Patent number 11,996,294
- Issue date May 28, 2024
- Applied Materials, Inc.
- Alvaro Garcia De Gorordo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Optoelectronic device including a superlattice
- Patent number 11,990,338
- Issue date May 21, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with elongated pattern
- Patent number 11,978,672
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Chin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
- Patent number 11,965,240
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Keigo Nishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching and apparatus for plasma processing
- Patent number 11,955,342
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,942,549
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,824,105
- Issue date Nov 21, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated capacitor with sidewall having reduced roughness
- Patent number 11,798,979
- Issue date Oct 24, 2023
- Texas Instruments Incorporated
- Elizabeth Costner Stewart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma purge method
- Patent number 11,725,276
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Hideomi Hane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cluster tool for selective area deposition
- Patent number 11,725,274
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and material deposition systems for forming semiconductor l...
- Patent number 11,670,508
- Issue date Jun 6, 2023
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic apparatus
- Patent number 11,587,785
- Issue date Feb 21, 2023
- Japan Display Inc.
- Yoshikatsu Imazeki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,555,246
- Issue date Jan 17, 2023
- Kokusai Electric Corporation
- Hironori Shimada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, manufacturing method thereof, and display dev...
- Patent number 11,557,612
- Issue date Jan 17, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,527,653
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cryogenic atomic layer etch with noble gases
- Patent number 11,515,166
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Alvaro Garcia De Gorordo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Nitride semiconductor device
- Patent number 11,495,671
- Issue date Nov 8, 2022
- Sumitomo Electric Device Innovations, Inc.
- Takuma Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with elongated pattern
- Patent number 11,469,143
- Issue date Oct 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Chin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display apparatus with array of light emitting diodes and method of...
- Patent number 11,423,830
- Issue date Aug 23, 2022
- Epistar Corporation
- Min-Hsun Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming carbon rich silicon-containing films
- Patent number 11,414,750
- Issue date Aug 16, 2022
- Entegris, Inc.
- Sungsil Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,387,097
- Issue date Jul 12, 2022
- Kokusai Electric Corporation
- Takeo Hanashima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,373,876
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Satoshi Takagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,355,648
- Issue date Jun 7, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and material deposition systems for forming semiconductor l...
- Patent number 11,282,704
- Issue date Mar 22, 2022
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method
- Patent number 11,170,999
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Kazumi Kubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Area selective deposition for cap layer formation in advanced contacts
- Patent number 11,170,992
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20240387258
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND MATERIAL DEPOSITION SYSTEMS FOR FORMING SEMICONDUCTOR L...
- Publication number 20240282574
- Publication date Aug 22, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH ELONGATED PATTERN
- Publication number 20240274471
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Chin CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING HIGH VOLTAGE TRANSISTOR AND STRUCTURE RESULTING T...
- Publication number 20240234566
- Publication date Jul 11, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- LING MEI LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240204104
- Publication date Jun 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Conductive Material Deposition
- Publication number 20240178003
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu Aizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240079479
- Publication date Mar 7, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240076777
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20240006306
- Publication date Jan 4, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Chengfeng LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND FORMATION METHOD THEREOF
- Publication number 20230395379
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Che CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CURTAIN DEVICE AND GAS PERMEABLE ASSEMBLY
- Publication number 20230343584
- Publication date Oct 26, 2023
- Brillian Network & Automation Integrated System Co., Ltd.
- Sheng-Chi HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLIER, PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEM...
- Publication number 20230253222
- Publication date Aug 10, 2023
- Kokusai Electric Corporation
- Kenta Kasamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION AND CROSS-LINKING OF POLYMERIC DIELECTRIC MATE...
- Publication number 20230238236
- Publication date Jul 27, 2023
- International Business Machines Corporation
- Cornelius Brown Peethala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND MATERIAL DEPOSITION SYSTEMS FOR FORMING SEMICONDUCTOR L...
- Publication number 20230187206
- Publication date Jun 15, 2023
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION FOR PATTERNING PROCESS
- Publication number 20230178379
- Publication date Jun 8, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ssu-Yu Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESS SYSTEM INCLUDING A COOLING STATION
- Publication number 20230138317
- Publication date May 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Chien Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THREE-DIMENSIONAL MEMORY DEVICE AND METHOD FOR MANUFACTURING THREE-...
- Publication number 20230114522
- Publication date Apr 13, 2023
- Yangtze Memory Technologies Co., Ltd.
- Zhaohui Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND...
- Publication number 20230112057
- Publication date Apr 13, 2023
- Kokusai Electric Corporation
- Hironori SHIMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20230103640
- Publication date Apr 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING MATERIAL WITHIN A GAP
- Publication number 20230099607
- Publication date Mar 30, 2023
- ASM IP HOLDING B.V.
- Timothee Blanquart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ATOMIC LAYER ETCH WITH NOBLE GASES
- Publication number 20230071505
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Alvaro GARCIA DE GORORDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH ELONGATED PATTERN
- Publication number 20220384268
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Chin CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING CARBON RICH SILICON-CONTAINING FILMS
- Publication number 20220364225
- Publication date Nov 17, 2022
- Entegris, Inc.
- Sungsil CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20220319918
- Publication date Oct 6, 2022
- MITSUI CHEMICALS TOHCELLO, INC.
- Toru MIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20220310437
- Publication date Sep 29, 2022
- Mitsubishi Electric Corporation
- Takafumi YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20220285562
- Publication date Sep 8, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND MATERIAL DEPOSITION SYSTEMS FOR FORMING SEMICONDUCTOR L...
- Publication number 20220270876
- Publication date Aug 25, 2022
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20220262630
- Publication date Aug 18, 2022
- Kokusai Electric Corporation
- Susumu NISHIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, RECORDING MEDIUM, AND SUBSTRATE PRO...
- Publication number 20220165565
- Publication date May 26, 2022
- Kokusai Electric Corporation
- Atsuro SEINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PURGE METHOD
- Publication number 20220081764
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hideomi HANE
- H01 - BASIC ELECTRIC ELEMENTS

deposition from the gas or vapour phase

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for manufacturing electronic device

Film stack simplification for high aspect ratio patterning and vert...

Method for forming components without adding tabs during etching

Method for forming carbon rich silicon-containing films

Cryogenic atomic layer etch with noble gases

Optoelectronic device including a superlattice

Semiconductor device with elongated pattern

Cleaning method, method of manufacturing semiconductor device, and...

Method of etching and apparatus for plasma processing

Semiconductor device and method of manufacture

Semiconductor device and method for manufacturing the same

Integrated capacitor with sidewall having reduced roughness

Plasma purge method

Integrated cluster tool for selective area deposition

Methods and material deposition systems for forming semiconductor l...

Electronic apparatus

Substrate processing apparatus and method of manufacturing semicond...

Semiconductor device, manufacturing method thereof, and display dev...

Semiconductor device and method of manufacture

Cryogenic atomic layer etch with noble gases

Nitride semiconductor device

Semiconductor device with elongated pattern

Display apparatus with array of light emitting diodes and method of...

Method for forming carbon rich silicon-containing films

Method of manufacturing semiconductor device, substrate processing...

Film forming method and film forming apparatus

Semiconductor device and method for manufacturing the same

Methods and material deposition systems for forming semiconductor l...

Deposition method

Area selective deposition for cap layer formation in advanced contacts

Patents Applicationslast 30 patents

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

METHODS AND MATERIAL DEPOSITION SYSTEMS FOR FORMING SEMICONDUCTOR L...

SEMICONDUCTOR DEVICE WITH ELONGATED PATTERN

METHOD OF FORMING HIGH VOLTAGE TRANSISTOR AND STRUCTURE RESULTING T...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

Method of Conductive Material Deposition

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE AND FORMATION METHOD THEREOF

GAS CURTAIN DEVICE AND GAS PERMEABLE ASSEMBLY

GAS SUPPLIER, PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEM...

SELECTIVE DEPOSITION AND CROSS-LINKING OF POLYMERIC DIELECTRIC MATE...

METHODS AND MATERIAL DEPOSITION SYSTEMS FOR FORMING SEMICONDUCTOR L...

FILM DEPOSITION FOR PATTERNING PROCESS

SUBSTRATE PROCESS SYSTEM INCLUDING A COOLING STATION

THREE-DIMENSIONAL MEMORY DEVICE AND METHOD FOR MANUFACTURING THREE-...

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND...

Semiconductor Device and Method of Manufacture

METHOD AND SYSTEM FOR FORMING MATERIAL WITHIN A GAP

CRYOGENIC ATOMIC LAYER ETCH WITH NOBLE GASES

SEMICONDUCTOR DEVICE WITH ELONGATED PATTERN

METHOD FOR FORMING CARBON RICH SILICON-CONTAINING FILMS

METHOD FOR MANUFACTURING ELECTRONIC DEVICE

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHODS AND MATERIAL DEPOSITION SYSTEMS FOR FORMING SEMICONDUCTOR L...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHOD OF PROCESSING SUBSTRATE, RECORDING MEDIUM, AND SUBSTRATE PRO...

PLASMA PURGE METHOD