Detection characterised by the variable being measured

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CPC
H01J2237/245

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/245Detection characterised by the variable being measured

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Optical emission spectroscopy for advanced process characterization
- Patent number 12,306,044
- Issue date May 20, 2025
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time dosimetry
- Patent number 12,298,447
- Issue date May 13, 2025
- Reveam, Inc.
- Chip Starns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Hybrid matcher and radio frequency matching system including the hy...
- Patent number 12,288,674
- Issue date Apr 29, 2025
- Samsung Electronics Co., Ltd.
- Hyosin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,281,381
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Sireesh Adimadhyam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern height metrology using an e-beam system
- Patent number 12,278,086
- Issue date Apr 15, 2025
- Imec VZW
- Gian Francesco Lorusso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and image generation method
- Patent number 12,278,084
- Issue date Apr 15, 2025
- Jeol Ltd.
- Motohiro Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assessment of matching networks
- Patent number 12,272,533
- Issue date Apr 8, 2025
- Advanced Energy Industries, Inc.
- Corneluis Erasmus van Greunen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive broad-band sensors for electromagnetic waves
- Patent number 12,272,532
- Issue date Apr 8, 2025
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wideband variable impedance load for high volume manufacturing qual...
- Patent number 12,272,524
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for monitoring semiconductor processes
- Patent number 12,266,552
- Issue date Apr 1, 2025
- Inficon, Inc.
- Matan Lapidot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection apparatus
- Patent number 12,265,043
- Issue date Apr 1, 2025
- NuFlare Technology, Inc.
- Riki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for using binning to increase power during a lo...
- Patent number 12,266,505
- Issue date Apr 1, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning electron microscope and image generation method using scan...
- Patent number 12,255,043
- Issue date Mar 18, 2025
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Numerically compensating SEM-induced charging using diffusion-based...
- Patent number 12,255,042
- Issue date Mar 18, 2025
- ASML Netherlands B.V.
- Thomas Jarik Huisman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-beam particle beam system and method for operating same
- Patent number 12,255,040
- Issue date Mar 18, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,249,485
- Issue date Mar 11, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus, and program for determining condition related to...
- Patent number 12,243,711
- Issue date Mar 4, 2025
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding method and substrate processing apparatus
- Patent number 12,243,728
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 12,241,772
- Issue date Mar 4, 2025
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for event modulated electron microscopy
- Patent number 12,237,147
- Issue date Feb 25, 2025
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Bryan Walter Reed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-precision timing clock method
- Patent number 12,226,246
- Issue date Feb 18, 2025
- Weng-Dah Ken
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Patents Applicationslast 30 patents

Information Patent Application
ION ANGLE SENSOR
- Publication number 20250157784
- Publication date May 15, 2025
- Applied Materials, Inc.
- Chuang-Chia Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...
- Publication number 20250157789
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jungwook SHON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...
- Publication number 20250157798
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250157799
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidation-Reduction Adjustable Plasma
- Publication number 20250157800
- Publication date May 15, 2025
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...
- Publication number 20250157785
- Publication date May 15, 2025
- HITACHI HIGH-TECH CORPORATION
- Hidenori MACHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...
- Publication number 20250149299
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF
- Publication number 20250140512
- Publication date May 1, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Huaidong ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL-DRIVEN PRESSURE ESTIMATION
- Publication number 20250140538
- Publication date May 1, 2025
- Applied Materials, Inc.
- Devi Raghavee Veerappan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REAL-TIME PLASMA MEASUREMENT AND CONTROL
- Publication number 20250140541
- Publication date May 1, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS AND METHOD
- Publication number 20250140522
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chun-Wei Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS
- Publication number 20250132139
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Hari Ponnekanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM
- Publication number 20250132138
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH WIRE FORM METAL DOPANT
- Publication number 20250125119
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE
- Publication number 20250116587
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel arc management algorithm of RF generator and Match box for CC...
- Publication number 20250118543
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Tiefeng SHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPROVED OPTICAL ACCESS FOR SPECTROSCOPIC MONITORING OF SEMICONDUCT...
- Publication number 20250118603
- Publication date Apr 10, 2025
- Verity Instruments, Inc.
- Mark Meloni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM
- Publication number 20250118578
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Ajith Karonnan Ramapurath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE
- Publication number 20250118542
- Publication date Apr 10, 2025
- TOKYO ELECTRON LIMITED
- Ayuta SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118525
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF
- Publication number 20250112028
- Publication date Apr 3, 2025
- JUSUNG ENGINEERING CO., LTD.
- Sang Kyo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS
- Publication number 20250100263
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...
- Publication number 20250104964
- Publication date Mar 27, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...
- Publication number 20250087444
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROFILING USING OPTICAL TOMOGRAPHY
- Publication number 20250087448
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE
- Publication number 20250087451
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...
- Publication number 20250087509
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Jitae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Filter
- Publication number 20250087449
- Publication date Mar 13, 2025
- Oxford Instruments Nanotechnology Tools Limited
- Peter Statham
- H01 - BASIC ELECTRIC ELEMENTS

Detection characterised by the variable being measured

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical emission spectroscopy for advanced process characterization

RF immune sensor probe for monitoring a temperature of an electrost...

Power adjustment method of upper electrode power supply and semicon...

Real-time dosimetry

Hybrid matcher and radio frequency matching system including the hy...

Methods and apparatus for processing a substrate

Closed loop faraday correction of a horizontal beam current profile...

Pattern height metrology using an e-beam system

Electron microscope and image generation method

Assessment of matching networks

Inductive broad-band sensors for electromagnetic waves

Station-to-station control of backside bow compensation deposition

Wideband variable impedance load for high volume manufacturing qual...

System and method for monitoring semiconductor processes

Inspection apparatus

Systems and methods for using binning to increase power during a lo...

Semiconductor processing apparatus and dielectric window cleaning m...

Method and apparatus for revitalizing plasma processing tools

Plasma processing apparatus and plasma processing method

Device and method for producing layers with improved uniformity in...

Scanning electron microscope and image generation method using scan...

Numerically compensating SEM-induced charging using diffusion-based...

Multi-beam particle beam system and method for operating same

Substrate processing apparatus, method of manufacturing semiconduct...

Plasma generating device and process executing apparatus including...

Method, apparatus, and program for determining condition related to...

Substrate holding method and substrate processing apparatus

Flow metrology calibration for improved processing chamber matching...

Methods and systems for event modulated electron microscopy

Ultra-precision timing clock method

Patents Applicationslast 30 patents

ION ANGLE SENSOR

E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...

CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

Oxidation-Reduction Adjustable Plasma

CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...

ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF

MODEL-DRIVEN PRESSURE ESTIMATION

REAL-TIME PLASMA MEASUREMENT AND CONTROL

SEMICONDUCTOR PROCESS APPARATUS AND METHOD

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS

SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM

ION SOURCE WITH WIRE FORM METAL DOPANT

METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE

Novel arc management algorithm of RF generator and Match box for CC...

IMPROVED OPTICAL ACCESS FOR SPECTROSCOPIC MONITORING OF SEMICONDUCT...

PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM

MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF

SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS

METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...

DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...

ION BEAM PROFILING USING OPTICAL TOMOGRAPHY

DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE

SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...

Electron Filter