Detection characterised by the variable being measured

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CPC
H01J2237/245

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/245Detection characterised by the variable being measured

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam device
- Patent number 12,334,299
- Issue date Jun 17, 2025
- HITACHI HIGH-TECH CORPORATION
- U Oh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device and aberration correction method
- Patent number 12,327,708
- Issue date Jun 10, 2025
- HITACHI HIGH-TECH CORPORATION
- Shingo Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnetic field signal acquisition system for high signal-to-...
- Patent number 12,322,580
- Issue date Jun 3, 2025
- Dublin City University
- Alessio Di Liberto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Auto-focus sensor implementation for multi-column microscopes
- Patent number 12,322,568
- Issue date Jun 3, 2025
- KLA Corporation
- Nicholas Petrone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional sweep probe system
- Patent number 12,322,581
- Issue date Jun 3, 2025
- Georgia Tech Research Corporation
- Chhavi Chhavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma diagnosis system and plasma diagnosis method
- Patent number 12,315,710
- Issue date May 27, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for observing permeation and diffusion path of observation t...
- Patent number 12,315,696
- Issue date May 27, 2025
- National Institute for Materials Science
- Akiko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and method and program for controlling...
- Patent number 12,315,704
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and methods of manufacturing semiconduc...
- Patent number 12,315,703
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Kyoungchon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical emission spectroscopy for advanced process characterization
- Patent number 12,306,044
- Issue date May 20, 2025
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time dosimetry
- Patent number 12,298,447
- Issue date May 13, 2025
- Reveam, Inc.
- Chip Starns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Hybrid matcher and radio frequency matching system including the hy...
- Patent number 12,288,674
- Issue date Apr 29, 2025
- Samsung Electronics Co., Ltd.
- Hyosin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,281,381
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Sireesh Adimadhyam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern height metrology using an e-beam system
- Patent number 12,278,086
- Issue date Apr 15, 2025
- Imec VZW
- Gian Francesco Lorusso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and image generation method
- Patent number 12,278,084
- Issue date Apr 15, 2025
- Jeol Ltd.
- Motohiro Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assessment of matching networks
- Patent number 12,272,533
- Issue date Apr 8, 2025
- Advanced Energy Industries, Inc.
- Corneluis Erasmus van Greunen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive broad-band sensors for electromagnetic waves
- Patent number 12,272,532
- Issue date Apr 8, 2025
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wideband variable impedance load for high volume manufacturing qual...
- Patent number 12,272,524
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for monitoring semiconductor processes
- Patent number 12,266,552
- Issue date Apr 1, 2025
- Inficon, Inc.
- Matan Lapidot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection apparatus
- Patent number 12,265,043
- Issue date Apr 1, 2025
- NuFlare Technology, Inc.
- Riki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for using binning to increase power during a lo...
- Patent number 12,266,505
- Issue date Apr 1, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
- Publication number 20250208074
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...
- Publication number 20250210310
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20250201515
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...
- Publication number 20250201540
- Publication date Jun 19, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian A. Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250201542
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Jinhyeok KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS PROVIDING APPARATUS AND SUBSTRATE TREATING APPARATUS IN...
- Publication number 20250201524
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Tae Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20250201531
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Chan Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD
- Publication number 20250201601
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Kazuhito YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250201525
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Jinhyeok KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Natural Frequency Adjuster For Extraction Electrodes
- Publication number 20250201508
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...
- Publication number 20250201518
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20250201528
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD
- Publication number 20250191883
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryuta HIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR...
- Publication number 20250191895
- Publication date Jun 12, 2025
- CKD CORPORATION
- Yuko SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...
- Publication number 20250189347
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Gyoseon Choo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION FLOW DETERMINATION DEVICE, CHARGED PARTICLE BEAM DEVICE,...
- Publication number 20250189462
- Publication date Jun 12, 2025
- HITACHI HIGH-TECH CORPORATION
- Norifumi KAMESHIRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ENHANCED RF POWER DELIVERY USING HARMONIC WAV...
- Publication number 20250191879
- Publication date Jun 12, 2025
- FORTH-RITE TECHNOLOGIES, LLC
- Terry R. Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250191889
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryutaro SUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20250191898
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Akira TANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SCANNING PATTERNS FOR SCIENTIFIC INSTRUMENTS
- Publication number 20250183002
- Publication date Jun 5, 2025
- FEI Company
- Gert-Jan de Vos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...
- Publication number 20250183018
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Wataru SUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRAMMABLE PRECISION ETCHING
- Publication number 20250183019
- Publication date Jun 5, 2025
- Board of Regents, The University of Texas System
- Sidlgata V. Sreenivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-INVASIVE MEASURING/DIAGNOSIS/TREATMENT APPARATUS AND METHOD
- Publication number 20250176925
- Publication date Jun 5, 2025
- Weng-Dah Ken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION ANGLE SENSOR
- Publication number 20250157784
- Publication date May 15, 2025
- Applied Materials, Inc.
- Chuang-Chia Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...
- Publication number 20250157789
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jungwook SHON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...
- Publication number 20250157798
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250157799
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidation-Reduction Adjustable Plasma
- Publication number 20250157800
- Publication date May 15, 2025
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...
- Publication number 20250157785
- Publication date May 15, 2025
- HITACHI HIGH-TECH CORPORATION
- Hidenori MACHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING

Detection characterised by the variable being measured

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam device

Charged particle beam device and aberration correction method

Electromagnetic field signal acquisition system for high signal-to-...

Auto-focus sensor implementation for multi-column microscopes

Three-dimensional sweep probe system

Plasma diagnosis system and plasma diagnosis method

Device for observing permeation and diffusion path of observation t...

Plasma processing apparatus, and method and program for controlling...

Carrier device, semiconductor apparatus, and residual charge detect...

Plasma processing apparatus and methods of manufacturing semiconduc...

Optical emission spectroscopy for advanced process characterization

RF immune sensor probe for monitoring a temperature of an electrost...

Power adjustment method of upper electrode power supply and semicon...

Real-time dosimetry

Hybrid matcher and radio frequency matching system including the hy...

Methods and apparatus for processing a substrate

Closed loop faraday correction of a horizontal beam current profile...

Pattern height metrology using an e-beam system

Electron microscope and image generation method

Assessment of matching networks

Inductive broad-band sensors for electromagnetic waves

Station-to-station control of backside bow compensation deposition

Wideband variable impedance load for high volume manufacturing qual...

System and method for monitoring semiconductor processes

Inspection apparatus

Systems and methods for using binning to increase power during a lo...

Semiconductor processing apparatus and dielectric window cleaning m...

Method and apparatus for revitalizing plasma processing tools

Plasma processing apparatus and plasma processing method

Device and method for producing layers with improved uniformity in...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION

MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...

IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS

PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PROCESS GAS PROVIDING APPARATUS AND SUBSTRATE TREATING APPARATUS IN...

HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Natural Frequency Adjuster For Extraction Electrodes

PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS

PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD

FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR...

SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...

INSPECTION FLOW DETERMINATION DEVICE, CHARGED PARTICLE BEAM DEVICE,...

SYSTEM AND METHOD FOR ENHANCED RF POWER DELIVERY USING HARMONIC WAV...

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

SCANNING PATTERNS FOR SCIENTIFIC INSTRUMENTS

PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...

PROGRAMMABLE PRECISION ETCHING

NON-INVASIVE MEASURING/DIAGNOSIS/TREATMENT APPARATUS AND METHOD

ION ANGLE SENSOR

E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...

CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

Oxidation-Reduction Adjustable Plasma

CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...