Diaphragms Shields associated with electron or ion-optical arrangements Compensation of disturbing fields

Industry

CPC
H01J37/09

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/09Diaphragms Shields associated with electron or ion-optical arrangements Compensation of disturbing fields

Industries

Patents Grantslast 30 patents

Information Patent Grant
Electron gun and charged particle beam device equipped with electro...
- Patent number 11,978,609
- Issue date May 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Minoru Kaneda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Charged particle beam system
- Patent number 11,961,704
- Issue date Apr 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Naoki Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining an energy width of a charged particle beam
- Patent number 11,948,771
- Issue date Apr 2, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,658
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,908,659
- Issue date Feb 20, 2024
- NuFlare Technology, Inc.
- Toshiki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,894,213
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput multi-electron beam system
- Patent number 11,869,743
- Issue date Jan 9, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depositive shielding for fiducial protection from redeposition
- Patent number 11,817,395
- Issue date Nov 14, 2023
- FEI Company
- Sean Morgan-Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam device
- Patent number 11,817,289
- Issue date Nov 14, 2023
- HITACHI HIGH-TECH CORPORATION
- Tsunenori Nomaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,798,776
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector
- Patent number 11,791,125
- Issue date Oct 17, 2023
- NuFlare Technology, Inc.
- Yuichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-leaf collimator
- Patent number 11,771,922
- Issue date Oct 3, 2023
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfang Liu
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Liquid metal ion source and focused ion beam apparatus
- Patent number 11,749,493
- Issue date Sep 5, 2023
- Hitachi High-Tech Science Corporation
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam processing apparatus
- Patent number 11,721,517
- Issue date Aug 8, 2023
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnetic field shielding plate, method for manufacturing sam...
- Patent number 11,690,208
- Issue date Jun 27, 2023
- HITACHI HIGH-TECH CORPORATION
- Ichiro Miyano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,670,477
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of electron beam comprising pinnacle limiting plate and m...
- Patent number 11,664,186
- Issue date May 30, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnetic field shielding plate, method for manufacturing sam...
- Patent number 11,659,700
- Issue date May 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Ichiro Miyano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of creating multiple electron beams
- Patent number 11,651,934
- Issue date May 16, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode holding assembly and arc chamber support assembly with the...
- Patent number 11,651,933
- Issue date May 16, 2023
- E/G Electro-Graph, Inc.
- Nam Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling apparatus and method of manufacturing sample
- Patent number 11,621,143
- Issue date Apr 4, 2023
- Jeol Ltd.
- Shogo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical system and multi-beam image acquiring apparatus
- Patent number 11,621,144
- Issue date Apr 4, 2023
- NuFlare Technology, Inc.
- John Hartley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
High-resolution multiple beam source
- Patent number 11,615,938
- Issue date Mar 28, 2023
- NUFLARE TECHNOLOGY, INC.
- John Hartley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,605,523
- Issue date Mar 14, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,574,793
- Issue date Feb 7, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspection apparatus and pattern outline position acquisiti...
- Patent number 11,569,057
- Issue date Jan 31, 2023
- NuFlare Technology, Inc.
- Shinji Sugihara
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...
- Publication number 20240136148
- Publication date Apr 25, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM INSPECTION
- Publication number 20240120173
- Publication date Apr 11, 2024
- VueReal Inc.
- Gholamreza CHAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample Milling Apparatus, Shield Plate, and Sample Milling Method
- Publication number 20240096584
- Publication date Mar 21, 2024
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mesh Integrity Check
- Publication number 20240085171
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- David Laemmle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BE...
- Publication number 20240038481
- Publication date Feb 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240029999
- Publication date Jan 25, 2024
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mechanism for Adjusting Angle of Incidence on Charged Particle Beam...
- Publication number 20240029992
- Publication date Jan 25, 2024
- Hitachi High-Tech Corporation
- Shunichi MOTOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOOD COLUMN AND CHARGED PARTICLE APPARATUS
- Publication number 20240006147
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID MET...
- Publication number 20230411109
- Publication date Dec 21, 2023
- FEI Company
- Sean M. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING CHARGED PARTICLE BEAMS
- Publication number 20230411110
- Publication date Dec 21, 2023
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
- Publication number 20230324318
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM IRRADIATION APPARATUS
- Publication number 20230317403
- Publication date Oct 5, 2023
- Sumitomo Heavy Industries, Ltd.
- Takuya FUKUURA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING
- Publication number 20230317402
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Derk Ferdinand WALVOORT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...
- Publication number 20230298848
- Publication date Sep 21, 2023
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Energy Filter, and Energy Analyzer and Charged Particle Beam Device...
- Publication number 20230298845
- Publication date Sep 21, 2023
- Hitachi High-Tech Corporation
- Kazuhiro HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20230260741
- Publication date Aug 17, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tetsuya Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230245849
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR REDUCING ICE CONTAMINATION OF A SAMPLE, FOCUSED ION BEAM...
- Publication number 20230215681
- Publication date Jul 6, 2023
- Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
- Sebastian TACKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOROIDAL MOTION ENHANCED ION SOURCE
- Publication number 20230187165
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- June Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shield For Filament In An Ion Source
- Publication number 20230162941
- Publication date May 25, 2023
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...
- Publication number 20230154723
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN INSPECTION APPARATUS, AND METHOD FOR ACQUIRING ALIGNMENT AM...
- Publication number 20230145411
- Publication date May 11, 2023
- NuFlare Technology, Inc.
- Shinji SUGIHARA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS
- Publication number 20230124558
- Publication date Apr 20, 2023
- ASML NETHERLANDS B.V.
- Johannes Cornelis Jacobus DE LANGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods of Creating Multiple Electron Beams
- Publication number 20230109032
- Publication date Apr 6, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM
- Publication number 20230109124
- Publication date Apr 6, 2023
- CARL ZEISS MICROSCOPY GMBH
- Gero Walter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTIC...
- Publication number 20230065475
- Publication date Mar 2, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam Pattern Device Having Beam Absorber Structure
- Publication number 20230052445
- Publication date Feb 16, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...
- Publication number 20230037583
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STACK ALIGNMENT TECHNIQUES
- Publication number 20230020745
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Arjen Benjamin STORM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE DEVICE AND ELECTRON BEAM INSPECTION AP...
- Publication number 20230005709
- Publication date Jan 5, 2023
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS

Diaphragms Shields associated with electron or ion-optical arrangements Compensation of disturbing fields

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electron gun and charged particle beam device equipped with electro...

Beam grid layout

Charged particle beam system

Apparatus using charged particle beams

Method of determining an energy width of a charged particle beam

Systems and methods for real time stereo imaging using multiple ele...

Scanning electron microscope device and electron beam inspection ap...

Multi charged particle beam writing apparatus

Ion milling device

High throughput multi-electron beam system

Depositive shielding for fiducial protection from redeposition

Charged particle beam device

Multi charged particle beam adjustment method, multi charged partic...

Charged particle beam apparatus

Aberration corrector

Multi-leaf collimator

Liquid metal ion source and focused ion beam apparatus

Focused ion beam processing apparatus

Electromagnetic field shielding plate, method for manufacturing sam...

Apparatus using charged particle beams

Apparatus of electron beam comprising pinnacle limiting plate and m...

Electromagnetic field shielding plate, method for manufacturing sam...

Systems and methods of creating multiple electron beams

Cathode holding assembly and arc chamber support assembly with the...

Ion milling apparatus and method of manufacturing sample

Electron optical system and multi-beam image acquiring apparatus

High-resolution multiple beam source

Aberration corrector and multiple electron beam irradiation apparatus

Aberration corrector and multiple electron beam irradiation apparatus

Pattern inspection apparatus and pattern outline position acquisiti...

Patents Applicationslast 30 patents

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...

EBEAM INSPECTION

Sample Milling Apparatus, Shield Plate, and Sample Milling Method

Mesh Integrity Check

IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BE...

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

Mechanism for Adjusting Angle of Incidence on Charged Particle Beam...

FLOOD COLUMN AND CHARGED PARTICLE APPARATUS

METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID MET...

APPARATUS USING CHARGED PARTICLE BEAMS

CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD

PARTICLE BEAM IRRADIATION APPARATUS

ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING

CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...

Energy Filter, and Energy Analyzer and Charged Particle Beam Device...

ION IMPLANTER AND ION IMPLANTATION METHOD

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

DEVICE FOR REDUCING ICE CONTAMINATION OF A SAMPLE, FOCUSED ION BEAM...

TOROIDAL MOTION ENHANCED ION SOURCE

Shield For Filament In An Ion Source

SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...

PATTERN INSPECTION APPARATUS, AND METHOD FOR ACQUIRING ALIGNMENT AM...

BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS

Systems and Methods of Creating Multiple Electron Beams

PARTICLE BEAM SYSTEM

PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTIC...

Beam Pattern Device Having Beam Absorber Structure

APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...

STACK ALIGNMENT TECHNIQUES

SCANNING ELECTRON MICROSCOPE DEVICE AND ELECTRON BEAM INSPECTION AP...