Detection characterised by the variable being measured

Industry

CPC
H01J2237/245

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/245Detection characterised by the variable being measured

Industries

Patents Grantslast 30 patents

Information Patent Grant
Ultra-precision timing clock method
- Patent number 12,226,246
- Issue date Feb 18, 2025
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Effective temperature calculation method for multi-charged particle...
- Patent number 12,230,472
- Issue date Feb 18, 2025
- NuFlare Technology, Inc.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring instrument and measuring method
- Patent number 12,222,379
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Takayuki Hatanaka
- G01 - MEASURING TESTING
Information Patent Grant
Sorption chamber walls for semiconductor equipment
- Patent number 12,217,945
- Issue date Feb 4, 2025
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and electron microscope
- Patent number 12,217,928
- Issue date Feb 4, 2025
- HITACHI HIGH-TECH CORPORATION
- Hideo Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress modulation by implant to back of wafer
- Patent number 12,217,974
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 12,211,756
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measurement system, measurement method, and plasma processing device
- Patent number 12,211,676
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Ayuta Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,205,798
- Issue date Jan 21, 2025
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,205,801
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Toshiaki Saijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for voltage contrast defect detection
- Patent number 12,196,692
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Weiming Ren
- G01 - MEASURING TESTING
Information Patent Grant
Electron gun, electron beam applicator, and method for controlling...
- Patent number 12,198,889
- Issue date Jan 14, 2025
- Photo electron Soul Inc.
- Atsushi Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process monitoring apparatus using terahertz waves and monit...
- Patent number 12,198,893
- Issue date Jan 14, 2025
- IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
- Hak Sung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring device and optical fiber strain measuring jig thereof
- Patent number 12,196,629
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Tong Wu
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus and gas switching method for substra...
- Patent number 12,191,119
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for inspecting electrostatic chuck
- Patent number 12,181,504
- Issue date Dec 31, 2024
- Semes Co., Ltd.
- Su Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc management algorithm of RF generator and match box for CCP plas...
- Patent number 12,176,190
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Tiefeng Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature estimation apparatus, plasma processing system, tempera...
- Patent number 12,170,193
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Yuki Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 12,165,937
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for scanning a sample using multi-beam inspection...
- Patent number 12,165,837
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of profiling charged-particle beams
- Patent number 12,165,836
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition process apparatus and method of optimizin...
- Patent number 12,165,935
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hung Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING...
- Publication number 20250054727
- Publication date Feb 13, 2025
- NuFlare Technology, Inc.
- Tsubasa NANAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC DEVICE, AND SEMICONDUCTOR PROCESSING EQUIPMENT US...
- Publication number 20250046587
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Taehyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS
- Publication number 20250046563
- Publication date Feb 6, 2025
- Axcelis Technologies, Inc.
- Wilhelm Peter Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSIS DEVICE AND MANUFACTURING METHOD OF PLASMA DIAGNOSI...
- Publication number 20250046588
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Youn Sok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING A BEAM CONVERGENCE OF A CHARGED PARTICLE BEAM...
- Publication number 20250037965
- Publication date Jan 30, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dominik Ehberger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...
- Publication number 20250037968
- Publication date Jan 30, 2025
- CARL ZEISS MICROSCOPY GMBH
- Lucas Harmsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...
- Publication number 20250037969
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Tatsuya MUROFUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR SUBSTRATE, APPARATUS, AND METHOD
- Publication number 20250029811
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Arthur Eduard OVERLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...
- Publication number 20250022680
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Dmitry Klochkov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER
- Publication number 20250014862
- Publication date Jan 9, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsuyoshi NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...
- Publication number 20250006477
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC CIRCUIT INCLUDING VARIABLE AMPLIFICATION UNIT AND...
- Publication number 20240429034
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Juhyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240420923
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Manabu ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20240420935
- Publication date Dec 19, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsunahiko NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRINTED MICROWAVE RESONATOR FOR MEASURING HIGH ELECTRON DENSITY PLA...
- Publication number 20240412959
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- David PETERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT
- Publication number 20240404793
- Publication date Dec 5, 2024
- SEMES CO., LTD.
- Wook Sang JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
- Publication number 20240395509
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA STATE VARIABLE SPECIFYING METHOD INCLUDING A DOUBLE PROBE HA...
- Publication number 20240395516
- Publication date Nov 28, 2024
- IUCF-HYU(Industry-University Cooperation Foundation Hanyang University)
- Chin Wook CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRESSIVE HEATING OF COMPONENTS OF SUBSTRATE PROCESSING SYSTEMS U...
- Publication number 20240395569
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF
- Publication number 20240382166
- Publication date Nov 21, 2024
- Rodney HERRING
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS
- Publication number 20240385048
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Bruce E. ADAMS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...
- Publication number 20240379469
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Lei LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONFIRMING AND FINDING AN IONIZATION EDGE WITHIN A MEASU...
- Publication number 20240379324
- Publication date Nov 14, 2024
- FEI Company
- Wouter Rene J. VAN DEN BROEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL
- Publication number 20240379387
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION APPARATUS FOR SENSOR DEVICE AND SYSTEM INCLUDING THE SAME
- Publication number 20240379335
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Taijo Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240377256
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Yunsong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...
- Publication number 20240371608
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Ryan Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20240371615
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS

Detection characterised by the variable being measured

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ultra-precision timing clock method

Ion milling device

Effective temperature calculation method for multi-charged particle...

Measuring instrument and measuring method

Sorption chamber walls for semiconductor equipment

Electron gun and electron microscope

Localized stress modulation by implant to back of wafer

Deposition system and method

Measurement system, measurement method, and plasma processing device

High-frequency power supply apparatus

Rating substrate support assemblies based on impedance circuit elec...

Plasma processing apparatus and plasma processing method

Systems and methods for voltage contrast defect detection

Electron gun, electron beam applicator, and method for controlling...

Plasma process monitoring apparatus using terahertz waves and monit...

Measuring device and optical fiber strain measuring jig thereof

Substrate processing apparatus and gas switching method for substra...

Plasma processing apparatus and plasma processing method

Apparatus and method for inspecting electrostatic chuck

Arc management algorithm of RF generator and match box for CCP plas...

Ribbon beam angle adjustment in an ion implantation system

Substrate processing apparatus and interlock method thereof

Temperature estimation apparatus, plasma processing system, tempera...

Optical diagnostics of semiconductor process using hyperspectral im...

System and method for scanning a sample using multi-beam inspection...

Plasma processing method for manufacturing semiconductor structure

Multiple charged-particle beam apparatus with low crosstalk

System and methods for automated processing of multiple samples in...

Systems and methods of profiling charged-particle beams

Physical vapor deposition process apparatus and method of optimizin...

Patents Applicationslast 30 patents

BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING...

PLASMA DIAGNOSTIC DEVICE, AND SEMICONDUCTOR PROCESSING EQUIPMENT US...

MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS

PLASMA DIAGNOSIS DEVICE AND MANUFACTURING METHOD OF PLASMA DIAGNOSI...

METHOD OF DETERMINING A BEAM CONVERGENCE OF A CHARGED PARTICLE BEAM...

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...

CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...

SENSOR SUBSTRATE, APPARATUS, AND METHOD

3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...

METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER

PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

PLASMA DIAGNOSTIC CIRCUIT INCLUDING VARIABLE AMPLIFICATION UNIT AND...

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

PRINTED MICROWAVE RESONATOR FOR MEASURING HIGH ELECTRON DENSITY PLA...

SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT

APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING

PLASMA STATE VARIABLE SPECIFYING METHOD INCLUDING A DOUBLE PROBE HA...

PROGRESSIVE HEATING OF COMPONENTS OF SUBSTRATE PROCESSING SYSTEMS U...

CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF

ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...

METHOD FOR CONFIRMING AND FINDING AN IONIZATION EDGE WITHIN A MEASU...

SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL

CALIBRATION APPARATUS FOR SENSOR DEVICE AND SYSTEM INCLUDING THE SAME

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS