Deposition of SiO2

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CPC
H01L21/31608

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31608Deposition of SiO2

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Patents Grantslast 30 patents

Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,881,379
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,404,272
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,404,271
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,879,066
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,191,378
- Issue date Jan 29, 2019
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,176,992
- Issue date Jan 8, 2019
- Tokyo Electron Limited
- Kazuhide Hasebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,141,187
- Issue date Nov 27, 2018
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and substrate processi...
- Patent number 9,966,251
- Issue date May 8, 2018
- Hitachi Kokusai Electric Inc.
- Ryota Sasajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and substrate processi...
- Patent number 9,966,252
- Issue date May 8, 2018
- Hitachi Kokusai Electric Inc.
- Ryota Sasajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication technique for high frequency, high power group III nitr...
- Patent number 9,882,039
- Issue date Jan 30, 2018
- University of South Carolina
- M. Asif Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor structures including tight pitch c...
- Patent number 9,437,480
- Issue date Sep 6, 2016
- Micron Technology, Inc.
- Luan C. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors for silicon dioxide gap fill
- Patent number 9,337,054
- Issue date May 10, 2016
- Entegris, Inc.
- William Hunks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming interconnect structures
- Patent number 9,245,792
- Issue date Jan 26, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Neng-Kuo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide-nitride-carbide thin-film with embedded nanocrystalli...
- Patent number 9,222,169
- Issue date Dec 29, 2015
- Sharp Laboratories of America, Inc.
- Pooran Chandra Joshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for providing a structure having reduced voids in a magnetic...
- Patent number 9,087,542
- Issue date Jul 21, 2015
- Western Digital (Fremont), LLC
- Yufeng Hu
- G11 - INFORMATION STORAGE
Information Patent Grant
Method and apparatus for angular high density plasma chemical vapor...
- Patent number 9,080,239
- Issue date Jul 14, 2015
- International Business Machines Corporation
- Daewon Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and substrate processi...
- Patent number 9,039,838
- Issue date May 26, 2015
- Hitachi Kokusai Electric Inc.
- Ryota Sasajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for angular high density plasma chemical vapor...
- Patent number 9,016,236
- Issue date Apr 28, 2015
- International Business Machines Corporation
- Daewon Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structures including tight pitch contacts
- Patent number 8,994,189
- Issue date Mar 31, 2015
- Micron Technology, Inc.
- Luan C. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post deposition plasma cleaning system and method
- Patent number 8,974,868
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing silicon and oxide films from organoaminosilan...
- Patent number 8,940,648
- Issue date Jan 27, 2015
- Air Products and Chemicals, Inc.
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of silicon-containing films
- Patent number 8,906,455
- Issue date Dec 9, 2014
- Air Products and Chemicals, Inc.
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Devices formed with dual damascene process
- Patent number 8,860,225
- Issue date Oct 14, 2014
- Infineon Technologies AG
- Philipp Riess
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and manufacturing method of semiconductor de...
- Patent number 8,815,495
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Masato Kushibiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flowable film dielectric gap fill process
- Patent number 8,809,161
- Issue date Aug 19, 2014
- Novellus Systems, Inc.
- Vishal Gauri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device using a microwave pla...
- Patent number 8,809,203
- Issue date Aug 19, 2014
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsuhiro Ichijo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structures including tight pitch contacts
- Patent number 8,723,326
- Issue date May 13, 2014
- Micron Technology, Inc.
- Luan C. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing silicon oxide thin film or silicon oxynitride...
- Patent number 8,673,070
- Issue date Mar 18, 2014
- National Institute of Advanced Industrial Science and Technology
- Sei Uemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing
- Patent number 8,667,928
- Issue date Mar 11, 2014
- Micron Technology, Inc.
- Shyam Surthi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method and substrate processing...
- Patent number 8,557,716
- Issue date Oct 15, 2013
- Hitachi Kokusai Electric Inc.
- Norikazu Mizuno
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...
- Publication number 20190041756
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURES INCLUDING TIGHT PITCH CONTACTS
- Publication number 20140246784
- Publication date Sep 4, 2014
- Micron Technology, Inc.
- Luan C. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWABLE FILM DIELECTRIC GAP FILL PROCESS
- Publication number 20140017904
- Publication date Jan 16, 2014
- Vishal GAURI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Novel Fabrication Technique for High Frequency, High Power Group II...
- Publication number 20140015011
- Publication date Jan 16, 2014
- M. Asif Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for Producing Silicon and Oxide Films from Organoaminosilan...
- Publication number 20130330937
- Publication date Dec 12, 2013
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...
- Publication number 20130213301
- Publication date Aug 22, 2013
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Temperature Deposition of Silicon-Containing Films
- Publication number 20130189853
- Publication date Jul 25, 2013
- TOKYO ELECTRON LIMITED
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GaN-based Semiconductor Element and Method of Manufacturing the Same
- Publication number 20130149828
- Publication date Jun 13, 2013
- FURUKAWA ELECTRIC CO., LTD.
- Yoshihiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DE...
- Publication number 20130122429
- Publication date May 16, 2013
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING METAL OXIDE FILM, METAL OXIDE FILM AND OPTICAL EL...
- Publication number 20130078457
- Publication date Mar 28, 2013
- PANASONIC CORPORATION
- Mitsuo SAITOH
- B32 - LAYERED PRODUCTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...
- Publication number 20130019804
- Publication date Jan 24, 2013
- Hitachi Kokusai Electric Inc.
- Ryota Sasajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PREVENTION AND REDUCTION OF SOLVENT AND SOLUTION PENETRATION INTO P...
- Publication number 20120208366
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- KELVIN CHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ANGULAR HIGH DENSITY PLASMA CHEMICAL VAPOR...
- Publication number 20120190203
- Publication date Jul 26, 2012
- International Business Machines Corporation
- Daewon Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20120108078
- Publication date May 3, 2012
- Kabushiki Kalsha Toshiba
- Tsunehiro INO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF FORMING TITANIUM SILICON OXIDE
- Publication number 20120088373
- Publication date Apr 12, 2012
- Kie Y. Ahn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
- Publication number 20120073751
- Publication date Mar 29, 2012
- Norikazu MIZUNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20120045905
- Publication date Feb 23, 2012
- Naonori AKAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAP PROCESSING
- Publication number 20120040534
- Publication date Feb 16, 2012
- Micron Technology, Inc.
- Arthur J. McGinnis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Devices Formed With Dual Damascene Process
- Publication number 20120025382
- Publication date Feb 2, 2012
- INFINEON TECHNOLOGIES AG
- Philipp Riess
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HDP-CVD SYSTEM
- Publication number 20120000423
- Publication date Jan 5, 2012
- Macronix International Co., Ltd.
- Tuung Luoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20110294304
- Publication date Dec 1, 2011
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES INCLUDING TIGHT PITCH CONTACTS
- Publication number 20110285029
- Publication date Nov 24, 2011
- Micron Technology, Inc.
- Luan C. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for Producing Silicon and Oxide Films from Organoaminosilan...
- Publication number 20110262642
- Publication date Oct 27, 2011
- Air Products and Chemicals, Inc.
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION SYSTEM
- Publication number 20110226178
- Publication date Sep 22, 2011
- TOKYO ELECTRON LIMITED
- Norihiko TSUJI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
DIELECTRIC LAYER STRUCTURE
- Publication number 20110204491
- Publication date Aug 25, 2011
- Chin-Hsiang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING
- Publication number 20110185970
- Publication date Aug 4, 2011
- Micron Technology, Inc.
- Shyam Surthi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR PRODUCING SILICON OXIDE THIN FILM OR SILICON OXYNITRIDE...
- Publication number 20110185948
- Publication date Aug 4, 2011
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Sei Uemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20110130011
- Publication date Jun 2, 2011
- Hitachi Kokusai Electric Inc.
- Ryota SASAJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20110124204
- Publication date May 26, 2011
- Hitachi Kokusai Electric Inc.
- Yosuke Ota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110089425
- Publication date Apr 21, 2011
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Mitsuhiro Ichijo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Deposition of SiO2

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Film deposition apparatus for fine pattern forming

Film deposition apparatus for fine pattern forming

Film deposition apparatus for fine pattern forming

Mask pattern forming method, fine pattern forming method, and film...

Mask pattern forming method, fine pattern forming method, and film...

Mask pattern forming method, fine pattern forming method, and film...

Mask pattern forming method, fine pattern forming method, and film...

Method of manufacturing semiconductor device and substrate processi...

Method of manufacturing semiconductor device and substrate processi...

Fabrication technique for high frequency, high power group III nitr...

Methods of forming semiconductor structures including tight pitch c...

Precursors for silicon dioxide gap fill

Method for forming interconnect structures

Silicon oxide-nitride-carbide thin-film with embedded nanocrystalli...

Method for providing a structure having reduced voids in a magnetic...

Method and apparatus for angular high density plasma chemical vapor...

Method of manufacturing semiconductor device and substrate processi...

Method and apparatus for angular high density plasma chemical vapor...

Semiconductor structures including tight pitch contacts

Post deposition plasma cleaning system and method

Process for producing silicon and oxide films from organoaminosilan...

Low temperature deposition of silicon-containing films

Devices formed with dual damascene process

Pattern forming method and manufacturing method of semiconductor de...

Flowable film dielectric gap fill process

Method for manufacturing semiconductor device using a microwave pla...

Semiconductor structures including tight pitch contacts

Process for producing silicon oxide thin film or silicon oxynitride...

Semiconductor processing

Semiconductor device manufacturing method and substrate processing...

Patents Applicationslast 30 patents

MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...

SEMICONDUCTOR STRUCTURES INCLUDING TIGHT PITCH CONTACTS

FLOWABLE FILM DIELECTRIC GAP FILL PROCESS

Novel Fabrication Technique for High Frequency, High Power Group II...

Process for Producing Silicon and Oxide Films from Organoaminosilan...

MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...

Low Temperature Deposition of Silicon-Containing Films

GaN-based Semiconductor Element and Method of Manufacturing the Same

PATTERN FORMING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DE...

METHOD OF FORMING METAL OXIDE FILM, METAL OXIDE FILM AND OPTICAL EL...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...

PREVENTION AND REDUCTION OF SOLVENT AND SOLUTION PENETRATION INTO P...

METHOD AND APPARATUS FOR ANGULAR HIGH DENSITY PLASMA CHEMICAL VAPOR...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHODS OF FORMING TITANIUM SILICON OXIDE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

GAP PROCESSING

Devices Formed With Dual Damascene Process

HDP-CVD SYSTEM

Method of manufacturing semiconductor device

SEMICONDUCTOR STRUCTURES INCLUDING TIGHT PITCH CONTACTS

Process for Producing Silicon and Oxide Films from Organoaminosilan...

FILM DEPOSITION SYSTEM

DIELECTRIC LAYER STRUCTURE

SEMICONDUCTOR PROCESSING

PROCESS FOR PRODUCING SILICON OXIDE THIN FILM OR SILICON OXYNITRIDE...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE