Diaphragms Shields associated with electron or ion-optical arrangements Compensation of disturbing fields

Industry

CPC
H01J37/09

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/09Diaphragms Shields associated with electron or ion-optical arrangements Compensation of disturbing fields

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Particle beam device having a deflection unit
- Patent number 12,288,664
- Issue date Apr 29, 2025
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 12,283,452
- Issue date Apr 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Hiroshi Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for forming a three-dimensional article
- Patent number 12,269,092
- Issue date Apr 8, 2025
- Arcam AB
- Safdar Ali
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Multi-beam particle beam system and method for operating same
- Patent number 12,255,040
- Issue date Mar 18, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for azimuthal deflection of individual particl...
- Patent number 12,249,478
- Issue date Mar 11, 2025
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens designs
- Patent number 12,243,714
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Laura Del Tin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for determining the virtual source location of a liquid met...
- Patent number 12,237,142
- Issue date Feb 25, 2025
- FEI Company
- Sean M. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toroidal motion enhanced ion source
- Patent number 12,154,755
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- June Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for adjusting angle of incidence on charged particle beam...
- Patent number 12,119,202
- Issue date Oct 15, 2024
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder, method for using sample holder, projection amount ad...
- Patent number 12,080,511
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Megumi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shield for filament in an ion source
- Patent number 12,046,443
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam adjustment method and three-dimensional powder bed fusion addi...
- Patent number 12,020,894
- Issue date Jun 25, 2024
- Jeol Ltd.
- Shio En
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Carbon nanotube device
- Patent number 11,996,261
- Issue date May 28, 2024
- Tsinghua University
- Xin-Yu Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and charged particle beam device equipped with electro...
- Patent number 11,978,609
- Issue date May 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Minoru Kaneda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Charged particle beam system
- Patent number 11,961,704
- Issue date Apr 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Naoki Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining an energy width of a charged particle beam
- Patent number 11,948,771
- Issue date Apr 2, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,658
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,908,659
- Issue date Feb 20, 2024
- NuFlare Technology, Inc.
- Toshiki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,894,213
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput multi-electron beam system
- Patent number 11,869,743
- Issue date Jan 9, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depositive shielding for fiducial protection from redeposition
- Patent number 11,817,395
- Issue date Nov 14, 2023
- FEI Company
- Sean Morgan-Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam device
- Patent number 11,817,289
- Issue date Nov 14, 2023
- HITACHI HIGH-TECH CORPORATION
- Tsunenori Nomaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,798,776
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector
- Patent number 11,791,125
- Issue date Oct 17, 2023
- NuFlare Technology, Inc.
- Yuichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID MET...
- Publication number 20250157780
- Publication date May 15, 2025
- FEI Company
- Sean M. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM FORMING UNIT WITH REDUCED SENSITIV...
- Publication number 20250125115
- Publication date Apr 17, 2025
- Carl Zeiss MultiSEM GmbH
- Christian Veit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LENS DESIGNS
- Publication number 20250125120
- Publication date Apr 17, 2025
- ASML NETHERLANDS B.V.
- Laura DEL TIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20250095950
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Paul IJmert SCHEFFERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20250079112
- Publication date Mar 6, 2025
- Hitachi High-Tech Corporation
- Hiroshi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREFOR
- Publication number 20250069858
- Publication date Feb 27, 2025
- ULVAC, Inc.
- Kenta DOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20250046567
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VALVES FOR CHARGED PARTICLE BEAM MICROSCOPE, VALVE MEMBER AND CHARG...
- Publication number 20250029808
- Publication date Jan 23, 2025
- Carl Zeiss MultiSEM GmbH
- Steffen Balling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIB AND SEM RESOLUTION ENHANCEMENT USING ASYMMETRIC PROBE DECONVOLU...
- Publication number 20250029809
- Publication date Jan 23, 2025
- FEI Company
- Galen GLEDHILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...
- Publication number 20250029807
- Publication date Jan 23, 2025
- INTEGRATED DYNAMICS ENGINEERING GMBH
- Steve Jackson DJEMPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
- Publication number 20240412407
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Junghee Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED T...
- Publication number 20240402104
- Publication date Dec 5, 2024
- Carl Zeiss MultiSEM GmbH
- Gero Storeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...
- Publication number 20240379322
- Publication date Nov 14, 2024
- Carl Zeiss MultiSEM GmbH
- Alexander Wertz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM DEVICE
- Publication number 20240355574
- Publication date Oct 24, 2024
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPA...
- Publication number 20240339291
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Herre Tjerk STEENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATION DEVICE AND ION IMPLANTER
- Publication number 20240266140
- Publication date Aug 8, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Sho KAWATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...
- Publication number 20240258065
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dose Cup Assembly for an Ion Implanter
- Publication number 20240249908
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Frank Sinclair
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SAMPLE HOLDER AND IMPEDANCE MICROSCOPE
- Publication number 20240242927
- Publication date Jul 18, 2024
- National Institute of Advanced Industrial Science and Technology
- Toshihiko OGURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...
- Publication number 20240234083
- Publication date Jul 11, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Fabrication of Shield Plate
- Publication number 20240208762
- Publication date Jun 27, 2024
- JEOL Ltd.
- Tsutomu Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
- Publication number 20240194438
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...
- Publication number 20240136148
- Publication date Apr 25, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS

Diaphragms Shields associated with electron or ion-optical arrangements Compensation of disturbing fields

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Particle beam device having a deflection unit

Charged particle beam apparatus

Apparatus and method for forming a three-dimensional article

Multi-beam particle beam system and method for operating same

Particle beam system for azimuthal deflection of individual particl...

Lens designs

Methods for determining the virtual source location of a liquid met...

Multiple charged-particle beam apparatus with low crosstalk

Toroidal motion enhanced ion source

Beam pattern device having beam absorber structure

Mechanism for adjusting angle of incidence on charged particle beam...

Sample holder, method for using sample holder, projection amount ad...

Shield for filament in an ion source

Beam adjustment method and three-dimensional powder bed fusion addi...

Carbon nanotube device

Electron gun and charged particle beam device equipped with electro...

Beam grid layout

Charged particle beam system

Apparatus using charged particle beams

Method of determining an energy width of a charged particle beam

Systems and methods for real time stereo imaging using multiple ele...

Scanning electron microscope device and electron beam inspection ap...

Multi charged particle beam writing apparatus

Ion milling device

High throughput multi-electron beam system

Depositive shielding for fiducial protection from redeposition

Charged particle beam device

Multi charged particle beam adjustment method, multi charged partic...

Charged particle beam apparatus

Aberration corrector

Patents Applicationslast 30 patents

METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID MET...

MULTI-BEAM SYSTEM AND MULTI-BEAM FORMING UNIT WITH REDUCED SENSITIV...

LENS DESIGNS

ELECTRON-OPTICAL DEVICE

Charged Particle Beam Apparatus

PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREFOR

Ion Milling Device

VALVES FOR CHARGED PARTICLE BEAM MICROSCOPE, VALVE MEMBER AND CHARG...

FIB AND SEM RESOLUTION ENHANCEMENT USING ASYMMETRIC PROBE DECONVOLU...

APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...

SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME

MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED T...

MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...

FOCUSED ION BEAM SYSTEM

FOCUSED ION BEAM DEVICE

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPA...

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

System and Method for Reducing Particle Formation in a Process Cham...

ION GENERATION DEVICE AND ION IMPLANTER

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...

Dose Cup Assembly for an Ion Implanter

SAMPLE HOLDER AND IMPEDANCE MICROSCOPE

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...

Apparatus and Method for Fabrication of Shield Plate

ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...