Details of electrostatic chucks

Industry

CPC
H01L21/6833

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/6833Details of electrostatic chucks

Industries

Patents Grantslast 30 patents

Information Patent Grant
High-temperature substrate support assembly with failure protection
- Patent number 12,185,433
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Denis Martin Koosau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for inspecting electrostatic chuck
- Patent number 12,181,504
- Issue date Dec 31, 2024
- Semes Co., Ltd.
- Su Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cryogenic susceptor and electric connector assembly used therein
- Patent number 12,176,238
- Issue date Dec 24, 2024
- MiCo Ceramics Ltd.
- Hyekyong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device
- Patent number 12,176,237
- Issue date Dec 24, 2024
- TOMOEGAWA CORPORATION
- Tomoya Hagihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and electrostatic clamp designs
- Patent number 12,174,552
- Issue date Dec 24, 2024
- ASML Holding N.V.
- Victor Antonio Perez-Falcon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Installation fixture for needle and installation method for needle
- Patent number 12,176,235
- Issue date Dec 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Fencheng Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
- Patent number 12,176,236
- Issue date Dec 24, 2024
- Kioxia Corporation
- Wu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and abnormality detection method
- Patent number 12,170,217
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Hiroaki Chihaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,170,219
- Issue date Dec 17, 2024
- Kyocera Corporation
- Naoki Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support table and RF rod
- Patent number 12,170,190
- Issue date Dec 17, 2024
- NGK Insulators, Ltd.
- Yutaka Unno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate supporting apparatus and substrate treating apparatus inc...
- Patent number 12,170,191
- Issue date Dec 17, 2024
- Semes Co., Ltd.
- Jong Gun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning electrostatic chuck
- Patent number 12,170,218
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh-Lin Yang
- B08 - CLEANING
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder
- Patent number 12,162,110
- Issue date Dec 10, 2024
- Kyocera Corporation
- Hiromasa Takemori
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Workpiece holding tool
- Patent number 12,165,897
- Issue date Dec 10, 2024
- Kyocera Corporation
- Naoki Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable wafer chuck
- Patent number 12,165,898
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with porous plug
- Patent number 12,162,111
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Arvinder Chadha
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,896
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Akira Nagayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bipolar electrostatic chuck for etch chamber
- Patent number 12,165,899
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Shinichi Oki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Screwless semiconductor processing chambers
- Patent number 12,165,909
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bo-Ru Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic substrate and electrostatic chuck
- Patent number 12,157,702
- Issue date Dec 3, 2024
- Shinko Electric Industries Co., Ltd.
- Tomotake Minemura
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Long-life extended temperature range embedded diode design for elec...
- Patent number 12,154,814
- Issue date Nov 26, 2024
- Lam Research Corporation
- Siyuan Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,154,812
- Issue date Nov 26, 2024
- Toto Ltd.
- Yutaka Momiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck sidewall gas curtain
- Patent number 12,154,813
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ian Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support
- Patent number 12,148,636
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Masanori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal diffuser for a semiconductor wafer holder
- Patent number 12,148,650
- Issue date Nov 19, 2024
- Watlow Electric Manufacturing Company
- Sanhong Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method for releasing sample
- Patent number 12,148,633
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and workpiece processing method
- Patent number 12,148,649
- Issue date Nov 19, 2024
- Disco Corporation
- Yukiyasu Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with seal surface
- Patent number 12,142,509
- Issue date Nov 12, 2024
- Lam Research Corporation
- Patrick G. Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carrier for microelectronic assemblies having direct bonding
- Patent number 12,142,510
- Issue date Nov 12, 2024
- Intel Corporation
- Shawna M. Liff
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250006539
- Publication date Jan 2, 2025
- TOTO LTD.
- Tetsuro ITOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRIC FIELD MEASURING APPARATUS AND METHOD OF MEASURING ELECTRIC...
- Publication number 20250004028
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Jinyeong Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...
- Publication number 20250003536
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Method and Apparatus
- Publication number 20250006537
- Publication date Jan 2, 2025
- SPTS TECHNOLOGIES LIMITED
- Adam S. BEACHEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250006516
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...
- Publication number 20250006477
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME
- Publication number 20250006538
- Publication date Jan 2, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250006540
- Publication date Jan 2, 2025
- TOTO LTD.
- Tetsuro ITOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE-PROCESSING APPARATUS
- Publication number 20250006541
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Riichiro ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETENTION DEVICE, AND ELECTROSTATIC CHUCK
- Publication number 20240429085
- Publication date Dec 26, 2024
- Niterra Co., Ltd.
- Akira INAYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240429084
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Youngbok LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC SUSCEPTOR AND ELECTRIC CONNECTOR ASSEMBLY USED THEREIN
- Publication number 20240420985
- Publication date Dec 19, 2024
- MiCo Ceramics Ltd.
- Hyekyong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20240420932
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC SUBSTRATE SUPPORT
- Publication number 20240420984
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...
- Publication number 20240420933
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amir H. Tavakoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING MESAS ON AN ELECTROSTATIC CHUCK
- Publication number 20240420986
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Wendell Glenn BOYD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20240412998
- Publication date Dec 12, 2024
- NGK Insulators, Ltd.
- Taro USAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aluminum Nitride Assemblage
- Publication number 20240413000
- Publication date Dec 12, 2024
- MORGAN ADVANCED CERAMICS, INC.
- Chengtsin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR AND METHOD OF MANUFACTURING THE SAME
- Publication number 20240412999
- Publication date Dec 12, 2024
- MICO CERAMICS LTD.
- Junghyun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALUMINA-BASED SINTERED BODY AND ELECTROSTATIC CHUCK
- Publication number 20240409468
- Publication date Dec 12, 2024
- Niterra Co., Ltd.
- Motoki HOTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...
- Publication number 20240412957
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Gautam PISHARODY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLID-STATE BONDING METHOD FOR THE MANUFACTURE OF SEMICONDUCTOR CHU...
- Publication number 20240404869
- Publication date Dec 5, 2024
- WATLOW ELECTRIC MANUFACTURING COMPANY
- Jason STEPHENS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLDING DEVICE
- Publication number 20240404796
- Publication date Dec 5, 2024
- Niterra Co., Ltd.
- Yasuaki KIMIKADO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...
- Publication number 20240404798
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240404860
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...
- Publication number 20240404861
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- SUSHIM KOSHTI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC SUBSTRATE, METHOD OF MANUFACTURING THE SAME, ELECTROSTATIC...
- Publication number 20240404862
- Publication date Dec 5, 2024
- Shinko Electric Industries Co., Ltd.
- Ryosuke Hori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE
- Publication number 20240404835
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Leonard M. TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF SUBSTRATE SUPPORT DEVICES USING INORGANIC DIELECTRIC...
- Publication number 20240395591
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS

Details of electrostatic chucks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High-temperature substrate support assembly with failure protection

Apparatus and method for inspecting electrostatic chuck

Cryogenic susceptor and electric connector assembly used therein

Electrostatic chuck device

Lithographic apparatus and electrostatic clamp designs

Installation fixture for needle and installation method for needle

Semiconductor manufacturing apparatus and method for manufacturing...

Substrate processing apparatus and abnormality detection method

Electrostatic chuck

Wafer support table and RF rod

Substrate supporting apparatus and substrate treating apparatus inc...

Method for cleaning electrostatic chuck

Substrate support and substrate processing apparatus

Sample holder

Workpiece holding tool

Adjustable wafer chuck

Electrostatic chuck with porous plug

Substrate support and substrate processing apparatus

Bipolar electrostatic chuck for etch chamber

Screwless semiconductor processing chambers

Ceramic substrate and electrostatic chuck

Long-life extended temperature range embedded diode design for elec...

Electrostatic chuck

Electrostatic chuck sidewall gas curtain

Substrate support

Thermal diffuser for a semiconductor wafer holder

Plasma processing apparatus and method for releasing sample

Processing apparatus and workpiece processing method

Electrostatic chuck with seal surface

Carrier for microelectronic assemblies having direct bonding

Patents Applicationslast 30 patents

ELECTROSTATIC CHUCK

ELECTRIC FIELD MEASURING APPARATUS AND METHOD OF MEASURING ELECTRIC...

SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...

Plasma Etching Method and Apparatus

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...

CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME

ELECTROSTATIC CHUCK

SUBSTRATE-PROCESSING APPARATUS

RETENTION DEVICE, AND ELECTROSTATIC CHUCK

WAFER SUPPORT DEVICE

SUBSTRATE PROCESSING APPARATUS

CRYOGENIC SUSCEPTOR AND ELECTRIC CONNECTOR ASSEMBLY USED THEREIN

SUBSTRATE SUPPORT

ELECTROSTATIC SUBSTRATE SUPPORT

RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...

FORMING MESAS ON AN ELECTROSTATIC CHUCK

WAFER PLACEMENT TABLE

Aluminum Nitride Assemblage

CERAMIC SUSCEPTOR AND METHOD OF MANUFACTURING THE SAME

ALUMINA-BASED SINTERED BODY AND ELECTROSTATIC CHUCK

HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...

SOLID-STATE BONDING METHOD FOR THE MANUFACTURE OF SEMICONDUCTOR CHU...

HOLDING DEVICE

HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...

PLASMA PROCESSING APPARATUS AND METHOD

APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...

CERAMIC SUBSTRATE, METHOD OF MANUFACTURING THE SAME, ELECTROSTATIC...

CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE

FABRICATION OF SUBSTRATE SUPPORT DEVICES USING INORGANIC DIELECTRIC...