Membership
Tour
Register
Log in
Differential etching apparatus including particular materials of construction
Follow
Industry
CPC
Y10S156/914
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
Y
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10
USPC classification
Y10S
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S156/00
Adhesive bonding and miscellaneous chemical manufacture
Current Industry
Y10S156/914
Differential etching apparatus including particular materials of construction
Industries
Overview
Organizations
People
Information
Impact
Please log in for detailed analytics
Patents Grants
last 30 patents
Information
Patent Grant
Method for fabricating chamber parts
Patent number
11,591,689
Issue date
Feb 28, 2023
Applied Materials, Inc.
Mats Larsson
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for backside polymer reduction in dry-etch process
Patent number
8,529,783
Issue date
Sep 10, 2013
Taiwan Semiconductor Manufacturing Co., Ltd.
Huang-Ming Chen
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Plasma confinement rings having reduced polymer deposition characte...
Patent number
8,500,952
Issue date
Aug 6, 2013
Lam Research Corporation
Rajinder Dhindsa
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Plasma confinement rings having reduced polymer deposition characte...
Patent number
8,262,922
Issue date
Sep 11, 2012
Lam Research Corporation
Rajinder Dhindsa
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method and apparatus for backside polymer reduction in dry-etch pro...
Patent number
7,713,380
Issue date
May 11, 2010
Taiwan Semiconductor Manufacturing Co., Ltd.
Huang-Ming Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma confinement ring assemblies having reduced polymer depositio...
Patent number
7,430,986
Issue date
Oct 7, 2008
Lam Research Corporation
Rajinder Dhindsa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Island projection-modified part, method for producing the same, and...
Patent number
7,338,699
Issue date
Mar 4, 2008
Tosoh Corporation
Koyata Takahashi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Dielectric-coated electrode, plasma discharge treatment apparatus a...
Patent number
7,281,491
Issue date
Oct 16, 2007
Konica Corporation
Shunichi Iwamaru
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Chemical vapor deposition apparatus
Patent number
7,270,715
Issue date
Sep 18, 2007
Micron Technology, Inc.
Ross S. Dando
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate processing apparatus and substrate processing method
Patent number
7,229,522
Issue date
Jun 12, 2007
Tokyo Electron Limited
Takayuki Toshima
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chamber having components with textured surfaces and method of manu...
Patent number
6,933,025
Issue date
Aug 23, 2005
Applied Materials, Inc.
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical vapor deposition apparatus
Patent number
6,814,813
Issue date
Nov 9, 2004
Micron Technology, Inc.
Ross S. Dando
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Coating boron carbide on aluminum
Patent number
6,808,747
Issue date
Oct 26, 2004
Hong Shih
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Chamber components having textured surfaces and method of manufacture
Patent number
6,777,045
Issue date
Aug 17, 2004
Applied Materials Inc.
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etching method and etching apparatus of carbon thin film
Patent number
6,743,729
Issue date
Jun 1, 2004
Osaka Prefecture
Katsutoshi Izumi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Container for treating with corrosive-gas and plasma and method for...
Patent number
6,645,585
Issue date
Nov 11, 2003
Kyocera Corporation
Shunichi Ozono
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing using a member comprising an oxide of a group...
Patent number
6,641,697
Issue date
Nov 4, 2003
Applied Materials, Inc.
Nianci Han
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low contamination high density plasma etch chambers and methods for...
Patent number
6,583,064
Issue date
Jun 24, 2003
Lam Research Corporation
Thomas E. Wicker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low contamination high density plasma etch chambers and methods for...
Patent number
6,394,026
Issue date
May 28, 2002
Lam Research Corporation
Thomas E. Wicker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Thin film formed by inductively coupled plasma
Patent number
6,380,612
Issue date
Apr 30, 2002
Hyundai Display Technology, Inc.
Jin Jang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Ceramic composition for an apparatus and method for processing a su...
Patent number
6,352,611
Issue date
Mar 5, 2002
Applied Materials, Inc.
Nianci Han
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Vacuum treatment system and its stage
Patent number
6,235,146
Issue date
May 22, 2001
Hitachi, Ltd.
Masanori Kadotani
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Coating for parts used in semiconductor processing chambers
Patent number
6,235,120
Issue date
May 22, 2001
Applied Materials, Inc.
Won Bang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Instrument for production of semiconductor device and process for p...
Patent number
6,221,200
Issue date
Apr 24, 2001
Nisshinbo Industries Inc.
Kazuo Saito
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate support for a thermal processing chamber
Patent number
6,200,388
Issue date
Mar 13, 2001
Applied Materials, Inc.
Dean C. Jennings
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Center gas feed apparatus for a high density plasma reactor
Patent number
6,193,836
Issue date
Feb 27, 2001
Applied Materials, Inc.
Jon Mohn
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low contamination high density plasma etch chambers and methods for...
Patent number
6,129,808
Issue date
Oct 10, 2000
Lam Research Corporation
Thomas E. Wicker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Ceramic composition for an apparatus and method for processing a su...
Patent number
6,123,791
Issue date
Sep 26, 2000
Applied Materials, Inc.
Nianci Han
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for processing glass substrate
Patent number
6,120,661
Issue date
Sep 19, 2000
Sony Corporation
Shinsuke Hirano
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Boron carbide parts and coatings in a plasma reactor
Patent number
6,120,640
Issue date
Sep 19, 2000
Applied Materials, Inc.
Hong Shih
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
METHOD FOR FABRICATING CHAMBER PARTS
Publication number
20230167543
Publication date
Jun 1, 2023
Applied Materials, Inc.
Mats LARSSON
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA CONFINEMENT RINGS HAVING REDUCED POLYMER DEPOSITION CHARACTE...
Publication number
20120325407
Publication date
Dec 27, 2012
LAM RESEARCH CORPORATION
Rajinder Dhindsa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for backside polymer reduction in dry-etch process
Publication number
20100190349
Publication date
Jul 29, 2010
Taiwan Semiconductor Manufacturing Company, Ltd.
Huang-Ming Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma confinement rings assemblies having reduced polymer depositi...
Publication number
20080318433
Publication date
Dec 25, 2008
LAM RESEARCH CORPORATION
Rajinder Dhindsa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma confinement ring assemblies having reduced polymer depositio...
Publication number
20060207502
Publication date
Sep 21, 2006
Rajinder Dhindsa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for backside polymer reduction in dry-etch pro...
Publication number
20050164506
Publication date
Jul 28, 2005
Huang-Ming Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Chamber having components with textured surfaces and method of manu...
Publication number
20040180158
Publication date
Sep 16, 2004
APPLIED MATERIALS, INC.
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Chemical vapor deposition apparatus
Publication number
20040089240
Publication date
May 13, 2004
Ross S. Dando
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Island projection-modified part, method for producing the same, and...
Publication number
20040086689
Publication date
May 6, 2004
TOSOH CORPORATION
Koyata Takahashi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Substrate processing apparatus and substrate processing method
Publication number
20040063319
Publication date
Apr 1, 2004
Takayuki Toshima
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dielectric-coated electrode, plasma discharge treatment apparatus a...
Publication number
20030228416
Publication date
Dec 11, 2003
Shunichi Iwamaru
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Chemical vapor deposition apparatus
Publication number
20030200926
Publication date
Oct 30, 2003
Ross S. Dando
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Process chamber components having textured internal surfaces and me...
Publication number
20030026917
Publication date
Feb 6, 2003
Shyh-Nung Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Etching method and etching apparatus of carbon thin film
Publication number
20020130107
Publication date
Sep 19, 2002
OSAKA PREFECTURE
Katsutoshi Izumi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Low contamination high density plasma etch chambers and methods for...
Publication number
20020102858
Publication date
Aug 1, 2002
Thomas E. Wicker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Substrate processing using a member comprising an oxide of a group...
Publication number
20020100554
Publication date
Aug 1, 2002
APPLIED MATERIALS, INC.
Nianci Han
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Container for treating with corrosive-gas and plasma and method for...
Publication number
20020009560
Publication date
Jan 24, 2002
KYOCERA CORPORATION
Shunichi Ozono
B32 - LAYERED PRODUCTS