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H01J37/3002

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3002Details

Industries

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for electron beam focusing in electron beam add...
- Patent number 12,148,592
- Issue date Nov 19, 2024
- General Electric Company
- John Scott Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection using semiconductor detector
- Patent number 12,009,177
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Chin King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for electron beam focusing in electron beam add...
- Patent number 11,837,428
- Issue date Dec 5, 2023
- General Electric Company
- John Scott Price
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
X-ray calibration standard object
- Patent number 11,806,800
- Issue date Nov 7, 2023
- Arcam AB
- Johan Backlund
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Resonator, linear accelerator, and ion implanter having adjustable...
- Patent number 11,728,133
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Keith E. Kowal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extended cathode and repeller life by active management of halogen...
- Patent number 11,664,183
- Issue date May 30, 2023
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-blur electrostatic transfer lens for multi-beam electron gun
- Patent number 11,562,879
- Issue date Jan 24, 2023
- NuFlare Technology, Inc.
- Victor Katsap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam position monitor for charged particles passing through a chamber
- Patent number 11,410,831
- Issue date Aug 9, 2022
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Rémi Nicolas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic electron impact ion source
- Patent number 11,276,544
- Issue date Mar 15, 2022
- PerkinElmer Health Sciences, Inc.
- David G. Welkie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implanter calibration
- Patent number 11,264,204
- Issue date Mar 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MeV-based ion beam analysis apparatus
- Patent number 11,255,803
- Issue date Feb 22, 2022
- Forschungszentrum Juelich GmbH
- Soeren Moeller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid metal ion source
- Patent number 11,170,967
- Issue date Nov 9, 2021
- Axcelis Technologies, Inc.
- Neil Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of evaluating carbon concentration of silicon sample, method...
- Patent number 11,047,800
- Issue date Jun 29, 2021
- Sumco Corporation
- Kazutaka Eriguchi
- G01 - MEASURING TESTING
Information Patent Grant
Multi-charged-particle-beam writing apparatus and beam evaluating m...
- Patent number 11,024,485
- Issue date Jun 1, 2021
- NuFlare Technology, Inc.
- Eita Fujisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and cleaning method thereof
- Patent number 10,971,339
- Issue date Apr 6, 2021
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic electron impact ion source
- Patent number 10,879,030
- Issue date Dec 29, 2020
- PerkinElmer Health Sciences, Inc.
- David G. Welkie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic element having grooved exterior surface
- Patent number 10,867,772
- Issue date Dec 15, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Eric Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implanter calibration
- Patent number 10,818,473
- Issue date Oct 27, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Hsiung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray calibration standard object
- Patent number 10,807,187
- Issue date Oct 20, 2020
- Arcam AB
- Johan Backlund
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Charged particle beam apparatus comprising a controller to set cont...
- Patent number 10,804,067
- Issue date Oct 13, 2020
- HITACHI HIGH-TECH CORPORATION
- Takanori Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam impurity identification
- Patent number 10,763,079
- Issue date Sep 1, 2020
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
LUT-based focused ion beam friendly fill-cell design
- Patent number 10,735,004
- Issue date Aug 4, 2020
- Microchip Technology Inc.
- Matthew Kian Chin Yap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection sensitivity calculation method and deflection sensitivit...
- Patent number 10,707,048
- Issue date Jul 7, 2020
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods for acquiring planar view STEM images of device structures
- Patent number 10,539,489
- Issue date Jan 21, 2020
- Micron Technology, Inc.
- Jamie C. Porter
- G01 - MEASURING TESTING
Information Patent Grant
Chamber with flow-through source
- Patent number 10,541,113
- Issue date Jan 21, 2020
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing biomass
- Patent number 10,533,195
- Issue date Jan 14, 2020
- Xyleco, Inc.
- Marshall Medoff
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Lanthanated tungsten ion source and beamline components
- Patent number 10,535,498
- Issue date Jan 14, 2020
- Axcelis Technologies, Inc.
- Neil K Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and electron source having single-atom termination struc...
- Patent number 10,529,531
- Issue date Jan 7, 2020
- Hitachi High-Tech Science Corporation
- Chuhei Oshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and ion implantation apparatus
- Patent number 10,529,532
- Issue date Jan 7, 2020
- Ulvac, Inc.
- Takumi Yuze
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FASTENER FOR SECURING FACEPLATE TO ION SOURCE
- Publication number 20240379319
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- John Alexander Walder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Actively Cooled Gas Line For Ion Source
- Publication number 20240331972
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION USING SEMICONDUCTOR DETECTOR
- Publication number 20240290575
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ION BEAM EXTRACTION ELECTRODE, ION SOURCE AND EXTRACTION ELECTRODE...
- Publication number 20240290576
- Publication date Aug 29, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ELECTRON BEAM FOCUSING IN ELECTRON BEAM ADD...
- Publication number 20240062983
- Publication date Feb 22, 2024
- GENERAL ELECTRIC COMPANY
- John Scott Price
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESONATOR, LINEAR ACCELERATOR, AND ION IMPLANTER HAVING ADJUSTABLE...
- Publication number 20230134262
- Publication date May 4, 2023
- Applied Materials, Inc.
- Keith E. Kowal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extended Cathode And Repeller Life By Active Management Of Halogen...
- Publication number 20220359147
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-BLUR ELECTROSTATIC TRANSFER LENS FOR MULTI-BEAM ELECTRON GUN
- Publication number 20220084778
- Publication date Mar 17, 2022
- NuFlare Technology, Inc.
- Victor KATSAP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ELECTRON BEAM FOCUSING IN ELECTRON BEAM ADD...
- Publication number 20220037105
- Publication date Feb 3, 2022
- GENERAL ELECTRIC COMPANY
- John Scott Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION USING SEMICONDUCTOR DETECTOR
- Publication number 20210407764
- Publication date Dec 30, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dynamic Electron Impact Ion Source
- Publication number 20210257180
- Publication date Aug 19, 2021
- PerkinElmer Health Sciences, Inc.
- David G. Welkie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION MONITOR FOR CHARGED PARTICLES PASSING THROUGH A CHAMBER
- Publication number 20210183613
- Publication date Jun 17, 2021
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Rémi NICOLAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEV-BASED ION BEAM ANALYSIS APPARATUS
- Publication number 20210080412
- Publication date Mar 18, 2021
- FORSCHUNGSZENTRUM JUELICH GMBH
- Soeren Moeller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANTER CALIBRATION
- Publication number 20210043422
- Publication date Feb 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Hsiung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POROUS CARBONACEOUS VACUUM CHAMBER LINERS
- Publication number 20210013000
- Publication date Jan 14, 2021
- Entegris, Inc.
- Troy SCOGGINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID METAL ION SOURCE
- Publication number 20200303154
- Publication date Sep 24, 2020
- Axcelis Technologies, Inc.
- Neil Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND CLEANING METHOD THEREOF
- Publication number 20200279720
- Publication date Sep 3, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu ADACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM IMPURITY IDENTIFICATION
- Publication number 20200266030
- Publication date Aug 20, 2020
- FEI Company
- Jeremy Graham
- G01 - MEASURING TESTING
Information Patent Application
LOW EMISSION CLADDING AND ION IMPLANTER
- Publication number 20200234917
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Julian G. Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20200211821
- Publication date Jul 2, 2020
- Kabushiki Kaisha Senryou
- Makoto YASUKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING BIOMASS
- Publication number 20200115723
- Publication date Apr 16, 2020
- Xyleco, Inc.
- Marshall Medoff
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
IMPLANTER CALIBRATION
- Publication number 20200058465
- Publication date Feb 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Hsiung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dynamic Electron Impact Ion Source
- Publication number 20200020502
- Publication date Jan 16, 2020
- PerkinElmer Health Sciences, Inc.
- David G. Welkie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC ELEMENT HAVING GROOVED EXTERIOR SURFACE
- Publication number 20200020508
- Publication date Jan 16, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Eric Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND BEAM EVALUATING M...
- Publication number 20190385812
- Publication date Dec 19, 2019
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ACQUIRING PLANAR VIEW STEM IMAGES OF DEVICE STRUCTURES
- Publication number 20190353566
- Publication date Nov 21, 2019
- Micron Technology, Inc.
- Jamie C. Porter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20190252151
- Publication date Aug 15, 2019
- Hitachi High-Technologies Corporation
- Takanori KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND ION IMPLANTATION APPARATUS
- Publication number 20190237290
- Publication date Aug 1, 2019
- ULVAC, Inc.
- Takumi YUZE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFLECTION SENSITIVITY CALCULATION METHOD AND DEFLECTION SENSITIVIT...
- Publication number 20190237293
- Publication date Aug 1, 2019
- EBARA CORPORATION
- Ryo TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER WITH FLOW-THROUGH SOURCE
- Publication number 20190198291
- Publication date Jun 27, 2019
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for electron beam focusing in electron beam add...

Detection using semiconductor detector

Systems and methods for electron beam focusing in electron beam add...

X-ray calibration standard object

Resonator, linear accelerator, and ion implanter having adjustable...

Extended cathode and repeller life by active management of halogen...

Low-blur electrostatic transfer lens for multi-beam electron gun

Beam position monitor for charged particles passing through a chamber

Dynamic electron impact ion source

Implanter calibration

MeV-based ion beam analysis apparatus

Liquid metal ion source

Method of evaluating carbon concentration of silicon sample, method...

Multi-charged-particle-beam writing apparatus and beam evaluating m...

Ion source and cleaning method thereof

Dynamic electron impact ion source

Electrostatic element having grooved exterior surface

Implanter calibration

X-ray calibration standard object

Charged particle beam apparatus comprising a controller to set cont...

Focused ion beam impurity identification

LUT-based focused ion beam friendly fill-cell design

Deflection sensitivity calculation method and deflection sensitivit...

Deflection scan speed adjustment during charged particle exposure

Methods for acquiring planar view STEM images of device structures

Chamber with flow-through source

Processing biomass

Lanthanated tungsten ion source and beamline components

Ion source and electron source having single-atom termination struc...

Ion source and ion implantation apparatus

Patents Applicationslast 30 patents

FASTENER FOR SECURING FACEPLATE TO ION SOURCE

Actively Cooled Gas Line For Ion Source

DETECTION USING SEMICONDUCTOR DETECTOR

ION BEAM EXTRACTION ELECTRODE, ION SOURCE AND EXTRACTION ELECTRODE...

SYSTEMS AND METHODS FOR ELECTRON BEAM FOCUSING IN ELECTRON BEAM ADD...

RESONATOR, LINEAR ACCELERATOR, AND ION IMPLANTER HAVING ADJUSTABLE...

Extended Cathode And Repeller Life By Active Management Of Halogen...

LOW-BLUR ELECTROSTATIC TRANSFER LENS FOR MULTI-BEAM ELECTRON GUN

SYSTEMS AND METHODS FOR ELECTRON BEAM FOCUSING IN ELECTRON BEAM ADD...

DETECTION USING SEMICONDUCTOR DETECTOR

Dynamic Electron Impact Ion Source

BEAM POSITION MONITOR FOR CHARGED PARTICLES PASSING THROUGH A CHAMBER

MEV-BASED ION BEAM ANALYSIS APPARATUS

IMPLANTER CALIBRATION

POROUS CARBONACEOUS VACUUM CHAMBER LINERS

LIQUID METAL ION SOURCE

ION SOURCE AND CLEANING METHOD THEREOF

FOCUSED ION BEAM IMPURITY IDENTIFICATION

LOW EMISSION CLADDING AND ION IMPLANTER

ELECTRON BEAM IRRADIATION DEVICE

PROCESSING BIOMASS

IMPLANTER CALIBRATION

Dynamic Electron Impact Ion Source

ELECTROSTATIC ELEMENT HAVING GROOVED EXTERIOR SURFACE

MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND BEAM EVALUATING M...

METHODS FOR ACQUIRING PLANAR VIEW STEM IMAGES OF DEVICE STRUCTURES

CHARGED PARTICLE BEAM APPARATUS

ION SOURCE AND ION IMPLANTATION APPARATUS

DEFLECTION SENSITIVITY CALCULATION METHOD AND DEFLECTION SENSITIVIT...

CHAMBER WITH FLOW-THROUGH SOURCE