Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Industry

CPC
B24B53/017

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B24Grinding technology B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS B24B53/00Devices or means for dressing or conditioning abrasive surfaces

Current Industry

B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Industries

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method of brush cleaning using periodic chemical trea...
- Patent number 12,224,186
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Brian J. Brown
- B08 - CLEANING
Information Patent Grant
Polishing and loading/unloading component module
- Patent number 12,194,592
- Issue date Jan 14, 2025
- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
- Linghan Shen
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, method for manufacturing polishing pad, and polishin...
- Patent number 12,186,855
- Issue date Jan 7, 2025
- Kuraray Co., Ltd.
- Mitsuru Kato
- B24 - GRINDING POLISHING
Information Patent Grant
Pedestal polishing apparatus
- Patent number 12,162,117
- Issue date Dec 10, 2024
- Lam Research Corporation
- Robert McKinney
- B24 - GRINDING POLISHING
Information Patent Grant
Monitoring method for chemical mechanical polishing and chemical me...
- Patent number 12,151,335
- Issue date Nov 26, 2024
- HWATSING TECHNOLOGY CO., LTD.
- Xinchun Lu
- B24 - GRINDING POLISHING
Information Patent Grant
Method for polishing single-crystal diamond
- Patent number 12,151,337
- Issue date Nov 26, 2024
- Huaqiao University
- Jing Lu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Conditioning disk replacement apparatus and method
- Patent number 12,145,233
- Issue date Nov 19, 2024
- Samsung Electronics Co., Ltd.
- Hoseop Choi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Containment and exhaust system for substrate polishing components
- Patent number 12,145,236
- Issue date Nov 19, 2024
- Axus Technology, LLC
- Daniel Ray Trojan
- B24 - GRINDING POLISHING
Information Patent Grant
Pad conditioner cleaning system
- Patent number 12,134,167
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Shantanu Rajiv Gadgil
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing apparatus and method
- Patent number 12,076,831
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Wei
- B24 - GRINDING POLISHING
Information Patent Grant
Method of using polishing pad
- Patent number 12,070,833
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- ChunHung Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Ceramic substrate with reaction-bonded silicon carbide having diamo...
- Patent number 12,054,439
- Issue date Aug 6, 2024
- II-VI DELAWARE, INC.
- Samuel M. Salamone
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Chemical mechanical planarization tool
- Patent number 12,030,159
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Kai Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Carrier head having abrasive structure on retainer ring
- Patent number 12,011,803
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Sheng Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Method for polishing semiconductor substrate
- Patent number 11,999,027
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- James Jeng-Jyi Hwang
- B24 - GRINDING POLISHING
Information Patent Grant
Planar grinder
- Patent number 12,000,764
- Issue date Jun 4, 2024
- Illinois Tool Works Inc.
- Kurt G. Adair
- G01 - MEASURING TESTING
Information Patent Grant
Chemical mechanical polishing apparatus, chemical mechanical polish...
- Patent number 11,986,921
- Issue date May 21, 2024
- Samsung Electronics Co., Ltd.
- Myung-Ki Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintenance methods for polishing systems and articles related thereto
- Patent number 11,986,925
- Issue date May 21, 2024
- Applied Materials, Inc.
- Shantanu Rajiv Gadgil
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Dressing apparatus and polishing apparatus
- Patent number 11,980,997
- Issue date May 14, 2024
- OKAMOTO MACHINE TOOL WORKS, LTD.
- Takahiko Mitsui
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for shaping workpieces
- Patent number 11,958,165
- Issue date Apr 16, 2024
- Zeeko Innovations Limited
- Anthony Beaucamp
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing member dressing method
- Patent number 11,945,075
- Issue date Apr 2, 2024
- Ebara Corporation
- Keita Yagi
- B24 - GRINDING POLISHING
Information Patent Grant
Consumable part monitoring in chemical mechanical polisher
- Patent number 11,931,860
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Thomas H. Osterheld
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for cleaning process monitoring
- Patent number 11,926,017
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Charlie Wang
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method of manufacturing composite article
- Patent number 11,911,871
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hua-Chou Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abrasive machining
- Patent number 11,904,427
- Issue date Feb 20, 2024
- Rolls-Royce PLC
- Donka Novovic
- B24 - GRINDING POLISHING
Information Patent Grant
Temperature control in chemical mechanical polish
- Patent number 11,904,430
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kei-Wei Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, semiconductor fabricating device and fabricating met...
- Patent number 11,883,926
- Issue date Jan 30, 2024
- Kioxia Corporation
- Takahiko Kawasaki
- B24 - GRINDING POLISHING
Information Patent Grant
Temperature-based in-situ edge assymetry correction during CMP
- Patent number 11,865,671
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 11,858,088
- Issue date Jan 2, 2024
- Disco Corporation
- Toshiyuki Moriya
- B24 - GRINDING POLISHING
Information Patent Grant
Methods to clean chemical mechanical polishing systems
- Patent number 11,850,704
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chieh Chang
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POLISHING PAD CONDITIONING APPARATUS
- Publication number 20250065472
- Publication date Feb 27, 2025
- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
- Hongxiu HE
- B24 - GRINDING POLISHING
Information Patent Application
DRESSER FOR POLISHING PAD, DRESSING METHOD, POLISHING METHOD, AND M...
- Publication number 20250065471
- Publication date Feb 27, 2025
- Noritake Co., Limited
- Masatoshi KISHIMOTO
- B24 - GRINDING POLISHING
Information Patent Application
CONTAINMENT AND EXHAUST SYSTEM FOR SUBSTRATE POLISHING COMPONENTS
- Publication number 20250065473
- Publication date Feb 27, 2025
- AXUS TECHNOLOGY, LLC
- Daniel Ray Trojan
- B24 - GRINDING POLISHING
Information Patent Application
PAD CONDITIONING DISK WITH COMPRESSIBLE CIRCUMFERENTIAL LAYER
- Publication number 20250058429
- Publication date Feb 20, 2025
- 3M Innovative Properties Company
- Matthew C. Fritz
- B24 - GRINDING POLISHING
Information Patent Application
CMP CONDITIONING DISC AND METHOD OF MANUFACTURING THE CMP CONDITION...
- Publication number 20250058430
- Publication date Feb 20, 2025
- EHWA DIAMOND INDUSTRIAL COMPANY LIMITED
- Yongsik MOON
- B22 - CASTING POWDER METALLURGY
Information Patent Application
PAD CONDITIONER
- Publication number 20250050463
- Publication date Feb 13, 2025
- SAESOL Diamond Ind. Co., Ltd.
- Sung Goo LEE
- B24 - GRINDING POLISHING
Information Patent Application
CONDITIONING ASSEMBLY AND DRESSING DEVICE THEREOF
- Publication number 20250050465
- Publication date Feb 13, 2025
- ABRASIVE TOTAL SOLUTIONS CO., LTD.
- YING-TUNG CHEN
- B24 - GRINDING POLISHING
Information Patent Application
PAD CONDITIONING BRUSH
- Publication number 20250050460
- Publication date Feb 13, 2025
- 3M Innovative Properties Company
- Uma Rames Krishna Lagudu
- B24 - GRINDING POLISHING
Information Patent Application
CONDITIONING DISK WITH MICROFEATURES
- Publication number 20250050464
- Publication date Feb 13, 2025
- 3M Innovative Properties Company
- Junqing Xie
- B24 - GRINDING POLISHING
Information Patent Application
PAD CONDITIONING DISK GIMBALING CONTROL
- Publication number 20250041985
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Justin H. WONG
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20250041989
- Publication date Feb 6, 2025
- EBARA CORPORATION
- Masaki KINOSHITA
- B24 - GRINDING POLISHING
Information Patent Application
PEDESTAL POLISHING APPARATUS
- Publication number 20250041990
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Robert McKinney
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS
- Publication number 20250025982
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Donghoon Kwon
- B24 - GRINDING POLISHING
Information Patent Application
CONDITIONING DISK REPLACEMENT APPARATUS AND METHOD
- Publication number 20240424627
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Hoseop Choi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE SUCTION MEMBER, ELASTIC SEAL ASSEMBLY, TOP RING, AND SUBS...
- Publication number 20240416480
- Publication date Dec 19, 2024
- EBARA CORPORATION
- Kazuhiro TAJIMA
- B24 - GRINDING POLISHING
Information Patent Application
SYSTEM AND METHOD FOR REMOVING IMPURITIES DURING CHEMICAL MECHANICA...
- Publication number 20240412977
- Publication date Dec 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Te-Chien HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PAD CONDITIONERS
- Publication number 20240399538
- Publication date Dec 5, 2024
- Samsung Electronics Co., Ltd.
- Seonmin YUN
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISH PAD CONDITIONER WITH MULTIPLE DISKS
- Publication number 20240391056
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Nai-Chieh HUANG
- B24 - GRINDING POLISHING
Information Patent Application
Polish Apparatus and Methods for Use
- Publication number 20240383096
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsiang Yen
- B24 - GRINDING POLISHING
Information Patent Application
VACUUM ASSEMBLY FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20240383100
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chen Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE CLEAN SYSTEM AND METHOD
- Publication number 20240383105
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Yi Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER POLISHING SYSTEM
- Publication number 20240367283
- Publication date Nov 7, 2024
- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
- Xiaoyu XU
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF USING POLISHING PAD
- Publication number 20240359288
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- ChunHung CHEN
- B24 - GRINDING POLISHING
Information Patent Application
CERAMIC SUBSTATE WITH REACTION-BONDED SILICON CARBIDE HAVING DIAMON...
- Publication number 20240360049
- Publication date Oct 31, 2024
- II-VI Delaware, Inc.
- Samuel M SALAMONE
- B24 - GRINDING POLISHING
Information Patent Application
PAD CONDITIONER
- Publication number 20240351164
- Publication date Oct 24, 2024
- Saesol Diamond Ind. Co., Ltd.
- Ji Woo KIM
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHOD OF BRUSH CLEANING USING PERIODIC CHEMICAL TREA...
- Publication number 20240332037
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Brian J. BROWN
- B08 - CLEANING
Information Patent Application
LIQUID SUPPLY DEVICE AND POLISHING DEVICE
- Publication number 20240308028
- Publication date Sep 19, 2024
- EBARA CORPORATION
- Noriyuki SATO
- B24 - GRINDING POLISHING
Information Patent Application
COVER ASSEMBLY, CLEANING METHOD, AND METHOD FOR MANUFACTURING COVER...
- Publication number 20240308023
- Publication date Sep 19, 2024
- EBARA CORPORATION
- YUSUKE MOCHIDA
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POL...
- Publication number 20240278383
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Hwiyoung Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONDITIONING POLISHING TOOL, SUBSTRATE PROCESSING METHOD...
- Publication number 20240253182
- Publication date Aug 1, 2024
- SCREEN Holdings Co., Ltd.
- Ryohei HOKAKU
- B24 - GRINDING POLISHING

Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method of brush cleaning using periodic chemical trea...

Polishing and loading/unloading component module

Polishing pad, method for manufacturing polishing pad, and polishin...

Pedestal polishing apparatus

Monitoring method for chemical mechanical polishing and chemical me...

Method for polishing single-crystal diamond

Conditioning disk replacement apparatus and method

Containment and exhaust system for substrate polishing components

Pad conditioner cleaning system

Chemical mechanical polishing apparatus and method

Method of using polishing pad

Ceramic substrate with reaction-bonded silicon carbide having diamo...

Chemical mechanical planarization tool

Carrier head having abrasive structure on retainer ring

Method for polishing semiconductor substrate

Planar grinder

Chemical mechanical polishing apparatus, chemical mechanical polish...

Maintenance methods for polishing systems and articles related thereto

Dressing apparatus and polishing apparatus

Methods and apparatus for shaping workpieces

Polishing apparatus and polishing member dressing method

Consumable part monitoring in chemical mechanical polisher

Method and apparatus for cleaning process monitoring

Method of manufacturing composite article

Abrasive machining

Temperature control in chemical mechanical polish

Polishing pad, semiconductor fabricating device and fabricating met...

Temperature-based in-situ edge assymetry correction during CMP

Polishing apparatus

Methods to clean chemical mechanical polishing systems

Patents Applicationslast 30 patents

POLISHING PAD CONDITIONING APPARATUS

DRESSER FOR POLISHING PAD, DRESSING METHOD, POLISHING METHOD, AND M...

CONTAINMENT AND EXHAUST SYSTEM FOR SUBSTRATE POLISHING COMPONENTS

PAD CONDITIONING DISK WITH COMPRESSIBLE CIRCUMFERENTIAL LAYER

CMP CONDITIONING DISC AND METHOD OF MANUFACTURING THE CMP CONDITION...

PAD CONDITIONER

CONDITIONING ASSEMBLY AND DRESSING DEVICE THEREOF

PAD CONDITIONING BRUSH

CONDITIONING DISK WITH MICROFEATURES

PAD CONDITIONING DISK GIMBALING CONTROL

POLISHING APPARATUS

PEDESTAL POLISHING APPARATUS

CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS

CONDITIONING DISK REPLACEMENT APPARATUS AND METHOD

SUBSTRATE SUCTION MEMBER, ELASTIC SEAL ASSEMBLY, TOP RING, AND SUBS...

SYSTEM AND METHOD FOR REMOVING IMPURITIES DURING CHEMICAL MECHANICA...

PAD CONDITIONERS

CHEMICAL MECHANICAL POLISH PAD CONDITIONER WITH MULTIPLE DISKS

Polish Apparatus and Methods for Use

VACUUM ASSEMBLY FOR CHEMICAL MECHANICAL POLISHING

SURFACE CLEAN SYSTEM AND METHOD

WAFER POLISHING SYSTEM

METHOD OF USING POLISHING PAD

CERAMIC SUBSTATE WITH REACTION-BONDED SILICON CARBIDE HAVING DIAMON...

PAD CONDITIONER

APPARATUS AND METHOD OF BRUSH CLEANING USING PERIODIC CHEMICAL TREA...

LIQUID SUPPLY DEVICE AND POLISHING DEVICE

COVER ASSEMBLY, CLEANING METHOD, AND METHOD FOR MANUFACTURING COVER...

CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POL...

METHOD FOR CONDITIONING POLISHING TOOL, SUBSTRATE PROCESSING METHOD...