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H01J2237/02

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/02Details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Core insertion type spiral tube and making method for the same
- Patent number 12,308,213
- Issue date May 20, 2025
- Hyun Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced deposition rate by thermal isolation cover for GIS manipul...
- Patent number 12,308,207
- Issue date May 20, 2025
- Applied Materials Israel Ltd.
- Sean Kashy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Support unit, heating unit and substrate treating apparatus includi...
- Patent number 12,300,531
- Issue date May 13, 2025
- Semes Co., Ltd.
- Chung Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting discharge site
- Patent number 12,288,669
- Issue date Apr 29, 2025
- NuFlare Technology, Inc.
- Toru Ariizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for forming a three-dimensional article
- Patent number 12,269,092
- Issue date Apr 8, 2025
- Arcam AB
- Safdar Ali
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Process chamber component and method of forming a surface texture
- Patent number 12,269,095
- Issue date Apr 8, 2025
- Cleanpart Group GmbH
- Olivier Marchand
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Electron detection device and scanning electron microscope
- Patent number 12,261,016
- Issue date Mar 25, 2025
- CIQTEK CO., LTD.
- Da Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma apparatus and methods for processing materials usi...
- Patent number 12,261,023
- Issue date Mar 25, 2025
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution ring for process chamber
- Patent number 12,243,719
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Hsiang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus and method for man...
- Patent number 12,243,729
- Issue date Mar 4, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 12,237,144
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
System and method for residual gas analysis
- Patent number 12,176,193
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and specimen contamination prevention method
- Patent number 12,131,881
- Issue date Oct 29, 2024
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,106,930
- Issue date Oct 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron detector
- Patent number 12,106,932
- Issue date Oct 1, 2024
- DECTRIS AG
- Radosav Pantelic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and monitoring device
- Patent number 12,106,948
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Ken Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 12,080,582
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...
- Publication number 20250183009
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Amin Azimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20250157783
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIBRATION REDUCTION IN ION IMPLANTERS USING EMBEDDED ACTUATOR FORCE...
- Publication number 20250144669
- Publication date May 8, 2025
- Applied Materials, Inc.
- Jordan B. TYE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140513
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Satoshi TOMIMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...
- Publication number 20250112031
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
- Publication number 20250104976
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...
- Publication number 20250104980
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Changbae PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20250095950
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Paul IJmert SCHEFFERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Vacuum Rotatable RF Component
- Publication number 20250079116
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Michael Mason Carrell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20250079142
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- B08 - CLEANING
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD F...
- Publication number 20250079111
- Publication date Mar 6, 2025
- Carl Zeiss MultiSEM GmbH
- Joerg Jacobi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY
- Publication number 20250069844
- Publication date Feb 27, 2025
- FEI Company
- Petr Hlavenka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic Cleaning Device
- Publication number 20250037962
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Yuto KUBONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...
- Publication number 20250029807
- Publication date Jan 23, 2025
- INTEGRATED DYNAMICS ENGINEERING GMBH
- Steve Jackson DJEMPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION
- Publication number 20250029831
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Tommi Tynell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION
- Publication number 20250014857
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Shaoqian WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER
- Publication number 20250014873
- Publication date Jan 9, 2025
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20250014855
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...
- Publication number 20240429019
- Publication date Dec 26, 2024
- SHINE Technologies, LLC
- Daniel Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION RING FOR PROCESS CHAMBER
- Publication number 20240379330
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Hsiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION ELECTRON MICROSCOPE
- Publication number 20240373591
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Daesung Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING KIT SHIELD
- Publication number 20240352574
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sundarapandian Ramaling Vijayalaskshmi REDDY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...
- Publication number 20240347313
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Zhidong DU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Core insertion type spiral tube and making method for the same

Apparatus for preventing contamination of self-plasma chamber

Enhanced deposition rate by thermal isolation cover for GIS manipul...

Support unit, heating unit and substrate treating apparatus includi...

Method and apparatus for detecting discharge site

Apparatus and method for forming a three-dimensional article

Process chamber component and method of forming a surface texture

Electron detection device and scanning electron microscope

Method and apparatus for revitalizing plasma processing tools

Microwave plasma apparatus and methods for processing materials usi...

Gas distribution ring for process chamber

Plasma generating device and process executing apparatus including...

Member for semiconductor manufacturing apparatus and method for man...

Apparatus of plural charged-particle beams

Apparatus using multiple beams of charged particles

Ion milling device

To an inductively coupled plasma source

Method and system for the removal and/or avoidance of contamination...

System and method for residual gas analysis

Method for producing lamella, analysis system and method for analyz...

Beam pattern device having beam absorber structure

Ion beam device

Electron microscope and specimen contamination prevention method

Ion beam processing apparatus, electrode assembly, and method of cl...

Refillable ion chamber with automated purging system

Charged particle beam device

Electron detector

Plasma processing apparatus and monitoring device

Bottom electrode assembly, plasma processing apparatus, and method...

Etching apparatus and methods of cleaning thereof

Patents Applicationslast 30 patents

METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

VIBRATION REDUCTION IN ION IMPLANTERS USING EMBEDDED ACTUATOR FORCE...

CHARGED PARTICLE BEAM DEVICE

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...

RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES

SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...

ELECTRON-OPTICAL DEVICE

In-Vacuum Rotatable RF Component

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD F...

SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

Electronic Cleaning Device

APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...

PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION

METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION

CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER

CHARGED PARTICLE APPARATUS AND METHOD

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT

GAS DISTRIBUTION RING FOR PROCESS CHAMBER

TRANSMISSION ELECTRON MICROSCOPE

Concentrated Solar Irradiation of Targets in Plasmas

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

PROCESSING KIT SHIELD

SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...

Apparatus and Methods for Plasma Processing