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H01J2237/02

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/02Details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Gas distribution ring for process chamber
- Patent number 12,243,719
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus and method for man...
- Patent number 12,243,729
- Issue date Mar 4, 2025
- NGK Insulators, Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 12,237,144
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
System and method for residual gas analysis
- Patent number 12,176,193
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and specimen contamination prevention method
- Patent number 12,131,881
- Issue date Oct 29, 2024
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,106,930
- Issue date Oct 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron detector
- Patent number 12,106,932
- Issue date Oct 1, 2024
- DECTRIS AG
- Radosav Pantelic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and monitoring device
- Patent number 12,106,948
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Ken Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 12,080,582
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder, method for using sample holder, projection amount ad...
- Patent number 12,080,511
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Megumi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier with vertical grid for supporting substrates in coater
- Patent number 12,068,142
- Issue date Aug 20, 2024
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,068,136
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, and apparatus for treating substrate with the same
- Patent number 12,062,525
- Issue date Aug 13, 2024
- PSK, Inc.
- Jong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency screen for an ultraviolet lamp system
- Patent number 12,020,910
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated electrode and ground plane for a substrate support
- Patent number 12,020,912
- Issue date Jun 25, 2024
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus
- Patent number 11,996,263
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 11,990,320
- Issue date May 21, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic-material shield around plasma chambers near pedestal
- Patent number 11,984,302
- Issue date May 14, 2024
- Applied Materials, Inc.
- Job George Konnoth Joseph
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY
- Publication number 20250069844
- Publication date Feb 27, 2025
- FEI Company
- Petr Hlavenka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic Cleaning Device
- Publication number 20250037962
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Yuto KUBONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...
- Publication number 20250029807
- Publication date Jan 23, 2025
- INTEGRATED DYNAMICS ENGINEERING GMBH
- Steve Jackson DJEMPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION
- Publication number 20250029831
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Tommi Tynell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION
- Publication number 20250014857
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Shaoqian WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER
- Publication number 20250014873
- Publication date Jan 9, 2025
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20250014855
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...
- Publication number 20240429019
- Publication date Dec 26, 2024
- SHINE Technologies, LLC
- Daniel Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION RING FOR PROCESS CHAMBER
- Publication number 20240379330
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Hsiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION ELECTRON MICROSCOPE
- Publication number 20240373591
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Daesung Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING KIT SHIELD
- Publication number 20240352574
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sundarapandian Ramaling Vijayalaskshmi REDDY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...
- Publication number 20240347313
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Zhidong DU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM
- Publication number 20240304426
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Sheng-chun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES
- Publication number 20240304428
- Publication date Sep 12, 2024
- LAM RESEARCH CORPORATION
- Wenbing YANG
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20240282548
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITION MONITORING DEVICES
- Publication number 20240274401
- Publication date Aug 15, 2024
- KLA Corporation
- James Richard Bella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...
- Publication number 20240274410
- Publication date Aug 15, 2024
- Hansol IONES Co., Ltd.
- Dae Gun Kim
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240266152
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED LASER AND PLASMA ETCH DICING
- Publication number 20240266220
- Publication date Aug 8, 2024
- Jonathan Bryant MELLEN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SPRAY-COATED ELECTROSTATIC CHUCK DESIGN
- Publication number 20240258076
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Tuck Foong KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20240258077
- Publication date Aug 1, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Gas distribution ring for process chamber

Plasma generating device and process executing apparatus including...

Member for semiconductor manufacturing apparatus and method for man...

Apparatus of plural charged-particle beams

Apparatus using multiple beams of charged particles

Ion milling device

To an inductively coupled plasma source

Method and system for the removal and/or avoidance of contamination...

System and method for residual gas analysis

Method for producing lamella, analysis system and method for analyz...

Beam pattern device having beam absorber structure

Ion beam device

Electron microscope and specimen contamination prevention method

Ion beam processing apparatus, electrode assembly, and method of cl...

Refillable ion chamber with automated purging system

Charged particle beam device

Electron detector

Plasma processing apparatus and monitoring device

Bottom electrode assembly, plasma processing apparatus, and method...

Etching apparatus and methods of cleaning thereof

Sample holder, method for using sample holder, projection amount ad...

Carrier with vertical grid for supporting substrates in coater

Substrate processing apparatus, method of manufacturing semiconduct...

Support unit, and apparatus for treating substrate with the same

Radio frequency screen for an ultraviolet lamp system

Integrated electrode and ground plane for a substrate support

Sensors and system for in-situ edge ring erosion monitor

Stage apparatus

Apparatus for preventing contamination of self-plasma chamber

Magnetic-material shield around plasma chambers near pedestal

Patents Applicationslast 30 patents

SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

Electronic Cleaning Device

APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...

PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION

METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION

CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER

CHARGED PARTICLE APPARATUS AND METHOD

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT

GAS DISTRIBUTION RING FOR PROCESS CHAMBER

TRANSMISSION ELECTRON MICROSCOPE

Concentrated Solar Irradiation of Targets in Plasmas

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

PROCESSING KIT SHIELD

SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...

Apparatus and Methods for Plasma Processing

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM

METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

SUBSTRATE POSITION MONITORING DEVICES

PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

INTEGRATED LASER AND PLASMA ETCH DICING

SPRAY-COATED ELECTROSTATIC CHUCK DESIGN

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER