Deposition of Zirconium oxides

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CPC
H01L21/31641

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31641Deposition of Zirconium oxides

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Patents Grantslast 30 patents

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Enhanced thin film deposition
- Patent number 10,964,534
- Issue date Mar 30, 2021
- ASM International
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced thin film deposition
- Patent number 10,297,444
- Issue date May 21, 2019
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming dielectric films, new precursors and their use in...
- Patent number 10,217,629
- Issue date Feb 26, 2019
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced thin film deposition
- Patent number 9,831,094
- Issue date Nov 28, 2017
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Method of fabricating a gate dielectric for high-k metal gate devices
- Patent number 9,711,373
- Issue date Jul 18, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Hao Chang
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Graded dielectric structures
- Patent number 9,627,501
- Issue date Apr 18, 2017
- Micron Technology, Inc.
- F. Daniel Gealy
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Information Patent Grant
Solution processible hardmasks for high resolution lithography
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- Issue date Mar 8, 2016
- Inpria Corporation
- Jason K. Stowers
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Information Patent Grant
Systems and methods for forming zirconium and/or hafnium-containing...
- Patent number 9,184,061
- Issue date Nov 10, 2015
- Micron Technology, Inc.
- Brian A. Vaartstra
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Information Patent Grant
Doping with ALD technology
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- Issue date Sep 22, 2015
- ASM America, Inc.
- Chang-Gong Wang
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Information Patent Grant
Enhanced thin film deposition
- Patent number 9,127,351
- Issue date Sep 8, 2015
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced thin film deposition
- Patent number 8,993,055
- Issue date Mar 31, 2015
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post deposition plasma cleaning system and method
- Patent number 8,974,868
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Tadahiro Ishizaka
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Information Patent Grant
Graded dielectric structures
- Patent number 8,951,903
- Issue date Feb 10, 2015
- Micron Technology, Inc.
- Dan Gealy
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Information Patent Grant
Method for fabricating a metal-insulator-metal (MIM) capacitor havi...
- Patent number 8,815,678
- Issue date Aug 26, 2014
- Renesas Electronics Corporation
- Toshihiro Iizuka
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Information Patent Grant
Charge reservoir structure
- Patent number 8,802,539
- Issue date Aug 12, 2014
- Soitec
- Frederic Allibert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 8,796,087
- Issue date Aug 5, 2014
- Samsung Electronics Co., Ltd.
- Weon-Hong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Zirconium-doped tantalum oxide films
- Patent number 8,765,616
- Issue date Jul 1, 2014
- Micron Technology, Inc.
- Kie Y. Ahn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,741,731
- Issue date Jun 3, 2014
- Hitachi Kokusai Electric Inc.
- Yuji Takebayashi
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Semiconductor device including insulating layer of cubic system or...
- Patent number 8,710,564
- Issue date Apr 29, 2014
- Samsung Electronics Co., Ltd.
- Jong-cheol Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dielectric films, new precursors and their use in...
- Patent number 8,668,957
- Issue date Mar 11, 2014
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 8,658,522
- Issue date Feb 25, 2014
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Film forming apparatus, film forming method and storage medium
- Patent number 8,539,908
- Issue date Sep 24, 2013
- Tokyo Electron Limited
- Toshio Takagi
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Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 8,471,359
- Issue date Jun 25, 2013
- Samsung Electronics Co., Ltd.
- Weon-Hong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,420,552
- Issue date Apr 16, 2013
- Hitachi Kokusai Electric Inc.
- Yuji Takebayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming high-k dielectric films based on novel titanium,...
- Patent number 8,399,056
- Issue date Mar 19, 2013
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Nicolas Blasco
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plasma-enhanced deposition process for forming a metal oxide thin f...
- Patent number 8,383,525
- Issue date Feb 26, 2013
- ASM America, Inc.
- Petri Raisanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 8,375,892
- Issue date Feb 19, 2013
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Film forming apparatus
- Patent number 8,336,487
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Yoshihiro Ishida
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Information Patent Grant
Integrated circuit including a ferroelectric memory cell and method...
- Patent number 8,304,823
- Issue date Nov 6, 2012
- NaMLab gGmbH
- Tim Boescke
- G11 - INFORMATION STORAGE
Information Patent Grant
Constructions comprising hafnium oxide and/or zirconium oxide
- Patent number 8,299,462
- Issue date Oct 30, 2012
- Round Rock Research, LLC
- Cancheepuram V. Srividya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ENHANCED THIN FILM DEPOSITION
- Publication number 20180130666
- Publication date May 10, 2018
- ASM INTERNATIONAL N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING A METAL-INSULATOR-METAL (MIM) CAPACITOR HAVI...
- Publication number 20140327064
- Publication date Nov 6, 2014
- Toshihiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR OPTOELECTRONICS DEVICES
- Publication number 20140217539
- Publication date Aug 7, 2014
- SILECS OY
- Juha T. Rantala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20130280881
- Publication date Oct 24, 2013
- Weon-Hong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR OPTOELECTRONICS DEVICES
- Publication number 20130193543
- Publication date Aug 1, 2013
- SILECS OY
- Juha T. Rantala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED THIN FILM DEPOSITION
- Publication number 20130183445
- Publication date Jul 18, 2013
- ASM INTERNATIONAL N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS
- Publication number 20130149468
- Publication date Jun 13, 2013
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20130122720
- Publication date May 16, 2013
- Hitachi Kokusai Electric Inc.
- Yuji TAKEBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A CAPACITOR DIELECTRIC AND METHOD FOR MANUFACTUR...
- Publication number 20130058007
- Publication date Mar 7, 2013
- Hynix Semiconductor Inc.
- Jong-Bum Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ZIRCONIUM-DOPED TANTALUM OXIDE FILMS
- Publication number 20130012034
- Publication date Jan 10, 2013
- Kie Y. Ahn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A THIN FILM CAPACITOR AND METHOD FOR FA...
- Publication number 20120261735
- Publication date Oct 18, 2012
- RENESAS ELECTRONICS CORPORATION
- Toshihiro IIZUKA
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SOLUTION PROCESSIBLE HARDMASKS FOR HIGH RESOLUTION LITHOGRAPHY
- Publication number 20120223418
- Publication date Sep 6, 2012
- Jason K. Stowers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRADED DIELECTRIC STRUCTURES
- Publication number 20120202358
- Publication date Aug 9, 2012
- Dan Gealy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Semiconductor Device Including Insulating Layer of Cubic System or...
- Publication number 20120168904
- Publication date Jul 5, 2012
- Jong-cheol Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20120108078
- Publication date May 3, 2012
- Kabushiki Kalsha Toshiba
- Tsunehiro INO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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METHOD OF FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20120058645
- Publication date Mar 8, 2012
- Kabushiki Kaisha Toshiba
- Kouichi Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
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CONSTRUCTIONS COMPRISING HAFNIUM OXIDE AND/OR ZIRCONIUM OXIDE
- Publication number 20120037902
- Publication date Feb 16, 2012
- ROUND ROCK RESEARCH, LLC
- Cancheepuram V. Srividya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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PROCESS TO MAKE HIGH-K TRANSISTOR DIELECTRICS
- Publication number 20110318915
- Publication date Dec 29, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Liang-Gi Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Method of manufacturing semiconductor device
- Publication number 20110294304
- Publication date Dec 1, 2011
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
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Transistor Device and Methods of Manufacture Thereof
- Publication number 20110284970
- Publication date Nov 24, 2011
- INFINEON TECHNOLOGIES AG
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILMS
- Publication number 20110256718
- Publication date Oct 20, 2011
- ASM INTERNATIONAL N.V.
- Suvi P. Haukka
- C30 - CRYSTAL GROWTH
Information Patent Application
MEMORY DEVICES INCLUDING DIELECTRIC THIN FILM AND METHOD OF MANUFAC...
- Publication number 20110212612
- Publication date Sep 1, 2011
- ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Sung-Yool CHOI
- H01 - BASIC ELECTRIC ELEMENTS
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FILM FORMING APPARATUS
- Publication number 20110197813
- Publication date Aug 18, 2011
- TOKYO ELECTRON LIMITED
- Yoshihiro Ishida
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Information Patent Application
VAPORIZER AND DEPOSITION SYSTEM USING THE SAME
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- Publication date Jul 28, 2011
- TOKYO ELECTRON LIMITED
- Sumi Tanaka
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Information Patent Application
METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS
- Publication number 20110168093
- Publication date Jul 14, 2011
- Applied Materials, Inc.
- Tatsuya Sato
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20110124204
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE,...
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- Hitachi Kokusai Electric Inc.
- Yuji TAKEBAYASHI
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METHOD FOR FORMING DIELECTRIC FILM AND METHOD FOR FORMING CAPACITOR...
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- Publication date Feb 3, 2011
- Hynix Semiconductor Inc.
- Deok-Sin KIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Methods of forming a dielectric thin film of a semiconductor device...
- Publication number 20110014770
- Publication date Jan 20, 2011
- SAMSUNG ELECTRONICS CO., LTD.
- Ki-yeon Park
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DIELECTRIC, CAPACITOR USING DIELECTRIC, SEMICONDUCTOR DEVICE USING...
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- Takashi Nakagawa
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Deposition of Zirconium oxides

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Enhanced thin film deposition

Enhanced thin film deposition

Method of forming dielectric films, new precursors and their use in...

Enhanced thin film deposition

Method of fabricating a gate dielectric for high-k metal gate devices

Graded dielectric structures

Solution processible hardmasks for high resolution lithography

Systems and methods for forming zirconium and/or hafnium-containing...

Doping with ALD technology

Enhanced thin film deposition

Enhanced thin film deposition

Post deposition plasma cleaning system and method

Graded dielectric structures

Method for fabricating a metal-insulator-metal (MIM) capacitor havi...

Charge reservoir structure

Method of fabricating a semiconductor device

Zirconium-doped tantalum oxide films

Method of manufacturing a semiconductor device

Semiconductor device including insulating layer of cubic system or...

Method of forming dielectric films, new precursors and their use in...

Methods and apparatus for incorporating nitrogen in oxide films

Film forming apparatus, film forming method and storage medium

Semiconductor device and method of fabricating the same

Method of manufacturing a semiconductor device

Method of forming high-k dielectric films based on novel titanium,...

Plasma-enhanced deposition process for forming a metal oxide thin f...

Methods and apparatus for incorporating nitrogen in oxide films

Film forming apparatus

Integrated circuit including a ferroelectric memory cell and method...

Constructions comprising hafnium oxide and/or zirconium oxide

Patents Applicationslast 30 patents

ENHANCED THIN FILM DEPOSITION

METHOD FOR FABRICATING A METAL-INSULATOR-METAL (MIM) CAPACITOR HAVI...

SEMICONDUCTOR OPTOELECTRONICS DEVICES

METHOD OF FABRICATING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR OPTOELECTRONICS DEVICES

ENHANCED THIN FILM DEPOSITION

METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD FOR FORMING A CAPACITOR DIELECTRIC AND METHOD FOR MANUFACTUR...

ZIRCONIUM-DOPED TANTALUM OXIDE FILMS

SEMICONDUCTOR DEVICE HAVING A THIN FILM CAPACITOR AND METHOD FOR FA...

SOLUTION PROCESSIBLE HARDMASKS FOR HIGH RESOLUTION LITHOGRAPHY

GRADED DIELECTRIC STRUCTURES

Semiconductor Device Including Insulating Layer of Cubic System or...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHOD OF FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

CONSTRUCTIONS COMPRISING HAFNIUM OXIDE AND/OR ZIRCONIUM OXIDE

PROCESS TO MAKE HIGH-K TRANSISTOR DIELECTRICS

Method of manufacturing semiconductor device

Transistor Device and Methods of Manufacture Thereof

THIN FILMS

MEMORY DEVICES INCLUDING DIELECTRIC THIN FILM AND METHOD OF MANUFAC...

FILM FORMING APPARATUS

VAPORIZER AND DEPOSITION SYSTEM USING THE SAME

METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE,...

METHOD FOR FORMING DIELECTRIC FILM AND METHOD FOR FORMING CAPACITOR...

Methods of forming a dielectric thin film of a semiconductor device...

DIELECTRIC, CAPACITOR USING DIELECTRIC, SEMICONDUCTOR DEVICE USING...