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H01J37/02

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/02Details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods of hysteresis compensation
- Patent number 12,183,537
- Issue date Dec 31, 2024
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for inspecting and grounding a mask in a charged particle sy...
- Patent number 12,142,451
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Tianming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of clamp compensation
- Patent number 12,057,286
- Issue date Aug 6, 2024
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring arrangement with moveable edge rings
- Patent number 12,027,410
- Issue date Jul 2, 2024
- Lam Research Corporation
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus, ion implantation apparatus, and ion i...
- Patent number 11,961,695
- Issue date Apr 16, 2024
- Semes Co., Ltd.
- Doyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems including pulsed dual-beam charge neutralization
- Patent number 11,915,901
- Issue date Feb 27, 2024
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,875,966
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Collision avoidance for particle beam instruments
- Patent number 11,798,774
- Issue date Oct 24, 2023
- Oxford Instruments Nanotechnology Tools Limited
- Stuart Andrew Swan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and method for controlling charged...
- Patent number 11,791,131
- Issue date Oct 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Takashi Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
System and method for reducing the charging effect in a transmissio...
- Patent number 11,715,618
- Issue date Aug 1, 2023
- FEI Company
- Yuchen Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coupling for connecting analytical systems with vibrational isolation
- Patent number 11,699,582
- Issue date Jul 11, 2023
- FEI Company
- Alexander Makarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 11,662,323
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vibration damping system for charged particle beam apparatus
- Patent number 11,664,185
- Issue date May 30, 2023
- HITACHI HIGH-TECH CORPORATION
- Jun Etoh
- B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information Patent Grant
Reentrant gas system for charged particle microscope
- Patent number 11,651,928
- Issue date May 16, 2023
- James B McGinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual XY variable aperture in an ion implantation system
- Patent number 11,574,796
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Jun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of clamp compensation
- Patent number 11,562,877
- Issue date Jan 24, 2023
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and drawing method
- Patent number 11,556,114
- Issue date Jan 17, 2023
- NuFlare Technology, Inc.
- Hikaru Yamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of hysteresis compensation
- Patent number 11,538,652
- Issue date Dec 27, 2022
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear motor for vacuum and vacuum processing apparatus
- Patent number 11,418,101
- Issue date Aug 16, 2022
- Hitachi High-Technologies Corporation
- Tomotaka Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source device
- Patent number 11,361,934
- Issue date Jun 14, 2022
- Sumitomo Heavy Industries, Ltd.
- Toshikazu Hiasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and control method thereof
- Patent number 11,352,694
- Issue date Jun 7, 2022
- NuFlare Technology, Inc.
- Satoshi Nakahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibrating method and calibrating system
- Patent number 11,289,303
- Issue date Mar 29, 2022
- Industrial Technology Research Institute
- Yen-Cheng Chen
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus
- Patent number 11,181,833
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Jerry Johannes Martinus Peijster
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and devices for examining an electrically charged specimen...
- Patent number 11,170,970
- Issue date Nov 9, 2021
- Carl Zeiss SMT GmbH
- Michael Budach
- G01 - MEASURING TESTING
Information Patent Grant
Collision avoidance for particle beam instruments
- Patent number 11,139,137
- Issue date Oct 5, 2021
- Oxford Instruments Nanotechnology Tools Limited
- Stuart Andrew Swan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,094,502
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscopy
- Patent number 11,067,486
- Issue date Jul 20, 2021
- United Kingdom Research and Innovation
- Meindert Hugo Lamers
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
Ion Milling Device
- Publication number 20250003841
- Publication date Jan 2, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS
- Publication number 20240355667
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF CLAMP COMPENSATION
- Publication number 20240339286
- Publication date Oct 10, 2024
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240321543
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Hideyuki Kotsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM
- Publication number 20240290590
- Publication date Aug 29, 2024
- SAMSUNG DISPLAY CO., LTD.
- YOUNGGIL PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGING AN ELECTROSTATIC CHUCK LOCATED WITHIN A VACUUM CHAMBER
- Publication number 20240234078
- Publication date Jul 11, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Adam Faust
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20240186099
- Publication date Jun 6, 2024
- NHV CORPORATION
- Tomonori SHIRAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION
- Publication number 20240186107
- Publication date Jun 6, 2024
- Bernardo KASTRUP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILAMENT ALIGNMENT DEVICE
- Publication number 20240153740
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Sangwoo Seon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANAGING BEAM POWER EFFECTS BY VARYING BASE EMISSIVITY
- Publication number 20240087839
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Dawei Sun
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR NON-INVASIVE SEMICONDUCTOR TECHNIQUE FOR M...
- Publication number 20240071710
- Publication date Feb 29, 2024
- FemtoMetrix, Inc.
- Timothy M. Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240062986
- Publication date Feb 22, 2024
- Hitachi High-Tech Corporation
- Naho TERAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...
- Publication number 20240047175
- Publication date Feb 8, 2024
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
SURFACE PREPARATION
- Publication number 20240021402
- Publication date Jan 18, 2024
- University College Dublin, National University of Ireland
- Denis Dowling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOOD COLUMN AND CHARGED PARTICLE APPARATUS
- Publication number 20240006147
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20230411108
- Publication date Dec 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Hideyuki Kotsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND METHOD OF MANUFACTURE
- Publication number 20230326705
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION
- Publication number 20230245848
- Publication date Aug 3, 2023
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230207248
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Young Je UM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF CLAMP COMPENSATION
- Publication number 20230120177
- Publication date Apr 20, 2023
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF HYSTERESIS COMPENSATION
- Publication number 20230101676
- Publication date Mar 30, 2023
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR REDUCING THE CHARGING EFFECT IN A TRANSMISSIO...
- Publication number 20230040558
- Publication date Feb 9, 2023
- FEI Company
- Yuchen Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual XY Variable Aperture In An Ion Implantation System
- Publication number 20230021619
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Jun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reentrant Gas System for Charged Particle Microscope
- Publication number 20230005697
- Publication date Jan 5, 2023
- FEI Company
- James B MCGINN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SY...
- Publication number 20230005698
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Tianming CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
- Publication number 20220375712
- Publication date Nov 24, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220359149
- Publication date Nov 10, 2022
- HITACHI HIGH-TECH CORPORATION
- Makoto SAKAKIBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Linear Motor for Vacuum and Vacuum Processing Apparatus
- Publication number 20220352804
- Publication date Nov 3, 2022
- HITACHI HIGH-TECH CORPORATION
- Tomotaka SHIBAZAKI
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods of hysteresis compensation

System for inspecting and grounding a mask in a charged particle sy...

Systems and methods of clamp compensation

Edge ring arrangement with moveable edge rings

Substrate treating apparatus, ion implantation apparatus, and ion i...

Replaceable module for a charged particle apparatus

Methods and systems including pulsed dual-beam charge neutralization

Method and apparatus for inspection

Collision avoidance for particle beam instruments

Charged particle beam apparatus and method for controlling charged...

Method and system for the removal and/or avoidance of contamination...

System and method for reducing the charging effect in a transmissio...

Coupling for connecting analytical systems with vibrational isolation

Method and system for inspecting an EUV mask

Vibration damping system for charged particle beam apparatus

Reentrant gas system for charged particle microscope

Dual XY variable aperture in an ion implantation system

Systems and methods of clamp compensation

Drawing apparatus and drawing method

Systems and methods of hysteresis compensation

Linear motor for vacuum and vacuum processing apparatus

Ion source device

Drawing apparatus and control method thereof

Aberration correction in charged particle system

Calibrating method and calibrating system

Substrate processing apparatus

Methods and devices for examining an electrically charged specimen...

Collision avoidance for particle beam instruments

Method and apparatus for inspection

Electron microscopy

Patents Applicationslast 30 patents

Ion Milling Device

COMPENSATION RASTER SCANNING

EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS

SYSTEMS AND METHODS OF CLAMP COMPENSATION

Charged Particle Beam Device

PLASMA MONITORING SYSTEM

DISCHARGING AN ELECTROSTATIC CHUCK LOCATED WITHIN A VACUUM CHAMBER

ELECTRON BEAM IRRADIATION DEVICE

METHOD AND APPARATUS FOR INSPECTION

FILAMENT ALIGNMENT DEVICE

MANAGING BEAM POWER EFFECTS BY VARYING BASE EMISSIVITY

METHOD AND APPARATUS FOR NON-INVASIVE SEMICONDUCTOR TECHNIQUE FOR M...

Charged Particle Beam Device

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

SURFACE PREPARATION

FLOOD COLUMN AND CHARGED PARTICLE APPARATUS

CHARGED PARTICLE BEAM DEVICE

PROCESSING APPARATUS AND METHOD OF MANUFACTURE

METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

SYSTEMS AND METHODS OF CLAMP COMPENSATION

SYSTEMS AND METHODS OF HYSTERESIS COMPENSATION

SYSTEM AND METHOD FOR REDUCING THE CHARGING EFFECT IN A TRANSMISSIO...

Dual XY Variable Aperture In An Ion Implantation System

Reentrant Gas System for Charged Particle Microscope

SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SY...

SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION

CHARGED PARTICLE BEAM DEVICE

Linear Motor for Vacuum and Vacuum Processing Apparatus