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H01J2237/02

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/02Details

Industries

Patents Grantslast 30 patents

Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and specimen contamination prevention method
- Patent number 12,131,881
- Issue date Oct 29, 2024
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,106,930
- Issue date Oct 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron detector
- Patent number 12,106,932
- Issue date Oct 1, 2024
- DECTRIS AG
- Radosav Pantelic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and monitoring device
- Patent number 12,106,948
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Ken Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 12,080,582
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder, method for using sample holder, projection amount ad...
- Patent number 12,080,511
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Megumi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier with vertical grid for supporting substrates in coater
- Patent number 12,068,142
- Issue date Aug 20, 2024
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,068,136
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, and apparatus for treating substrate with the same
- Patent number 12,062,525
- Issue date Aug 13, 2024
- PSK, Inc.
- Jong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency screen for an ultraviolet lamp system
- Patent number 12,020,910
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated electrode and ground plane for a substrate support
- Patent number 12,020,912
- Issue date Jun 25, 2024
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus
- Patent number 11,996,263
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 11,990,320
- Issue date May 21, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic-material shield around plasma chambers near pedestal
- Patent number 11,984,302
- Issue date May 14, 2024
- Applied Materials, Inc.
- Job George Konnoth Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Methods and apparatus for precleaning and treating wafer surfaces
- Patent number 11,939,666
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Xiangjin Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for metal contamination control in an ion impl...
- Patent number 11,923,169
- Issue date Mar 5, 2024
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cryotransfer holder and workstation
- Patent number 11,908,655
- Issue date Feb 20, 2024
- Gatan, Inc.
- Alexander Jozef Gubbens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus suitable for a particle beam apparatus
- Patent number 11,908,656
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Han Willem Hendrik Severt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of controlling an energy spread of a charg...
- Patent number 11,881,374
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Shakeeb Bin Hasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,875,966
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,869,748
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Takeshi Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and charge neutralization method for...
- Patent number 11,862,439
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Takahiro Kawawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS DISTRIBUTION RING FOR PROCESS CHAMBER
- Publication number 20240379330
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Hsiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION ELECTRON MICROSCOPE
- Publication number 20240373591
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Daesung Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING KIT SHIELD
- Publication number 20240352574
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sundarapandian Ramaling Vijayalaskshmi REDDY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...
- Publication number 20240347313
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Zhidong DU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM
- Publication number 20240304426
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Sheng-chun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES
- Publication number 20240304428
- Publication date Sep 12, 2024
- LAM RESEARCH CORPORATION
- Wenbing YANG
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20240282548
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITION MONITORING DEVICES
- Publication number 20240274401
- Publication date Aug 15, 2024
- KLA Corporation
- James Richard Bella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...
- Publication number 20240274410
- Publication date Aug 15, 2024
- Hansol IONES Co., Ltd.
- Dae Gun Kim
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240266152
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED LASER AND PLASMA ETCH DICING
- Publication number 20240266220
- Publication date Aug 8, 2024
- Jonathan Bryant MELLEN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SPRAY-COATED ELECTROSTATIC CHUCK DESIGN
- Publication number 20240258076
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Tuck Foong KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20240258077
- Publication date Aug 1, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROBOT, APPARATUS INCLUDING ROBOT, AND METHOD FOR MANUFACTURING SEMI...
- Publication number 20240243001
- Publication date Jul 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Yun CHENG
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SUBSTRATE TREATMENT APPARATUS
- Publication number 20240234101
- Publication date Jul 11, 2024
- INNOVATION FOR CREATIVE DEVICES CO., LTD.
- Buil JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Gun, Electron Beam Applying Device, and Irradiation Positi...
- Publication number 20240222062
- Publication date Jul 4, 2024
- Photo electron Soul, Inc.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS
- Publication number 20240222068
- Publication date Jul 4, 2024
- FEI Company
- Jing Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
- Publication number 20240194446
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20240186099
- Publication date Jun 6, 2024
- NHV CORPORATION
- Tomonori SHIRAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES
- Publication number 20240183028
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Xiangjin XIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240186100
- Publication date Jun 6, 2024
- NuFlare Technology, Inc.
- Shuji YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION
- Publication number 20240186107
- Publication date Jun 6, 2024
- Bernardo KASTRUP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion beam device

Electron microscope and specimen contamination prevention method

Ion beam processing apparatus, electrode assembly, and method of cl...

Refillable ion chamber with automated purging system

Charged particle beam device

Electron detector

Plasma processing apparatus and monitoring device

Bottom electrode assembly, plasma processing apparatus, and method...

Etching apparatus and methods of cleaning thereof

Sample holder, method for using sample holder, projection amount ad...

Carrier with vertical grid for supporting substrates in coater

Substrate processing apparatus, method of manufacturing semiconduct...

Support unit, and apparatus for treating substrate with the same

Radio frequency screen for an ultraviolet lamp system

Integrated electrode and ground plane for a substrate support

Sensors and system for in-situ edge ring erosion monitor

Stage apparatus

Apparatus for preventing contamination of self-plasma chamber

Magnetic-material shield around plasma chambers near pedestal

Vacuum chamber arrangement for charged particle beam generator

Methods and apparatus for precleaning and treating wafer surfaces

Semiconductor wafer

Apparatus and method for metal contamination control in an ion impl...

Cryotransfer holder and workstation

Stage apparatus suitable for a particle beam apparatus

Apparatus of plural charged-particle beams

Apparatus for and method of controlling an energy spread of a charg...

Method and apparatus for inspection

Substrate processing apparatus and method of manufacturing semicond...

Substrate processing apparatus and charge neutralization method for...

Patents Applicationslast 30 patents

GAS DISTRIBUTION RING FOR PROCESS CHAMBER

TRANSMISSION ELECTRON MICROSCOPE

Concentrated Solar Irradiation of Targets in Plasmas

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

PROCESSING KIT SHIELD

SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...

Apparatus and Methods for Plasma Processing

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM

METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

SUBSTRATE POSITION MONITORING DEVICES

PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

INTEGRATED LASER AND PLASMA ETCH DICING

SPRAY-COATED ELECTROSTATIC CHUCK DESIGN

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER

ROBOT, APPARATUS INCLUDING ROBOT, AND METHOD FOR MANUFACTURING SEMI...

CHARGED PARTICLE APPARATUS AND METHOD

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

PLASMA SUBSTRATE TREATMENT APPARATUS

Electron Gun, Electron Beam Applying Device, and Irradiation Positi...

CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS

CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER

ELECTRON BEAM IRRADIATION DEVICE

METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

METHOD AND APPARATUS FOR INSPECTION

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...