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CPC
G03F7/7085

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7085Detection arrangement

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Projection exposure apparatus for semiconductor lithography
- Patent number 12,321,105
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Timo Laufer
- G01 - MEASURING TESTING
Information Patent Grant
Device for detecting a temperature, installation for producing an o...
- Patent number 12,321,106
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Michael Stolz
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system, lithographic apparatus, and inspection method
- Patent number 12,313,980
- Issue date May 27, 2025
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure apparatus having a device for determining the c...
- Patent number 12,306,551
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G01 - MEASURING TESTING
Information Patent Grant
Hollow-core photonic crystal fiber based optical component for broa...
- Patent number 12,306,433
- Issue date May 20, 2025
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, illumination switches an...
- Patent number 12,306,541
- Issue date May 20, 2025
- ASML Holding N.V. & ASML Netherlands B.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inner pod holding device conducive to reducing dust contamination a...
- Patent number 12,306,550
- Issue date May 20, 2025
- GUDENG EQUIPMENT CO., LTD.
- Yin-Feng Chan
- G01 - MEASURING TESTING
Information Patent Grant
Exhaust system with U-shaped pipes
- Patent number 12,276,923
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Fu Lin
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Reflector manufacturing method and associated reflector
- Patent number 12,269,229
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Sander Bas Roobol
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Differential measurement system
- Patent number 12,248,255
- Issue date Mar 11, 2025
- ASML Netherlands B.V.
- Hubert Matthieu Richard Steijns
- G01 - MEASURING TESTING
Information Patent Grant
Determining hot spot ranking based on wafer measurement
- Patent number 12,242,201
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING
Information Patent Grant
EUV light source contamination monitoring system
- Patent number 12,228,863
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for submicron additive manufacturing
- Patent number 12,208,569
- Issue date Jan 28, 2025
- Lawrence Livermore National Security, LLC
- Sourabh Kumar Saha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
EUV microscope
- Patent number 12,203,874
- Issue date Jan 21, 2025
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and method
- Patent number 12,204,255
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Clamp assembly
- Patent number 12,189,309
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Ronald Van Der Wilk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning interference lithographic system
- Patent number 12,189,300
- Issue date Jan 7, 2025
- Tsinghua University; Beijing U-Precision Tech Co., Ltd.
- Leijie Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Storage environment monitoring system and methods of operation
- Patent number 12,174,528
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Wei Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating a mathematical model for positioning individu...
- Patent number 12,164,102
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Norman Kretzschmar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
End-of-life monitoring of dynamic gas lock membranes and pupil face...
- Patent number 12,158,705
- Issue date Dec 3, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Joseph Harry Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 12,147,162
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Catharinus De Schiffart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology measurement method and apparatus
- Patent number 12,140,875
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Ilse Van Weperen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for measuring a substrate and method for correcting cyclic e...
- Patent number 12,135,211
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Stephan Zschaeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and lithography apparatus
- Patent number 12,130,557
- Issue date Oct 29, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and ultraviolet radiation control system
- Patent number 12,124,172
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Alexander Kremer
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR AND METHOD OF VIBRATION CANCELLATION FOR LASER WAVELE...
- Publication number 20250208525
- Publication date Jun 26, 2025
- CYMER, LLC
- Mohammad Amin KHAMEHCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WARPAGE DETERMINATION SYSTEM
- Publication number 20250199421
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Efthymios STRATIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...
- Publication number 20250199422
- Publication date Jun 19, 2025
- Carl Zeiss SMT GMBH
- Stefan LIPPOLDT
- G02 - OPTICS
Information Patent Application
RETICLE CLAMPING MODULE
- Publication number 20250199420
- Publication date Jun 19, 2025
- GUDENG EQUIPMENT CO., LTD.
- YU-LIN CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-CLEANLINESS RETICLE CLAMPING MODULE
- Publication number 20250181000
- Publication date Jun 5, 2025
- GUDENG EQUIPMENT CO., LTD.
- AN-PANG WANG
- G01 - MEASURING TESTING
Information Patent Application
TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...
- Publication number 20250175589
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Senthil Lakshmanan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250174452
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...
- Publication number 20250164893
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Steffen VAAS
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
STORAGE AND TRANSFER MODULE AND SUBSTRATE TREATMENT APPARATUS INCLU...
- Publication number 20250164898
- Publication date May 22, 2025
- Ki Won HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250166983
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS
- Publication number 20250155823
- Publication date May 15, 2025
- Lasertec Corporation
- Ko GONDAIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
- Publication number 20250155828
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND
- Publication number 20250147438
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR SUBMICRON ADDITIVE MANUFACTURING
- Publication number 20250144873
- Publication date May 8, 2025
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Sourabh Kumar SAHA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...
- Publication number 20250138302
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Thilo Pollak
- G02 - OPTICS
Information Patent Application
ILLUMINATING APPARATUS, MOLDING APPARATUS, AND METHOD FOR MANUFACTU...
- Publication number 20250138430
- Publication date May 1, 2025
- Canon Kabushiki Kaisha
- OSAMU YASUNOBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20250138440
- Publication date May 1, 2025
- ASML NETHERLANDS B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS
- Publication number 20250130510
- Publication date Apr 24, 2025
- Nikon Corporation
- Pai-Hsueh Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, LITHOG...
- Publication number 20250130509
- Publication date Apr 24, 2025
- Canon Kabushiki Kaisha
- GENICHIROU KIYOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Microscope
- Publication number 20250116615
- Publication date Apr 10, 2025
- EUV TECH, INC.
- CHAMI N. PERERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL APPARATUS
- Publication number 20250116943
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Debashis DE MUNSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS
- Publication number 20250110413
- Publication date Apr 3, 2025
- Carl Zeiss SMT GMBH
- Markus RAAB
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...
- Publication number 20250103855
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Wenjie JIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...
- Publication number 20250093788
- Publication date Mar 20, 2025
- Canon Kabushiki Kaisha
- YUICHIRO MORIKUNI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20250085172
- Publication date Mar 13, 2025
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20250085641
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250060681
- Publication date Feb 20, 2025
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20250053103
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...
- Publication number 20250053102
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Detection arrangement

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Projection exposure apparatus for semiconductor lithography

Device for detecting a temperature, installation for producing an o...

Inspection system, lithographic apparatus, and inspection method

Projection exposure apparatus having a device for determining the c...

Hollow-core photonic crystal fiber based optical component for broa...

Lithographic apparatus, metrology systems, illumination switches an...

Inner pod holding device conducive to reducing dust contamination a...

Exhaust system with U-shaped pipes

Reflector manufacturing method and associated reflector

Differential measurement system

Determining hot spot ranking based on wafer measurement

Inspection method and apparatus, lithographic apparatus, lithograph...

EUV light source contamination monitoring system

Stage apparatus and electron beam lithography system

System and method for submicron additive manufacturing

EUV microscope

Lithographic apparatus and method

Clamp assembly

Scanning interference lithographic system

Calibration system for an extreme ultraviolet light source

Storage environment monitoring system and methods of operation

System for monitoring a plasma

Semiconductor processing tool and methods of operation

Method for generating a mathematical model for positioning individu...

End-of-life monitoring of dynamic gas lock membranes and pupil face...

Imprint lithography

Metrology measurement method and apparatus

Device for measuring a substrate and method for correcting cyclic e...

Optical system and lithography apparatus

Lithographic apparatus and ultraviolet radiation control system

Patents Applicationslast 30 patents

APPARATUS FOR AND METHOD OF VIBRATION CANCELLATION FOR LASER WAVELE...

SUBSTRATE WARPAGE DETERMINATION SYSTEM

INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...

RETICLE CLAMPING MODULE

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...

STORAGE AND TRANSFER MODULE AND SUBSTRATE TREATMENT APPARATUS INCLU...

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS

EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM

INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND

SYSTEM AND METHOD FOR SUBMICRON ADDITIVE MANUFACTURING

OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...

ILLUMINATING APPARATUS, MOLDING APPARATUS, AND METHOD FOR MANUFACTU...

LITHOGRAPHIC APPARATUS AND METHOD

VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, LITHOG...

EUV Microscope

OPTICAL APPARATUS

METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS

METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...

SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES