Detection characterised by the variable being measured

Industry

CPC
H01J2237/245

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/245Detection characterised by the variable being measured

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for inspecting a specimen and charged particle beam device
- Patent number 12,362,131
- Issue date Jul 15, 2025
- Applied Materials Israel Ltd.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,143
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for controlling a plasma sheath characteristic
- Patent number 12,362,159
- Issue date Jul 15, 2025
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspection apparatus and semiconductor inspection met...
- Patent number 12,362,139
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Yujin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,145
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yuji Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for measuring pedestal voltage uniformity in p...
- Patent number 12,362,136
- Issue date Jul 15, 2025
- Stephen Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio-frequency antenna and plasma processing device
- Patent number 12,354,839
- Issue date Jul 8, 2025
- EMD CORPORATION
- Akinori Ebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ focus ring coating
- Patent number 12,354,842
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay measurement system and overlay measurement device for overl...
- Patent number 12,354,829
- Issue date Jul 8, 2025
- HITACHI HIGH-TECH CORPORATION
- Masaki Sugie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of non-stoichiometric metal compound layer
- Patent number 12,351,901
- Issue date Jul 8, 2025
- SOLERAS ADVANCED COATINGS BV
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor analysis system
- Patent number 12,347,707
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yudai Kubo
- G05 - CONTROLLING REGULATING
Information Patent Grant
Determining an optimal ion energy for plasma processing of a dielec...
- Patent number 12,347,662
- Issue date Jul 1, 2025
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Qihao Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple charged-particle beam apparatus and methods of operating t...
- Patent number 12,347,643
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,334,299
- Issue date Jun 17, 2025
- HITACHI HIGH-TECH CORPORATION
- U Oh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device and aberration correction method
- Patent number 12,327,708
- Issue date Jun 10, 2025
- HITACHI HIGH-TECH CORPORATION
- Shingo Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnetic field signal acquisition system for high signal-to-...
- Patent number 12,322,580
- Issue date Jun 3, 2025
- Dublin City University
- Alessio Di Liberto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Auto-focus sensor implementation for multi-column microscopes
- Patent number 12,322,568
- Issue date Jun 3, 2025
- KLA Corporation
- Nicholas Petrone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional sweep probe system
- Patent number 12,322,581
- Issue date Jun 3, 2025
- Georgia Tech Research Corporation
- Chhavi Chhavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma diagnosis system and plasma diagnosis method
- Patent number 12,315,710
- Issue date May 27, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for observing permeation and diffusion path of observation t...
- Patent number 12,315,696
- Issue date May 27, 2025
- National Institute for Materials Science
- Akiko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and method and program for controlling...
- Patent number 12,315,704
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and methods of manufacturing semiconduc...
- Patent number 12,315,703
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Kyoungchon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical emission spectroscopy for advanced process characterization
- Patent number 12,306,044
- Issue date May 20, 2025
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time dosimetry
- Patent number 12,298,447
- Issue date May 13, 2025
- Reveam, Inc.
- Chip Starns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Hybrid matcher and radio frequency matching system including the hy...
- Patent number 12,288,674
- Issue date Apr 29, 2025
- Samsung Electronics Co., Ltd.
- Hyosin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,281,381
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Sireesh Adimadhyam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Resonant Frequency Shift as Etch Stop of Gate Oxide of MOSFET Trans...
- Publication number 20250232968
- Publication date Jul 17, 2025
- King Faisal University
- HESHAM MOHAMMED ENSHASY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND MEASUREMENT METHOD
- Publication number 20250232946
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Minami UCHIHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SA...
- Publication number 20250232948
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Hoonseop KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM OPTIMIZATION FOR OVERLAY MEASUREMENT OF BURIED FEATURES
- Publication number 20250231129
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Benoit Herve GAURY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND WAFER PR...
- Publication number 20250233023
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Jewon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ETCHING METHOD
- Publication number 20250226183
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20250226247
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- SOONKU KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...
- Publication number 20250226175
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Zhong-wei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218825
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jae Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTATE PROCESSING METHOD USING TH...
- Publication number 20250218752
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING TEMPERATURE
- Publication number 20250218736
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Yun Sik JU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MEASURING PLASMA DENSITY
- Publication number 20250218750
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sung Hyun YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME MEASUREMENT OF MICROWAVE RESONATORS AS PLASMA DIAGNOSTICS...
- Publication number 20250218751
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- DAVID PETERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...
- Publication number 20250218726
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Sanghyeon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD AND SUBSTRATE TREATMENT APPARATUS INCLUDING SHOWERHEAD
- Publication number 20250218731
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Je Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20250218747
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Dong Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIMODE DOSE COMPENSATION SYSTEM
- Publication number 20250218722
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Klaus PETRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
- Publication number 20250208074
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...
- Publication number 20250210310
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20250201515
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...
- Publication number 20250201540
- Publication date Jun 19, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian A. Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250201542
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Jinhyeok KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS PROVIDING APPARATUS AND SUBSTRATE TREATING APPARATUS IN...
- Publication number 20250201524
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Tae Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD
- Publication number 20250201601
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Kazuhito YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20250201531
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Chan Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250201525
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Jinhyeok KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Natural Frequency Adjuster For Extraction Electrodes
- Publication number 20250201508
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...
- Publication number 20250201518
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20250201528
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD
- Publication number 20250191883
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryuta HIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS

Detection characterised by the variable being measured

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for inspecting a specimen and charged particle beam device

Plasma processing apparatus and plasma processing method

Systems and methods for controlling a plasma sheath characteristic

Semiconductor inspection apparatus and semiconductor inspection met...

Plasma processing apparatus and plasma processing method

Apparatus and method for measuring pedestal voltage uniformity in p...

Radio-frequency antenna and plasma processing device

In-situ focus ring coating

Overlay measurement system and overlay measurement device for overl...

Deposition of non-stoichiometric metal compound layer

Semiconductor analysis system

Determining an optimal ion energy for plasma processing of a dielec...

Multiple charged-particle beam apparatus and methods of operating t...

Charged particle beam device

Charged particle beam device and aberration correction method

Electromagnetic field signal acquisition system for high signal-to-...

Auto-focus sensor implementation for multi-column microscopes

Three-dimensional sweep probe system

Plasma diagnosis system and plasma diagnosis method

Device for observing permeation and diffusion path of observation t...

Plasma processing apparatus, and method and program for controlling...

Carrier device, semiconductor apparatus, and residual charge detect...

Plasma processing apparatus and methods of manufacturing semiconduc...

Optical emission spectroscopy for advanced process characterization

RF immune sensor probe for monitoring a temperature of an electrost...

Power adjustment method of upper electrode power supply and semicon...

Real-time dosimetry

Hybrid matcher and radio frequency matching system including the hy...

Methods and apparatus for processing a substrate

Closed loop faraday correction of a horizontal beam current profile...

Patents Applicationslast 30 patents

Resonant Frequency Shift as Etch Stop of Gate Oxide of MOSFET Trans...

CHARGED PARTICLE BEAM DEVICE, AND MEASUREMENT METHOD

ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SA...

E-BEAM OPTIMIZATION FOR OVERLAY MEASUREMENT OF BURIED FEATURES

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND WAFER PR...

PLASMA TREATMENT DEVICE AND ETCHING METHOD

SEMICONDUCTOR PROCESSING APPARATUS

DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTATE PROCESSING METHOD USING TH...

APPARATUS AND METHOD FOR CONTROLLING TEMPERATURE

APPARATUS AND METHOD FOR MEASURING PLASMA DENSITY

REAL-TIME MEASUREMENT OF MICROWAVE RESONATORS AS PLASMA DIAGNOSTICS...

Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...

SHOWERHEAD AND SUBSTRATE TREATMENT APPARATUS INCLUDING SHOWERHEAD

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

MULTIMODE DOSE COMPENSATION SYSTEM

SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION

MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...

IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS

PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PROCESS GAS PROVIDING APPARATUS AND SUBSTRATE TREATING APPARATUS IN...

PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD

HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Natural Frequency Adjuster For Extraction Electrodes

PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS

PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD