Details of electrostatic chucks

Industry

CPC
H01L21/6833

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/6833Details of electrostatic chucks

Industries

Patents Grantslast 30 patents

Information Patent Grant
Carrier chuck and methods of forming and using thereof
- Patent number 12,327,749
- Issue date Jun 10, 2025
- Intel Corporation
- Deniz Turan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device, pressure calculation method and program
- Patent number 12,327,750
- Issue date Jun 10, 2025
- Horiba Stec, Co., Ltd.
- Lei Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method
- Patent number 12,327,748
- Issue date Jun 10, 2025
- PIOTECH INC.
- Zhuo Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with improved temperature control
- Patent number 12,322,633
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Hanish Kumar Panavalappil Kumarankutty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck prepared by additive manufacturing, and related...
- Patent number 12,322,634
- Issue date Jun 3, 2025
- Entegris, Inc.
- Chandra Venkatraman
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Apparatus and method for self-assembling semiconductor light emitti...
- Patent number 12,315,754
- Issue date May 27, 2025
- LG Electronics Inc.
- Kisu Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and method and program for controlling...
- Patent number 12,315,704
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate fixing device
- Patent number 12,315,755
- Issue date May 27, 2025
- Shinko Electric Industries Co., Ltd.
- Yasuhiko Kusama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and methods of manufacturing semiconduc...
- Patent number 12,315,703
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Kyoungchon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck sheet and electrostatic chuck comprising same
- Patent number 12,308,274
- Issue date May 20, 2025
- AMOSENSE CO., LTD.
- Jihyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method for multi-zone active-matrix temperature control in...
- Patent number 12,309,891
- Issue date May 20, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-resistant member
- Patent number 12,304,875
- Issue date May 20, 2025
- Toto Ltd.
- Junichi Iwasawa
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,300,476
- Issue date May 13, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placement stage and substrate processing apparatus
- Patent number 12,300,530
- Issue date May 13, 2025
- Tokyo Electron Limited
- Daisuke Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, heating unit and substrate treating apparatus includi...
- Patent number 12,300,531
- Issue date May 13, 2025
- Semes Co., Ltd.
- Chung Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck for high bias radio frequency (RF) power applic...
- Patent number 12,300,473
- Issue date May 13, 2025
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,300,475
- Issue date May 13, 2025
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with multiple heater zones
- Patent number 12,293,933
- Issue date May 6, 2025
- VM INC.
- Woo Hyung Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including shower head and edge ring...
- Patent number 12,293,901
- Issue date May 6, 2025
- Samsung Electronics Co., Ltd.
- Woorim Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 12,288,713
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder
- Patent number 12,288,714
- Issue date Apr 29, 2025
- Kyocera Corporation
- Seiya Saisho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 12,283,461
- Issue date Apr 22, 2025
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus
- Patent number 12,283,511
- Issue date Apr 22, 2025
- NGK Insulators, Ltd.
- Masaki Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for repairing electrostatic chuck device
- Patent number 12,280,578
- Issue date Apr 22, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Keisuke Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing method and apparatus
- Patent number 12,283,512
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shuang-Shiuan Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic susceptor
- Patent number 12,283,513
- Issue date Apr 22, 2025
- MiCo Ceramics Ltd.
- Jusung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anodized titanium material and method for producing the same
- Patent number 12,276,037
- Issue date Apr 15, 2025
- Yamaguchi Prefectural Industrial Technology Institute
- Takehiko Muranaka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...
- Publication number 20250178234
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT
- Publication number 20250183015
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLDING MEMBER AND METHOD OF MANUFACTURING HOLDING MEMBER
- Publication number 20250183082
- Publication date Jun 5, 2025
- Niterra Co., Ltd.
- Hideki UEMATSU
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250179641
- Publication date Jun 5, 2025
- JIANGSU LEADMICRO NANO TECHNOLOGY CO., LTD.
- Ren ZHOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250183084
- Publication date Jun 5, 2025
- SAMSUNG DISPLAY CO., LTD.
- YONGHYUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK MEMBER AND ELECTROSTATIC CHUCK DEVICE
- Publication number 20250183083
- Publication date Jun 5, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Kenta OISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE RANGE HEATED ELECTROSTATIC CHUCK
- Publication number 20250183085
- Publication date Jun 5, 2025
- Axcelis Technologies, Inc.
- John Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250183086
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250174484
- Publication date May 29, 2025
- TOTO LTD.
- Kouta KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BONDED BODY
- Publication number 20250162950
- Publication date May 22, 2025
- NGK Insulators, Ltd.
- Masato MISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR REDUCING WAFER BACKSIDE DAMAGE
- Publication number 20250167025
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Sairam Sundaram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE ATTRACTION DEVICE
- Publication number 20250167029
- Publication date May 22, 2025
- CREATIVE TECHNOLOGY CORPORATION
- Hiromitsu ONODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT
- Publication number 20250167030
- Publication date May 22, 2025
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250155473
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Daesung Jung
- G01 - MEASURING TESTING
Information Patent Application
CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250157844
- Publication date May 15, 2025
- Shinko Electric Industries Co., Ltd.
- Ryosuke Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250157845
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Masanori SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250157843
- Publication date May 15, 2025
- Shinko Electric Industries Co., Ltd.
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149368
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Taro USAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149310
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING FLUID SUPPLY UNIT AND FLUI...
- Publication number 20250149312
- Publication date May 8, 2025
- SEMES CO., LTD.
- Tae Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149369
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Taro USAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK UNIT, LAMINATION APPARATUS AND METHOD OF LAMINA...
- Publication number 20250149371
- Publication date May 8, 2025
- SAMSUNG DISPLAY CO., LTD.
- TAEYOUNG PARK
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149370
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250149311
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Junho IM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CENTERING WAFER FOR PROCESSING CHAMBER
- Publication number 20250149367
- Publication date May 8, 2025
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT DEVICE AND METHOD OF CONTROLLING PREVENTION OF LE...
- Publication number 20250140533
- Publication date May 1, 2025
- SEMES CO., LTD.
- Soon Cheon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREOF
- Publication number 20250140593
- Publication date May 1, 2025
- SODICK CO., LTD.
- Toshiyuki UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CHUCK
- Publication number 20250132183
- Publication date Apr 24, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Chun-Chi Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250132184
- Publication date Apr 24, 2025
- NGK Insulators, Ltd.
- Taro USAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING SYSTEM FOR SEMICONDUCTOR EQUIPMENT
- Publication number 20250132185
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa Kim
- H01 - BASIC ELECTRIC ELEMENTS

Details of electrostatic chucks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Carrier chuck and methods of forming and using thereof

Electrostatic chuck device, pressure calculation method and program

Semiconductor processing apparatus and method

Electrostatic chuck with improved temperature control

Electrostatic chuck prepared by additive manufacturing, and related...

Apparatus and method for self-assembling semiconductor light emitti...

Plasma processing apparatus, and method and program for controlling...

Substrate fixing device

Plasma processing apparatus and methods of manufacturing semiconduc...

Electrostatic chuck sheet and electrostatic chuck comprising same

Control method for multi-zone active-matrix temperature control in...

Plasma-resistant member

RF immune sensor probe for monitoring a temperature of an electrost...

Stage, plasma processing apparatus, and cleaning method

Wafer placement table

Placement stage and substrate processing apparatus

Support unit, heating unit and substrate treating apparatus includi...

Electrostatic chuck for high bias radio frequency (RF) power applic...

Substrate support and substrate processing apparatus

Electrostatic chuck with multiple heater zones

Substrate processing apparatus including shower head and edge ring...

Mounting table and plasma processing apparatus

Sample holder

Systems and methods for achieving peak ion energy enhancement with...

Member for semiconductor manufacturing apparatus

Method for repairing electrostatic chuck device

Semiconductor processing method and apparatus

Ceramic susceptor

Anodized titanium material and method for producing the same

Wafer chuck structure with holes in upper surface to improve temper...

Patents Applicationslast 30 patents

METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...

HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT

HOLDING MEMBER AND METHOD OF MANUFACTURING HOLDING MEMBER

SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

ELECTROSTATIC CHUCK MEMBER AND ELECTROSTATIC CHUCK DEVICE

LARGE RANGE HEATED ELECTROSTATIC CHUCK

ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS

ELECTROSTATIC CHUCK

BONDED BODY

APPARATUS AND METHODS FOR REDUCING WAFER BACKSIDE DAMAGE

WORKPIECE ATTRACTION DEVICE

LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT

SUBSTRATE PROCESSING APPARATUS

CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS

ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE PROCESSING APPARATUS INCLUDING FLUID SUPPLY UNIT AND FLUI...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

ELECTROSTATIC CHUCK UNIT, LAMINATION APPARATUS AND METHOD OF LAMINA...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE PROCESSING APPARATUS

CENTERING WAFER FOR PROCESSING CHAMBER

SUBSTRATE SUPPORT DEVICE AND METHOD OF CONTROLLING PREVENTION OF LE...

ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREOF

WAFER CHUCK

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

COOLING SYSTEM FOR SEMICONDUCTOR EQUIPMENT