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G03F7/7085

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7085Detection arrangement

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating a mathematical model for positioning individu...
- Patent number 12,164,102
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Norman Kretzschmar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
End-of-life monitoring of dynamic gas lock membranes and pupil face...
- Patent number 12,158,705
- Issue date Dec 3, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Joseph Harry Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 12,147,162
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Catharinus De Schiffart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology measurement method and apparatus
- Patent number 12,140,875
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Ilse Van Weperen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for measuring a substrate and method for correcting cyclic e...
- Patent number 12,135,211
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Stephan Zschaeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and lithography apparatus
- Patent number 12,130,557
- Issue date Oct 29, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and ultraviolet radiation control system
- Patent number 12,124,172
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Alexander Kremer
- G01 - MEASURING TESTING
Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle detection apparatus, reticle detection method, exposure mac...
- Patent number 12,117,738
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer processing apparatus and wafer transfer method
- Patent number 12,099,309
- Issue date Sep 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography thermal control
- Patent number 12,096,544
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for monitoring and controlling extreme ultraviole...
- Patent number 12,085,860
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of bubble removal from viscous fluid
- Patent number 12,083,450
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chian-Niang Lin
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
System and method for detecting debris in a photolithography system
- Patent number 12,085,865
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Yu Tu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Overlay measurement device
- Patent number 12,085,383
- Issue date Sep 10, 2024
- AUROS TECHNOLOGY, INC.
- Gyu Nam Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection tool for an extreme ultraviolet radiation source to obse...
- Patent number 12,066,761
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chiao-Hua Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source apparatus, exposure apparatus, and article manufacturi...
- Patent number 12,066,759
- Issue date Aug 20, 2024
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- F21 - LIGHTING
Information Patent Grant
Droplet generator and method of servicing a photolithographic tool
- Patent number 12,055,864
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 12,044,981
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exhaust gas monitor for photoresist adhesion control
- Patent number 12,044,983
- Issue date Jul 23, 2024
- Texas Instruments Incorporated
- Joseph Peter Plourde
- G01 - MEASURING TESTING
Information Patent Grant
Measurement tool and method for lithography masks
- Patent number 12,032,298
- Issue date Jul 9, 2024
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
High throughput and high position accurate method for particle insp...
- Patent number 12,013,646
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Jui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Substrate measuring device and a method of using the same
- Patent number 12,007,691
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Min-Cheng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exhaust system with u-shaped pipes
- Patent number 11,994,809
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Fu Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,994,808
- Issue date May 28, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for improving critical dimension variation
- Patent number 11,988,972
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hsun Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240411235
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Dae Geun YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND ARTICLE MANUFACTURING METHOD
- Publication number 20240393683
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- KENJI YAEGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...
- Publication number 20240385534
- Publication date Nov 21, 2024
- Canon Kabushiki Kaisha
- SHINGO HANYUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION COLLECTION SYSTEM, INSPECTION SUBSTRATE, AND INFORMATIO...
- Publication number 20240385538
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Junnosuke Maki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY THERMAL CONTROL
- Publication number 20240389215
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE ENVIRONMENT MONITORING SYSTEM AND METHODS OF OPERATION
- Publication number 20240377727
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Wei LU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...
- Publication number 20240377752
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...
- Publication number 20240377763
- Publication date Nov 14, 2024
- Nikon Corporation
- Arata OCHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240377764
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu TU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...
- Publication number 20240361701
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chiao-Hua CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...
- Publication number 20240353768
- Publication date Oct 24, 2024
- Carl Zeiss SMT GMBH
- Lutz Brekerbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF SERVICING PHOTOLITHOGRAPHIC APPARATUS
- Publication number 20240345493
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Huan CHEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
- Publication number 20240345491
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE ADJUSTMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICL...
- Publication number 20240345494
- Publication date Oct 17, 2024
- Canon Kabushiki Kaisha
- NAOKI FUNABASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SENSOR SYSTEM
- Publication number 20240345492
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Gijs KRAMER
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT
- Publication number 20240337956
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Lucas Christiaan Johan HEIJMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DRYING DEVICE
- Publication number 20240337442
- Publication date Oct 10, 2024
- Carl Zeiss SMT GMBH
- Arvid Maczeyzik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INNER POD HOLDING DEVICE CONDUCIVE TO REDUCING DUST CONTAMINATION A...
- Publication number 20240329544
- Publication date Oct 3, 2024
- GUDENG EQUIPMENT CO., LTD.
- YIN-FENG CHAN
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD
- Publication number 20240329546
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE MEASUREMENT DEVICE FOR LASER INTERFERENCE PHOTOLITHOGRAPHY SY...
- Publication number 20240319619
- Publication date Sep 26, 2024
- TSINGHUA UNIVERSITY
- Yu ZHU
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...
- Publication number 20240319621
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST UNIFORMITY DRIFT CORRECTION
- Publication number 20240319608
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Roberto B. WIENER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE EDGE PATTERNING TECHNIQUES
- Publication number 20240319615
- Publication date Sep 26, 2024
- ONTO INNOVATION INC.
- Keith F. Best
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS
- Publication number 20240310740
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Kenichirou MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTIMIZATION METHOD OF OVERLAY MEASUREMENT DEVICE AND OVERLAY MEASU...
- Publication number 20240312847
- Publication date Sep 19, 2024
- AUROS TECHNOLOGY, INC.
- Seung Soo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXHAUST SYSTEM WITH U-SHAPED PIPES
- Publication number 20240310741
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Yu-Fu Lin
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240295824
- Publication date Sep 5, 2024
- Gigaphoton Inc.
- Tomoyoshi TOIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Detection arrangement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System for monitoring a plasma

Semiconductor processing tool and methods of operation

Method for generating a mathematical model for positioning individu...

End-of-life monitoring of dynamic gas lock membranes and pupil face...

Imprint lithography

Metrology measurement method and apparatus

Device for measuring a substrate and method for correcting cyclic e...

Optical system and lithography apparatus

Lithographic apparatus and ultraviolet radiation control system

Overlay measurement system using lock-in amplifier technique

Reticle detection apparatus, reticle detection method, exposure mac...

Wafer processing apparatus and wafer transfer method

Lithography thermal control

System and method for monitoring and controlling extreme ultraviole...

Method of bubble removal from viscous fluid

System and method for detecting debris in a photolithography system

Overlay measurement device

Inspection tool for an extreme ultraviolet radiation source to obse...

Pellicle and pellicle assembly

Light source apparatus, exposure apparatus, and article manufacturi...

Droplet generator and method of servicing a photolithographic tool

Method and apparatus for optimization of lithographic process

Exhaust gas monitor for photoresist adhesion control

Measurement tool and method for lithography masks

High throughput and high position accurate method for particle insp...

Metrology system and method for determining a characteristic of one...

Substrate measuring device and a method of using the same

Exhaust system with u-shaped pipes

Lithographic apparatus, metrology systems, phased array illuminatio...

Method and apparatus for improving critical dimension variation

Patents Applicationslast 30 patents

HIGH RESOLUTION PHOTOLITHOGRAPHY

SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE PROCESSING SYSTEM AND ARTICLE MANUFACTURING METHOD

MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...

INFORMATION COLLECTION SYSTEM, INSPECTION SUBSTRATE, AND INFORMATIO...

LITHOGRAPHY THERMAL CONTROL

STORAGE ENVIRONMENT MONITORING SYSTEM AND METHODS OF OPERATION

SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...

MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...

METHODS OF SERVICING PHOTOLITHOGRAPHIC APPARATUS

EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM

TEMPERATURE ADJUSTMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICL...

SENSOR SYSTEM

APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT

METHOD AND DRYING DEVICE

INNER POD HOLDING DEVICE CONDUCIVE TO REDUCING DUST CONTAMINATION A...

LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD

PHASE MEASUREMENT DEVICE FOR LASER INTERFERENCE PHOTOLITHOGRAPHY SY...

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...

FAST UNIFORMITY DRIFT CORRECTION

SUBSTRATE EDGE PATTERNING TECHNIQUES

SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS

OPTIMIZATION METHOD OF OVERLAY MEASUREMENT DEVICE AND OVERLAY MEASU...

EXHAUST SYSTEM WITH U-SHAPED PIPES

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...